Micromanufacturing and nanotechnology:
Gespeichert in:
| Weitere Verfasser: | |
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| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Berlin u.a
Springer
2006
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| Online-Zugang: | Inhaltstext Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XXIII, 468 S. Ill., graph. Darst. |
| ISBN: | 9783540253778 3540253777 |
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| 245 | 1 | 0 | |a Micromanufacturing and nanotechnology |c N. P. Mahalik (Ed.) |
| 264 | 1 | |a Berlin u.a |b Springer |c 2006 | |
| 300 | |a XXIII, 468 S. |b Ill., graph. Darst. | ||
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| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Nanotechnology | |
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| 650 | 0 | 7 | |a Nanotechnologie |0 (DE-588)4327470-5 |2 gnd |9 rswk-swf |
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| 700 | 1 | |a Mahalik, Nitaigour Premchand |4 edt | |
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Datensatz im Suchindex
| _version_ | 1804135086944157696 |
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| adam_text | N. P. MAHALIK (ED.) MICROMANUFACTURING AND NANOTECHNOLOGY WITH 300
FIGURES SPRINGER CONTENTS 1 INTRODUCTION 1 1. I BACKGROUND 1 1.2
INTRODUCTION 2 1.2.1 PRECISION ENGINEERING 2 1.2.2 MICROMILLING AND
MICRODRILLING 3 1.3 MICROELECTROMECHANICAL SYSTEMS (MEMS) 5 1.3.1 AN
EXAMPLE: MICROPHENOMENON IN ELECTROPHOTOGRAPHY 6 1.4 MICROELECTRONICS
FABRICATION METHODS 7 1.4.1 BULK MICROMACHINING 8 1.4.2 SURFACE
MICROMACHINING 8 1.5 MICROINSTRUMENTATION 9 1.6 MICROMECHATRONICS 9 1.7
NANOFINISHING 10 1.8 OPTICALLY VARIABLE DEVICE 10 1.9 MECS 11 1.10 SPACE
MICROPROPULSION 11 1.11 E-BEAM NANOLITHOGRAPHY 12 1.12 NANOTECHNOLOGY 12
1.13 CARBON NANOTUBES AND STRUCTURES 13 1.14 MOLECULAR LOGIC GATES 14
1.15 MICRODEVICES AS NANOLEVEL BIOSENSORS 15 1.16 CROSSLINKING IN C 6 O
AND DERIVATISATION 16 1.17 FUEL CELL 17 2 PRINCIPLES OF MEMS AND MOEMS
19 2.1 INTRODUCTION 19 2.2 DRIVING PRINCIPLE FOR ACTUATION 20 2.3
FABRICATION PROCESS 21 2.4 MECHANICAL MEMS 23 2.4.1 MECHANICAL SENSOR 23
2.4.2 ACCELEROMETER, CANTILEVER AND CAPACITIVE MEASUREMENT 24 2.4.3
MICROPHONE 25 2.4.4 GYROSCOPE 26 2.4.5 MECHANICAL ACTUATOR 26 2.5
THERMAL MEMS 28 2.5.1 THERMOMETRY 28 2.5.2 DATA STORAGE APPLICATIONS 30
XII 2.5.3 MICROPLATE GAS SENSOR 30 2.5.4 THERMOACTUATOR 31 2.6 MAGNETIC
MEMS 31 2.7 MOEMS 35 2.8 SPATIAL LIGHT MODULATOR 37 2.9 DIGITAL
MICROMIRROR DEVICE 38 2.10 GRATING LIGHT VALVE* (GLV) 40 3. LASER
TECHNOLOGY IN MICROMANUFACTURING 45 3.1. INTRODUCTION 45 3.2. GENERATION
OF LASER LIGHT 45 3.3 PROPERTIES OF LASER LIGHT 49 3.3.1 MONOCHROMACITY
50 3.3.2 DIRECTIONALITY 50 3.3.3 BRIGHTNESS 51 3.3.4 COHERENCE 51 3.3.5
SPATIAL PROFILE 51 3.3.6 TEMPORAL PROFILE 52 3.4 PRACTICAL LASERS 52 3.5
LASER TECHNOLOGY IN MICROMANUFACTURING 54 3.5.1 BACKGROUND 54 3.5.2
ABSORPTION AND REFLECTION OF LASER LIGHT 54 3.5.3 APPLICATION TECHNOLOGY
FUNDAMENTALS 56 4 SOFT GEOMETRICAL ERROR COMPENSATION METHODS USING
LASER INTERFEROMETER.. 63 4.1 INTRODUCTION 63 4.2 OVERVIEW OF
GEOMETRICAL ERROR CALIBRATION 64 4.2.1 ERROR MEASUREMENT SYSTEM 66 4.2.2
ACCURACY ASSESSMENT 67 4.3 GEOMETRICAL ERROR COMPENSATION SCHEMES 68
4.3.1 LOOK-UP TABLE FOR GEOMETRICAL ERRORS 69 4.3.2 PARAMETRIC MODEL FOR
GEOMETRICAL ERRORS 70 4.4 EXPERIMENTAL RESULTS 73 4.4.1 ERROR
