Nanoscale calibration standards and methods: dimensional and related measurements in the micro- and nanometer range
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Weinheim
Wiley-VCH
2005
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| Ausgabe: | 1. ed., 1. reprint |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | XXII, 519 S. Ill., graph. Darst. |
| ISBN: | 352740502X 9783527405022 |
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| 245 | 1 | 0 | |a Nanoscale calibration standards and methods |b dimensional and related measurements in the micro- and nanometer range |c ed. by Günter Wilkening ... |
| 250 | |a 1. ed., 1. reprint | ||
| 264 | 1 | |a Weinheim |b Wiley-VCH |c 2005 | |
| 300 | |a XXII, 519 S. |b Ill., graph. Darst. | ||
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| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Microstructure |x Measurement |v Congresses | |
| 650 | 4 | |a Nanostructured materials |x Measurement |v Congresses | |
| 650 | 4 | |a Scientific apparatus and instruments |x Calibration |v Congresses | |
| 650 | 4 | |a Stereology |v Congresses | |
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| adam_text | NANOSCALE CALIBRATION STANDARDS AND METHODS DIMENSIONAL AND RELATED
MEASUREMENTS IN THE MICRO- AND NANOMETER RANGE EDITED BY CUNTER
WILKENING, LUDGER KOENDERS TECHNISCHE } INFORMATIONSBIBLIOTHEK
UNIVERSITATSBIBLIOTHEK HANNOVER WILEY- VCH WILEY-VCH VERLAG GMBH & CO.
KGAA CONTENTS PART I INSTRUMENTATION - OVERVIEW 1 METROLOGICAL SCANNING
PROBE MICROSCOPES - INSTRUMENTS FOR DIMENSIONAL NANOMETROLOGY 3
HANS-ULRICH DANZEBRINK, FRANK POHLENZ, GAOLIANG DAI, AND CLAUDIO DAL
SAVIO 1.1 INTRODUCTION 3 1.2 HIGH-RESOLUTION PROBING SYSTEMS 4 1.2.1
SENSOR OBJECTIVE WITH BEAM DEFLECTION DETECTION 5 1.2.2 SENSOR OBJECTIVE
WITH PIEZOLEVER MODULE 7 1.2.3 SENSOR OBJECTIVE WITH TUNING FORK MODULE
8 1.2.4 SENSOR HEAD FOR COMBINED SCANNING PROBE AND INTERFERENCE
MICROSCOPY 9 1.3 METROLOGY SYSTEMS BASED ON SCANNING PROBE MICROSCOPES
12 1.3.1 SCANNING FORCE MICROSCOPES OF TYPE VERITEKT 13 1.3.2
METROLOGICAL LARGE RANGE SCANNING FORCE MICROSCOPE 15 1.4 SUMMARY 18
ACKNOWLEDGMENTS 19 REFERENCES 19 / 2 NANOMETROLOGY AT THE IMCC 22 M.
BISI, E. MASSA, A. PASQUINI, G. B. PICOTTO, AND M. PISANI 2.1
INTRODUCTION 22 2.2 SURFACE METROLOGY 23 2.2.1 SCANNING PROBE MICROSCOPY
23 2.2.2 OPTICAL DIFFRACTOMETRY 25 2.2.3 STYLUS PROFILOMETRY 27 2.3
ATOMIC SCALE METROLOGY 28 2.3.1 LATTICE PARAMETER OF SILICON 29 2.3.2
COMBINED OPTICAL AND X-RAY INTERFEROMETRY (COXI) 30 2.4 PHASE-CONTRAST
TOPOGRAPY 31 2A.I DETECTION OF SMALL LATTICE STRAIN 31 2.4.2
PHASE-CONTRAST IMAGING 32 NANOSCALE CALIBRATION STANDARDS AND METHODS:
DIMENSIONAL AND RELATED MEASUREMENTS IN THE MICRO- AND NANOMETER RANGE.
