Photomask fabrication technology:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
McGraw-Hill
2005
|
| Schriftenreihe: | McGraw-Hill electronic engineering
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Includes bibliographical references and index |
| Beschreibung: | XI, 571 S. Ill., graph. Darst. |
| ISBN: | 0071445633 |
Internformat
MARC
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| 300 | |a XI, 571 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a McGraw-Hill electronic engineering | |
| 500 | |a Includes bibliographical references and index | ||
| 650 | 4 | |a Integrated circuits |x Masks | |
| 650 | 4 | |a Masks (Electronics) | |
| 650 | 4 | |a Microlithography | |
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| 700 | 1 | |a Wu, Banqiu |e Sonstige |4 oth | |
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Datensatz im Suchindex
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|---|---|
| adam_text | PHOTOMASK FABRICATION TECHNOLOGY BENJAMIN G. EYNON, JR. KLA-TENCOR
CORPORATION BANQIU WU PHOTRONICS, INC. MCGRAW-HILL NEW YORK CHICAGO SAN
FRANCISCO LISBON LONDON MADRID MEXICO CITY MILAN NEW DELHI SAN JUAN
SEOUL SINGAPORE SYDNEY TORONTO CONTENTS CONTRIBUTORS VII PREFACE IX
CHAPTER 1. INTRODUCTION BENJAMIN G. EYNON, JR. 1 CHAPTER 2. DATA
PREPARATION PAUL DEPESA, DEREK KAY, AND GARY MEYERS 35 CHAPTER 3.
PATTERN GENERATION MARK GESLEY 55 CHAPTER 4. PHOTOMASK PATTERN TRANSFER
BANQIUWU 177 CHAPTER 5. PHOTOMASK METROLOGY RICHARD M. SILVER AND ANDRAES
E. VLADAER 261 CHAPTER 6. PROCESS BACK END AND DEFECTIVITY CONTROL
EDITATEJNIL,TED LIANG, FLORENCE O. ESCHBACH, AND ALAN R. STIVERS 343
CHAPTER 7. RESOLUTION ENHANCEMENT TECHNIQUES ROBERT J. SOCHA 425 CHAPTER
8. NGL MASKTECHNOLOGY INTRODUCTION EMILY FISCH GALLAGHER, MICHAEL
LERCEL, AND DHIRENDRA P. MATHUR 513 INDEX 565
|
| adam_txt |
PHOTOMASK FABRICATION TECHNOLOGY BENJAMIN G. EYNON, JR. KLA-TENCOR
CORPORATION BANQIU WU PHOTRONICS, INC. MCGRAW-HILL NEW YORK CHICAGO SAN
FRANCISCO LISBON LONDON MADRID MEXICO CITY MILAN NEW DELHI SAN JUAN
SEOUL SINGAPORE SYDNEY TORONTO CONTENTS CONTRIBUTORS VII PREFACE IX
CHAPTER 1. INTRODUCTION BENJAMIN G. EYNON, JR. 1 CHAPTER 2. DATA
PREPARATION PAUL DEPESA, DEREK KAY, AND GARY MEYERS 35 CHAPTER 3.
PATTERN GENERATION MARK GESLEY 55 CHAPTER 4. PHOTOMASK PATTERN TRANSFER
BANQIUWU 177 CHAPTER 5. PHOTOMASK METROLOGY RICHARD M. SILVER AND ANDRAES
E. VLADAER 261 CHAPTER 6. PROCESS BACK END AND DEFECTIVITY CONTROL
EDITATEJNIL,TED LIANG, FLORENCE O. ESCHBACH, AND ALAN R. STIVERS 343
CHAPTER 7. RESOLUTION ENHANCEMENT TECHNIQUES ROBERT J. SOCHA 425 CHAPTER
8. NGL MASKTECHNOLOGY INTRODUCTION EMILY FISCH GALLAGHER, MICHAEL
LERCEL, AND DHIRENDRA P. MATHUR 513 INDEX 565 |
| any_adam_object | 1 |
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| dewey-hundreds | 600 - Technology (Applied sciences) |
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| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Elektrotechnik / Elektronik / Nachrichtentechnik |
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| illustrated | Illustrated |
| index_date | 2024-07-02T13:59:22Z |
| indexdate | 2024-07-09T20:35:38Z |
| institution | BVB |
| isbn | 0071445633 |
| language | English |
| lccn | 2005047886 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-014642824 |
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| physical | XI, 571 S. Ill., graph. Darst. |
| publishDate | 2005 |
| publishDateSearch | 2005 |
| publishDateSort | 2005 |
| publisher | McGraw-Hill |
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| series2 | McGraw-Hill electronic engineering |
| spelling | Photomask fabrication technology Benjamin G. Eynon ; Banqiu Wu New York [u.a.] McGraw-Hill 2005 XI, 571 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier McGraw-Hill electronic engineering Includes bibliographical references and index Integrated circuits Masks Masks (Electronics) Microlithography Maskentechnik (DE-588)4125845-9 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Maskentechnik (DE-588)4125845-9 s DE-604 Eynon, Benjamin G. Sonstige oth Wu, Banqiu Sonstige oth GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014642824&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Photomask fabrication technology Integrated circuits Masks Masks (Electronics) Microlithography Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)4191584-7 |
| title | Photomask fabrication technology |
| title_auth | Photomask fabrication technology |
| title_exact_search | Photomask fabrication technology |
| title_exact_search_txtP | Photomask fabrication technology |
| title_full | Photomask fabrication technology Benjamin G. Eynon ; Banqiu Wu |
| title_fullStr | Photomask fabrication technology Benjamin G. Eynon ; Banqiu Wu |
| title_full_unstemmed | Photomask fabrication technology Benjamin G. Eynon ; Banqiu Wu |
| title_short | Photomask fabrication technology |
| title_sort | photomask fabrication technology |
| topic | Integrated circuits Masks Masks (Electronics) Microlithography Maskentechnik (DE-588)4125845-9 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Integrated circuits Masks Masks (Electronics) Microlithography Maskentechnik Lithografie Halbleitertechnologie |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014642824&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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