APPROXIMATIONS 74 4.4.2 LINEAR ERROR 74 4.4.3 STRAIGHTNESS ERROR 77
4.4.4 ANGULAR ERROR 77 4.4.5 SQUARENESS ERROR 78 4.4.6 ASSESSMENT 79 4.5
CONCLUSIONS 79 5 CHARACTERISING ETCHING PROCESS IN BULK MICROMACHINING
83 5.1 INTRODUCTION 83 5.2 WET BULK MICROMACHINING (WBM) 83 5.3 REVIEW
84 5.4 CRYSTALLOGRAPHY AND ITS EFFECTS 85 5.4.1 AN EXAMPLE 86 CONTENTS
XIII 5.5 SILICON AS SUBSTRATE AND STRUCTURAL MATERIAL 87 5.5.1 SILICON
AS SUBSTRATE 87 5.5.2 SILICON AS STRUCTURAL MATERIAL 88 5.5.3 STRESS AND
STRAIN 88 5.5.4 THERMAL PROPERTIES OF SILICON 92 5.6 WET ETCHING PROCESS
92 5.6.1 ISOTROPIC ETCHANTS 93 5.6.2 REACTION PHENOMENON 93 5.6.3
ISOTROPIC ETCH CURVES 94 5.6.4 MASKING 96 5.6.5 DD ETCHANT 97 5.7
ANISOTROPIC ETCHING 97 5.7.1 ANISOTROPIC ETCHANTS 98 5.7.2 MASKING FOR
ANISOTROPIC ETCHANTS 98 5.8 ETCHING CONTROL: THE STOP TECHNIQUES 99
5.8.1 BORON DIFFUSION ETCH STOP 99 5.8.2 ELECTROCHEMICAL ETCHING STOP
100 5.8.3 THIN FILMS AND SOI ETCH STOP 101 5.9 PROBLEMS WITH ETCHING IN
BULK MICROMACHINING 102 5.9.1 RE CONSUMPTION 102 5.9.2 CORNER
COMPENSATION 103 5.10 CONCLUSIONS 104 6 FEATURES OF SURFACE
MICROMACHINING AND WAFER BONDING PROCESS 107 6.1 INTRODUCTION 107 6.2
PHOTOLITHOGRAPHY 108 6.3 SURFACE MICROMACHINING 1LL 6.3.1 BULK VERSUS
SURFACE MICROMACHINING 112 6.4 CHARACTERISING SURFACE MICROMACHINING
PROCESS 113 6.4.1 ISOLATION LAYER 113 6.4.2 SACRIFICIAL LAYER 114 6.4.3
STRUCTURAL MATERIAL 114 6.4.4 SELECTIVE ETCHING 115 6.5 PROPERTIES 116
6.5.1 ADHESION 117 6.5.2 STRESS 118 6.5.3 STICTION 121 6.6 WAFER BONDING
122 6.6.1 ANODIC BONDING 123 6.6.2 FUSION BONDING 124 6.7 SUMMARY 125 7
MICROMANUFACTURING FOR DOCUMENT SECURITY: OPTICALLY VARIABLE DEVICE....
131 7.1 PREAMBLE 131 7.2 INTRODUCTION 131 7.3 ODV FOIL MICROSTRUCTURES
133 XIV 7.3.1 THE SECURITY HOLOGRAM 133 7.3.2 THE KINEGRAM* 134 7.3.3
CATPIX* ELECTRON BEAM LITHOGRAPHY MICROSTRUCTURE 137 7.3.4 STRUCTURAL
STABILITY 138 7.3.5 PIXELGRAM* PALETTE CONCEPT 139 7.3.6 EXELGRAM* TRACK
BASED OVD MICROSTRUCTURE 141 7.3.7 COVERT IMAGE MICROGRAPHIC SECURITY
FEATURES 144 7.3.8 KINEGRAM* AND EXELGRAM* : COMPARISON 145 7.3.9
VECTORGRAM* IMAGE MULTIPLEXING 145 7.3.10 INTERSTITIAL GROOVE ELEMENT
MODULATION 148 7.4 GENERIC OVD MICROSTRUCTURES 149 7.4.1 OPTICALLY
VARIABLE INK TECHNOLOGY 150 7.4.2 DIFFRACTIVE DATA FOILS 151 7.4.3
BIOMETRIC OVD TECHNOLOGY 154 7.5 NANOCODES 157 7.5.1 MICROMIRROR OVD 159
7.5.2 ORIGINATION OF MICROMIRROR OVD 160 7.5.3 SUMMARY OF MICROMIRROR
OVD OPTICAL EFFECTS 164 7.6 CONCLUSIONS 166 8 NANOFINISHING TECHNIQUES
171 8.1 INTRODUCTION 171 8.2 TRADITIONAL FINISHING PROCESSES 173 8.2.1
GRINDING 173 8.2.2 LAPPING 173 8.2.3 HONING 174 8.3 ADVANCED FINISHING
PROCESSES (AFPS) 174 8.3.1 ABRASIVE FLOW MACHINING (AFM) 175 8.3.2
MAGNETIC ABRASIVE FINISHING (MAF) 178 8.3.3 MAGNETORHEOLOGICAL FINISHING
(MRF) 180 8.3.4 MAGNETORHEOLOGICAL ABRASIVE FLOW FINISHING (MRAFF) 183
8.3.5 MAGNETIC FLOAT POLISHING (MFP) 188 8.3.6 ELASTIC EMISSION
MACHINING (EEM) 189 8.3.7 ION BEAM MACHINING (IBM) 190 8.3.8 CHEMICAL
MECHANICAL POLISHING (CMP) 192 9 MICRO AND NANOTECHNOLOGY APPLICATIONS
FOR SPACE MICROPROPULSION 197 9.1 INTRODUCTION 197 9.2 SUBSYSTEMS AND
DEVICES FOR SPACECRAFTS MICROPROPULSION 201 9.3 PROPULSION SYSTEMS 207
9.3.1 SOLID PROPELLANT 208 9.3.2 COLD-GAS 208 9.3.3 COLLOID THRUSTER 208
9.3.4 WARM-GAS 208 9.3.5 MONOPROPELLANT AND BIPROPELLANT SYSTEMS 208
9.3.6 REGENERATIVE PRESSURISATION CYCLES 209 CONTENTS XV 9.3.7 ACDS 209
9.4 REALISATION OF A COLD-GAS MICROTHRUSTER 209 9.4.1 GAS AND FLUID