EDITED BY G. WILKENING AND L. KOENDERS COPYRIGHT 2005 WILEY-VCH VERLAG
GMBH & CO. KGAA, WEINHEIM ISBN 3-527-40502-X VI CONTENTS 2.5 2.6
NANOBALANCE CONCLUSIONS REFERENCES 34 35 36 3 METROLOGICAL APPLICATIONS
OF X-RAY INTERFEROMETRY 38 ANDREW YACOOT 3.1 INTRODUCTION 38 3.2
MEASUREMENT OF NON-LINEARITY IN OPTICAL INTERFEROMETERS 40 3.3 COMBINED
OPTICAL AND X-RAY INTERFEROMETRY 41 3.4 MEASUREMENT OF SMALL ANGLES 42
3.5 X-RAY INTERFEROMETRY AND SCANNING PROBE MICROSCOPY 43 3.6
CONCLUSIONS 43 REFERENCES 44 PART II INSTRUMENTATION - LONG-RANGE
SCANNING PROBE MICROSCOPE 4 ADVANCES IN TRACEABLE NANOMETROLOGY WITH THE
NANOPOSITIONING AND NANOMEASURING MACHINE 47 EBERHARD MANSKE, ROSTISLAV
MASTYLO, TINO HAUSOTTE, NORBERT HQFINANN, AND GERD JAGER 4.1
INTRODUCTION 47 4.2 DESIGN AND OPERATION 48 4.3 UNCERTAINTY BUDGET 52
4.4 FOCUS SENSOR 53 4.5 MEASURING OPPORTUNITIES AND PERFORMANCE WITH
FOCUS SENSOR 55 4.6 FOCUS PROBE WITH SFM CANTILEVER 58 4.7 CONCLUSION 58
ACKNOWLEDGEMENTS 59 REFERENCES 59 5 COORDINATE MEASUREMENTS IN
MICROSYSTEMS BY USING AFM-PROBING: PROBLEMS AND SOLUTIONS 60 DOROTHEE
HILSER, RALPH PETERSEN, AND HENDRIK ROTHE 5.1 INTRODUCTION 60 5.2
REALIZING CMMS FOR MICROSYSTEMS 61 5.3 PROBLEMS AND SOLUTIONS 64 5.3.1
DYNAMICS OF POSITIONING SYSTEM 64 5.3.2 CMM: ONE-MILLIMETER SCAN 67
5.3.3 MEASURING STRATEGIES 68 5.4 CONCLUSION AND OUTLOOK 71 REFERENCES
72 CONTENTS VII 6 METROLOGICAL LARGE RANGE SCANNING FORCE MICROSCOPE
APPLICABLE FOR TRACEABLE CALIBRATION OF SURFACE TEXTURES 73 GAOLIANG
DAI, FRANK POHLENZ, HANS-ULRICH DANZEBRINK, MIN XU, KLAUS HASCHE,
GTINTER WILKENING 6.1 INTRODUCTION 74 6.2 INSTRUMENTATION 75 6.2.1
PRINCIPLE 75 6.2.2 METROLOGICAL PROPERTIES 76 6.2.3 TRACEABILITY 78
6.2.4 SPECIALLY DESIGNED FEATURES 79 6.3 MEASUREMENT RESULT OF A
2D-GRATING STANDARD 80 6.3.1 MEASUREMENT STRATEGY 80 6.3.2 DATA
EVALUATION 82 6.3.3 MEASUREMENT RESULT OF THE MEAN PITCH VALUE 83 6.3.4
MEASUREMENT OF THE LOCAL PITCH VARIATION 83 6.4 A SELECTED MEASUREMENT
RESULT OF A MICROROUGHNESS STANDARD 85 6.4.1 MEASUREMENT RESULT OF A
GLASS FLATNESS STANDARD 86 6.4.2 MEASUREMENT OF A PTB MICROROUGHNESS
STANDARD 87 6.4.3 COMPARISON OF THE ROUGHNESS MEASUREMENT RESULTS
DERIVED FROM SFM AND STYLUS INSTRUMENTS USING GAUSSIAN FILTER 88 6.4.4
COMPARISON USING MORPHOLOGICAL FILTERS 89 6.4.5 EVALUATION RESULTS USING
PTB REFERENCE SOFTWARE 90 6.5 OUTLOOK AND CONCLUSION 91 REFERENCES 92
PART III INSTRUMENTATION - DEVELOPMENT OF SPM AND SENSORS 7 TRACEABLE
PROBING WITH AN AFM 95 K. DIRSCHERL AND K. R. KOOPS 7.1 INTRODUCTION 95
7.2 SETUP 96 7.3 CORRECTION FOR PIEZO NONLINEARITIES 10U 7.3.1
HYSTERESIS 200 7.3.2 DRIFT 102 7.4 REAL-TIME CONTROL THROUGH SSE2
ASSEMBLY 103 7.4 IMPLEMENTATION OF THE MEASUREMENT CONTROLLER 104 7.6
IMAGE ANALYSIS 105 7.7 CONCLUSIONS 207 ACKNOWLEDGMENTS 208 REFERENCES
208 8 SCANNING PROBE MICROSCOPE SETUP WITH INTERFEROMETRIC DRIFT
COMPENSATION 209 ANDRZEJ SIKORA, DMITRI V. SOKOLOV, AND HANS U.
DANZEBRINK 8.1 MOTIVATION 209 VIII CONTENTS 8.2 EXISTING SETUP - WITHOUT
DRIFT COMPENSATION 2 22 8.3 MEASUREMENT METHOD AND SETUP FOR DRIFT
COMPENSATION 212 8.4 EXPERIMENT AND RESULTS 225 8.5 SUMMARY 228
REFERENCES 228 9 DSP-BASED METROLOGICAL SCANNING FORCE MICROSCOPE WITH
DIRECT INTERFEROMETRIC POSITION MEASUREMENT AND IMPROVED MEASUREMENT
SPEED 229 GAOLIANG DAI, FRANK POHLENZ, HANS-TJLRICH DANZEBRINK, KLAUS
HASCHE, AND GIINTER WILKENING 9.1 INTRODUCTION 229 9.2 INSTRUMENT 120
9.2.1 PRINCIPLE 120 9.2.2 DSP-BASED SIGNAL PROCESSING SYSTEM 122 9.2.3
CALIBRATION OF THE TIP SIGNAL FOR TRACEABLY MEASURING THE BENDING OF THE
CANTILEVER 223 9.3 CORRECTION OF NONLINEARITY OF THE OPTICAL
INTERFEROMETERS IN THE M-SFM 124 9.3.1 REVIEW OF NONLINEARITY CORRECTION
METHODS 124 9.3.2 ADAPTED HEYDEMANN CORRECTION IN A FAST SERVO CONTROL
LOOP 225 9.3.3 PERFORMANCE OF THE INTERFEROMETERS IN THE M-SFM VERITEKT
C 226 9.4 IMPROVING THE MEASUREMENT SPEED 228 9.5 A MEASUREMENT EXAMPLE
OF STEP-HEIGHT STANDARD 129 REFERENCES 130 10 COMBINED CONFOCAL AND
SCANNING PROBE SENSOR FOR NANO-COORDINATE METROLOGY 131 DMITRI V.
SOKOLOV, DMITRI V. KAZANTSEV, JAMES W. G. TYRRELL, TOMASZ HASEK, AND
HANS U. DANZEBRINK 10.1 INTRODUCTION 132 10.2 INSTRUMENTATION AND
EXPERIMENTAL DETAILS 133 10.3 RESULTS AND DISCUSSION 136 10.3.1 IMAGING
IN THE CONFOCAL AND SPM MODE 136 10.3.2 ONE-DIMENSIONAL OPTICAL AND SPM
MEASUREMENTS 138 10.4 SUMMARY AND CONCLUSIONS 141 ACKNOWLEDGMENTS 142
REFERENCES 142 11 COMBINED SHEAR FORCE-TUNNELING MICROSCOPE WITH
INTERFEROMETRIC TIP OSCILLATION DETECTION FOR LOCAL SURFACE
INVESTIGATION AND OXIDATION 244 ANDRZEJ SIKORA, TEODOR GOTSZALK, AND
ROMAN SZELOCH 11.1 INTRODUCTION 144 11.2 INSTRUMENTATION 145 11.3 LOCAL
SURFACE ELECTRICAL PROPERTIES INVESTIGATION 152 CONTENTS IX 11.4 LOCAL
SURFACE OXIDATION 152 11.5 SUMMARY 154 ACKNOWLEDGEMENTS 155 REFERENCES
155 12 LOW NOISE PIEZORESISTIVE MICRO FORCE SENSOR 157 L. DOERING, E.
PEINER, V. NESTEROV, AND U. BRAND 12.1 INTRODUCTION 157 12.2
MANUFACTURING OF THE SENSOR 158 12.2.1 COMPUTER AIDED DESIGN 158 12.2.2
MANUFACTURING OF THE SENSOR 158 12.3 SENSOR PROPERTIES 160 12.3.1 DOPING
PROFILE 160 12.3.2 SPECTROSCOPIC NOISE ANALYSIS AND DETERMINATION OF THE
HOOGE CONSTANT 163 12.3.3 FORCE CALIBRATION AND ELECTRICAL CALIBRATION
165 12.4 APPLICATION: FORCE CALIBRATION OF A STYLUS INSTRUMENT 167 12.5
CONCLUSIONS 169 REFERENCES 170 PART IV CALIBRATION - OVERVIEW 13 TOWARDS
A GUIDELINE FOR SPM CALIBRATION 173 T. DZIOMBA, L. KOENDERS, AND G.