DYNAMIC 210 9.4.2 PROTOTYPING 211 9.5 CONCLUSIONS 217 10 CARBON NANOTUBE
PRODUCTION AND APPLICATIONS: BASIS OF NANOTECHNOLOGY 219 10.1
INTRODUCTION 219 10.2 NANOTECHNOLOGY AND CARBON NANOTUBE PROMISES 219
10.3 GROWING INTEREST IN CARBON NANOTUBE 221 10.4 STRUCTURE AND
PROPERTIES OF CARBON NANOTUBES 223 10.5 PRODUCTION OF CARBON NANOTUBE
225 10.5.1 CHEMICAL VAPOUR DEPOSITION 226 10.5.2 ARC DISCHARGE 227
10.5.3 LASER ABLATION 228 10.5.4 MECHANISMS OF GROWTH 229 10.5.5
PURIFICATION OF CARBON NANOTUBE 230 10.6 APPLICATIONS OF CARBON
NANOTUBES 231 10.6.1 ELECTRICAL TRANSPORT OF CARBON NANOTUBES FOR FET
231 10.6.2 COMPUTERS 233 10.6.3 CNT NANODEVICES FOR BIOMEDICAL
APPLICATION 234 10.6.4 X-RAY EQUIPMENT 235 10.6.5 CNTS FOR NANOMECHANIC
ACTUATOR AND ARTIFICIAL MUSCLES 236 10.6.6 FUEL CELLS 237 10.6.7
MEMBRANE ELECTRODE ASSEMBLY 238 10.6.8 REINFORCEMENT OF BIPOLAR PLATES
WITH CNTS 239 10.6.9 HYDROGEN STORAGE IN CNTS 240 11 CARBON-BASED
NANOSTRUCTURES 247 11.1 INTRODUCTION 247 11.2 HISTORY OF FULLERENES 247
11.3 STRUCTURE OF CARBON NANOTUBES (CNTS) 248 11.3.1 Y-SHAPED 248 11.3.2
DOUBLE HELICAL 252 11.3.3 BAMBOO LIKE STRUCTURE 252 11.3.4 HIERARCHICAL
MORPHOLOGY STRUCTURE 252 11.3.5 RING STRUCTURED MWCNTS 252 11.3.6 CONE
SHAPED ENF CAP OF MWCNTS 252 11.4 STRUCTURE OF FULLERENES 253 11.4.1
STRUCTURE OF C 48 FULLERENES 253 11.4.2 TOROIDAL FULLERENES 253 11.4.3
STRUCTURE OF C 60 , C 59 , C 58 , C 57 , C 53 253 11.4.4 THE SMALL
FULLERENES C 50 254 11.5 STRUCTURE OF CARBON NANOBALLS (CNBS) 256 11.6
STRUCTURE OF CARBON NANOFIBERS (CNFS) 257 11.6.1 HEXAGONAL CNFS 257 XVI
11.6.2 CONE SHAPED CNFS 257 11.6.3 HELICAL CNFS 257 11.7 POROUS CARBON
258 11.8 PROPERTIES OF CARBON NANOSTRUCTURES 259 11.8.1 MOLECULAR
PROPERTIES 259 11.8.2 ELECTRONIC PROPERTIES 259 11.8.3 OPTICAL
PROPERTIES 259 11.8.4 MECHANICAL PROPERTIES 260 11.8.5 PERIODIC
PROPERTIES 260 11.9 SYNTHESIS 261 11.9.1 CARBON NANOTUBES 261 11.9.2
FULLERENES 262 11.9.3 NANOBALLS 263 11.9.4 NANOFIBERS 263 11.10
POTENTIAL APPLICATIONS OF NANOSTRUCTURES 265 11.10.1 ENERGY STORAGE 265
11.10.2 HYDROGEN STORAGE 265 11.10.3 LITHIUM INTERCALATION 266 11.10.4
ELECTROCHEMICAL SUPERCAPACITORS 267 11.10.5 MOLECULAR ELECTRONICS WITH
CNTS 268 11.11 COMPOSITE MATERIALS 270 11.12 SUMMARY 271 12 MOLECULAR
LOGIC GATES 275 12.1 INTRODUCTION 275 12.2 LOGIC GATES 275 12.3
FLUORESCENCE BASED MOLECULAR LOGIC GATES 277 12.4 COMBINATIONAL LOGIC
CIRCUITS 285 12.5 RECONFIGURABLE MOLECULAR LOGIC 286 12.6 ABSORPTION
BASED MOLECULAR LOGIC GATES 287 12.7 MOLECULAR LOGIC GATES: ELECTRONIC
CONDUCTANCE 293 12.8 CONCLUSIONS 295 13 NANOMECHANICAL CANTILEVER
DEVICES FOR BIOLOGICAL SENSORS 299 13.1 INTRODUCTION 299 13.2 PRINCIPLES
300 13.3 STATIC DEFORMATION APPROACH 301 13.4 RESONANCE MODE APPROACH
302 13.5 HEAT DETECTION APPROACH 305 13.6 MICROFABRICATION 306 13.6.1
SI-BASED CANTILEVER 306 13.6.2 PIEZORESISTIVE INTEGRATED CANTILEVER 307
13.6.3 PIEZOELECTRIC INTEGRATED CANTILEVER 308 13.7 MEASUREMENT AND
READOUT TECHNIQUE 309 13.7.1 OPTICAL METHOD 309 13.7.2 INTERFEROMETRY
310 CONTENTS XVII 13.7.3 PIEZORESISTIVE METHOD 310 13.7.4 CAPACITANCE
METHOD 311 13.7.5 PIEZOELECTRIC METHOD 311 13.8 BIOLOGICAL SENSING 313
13.8.1 DNA DETECTION 313 13.8.2 PROTEIN DETECTION 315 13.8.3 CELL
DETECTION 317 13.9 CONCLUSIONS 318 14 MICRO ENERGY AND CHEMICAL SYSTEMS
AND MULTISCALE FABRICATION 323 14.1 INTRODUCTION 323 14.2 MICRO ENERGY
AND CHEMICAL SYSTEMS 327 14.2.1 HEAT AND MASS TRANSFER IN MECS DEVICES