WILKENING 13.1 INTRODUCTION 173 13.2 GENERAL 176 13.2.1 SCHEMATIC
DESCRIPTION OF SPMS 176 13.2.2 METROLOGICAL CLASSIFICATION OF SPMS 177
13.2.3 CALIBRATION INTERVALS 178 13.3 VERIFICATION OF PROPERTIES OF
INSTRUMENT, TIP AND ENVIRONMENT 178 13.3.1 AMBIENT CONDITIONS 179 13.3.2
FLATNESS MEASUREMENTS AND SIGNAL NOISE 179 13.3.3 REPEATABILITY AND
NOISE 181 13.3.4 TIP SHAPE 182 13.4 CALIBRATION OF THE SCANNER AXES 183
13.4.1 LATERAL CALIBRATION 183 13.4.2 CALIBRATION OF THE VERTICAL AXIS
186 USING LASER INTERFEROMETERS 187 USING TRANSFER STANDARDS 188
EVALUATION OF STEP HEIGHT 188 13.5 UNCERTAINTY OF MEASUREMENTS 290
ACKNOWLEDGMENTS 291 REFERENCES 292 CONTENTS 14 TRUE THREE-DIMENSIONAL
CALIBRATION OF CLOSED LOOP SCANNING PROBE MICROSCOPES 193 J. GARNAES, A.
KUHLE, L. NIELSEN, AND F. BORSETTO 14.1 INTRODUCTION 193 14.2 MODEL OF
THE MEASUREMENT SYSTEM 194 14.3 THE CORRECTION MATRIX 195 14.4 THEORY
FOR ESTIMATING THE VERTICAL SKEW 196 14.5 EXPERIMENTAL RESULTS AND
DISCUSSION 200 14.6 CONCLUSION 202 ACKNOWLEDGEMENTS 202 APPENDIX 203
REFERENCES 204 15 HEIGHT AND PITCH AT NANOSCALE - HOW TRACEABLE IS
NANOMETROLOGY? 205 L. KOENDERS AND F. MELI 15.1 INTRODUCTION 205 15.2
COMPARISON ON ONE-DIMENSIONAL PITCH STANDARDS (NANO 4) 206 15.2.1
STANDARDS AND MEASURAND 206 15.2.2 PARTICIPANTS AND MEASUREMENT METHODS
207 15.2.3 RESULTS 208 15.2.4 UNCERTAINTY 210 15.2.5 DISCUSSION 211 15.3
COMPARISON ON STEP HEIGHT (NANO4) 212 15.3.1 STANDARDS 212 15.3.2
MEASUREMENT METHODS 213 15.3.3 RESULTS 214 15.3.4 UNCERTAINTIES 216
15.3.5 DISCUSSION 217 15.4 CONCLUSIONS 218 ACKNOWLEDGMENT 228 REFERENCES
219 16 THE BEHAVIOR OF PIEZOELECTRIC ACTUATORS AND THE EFFECT ON
STEP-HEIGHT MEASUREMENT WITH SCANNING FORCE MICROSCOPES 220 A. GRANT, L.
MCDONNELL, AND E. M. GIL ROMERO 16.1 INTRODUCTION 220 16.2 EXPERIMENTAL
222 16.2.1 SCANNING FORCE MICROSCOPES 222 16.2.2 Z CALIBRATION WITH
STEP-HEIGHT STANDARDS 223 16.2.3 Z CALIBRATION WITH FIBER-OPTIC
DISPLACEMENT SENSOR 223 16.3 RESULTS 224 16.3.1 EFFECT OF VOLTAGE SWEEP
224 16.3.2 EFFECT OF Z ACTUATOR OFFSET 225 16.3.3 IMPLICATIONS OF
ACTUATOR OFFSET FOR SAMPLE TILT 227 16.3.4 IMPLICATIONS OF ACTUATOR
OFFSET FOR SCANNER CURVATURE 227 CONTENTS XI 16.4 CONCLUSIONS 228
ACKNOWLEDGMENTS 228 REFERENCES 228 17 AN APPROACH TO THE DEVELOPMENT OF
TOLERANCE SYSTEMS FOR MICRO- AND NANOTECHNOLOGY 230 J. SCHOBEL AND E.
WESTKAMPER 17.1 INTRODUCTION 230 17.2 TOLERANCING AND STANDARDS 231
17.2.1 MEASUREMENT SYSTEMS ANALYSIS 232 17.2.2 STEP-HEIGHT
MEASUREMENTS 232 17.2.3 MICROROUGHNESS 234 17.3 MACHINING EXPERIMENTS
235 17.3.1 MICROMILLING 235 17.3.2 SPUTTERING 237 17.4 CONCLUSIONS 240
REFERENCES 241 PART V CALIBRATION - STANDARDS FOR NANOMETROLOGY 18
STANDARDS FOR THE CALIBRATION OF INSTRUMENTS FOR DIMENSIONAL
NANOMETROLOGY 245 L. KOENDERS, T. DZIOMBA, P. THOMSEN-SCHMIDT, AND G.
WILKENING 18.1 INTRODUCTION 245 18.2 STANDARDS FOR SCANNING PROBE
MICROSCOPY 246 18.2.1 FLATNESS STANDARD 246 18.2.2 TIP CHARACTERIZES 248
18.2.3 LATERAL STANDARDS 250 18.2.4 STEP-HEIGHT STANDARDS 252 18.2.5
NANOROUGHNESS STANDARDS 254 18.3 FILM THICKNESS STANDARDS 254 18.4
OUTLOOK 256 ACKNOWLEDGMENTS 256 REFERENCES 257 19 ATOMIC FLAT
SILICON SURFACE FOR THE CALIBRATION OF STYLUS INSTRUMENTS 259 S. GROGER
AND M. DIETZSCH 19.1 CALIBRATION OF STYLUS INSTRUMENTS 259 19.2 ATOMIC
FLAT SILICON AS CALIBRATION STANDARD 263 19.3 SELECTION OF THE
MEASUREMENT INSTRUMENT FOR THE ASSESSMENT OF FLATNESS 264 19.4
CALIBRATION OF THE STYLUS INSTRUMENT ME 10 265 19.5 CHARACTERISTICS OF
THE MEASUREMENT INSTRUMENT AFTER MODIFICATION 267 19.6 CONCLUSIONS AND
OUTLOOK 268 REFERENCES 268 XII CONTENTS 20 INVESTIGATIONS OF
NANOROUGHNESS STANDARDS BY SCANNING FORCE MICROSCOPES AND INTERFERENCE
MICROSCOPE 269 R. KRIXGER-SEHM, T. DZIOMBA, AND G. DAI 20.1 INTRODUCTION
269 20.2 STANDARDIZATION ASPECTS 270 20.3 MANUFACTURING OF CALIBRATION
SPECIMENS 271 20.3.1 CONDITIONS FOR SMALLER ROUGHNESS 271 20.3.2
MANUFACTURING PROCESS 272 20.3.3 PROFILE REPETITION 273 20.4
MEASUREMENTS 274 20.4.1 IDENTIFICATION OF THE FIELDS OF INTEREST 274
20.4.2 CORRELATION OF FIELDS 274 20.4.3 MEASUREMENTS WITH INTERFERENCE
MICROSCOPE 275 20.4.4 SCANNING FORCE MICROSCOPE MEASUREMENTS 276 20.4.5
LONG RANGE SFM MEASUREMENTS 278 20.4.6 RELATION TO PROVEN ROUGHNESS
STANDARDS 279 20.5 CONCLUSIONS AND OUTLOOK 279 ACKNOWLEDGMENTS 281
REFERENCES 282 21 TESTING THE LATERAL RESOLUTION IN THE NANOMETRE RANGE
WITH A NEW TYPE OF CERTIFIED REFERENCE MATERIAL 282 M. SENONER, TH.