328 14.2.2 MECS TECHNOLOGY 328 14.3 MECS FEBRICATION 330 14.3.1
CHALLENGES 330 14.3.2 FEATURE SIZES 331 14.3.3 MICROLAMINATION 332 14.4
DIMENSIONAL CONTROL IN MICROLAMINATION 334 14.4.1 EFFECTS OF PATTERNING
ON MICROCHANNEL ARRAY PERFORMANCE.... 335 14.4.2 THEORY 336 14.4.3
MICROCHANNEL FABRICATION 337 14.4.4 RESULTS 338 14.5 SOURCES OF WARPAGE
IN MICROCHANNEL ARRAYS 341 14.5.1 ANALYSIS 343 14.5.2 RESULTS 346 14.6
EFFECTS OF REGISTRATION AND BONDING ON MICROCHANNEL PERFORMANCE... 347
14.7 GEOMETRICAL CONSTRAINTS IN MICROCHANNEL ARRAYS 348 14.8 ECONOMICS
OF MICROLAMINATION 351 15 SCULPTURED THIN FILMS 357 15.1 INTRODUCTION
357 15.2 STF GROWTH 358 15.5.1 EXPERIMENTAL AND PHENOMENOLOGICAL 358
15.2.2 COMPUTER MODELING 362 15. 3 OPTICAL PROPERTIES 363 15.3.1 THEORY
363 15.3.2 CHARACTERISTIC BEHAVIOR 370 15.4 APPLICATIONS 373 15.4.1
OPTICAL 373 15.4.2 CHEMICAL 375 15.4.3 ELECTRONICS 375 15.4.4 BIOLOGICAL
375 15.5 CONCLUDING REMARKS 376 16 E-BEAM NANOLITHOGRAPHY INTEGRATED
WITH NANOASSEMBLY: PCE 383 XVIII 16.1 INTRODUCTION 383 16.2
ELECTRON-BEAM RADIATION 384 16.2.1 POLYMERIC MATERIALS 384 16.2.2
MOLECULAR MATERIALS 385 16.3 SELF-ASSEMBLED MONOLAYERS 387 16.4 SUMMARY
AND OUTLOOK 391 17 NANOLITHOGRAPHY IN THE EVANESCENT NEAR FIELD 397 17.1
INTRODUCTION 397 17.2 HISTORICAL DEVELOPMENT 398 17.3 PRINCIPLES OF
ENFOL 400 17.4 MASK REQUIREMENTS AND FABRICATION 401 17.5 PATTERN
DEFINITION 402 17.5.1 EXPOSURE CONDITIONS 402 17.5.2 RESIST REQUIREMENTS
403 17.5.3 OVERCOMING THE DIFFRACTION LIMIT 403 17.6. PATTERN TRANSFER
405 17.6.1 SUBTRACTIVE PATTERN TRANSFER 405 17.6.2 ADDITIVE PATTERN
TRANSFER 406 17.7 SIMULATIONS 407 17.7.1 SIMULATION METHODS AND MODELS
409 17.7.2 INTENSITY DISTRIBUTION 410 17.7.3 DEPTH OF FIELD (DOF) 411
17.7.4 EXPOSURE VARIATIONS DUE TO EDGE ENHANCEMENTS 413 17.8
NANOLITHOGRAPHY USING SURFACE PLASMONS 414 17.8.1 EVANESCENT
INTERFEROMETRIC LITHOGRAPHY (EIL) 415 17.8.2 PLANAR LENS LITHOGRAPHY
(PLL) 416 17.8.3 SURFACE PLASMON ENHANCED CONTACT LITHOGRAPHY (SPECL)...
419 17.9 CONCLUSIONS 421 18 NANOTECHNOLOGY FOR FUEL CELL APPLICATIONS
425 18.1 CURRENT STATE OF THE KNOWLEDGE AND NEEDS 425 18.2 NANOPARTICLES
IN HETEROGENEOUS CATALYSIS 427 18.3 O 2 ELECTROREDUCTION REACTION ON
CARBON-SUPPORTED PT CATALYSTS 429 18.4 CARBON NANOTUBES AS CATALYST
SUPPORTS 432 18.5 CONCLUDING REMARKS 437 19 DERIVATISATION OF CARBON
NANOTUBES WITH AMINES 441 19.1 INTRODUCTION 441 19.2 EXPERIMENTAL DESIGN
442 19.3 DIRECT AMIDATION OF CARBOXILIC FUNCTIONALITIES 443 19.4 DIRECT
AMINE ADDITION 445 19.5 CONCLUSIONS 450 20 CHEMICAL CROSSLINKING IN C 60
THIN FILMS 453 20.1 INTRODUCTION 453 CONTENTS XIX 20.2 EXPERIMENT 454
20.2.1 ANALYTICAL INSTRUMENTS 454 20.2.2 DEPOSITION OF FULLERENE FILMS
455 20.2.3 REACTION WITH 1,8-DIAMINOOCTANE 455 20.3 RESULTS AND
DISCUSSION 455 20.3.1 (1,8) DIAMINOOCTANE-DERIVATISED C 60 POWDER 455
20.3.2 (1,8) DIAMINOOCTANE-DERIVATISED C 60 FILMS 456 20.4 CONCLUSIONS
460
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| adam_txt |
N. P. MAHALIK (ED.) MICROMANUFACTURING AND NANOTECHNOLOGY WITH 300
FIGURES SPRINGER CONTENTS 1 INTRODUCTION 1 1. I BACKGROUND 1 1.2
INTRODUCTION 2 1.2.1 PRECISION ENGINEERING 2 1.2.2 MICROMILLING AND
MICRODRILLING 3 1.3 MICROELECTROMECHANICAL SYSTEMS (MEMS) 5 1.3.1 AN
EXAMPLE: MICROPHENOMENON IN ELECTROPHOTOGRAPHY 6 1.4 MICROELECTRONICS
FABRICATION METHODS 7 1.4.1 BULK MICROMACHINING 8 1.4.2 SURFACE
MICROMACHINING 8 1.5 MICROINSTRUMENTATION 9 1.6 MICROMECHATRONICS 9 1.7