WIRTH, W. UNGER, W. OSTERLE, I. KAIANDER, R.I. SELLIN, AND D. BIMBERG
21.1 INTRODUCTION 282 21.2 DESCRIPTION OF THE REFERENCE MATERIAL 283
21.3 MODELING OF LATERAL RESOLUTION 284 21.3.1 ANALYSIS OF A NARROW
STRIP 288 21.3.2 ANALYSIS OF A STRAIGHT EDGE 289 21.3.3 ANALYSIS OF
GRATINGS 292 21.4 CONCLUSIONS 294 / ACKNOWLEDGMENTS 294 REFERENCES 294
PART VI CALIBRATION - TIP SHAPE 22 RECONSTRUCTION AND GEOMETRIC
ASSESSMENT OF AFM TIPS 297 TORSTEN MACHLEIDT, RALF KASTNER, AND
KARL-HEINZ FRANKE 22.1 INTRODUCTION 298 22.2 RECONSTRUCTION OF THE
TACTILE TIP 299 22.2.1 IMAGING THE TIP USING SCANNING ELECTRON
MICROSCOPY 299 22.2.2 RECONSTRUCTION BY KNOWN SAMPLE STRUCTURE 300
22.2.3 BLIND TIP ESTIMATION 302 22.2.4 MOTIVATION 302 22.2.5 TIP
ASSESSMENT 302 CONTENTS XIII 22.2.5.1 TWO-DIMENSIONAL CHARACTERIZATION
302 22.2.5.2 GEOMETRICAL INTERPRETATION 303 22.2.5.3 TIP ANGLE 304
22.2.5.4 TIP RADIUS 305 22.2.5.5 TIP CURVATION 305 22.2.5.6 REVIEW 306
22.2.6 THREE-DIMENSIONAL CHARACTERIZATION 306 22.2.6.1 GEOMETRICAL
INTERPRETATION 306 22.2.6.2 SIMULATED ANNEALING ALGORITHM 307 22.2.6.3
CONVERGENCE 308 22.2.7 EXPERIMENTAL RESULTS 309 22.3 SUMMARY AND OUTLOOK
309 REFERENCES 320 23 COMPARISON OF DIFFERENT METHODS OF SFM TIP SHAPE
DETERMINATION FOR VARIOUS CHARACTERISATION STRUCTURES AND TYPES OF TIP
322 S. CZERKAS, T. DZIOMBA, AND H. BOSSE 23.1 INTRODUCTION 32 2 23.2
INSTRUMENTATION 322 23.3 RESULTS AND DISCUSSION 323 23.3.1 NEEDS OF CD
METROLOGY 313 23.3.2 TIP SHAPE DETERMINATION 324 23.3.3 CONCLUSIONS 328
23.4 SUMMARY 320 REFERENCES 320 PART VII CALIBRATION - OPTICAL METHODS
24 DOUBLE TILT IMAGING METHOD FOR MEASURING APERTURE CORRECTION FACTOR
323 YEN-LIANG CHEN, CHAO-JUNG CHEN, AND GWO-SHENG PENG 24.1 INTRODUCTION
323 24.2 TRACEABILITY OF STEP HEIGHT 324 24.3 WORKING PRINCIPLE OF DIT
METHOD 325 24.4 EXPERIMENTAL SETUP 326 24.5 RELATIVE STANDARD
UNCERTAINTY OF NUMERICAL APERTURE CORRECTION FACTOR 328 24.6 UNCERTAINTY
ANALYSIS OF THE NUMERICAL APERTURE CORRECTION FACTOR 329 24.7 CONCLUSION
329 REFERENCES 330 25 HOW STATISTICAL NOISE LIMITS THE ACCURACY OF
OPTICAL INTERFEROMETRY FOR NANOMETROLOGY 331 VICTOR NASCOV 25.1
INTRODUCTION 331 25.2 OPTICAL INTERFEROMETRY OVERVIEW 332 XIV CONTENTS
25.2.1 TWO WAVES INTERFEROMETRY 332 25.2.2 MULTIPLE WAVES INTERFEROMETRY
337 25.3 STATISTICAL ERRORS ON PROCESSING ELEMENTARY FRINGE PATTERNS 337
25.4 WAVELENGTHS AND DISPLACEMENTS MEASUREMENT 340 25.5 ABSOLUTE
DISTANCE MEASUREMENT 341 25.6 CONCLUSIONS 343 REFERENCES 344 26
UNCERTAINTY ANALYSIS OF THE PTB MEASURING EQUIPMENT FOR THE
INVESTIGATION OF LASER INTERFEROMETERS 345 G. SPARRER AND A. ABOU-ZEID
26.1 INTRODUCTION 345 26.2 THE CALIBRATION FACILITY 346 26.3 MEASUREMENT
PROCEDURE 348 26.4 THE UNCERTAINTY OF THE COMPLETE CALIBRATION FACILITY
349 26.4.1 THE MEASUREMENT UNCERTAINTY OF THE COMPARATOR 349 26.4.2 THE
MEASUREMENT UNCERTAINTY OF THE STANDARD LASER INTERFEROMETER TAKING INTO
ACCOUNT THE REFRACTIVE INDEX OF AIR AND THE THERMAL EXPANSION 352 26.4.3
THE EXPANDED MEASUREMENT UNCERTAINTY OF THE ENTIRE CALIBRATION FACILITY
355 SIGNS AND SYMBOLS OF THE MODEL EQUATIONS AND THE UNCERTAINTY
BUDGETS: 356 REFERENCES 357 PART VIII APPLICATION - LATERAL STRUCTURES
27 LATERAL AND VERTICAL DIAMETER MEASUREMENTS ON POLYMER PARTICLES WITH
A METROLOGY AFM 361 F. MELI 27.1 INTRODUCTION 361 27.2 EXPERIMENTAL
SETUP 363 27.3 MEASUREMENT RESULTS AND DISCUSSION 365 27.3.1 HEIGHT
MEASUREMENTS ON GOLD COLLOIDS 365 27.3.2 POSSIBLE SYSTEMATIC DEVIATIONS
WITH HEIGHT MEASUREMENTS ON GOLD COLLOIDS 368 27.3.3 LATERAL
MEASUREMENTS ON POLYMER SPHERES 370 27 A CONCLUSION 374 REFERENCES 374
28 PITCH AND CD MEASUREMENTS AT ANISOTROPICALLY ETCHED SI STRUCTURES IN
AN SEM 375 C. G. FRASE, S. CZERKAS, H. BOSSE, YU. A. NOVIKOV, AND A. V.