NANOFINISHING 10 1.8 OPTICALLY VARIABLE DEVICE 10 1.9 MECS 11 1.10 SPACE
MICROPROPULSION 11 1.11 E-BEAM NANOLITHOGRAPHY 12 1.12 NANOTECHNOLOGY 12
1.13 CARBON NANOTUBES AND STRUCTURES 13 1.14 MOLECULAR LOGIC GATES 14
1.15 MICRODEVICES AS NANOLEVEL BIOSENSORS 15 1.16 CROSSLINKING IN C 6 O
AND DERIVATISATION 16 1.17 FUEL CELL 17 2 PRINCIPLES OF MEMS AND MOEMS
19 2.1 INTRODUCTION 19 2.2 DRIVING PRINCIPLE FOR ACTUATION 20 2.3
FABRICATION PROCESS 21 2.4 MECHANICAL MEMS 23 2.4.1 MECHANICAL SENSOR 23
2.4.2 ACCELEROMETER, CANTILEVER AND CAPACITIVE MEASUREMENT 24 2.4.3
MICROPHONE 25 2.4.4 GYROSCOPE 26 2.4.5 MECHANICAL ACTUATOR 26 2.5
THERMAL MEMS 28 2.5.1 THERMOMETRY 28 2.5.2 DATA STORAGE APPLICATIONS 30
XII 2.5.3 MICROPLATE GAS SENSOR 30 2.5.4 THERMOACTUATOR 31 2.6 MAGNETIC
MEMS 31 2.7 MOEMS 35 2.8 SPATIAL LIGHT MODULATOR 37 2.9 DIGITAL
MICROMIRROR DEVICE 38 2.10 GRATING LIGHT VALVE* (GLV) 40 3. LASER
TECHNOLOGY IN MICROMANUFACTURING 45 3.1. INTRODUCTION 45 3.2. GENERATION
OF LASER LIGHT 45 3.3 PROPERTIES OF LASER LIGHT 49 3.3.1 MONOCHROMACITY
50 3.3.2 DIRECTIONALITY 50 3.3.3 BRIGHTNESS 51 3.3.4 COHERENCE 51 3.3.5
SPATIAL PROFILE 51 3.3.6 TEMPORAL PROFILE 52 3.4 PRACTICAL LASERS 52 3.5
LASER TECHNOLOGY IN MICROMANUFACTURING 54 3.5.1 BACKGROUND 54 3.5.2
ABSORPTION AND REFLECTION OF LASER LIGHT 54 3.5.3 APPLICATION TECHNOLOGY
FUNDAMENTALS 56 4 SOFT GEOMETRICAL ERROR COMPENSATION METHODS USING
LASER INTERFEROMETER. 63 4.1 INTRODUCTION 63 4.2 OVERVIEW OF
GEOMETRICAL ERROR CALIBRATION 64 4.2.1 ERROR MEASUREMENT SYSTEM 66 4.2.2
ACCURACY ASSESSMENT 67 4.3 GEOMETRICAL ERROR COMPENSATION SCHEMES 68
4.3.1 LOOK-UP TABLE FOR GEOMETRICAL ERRORS 69 4.3.2 PARAMETRIC MODEL FOR
GEOMETRICAL ERRORS 70 4.4 EXPERIMENTAL RESULTS 73 4.4.1 ERROR
APPROXIMATIONS 74 4.4.2 LINEAR ERROR 74 4.4.3 STRAIGHTNESS ERROR 77
4.4.4 ANGULAR ERROR 77 4.4.5 SQUARENESS ERROR 78 4.4.6 ASSESSMENT 79 4.5
CONCLUSIONS 79 5 CHARACTERISING ETCHING PROCESS IN BULK MICROMACHINING
83 5.1 INTRODUCTION 83 5.2 WET BULK MICROMACHINING (WBM) 83 5.3 REVIEW
84 5.4 CRYSTALLOGRAPHY AND ITS EFFECTS 85 5.4.1 AN EXAMPLE 86 CONTENTS
XIII 5.5 SILICON AS SUBSTRATE AND STRUCTURAL MATERIAL 87 5.5.1 SILICON
AS SUBSTRATE 87 5.5.2 SILICON AS STRUCTURAL MATERIAL 88 5.5.3 STRESS AND
STRAIN 88 5.5.4 THERMAL PROPERTIES OF SILICON 92 5.6 WET ETCHING PROCESS
92 5.6.1 ISOTROPIC ETCHANTS 93 5.6.2 REACTION PHENOMENON 93 5.6.3
ISOTROPIC ETCH CURVES 94 5.6.4 MASKING 96 5.6.5 DD ETCHANT 97 5.7
ANISOTROPIC ETCHING 97 5.7.1 ANISOTROPIC ETCHANTS 98 5.7.2 MASKING FOR
ANISOTROPIC ETCHANTS 98 5.8 ETCHING CONTROL: THE STOP TECHNIQUES 99
5.8.1 BORON DIFFUSION ETCH STOP 99 5.8.2 ELECTROCHEMICAL ETCHING STOP
100 5.8.3 THIN FILMS AND SOI ETCH STOP 101 5.9 PROBLEMS WITH ETCHING IN
BULK MICROMACHINING 102 5.9.1 RE CONSUMPTION 102 5.9.2 CORNER
COMPENSATION 103 5.10 CONCLUSIONS 104 6 FEATURES OF SURFACE
MICROMACHINING AND WAFER BONDING PROCESS 107 6.1 INTRODUCTION 107 6.2
PHOTOLITHOGRAPHY 108 6.3 SURFACE MICROMACHINING 1LL 6.3.1 BULK VERSUS
SURFACE MICROMACHINING 112 6.4 CHARACTERISING SURFACE MICROMACHINING
PROCESS 113 6.4.1 ISOLATION LAYER 113 6.4.2 SACRIFICIAL LAYER 114 6.4.3
STRUCTURAL MATERIAL 114 6.4.4 SELECTIVE ETCHING 115 6.5 PROPERTIES 116
6.5.1 ADHESION 117 6.5.2 STRESS 118 6.5.3 STICTION 121 6.6 WAFER BONDING
122 6.6.1 ANODIC BONDING 123 6.6.2 FUSION BONDING 124 6.7 SUMMARY 125 7
MICROMANUFACTURING FOR DOCUMENT SECURITY: OPTICALLY VARIABLE DEVICE.
131 7.1 PREAMBLE 131 7.2 INTRODUCTION 131 7.3 ODV FOIL MICROSTRUCTURES
133 XIV 7.3.1 THE SECURITY HOLOGRAM 133 7.3.2 THE KINEGRAM* 134 7.3.3
CATPIX* ELECTRON BEAM LITHOGRAPHY MICROSTRUCTURE 137 7.3.4 STRUCTURAL
STABILITY 138 7.3.5 PIXELGRAM* PALETTE CONCEPT 139 7.3.6 EXELGRAM* TRACK
BASED OVD MICROSTRUCTURE 141 7.3.7 COVERT IMAGE MICROGRAPHIC SECURITY
FEATURES 144 7.3.8 KINEGRAM* AND EXELGRAM* : COMPARISON 145 7.3.9
VECTORGRAM* IMAGE MULTIPLEXING 145 7.3.10 INTERSTITIAL GROOVE ELEMENT
MODULATION 148 7.4 GENERIC OVD MICROSTRUCTURES 149 7.4.1 OPTICALLY
VARIABLE INK TECHNOLOGY 150 7.4.2 DIFFRACTIVE DATA FOILS 151 7.4.3
BIOMETRIC OVD TECHNOLOGY 154 7.5 NANOCODES 157 7.5.1 MICROMIRROR OVD 159
7.5.2 ORIGINATION OF MICROMIRROR OVD 160 7.5.3 SUMMARY OF MICROMIRROR
OVD OPTICAL EFFECTS 164 7.6 CONCLUSIONS 166 8 NANOFINISHING TECHNIQUES
171 8.1 INTRODUCTION 171 8.2 TRADITIONAL FINISHING PROCESSES 173 8.2.1
GRINDING 173 8.2.2 LAPPING 173 8.2.3 HONING 174 8.3 ADVANCED FINISHING
PROCESSES (AFPS) 174 8.3.1 ABRASIVE FLOW MACHINING (AFM) 175 8.3.2
MAGNETIC ABRASIVE FINISHING (MAF) 178 8.3.3 MAGNETORHEOLOGICAL FINISHING
(MRF) 180 8.3.4 MAGNETORHEOLOGICAL ABRASIVE FLOW FINISHING (MRAFF) 183
8.3.5 MAGNETIC FLOAT POLISHING (MFP) 188 8.3.6 ELASTIC EMISSION
MACHINING (EEM) 189 8.3.7 ION BEAM MACHINING (IBM) 190 8.3.8 CHEMICAL
MECHANICAL POLISHING (CMP) 192 9 MICRO AND NANOTECHNOLOGY APPLICATIONS
FOR SPACE MICROPROPULSION 197 9.1 INTRODUCTION 197 9.2 SUBSYSTEMS AND
DEVICES FOR SPACECRAFTS MICROPROPULSION 201 9.3 PROPULSION SYSTEMS 207
9.3.1 SOLID PROPELLANT 208 9.3.2 COLD-GAS 208 9.3.3 COLLOID THRUSTER 208
9.3.4 WARM-GAS 208 9.3.5 MONOPROPELLANT AND BIPROPELLANT SYSTEMS 208
9.3.6 REGENERATIVE PRESSURISATION CYCLES 209 CONTENTS XV 9.3.7 ACDS 209
9.4 REALISATION OF A COLD-GAS MICROTHRUSTER 209 9.4.1 GAS AND FLUID
DYNAMIC 210 9.4.2 PROTOTYPING 211 9.5 CONCLUSIONS 217 10 CARBON NANOTUBE
PRODUCTION AND APPLICATIONS: BASIS OF NANOTECHNOLOGY 219 10.1
INTRODUCTION 219 10.2 NANOTECHNOLOGY AND CARBON NANOTUBE PROMISES 219
10.3 GROWING INTEREST IN CARBON NANOTUBE 221 10.4 STRUCTURE AND
PROPERTIES OF CARBON NANOTUBES 223 10.5 PRODUCTION OF CARBON NANOTUBE
225 10.5.1 CHEMICAL VAPOUR DEPOSITION 226 10.5.2 ARC DISCHARGE 227
10.5.3 LASER ABLATION 228 10.5.4 MECHANISMS OF GROWTH 229 10.5.5
PURIFICATION OF CARBON NANOTUBE 230 10.6 APPLICATIONS OF CARBON
NANOTUBES 231 10.6.1 ELECTRICAL TRANSPORT OF CARBON NANOTUBES FOR FET
231 10.6.2 COMPUTERS 233 10.6.3 CNT NANODEVICES FOR BIOMEDICAL
APPLICATION 234 10.6.4 X-RAY EQUIPMENT 235 10.6.5 CNTS FOR NANOMECHANIC
ACTUATOR AND ARTIFICIAL MUSCLES 236 10.6.6 FUEL CELLS 237 10.6.7
MEMBRANE ELECTRODE ASSEMBLY 238 10.6.8 REINFORCEMENT OF BIPOLAR PLATES
WITH CNTS 239 10.6.9 HYDROGEN STORAGE IN CNTS 240 11 CARBON-BASED
NANOSTRUCTURES 247 11.1 INTRODUCTION 247 11.2 HISTORY OF FULLERENES 247
11.3 STRUCTURE OF CARBON NANOTUBES (CNTS) 248 11.3.1 Y-SHAPED 248 11.3.2
DOUBLE HELICAL 252 11.3.3 BAMBOO LIKE STRUCTURE 252 11.3.4 HIERARCHICAL
MORPHOLOGY STRUCTURE 252 11.3.5 RING STRUCTURED MWCNTS 252 11.3.6 CONE
SHAPED ENF CAP OF MWCNTS 252 11.4 STRUCTURE OF FULLERENES 253 11.4.1
STRUCTURE OF C 48 FULLERENES 253 11.4.2 TOROIDAL FULLERENES 253 11.4.3
STRUCTURE OF C 60 , C 59 , C 58 , C 57 , C 53 253 11.4.4 THE SMALL
FULLERENES C 50 254 11.5 STRUCTURE OF CARBON NANOBALLS (CNBS) 256 11.6
STRUCTURE OF CARBON NANOFIBERS (CNFS) 257 11.6.1 HEXAGONAL CNFS 257 XVI
11.6.2 CONE SHAPED CNFS 257 11.6.3 HELICAL CNFS 257 11.7 POROUS CARBON
258 11.8 PROPERTIES OF CARBON NANOSTRUCTURES 259 11.8.1 MOLECULAR