RAKOV 28.1 INTRODUCTION 376 28.2 GWPS SPECIMEN 376 CONTENTS XV 28.3 SEM
INSTRUMENTATION 377 28.4 SEM IMAGE FORMATION AND MODELING 377 28.5 SEM
MEASUREMENT METHOD 381 28.6 MEASUREMENT RESULTS 382 28.7 CONCLUSION 384
REFERENCES 384 29 ANALYSIS AND COMPARISON OF CD-SEM EDGE OPERATORS: A
CONTRIBUTION TO FEATURE WIDTH METROLOGY 385 C.G. FRASE, W.
HAJLLER-GROHNE, E. BUHR, K.-HAHM, AND H. BOSSE 29.1 INTRODUCTION 385
29.2 EXPONENTIAL FIT OPERATOR 387 29.2.1 SECONDARY ELECTRON IMAGE
FORMATION AT STRUCTURAL EDGES 387 29.2.2 DEFINITION OF TOP CD OPERATOR
390 29.2.3 SEM MODEL INPUT PARAMETER VARIATIONS 390 29.2.4 EXPERIMENTAL
PARAMETER VARIATIONS 392 29.2.5 MEASUREMENT RESULTS 393 29.3 MODIFIED
EXPONENTIAL FIT OPERATOR FOR HIGH SIDEWALL ANGLES 394 29.4 GAUSS FIT
OPERATOR 396 29.5 SIGNAL DECAY OPERATOR 398 29.6 CONCLUSION 402
REFERENCES 403 30 MEASUREMENT OF HIGH-RESOLUTION INTERFERENTIAL ENCODERS
USING THE PTB NANOMETER COMPARATOR 404 J. FLTIGGE, R. KOENING, AND H.
BOSSE 30.1 PRINCIPLE 404 30.2 LASER INTERFEROMETER 405 30.3 INCREMENTAL
LINEAR ENCODERS 406 30.4 MEASUREMENT RESULTS 408 REFERENCES 409 / PART
IX APPLICATION - SURFACE 31 EXPERIMENTAL CHARACTERIZATION OF MICROMILLED
SURFACES BY LARGE-RANGE AFM 413 P. BARIANI, G. BISSACCO, H. N. HANSEN,
AND L. DE CHIFFRE 31.1 INTRODUCTION 423 31.2 MICROMILLING OF HARDENED
TOOL STEEL 424 31.3 SURFACE TOPOGRAPHY MEASUREMENT 425 31.4 LARGE-RANGE
ATOMIC FORCE MICROSCOPY 426 31.5 TECHNIQUES USED FOR COMPARISON 426 31.6
EVALUATION OF SAMPLING CONDITIONS FOR THE DIFFERENT TECHNIQUES 417 31.7
RESULTS 418 31.8 DISCUSSION AND CONCLUSIONS 422 I! XVI CONTENTS
REFERENCES 423 32 INVESTIGATION OF THE SURFACE ROUGHNESS MEASUREMENT OF
MASS STANDARDS 424 C. ZERROUKI, L.R PENDRILLJ. M. BENNETT, Y. HAIDAR, F.