PROPERTIES 259 11.8.2 ELECTRONIC PROPERTIES 259 11.8.3 OPTICAL
PROPERTIES 259 11.8.4 MECHANICAL PROPERTIES 260 11.8.5 PERIODIC
PROPERTIES 260 11.9 SYNTHESIS 261 11.9.1 CARBON NANOTUBES 261 11.9.2
FULLERENES 262 11.9.3 NANOBALLS 263 11.9.4 NANOFIBERS 263 11.10
POTENTIAL APPLICATIONS OF NANOSTRUCTURES 265 11.10.1 ENERGY STORAGE 265
11.10.2 HYDROGEN STORAGE 265 11.10.3 LITHIUM INTERCALATION 266 11.10.4
ELECTROCHEMICAL SUPERCAPACITORS 267 11.10.5 MOLECULAR ELECTRONICS WITH
CNTS 268 11.11 COMPOSITE MATERIALS 270 11.12 SUMMARY 271 12 MOLECULAR
LOGIC GATES 275 12.1 INTRODUCTION 275 12.2 LOGIC GATES 275 12.3
FLUORESCENCE BASED MOLECULAR LOGIC GATES 277 12.4 COMBINATIONAL LOGIC
CIRCUITS 285 12.5 RECONFIGURABLE MOLECULAR LOGIC 286 12.6 ABSORPTION
BASED MOLECULAR LOGIC GATES 287 12.7 MOLECULAR LOGIC GATES: ELECTRONIC
CONDUCTANCE 293 12.8 CONCLUSIONS 295 13 NANOMECHANICAL CANTILEVER
DEVICES FOR BIOLOGICAL SENSORS 299 13.1 INTRODUCTION 299 13.2 PRINCIPLES
300 13.3 STATIC DEFORMATION APPROACH 301 13.4 RESONANCE MODE APPROACH
302 13.5 HEAT DETECTION APPROACH 305 13.6 MICROFABRICATION 306 13.6.1
SI-BASED CANTILEVER 306 13.6.2 PIEZORESISTIVE INTEGRATED CANTILEVER 307
13.6.3 PIEZOELECTRIC INTEGRATED CANTILEVER 308 13.7 MEASUREMENT AND
READOUT TECHNIQUE 309 13.7.1 OPTICAL METHOD 309 13.7.2 INTERFEROMETRY
310 CONTENTS XVII 13.7.3 PIEZORESISTIVE METHOD 310 13.7.4 CAPACITANCE
METHOD 311 13.7.5 PIEZOELECTRIC METHOD 311 13.8 BIOLOGICAL SENSING 313
13.8.1 DNA DETECTION 313 13.8.2 PROTEIN DETECTION 315 13.8.3 CELL
DETECTION 317 13.9 CONCLUSIONS 318 14 MICRO ENERGY AND CHEMICAL SYSTEMS
AND MULTISCALE FABRICATION 323 14.1 INTRODUCTION 323 14.2 MICRO ENERGY
AND CHEMICAL SYSTEMS 327 14.2.1 HEAT AND MASS TRANSFER IN MECS DEVICES
328 14.2.2 MECS TECHNOLOGY 328 14.3 MECS FEBRICATION 330 14.3.1
CHALLENGES 330 14.3.2 FEATURE SIZES 331 14.3.3 MICROLAMINATION 332 14.4
DIMENSIONAL CONTROL IN MICROLAMINATION 334 14.4.1 EFFECTS OF PATTERNING
ON MICROCHANNEL ARRAY PERFORMANCE. 335 14.4.2 THEORY 336 14.4.3
MICROCHANNEL FABRICATION 337 14.4.4 RESULTS 338 14.5 SOURCES OF WARPAGE
IN MICROCHANNEL ARRAYS 341 14.5.1 ANALYSIS 343 14.5.2 RESULTS 346 14.6
EFFECTS OF REGISTRATION AND BONDING ON MICROCHANNEL PERFORMANCE. 347
14.7 GEOMETRICAL CONSTRAINTS IN MICROCHANNEL ARRAYS 348 14.8 ECONOMICS
OF MICROLAMINATION 351 15 SCULPTURED THIN FILMS 357 15.1 INTRODUCTION
357 15.2 STF GROWTH 358 15.5.1 EXPERIMENTAL AND PHENOMENOLOGICAL 358
15.2.2 COMPUTER MODELING 362 15. 3 OPTICAL PROPERTIES 363 15.3.1 THEORY
363 15.3.2 CHARACTERISTIC BEHAVIOR 370 15.4 APPLICATIONS 373 15.4.1
OPTICAL 373 15.4.2 CHEMICAL 375 15.4.3 ELECTRONICS 375 15.4.4 BIOLOGICAL
375 15.5 CONCLUDING REMARKS 376 16 E-BEAM NANOLITHOGRAPHY INTEGRATED
WITH NANOASSEMBLY: PCE 383 XVIII 16.1 INTRODUCTION 383 16.2
ELECTRON-BEAM RADIATION 384 16.2.1 POLYMERIC MATERIALS 384 16.2.2
MOLECULAR MATERIALS 385 16.3 SELF-ASSEMBLED MONOLAYERS 387 16.4 SUMMARY
AND OUTLOOK 391 17 NANOLITHOGRAPHY IN THE EVANESCENT NEAR FIELD 397 17.1
INTRODUCTION 397 17.2 HISTORICAL DEVELOPMENT 398 17.3 PRINCIPLES OF
ENFOL 400 17.4 MASK REQUIREMENTS AND FABRICATION 401 17.5 PATTERN
DEFINITION 402 17.5.1 EXPOSURE CONDITIONS 402 17.5.2 RESIST REQUIREMENTS
403 17.5.3 OVERCOMING THE DIFFRACTION LIMIT 403 17.6. PATTERN TRANSFER
405 17.6.1 SUBTRACTIVE PATTERN TRANSFER 405 17.6.2 ADDITIVE PATTERN
TRANSFER 406 17.7 SIMULATIONS 407 17.7.1 SIMULATION METHODS AND MODELS
409 17.7.2 INTENSITY DISTRIBUTION 410 17.7.3 DEPTH OF FIELD (DOF) 411
17.7.4 EXPOSURE VARIATIONS DUE TO EDGE ENHANCEMENTS 413 17.8
NANOLITHOGRAPHY USING SURFACE PLASMONS 414 17.8.1 EVANESCENT
INTERFEROMETRIC LITHOGRAPHY (EIL) 415 17.8.2 PLANAR LENS LITHOGRAPHY
(PLL) 416 17.8.3 SURFACE PLASMON ENHANCED CONTACT LITHOGRAPHY (SPECL).
419 17.9 CONCLUSIONS 421 18 NANOTECHNOLOGY FOR FUEL CELL APPLICATIONS
425 18.1 CURRENT STATE OF THE KNOWLEDGE AND NEEDS 425 18.2 NANOPARTICLES
IN HETEROGENEOUS CATALYSIS 427 18.3 O 2 ELECTROREDUCTION REACTION ON
CARBON-SUPPORTED PT CATALYSTS 429 18.4 CARBON NANOTUBES AS CATALYST
SUPPORTS 432 18.5 CONCLUDING REMARKS 437 19 DERIVATISATION OF CARBON
NANOTUBES WITH AMINES 441 19.1 INTRODUCTION 441 19.2 EXPERIMENTAL DESIGN
442 19.3 DIRECT AMIDATION OF CARBOXILIC FUNCTIONALITIES 443 19.4 DIRECT
AMINE ADDITION 445 19.5 CONCLUSIONS 450 20 CHEMICAL CROSSLINKING IN C 60
THIN FILMS 453 20.1 INTRODUCTION 453 CONTENTS XIX 20.2 EXPERIMENT 454
20.2.1 ANALYTICAL INSTRUMENTS 454 20.2.2 DEPOSITION OF FULLERENE FILMS
455 20.2.3 REACTION WITH 1,8-DIAMINOOCTANE 455 20.3 RESULTS AND
DISCUSSION 455 20.3.1 (1,8) DIAMINOOCTANE-DERIVATISED C 60 POWDER 455
20.3.2 (1,8) DIAMINOOCTANE-DERIVATISED C 60 FILMS 456 20.4 CONCLUSIONS
460 |
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| building | Verbundindex |
| bvnumber | BV021293405 |
| callnumber-first | T - Technology |
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| callnumber-raw | T174.7 |
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| dewey-full | 620.5 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Maschinenbau / Maschinenwesen Elektrotechnik / Elektronik / Nachrichtentechnik |
| discipline_str_mv | Maschinenbau / Maschinenwesen Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| illustrated | Illustrated |
| index_date | 2024-07-02T13:50:32Z |
| indexdate | 2024-07-09T20:34:55Z |
| institution | BVB |
| isbn | 9783540253778 3540253777 |
| language | English |
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| physical | XXIII, 468 S. Ill., graph. Darst. |
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| spelling | Micromanufacturing and nanotechnology N. P. Mahalik (Ed.) Berlin u.a Springer 2006 XXIII, 468 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Literaturangaben Nanotechnology Mikrosystemtechnik (DE-588)4221617-5 gnd rswk-swf Nanotechnologie (DE-588)4327470-5 gnd rswk-swf Mikrosystemtechnik (DE-588)4221617-5 s DE-604 Nanotechnologie (DE-588)4327470-5 s Mahalik, Nitaigour Premchand edt text/html http://deposit.dnb.de/cgi-bin/dokserv?id=2603437&prov=M&dok_var=1&dok_ext=htm Inhaltstext GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014614217&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Micromanufacturing and nanotechnology Nanotechnology Mikrosystemtechnik (DE-588)4221617-5 gnd Nanotechnologie (DE-588)4327470-5 gnd |
| subject_GND | (DE-588)4221617-5 (DE-588)4327470-5 |
| title | Micromanufacturing and nanotechnology |
| title_auth | Micromanufacturing and nanotechnology |
| title_exact_search | Micromanufacturing and nanotechnology |
| title_exact_search_txtP | Micromanufacturing and nanotechnology |
| title_full | Micromanufacturing and nanotechnology N. P. Mahalik (Ed.) |
| title_fullStr | Micromanufacturing and nanotechnology N. P. Mahalik (Ed.) |
| title_full_unstemmed | Micromanufacturing and nanotechnology N. P. Mahalik (Ed.) |
| title_short | Micromanufacturing and nanotechnology |
| title_sort | micromanufacturing and nanotechnology |
| topic | Nanotechnology Mikrosystemtechnik (DE-588)4221617-5 gnd Nanotechnologie (DE-588)4327470-5 gnd |
| topic_facet | Nanotechnology Mikrosystemtechnik Nanotechnologie |
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