DE FORNEL, AND P. PINOT 32.1 INTRODUCTION 424 32.2 REQUIREMENTS FOR
SURFACE ROUGHNESS OF MASS STANDARDS 425 32.3 SURFACE ROUGHNESS
MEASUREMENT METHODS APPLIED TO MASS STAN- DARDS 426 32.3.1 MECHANICAL
PROFILER (NAWC-US) 427 32.3.2 NEAR FIELD MICROSCOPE (LPUB, FR) 427
32.3.3 ANGLE-RESOLVED LIGHT SCATTERING (BNM-INM, FR) 428 32.3.4
ANGLE-RESOLVED LIGHT SCATTERING (LASERCHECK, US) 428 32.3.5 TOTAL
INTEGRATED LIGHT SCATTERING (SP, SE) 429 32.4 RESULTS AND INSTRUMENTS
COMPARISON 429 32.5 CONCLUSION 432 REFERENCES 433 33 SURFACE ANALYSIS OF
PRECISION WEIGHTS FOR THE STUDY OF COMMONLY OCCURRING CONTAMINANTS 434
ULF JACOBSSON AND PETER SJOVALL 33.1 INTRODUCTION 434 33.2 EXPERIMENTAL
435 33.3 RESULTS 438 33.4 DISCUSSION AND CONCLUSIONS 442 REFERENCES 442
34 TIP-SHAPE EFFECT ON THE ACCURACY OF CAPACITANCE DETERMINATION BY
SCANNING CAPACITANCE MICROSCOPES 443 STEFAN LDNYI 34.1 INTRODUCTION 443
34.2 PROBE GEOMETRY 445 34.3 SIMULATED TOPOGRAPHIC ARTIFACTS 446 34.4
RESULTS 447 34.5 DISCUSSION 450 REFERENCES 451 35 ATOMIC FORCE
MICROSCOPE TIP INFLUENCE ON THE FRACTAL AND MULTI-FRACTAL ANALYSES OF
THE PROPERTIES OF RANDOMLY ROUGH SURFACES 452 P. KLAPETEK, I. OHLIDAL,
AND J. BILEK 35.1 INTRODUCTION 452 35.2 DATA SIMULATION AND PROCESSING
453 35.3 FRACTAL PROPERTIES ANALYSIS 454 35.4 MULTI-FRACTAL PROPERTIES
ANALYSIS 457 35.5 RESULTS AND DISCUSSION 460 CONTENTS XVII 35.6
CONCLUSION REFERENCES 461 462 PART X APPLICATION - MATERIAL PROPERTIES
36 ATOMIC FORCE MICROSCOPE INDENTATION MEASUREMENT SOFTWARE 465 DAVID
SHUMAN 36.1 INTRODUCTION 465 36.2 EXPERIMENTAL DETAILS 468 36.2.1 SAMPLE
PREPARATION 469 36.2.2 INDENTATION PROCEDURE 469 36.2.3 AFM CALIBRATION
469 36.2.4 SURFACE HEIGHT AND ROUGHNESS 470 36.2.5 PROJECTED AREA 470
36.2.6 PROJECTED AREA 473 36.2.7 SURFACE AREA 473 36.2.8 ELASTIC
RECONSTRUCTION 474 36.2.9 BUILDING THE AREA FUNCTIONS 475 36.2.10
INDENTER ANGLE AND RADIUS 476 36.2.11 NANOMC HARDNESS 477 36.3
CONCLUSION 479 ACKNOWLEDGMENTS 479 REFERENCES 480 37 NANODEFORMATION
ANALYSIS NEAR SMALL CRACKS BY MEANS OF NANODAC TECHNIQUE 481 JURGEN
KELLER, DIETMAR VOGEL, AND BERND MICHEL 37.1 INTRODUCTION 481 37.2
DIGITAL IMAGE CORRELATION ON SPM IMAGES 482 37.2.1 PRINCIPLE OF NANODAC
482 37.2.2 STABILITY ASPECTS OF SPM MEASUREMENTS 484 37.3 CRACK
EVALUATION 488 37.3.1 EXPERIMENTAL SETUP 488 37.3.2 CRACK OPENING
DISPLACEMENT ANALYSIS 489 37.4 ADAPTATION TO FINITE ELEMENT ANALYSIS 491
37 .4.1 ADAPTATION CONCEPT 492 37.4.2 MESH TRANSFER FROM FEA TO
EXPERIMENT 493 37.4.3 VERIFICATION PLATFORM 494 DEROTATION AND
DISPLACEMENT MATCHING 494 DETERMINATION OF MATERIAL PROPERTIES 495 37.5
APPLICATION OF DIC TO MICROMACHINED GAS SENSOR 496 37.6 CONCLUSIONS 498
ACKNOWLEDGMENTS 498 REFERENCES 498 ] I XVIII I CONTENTS 38 PTB S
PRECISION INTERFEROMETERFBR HIGH ACCURACY CHARACTERIZATION OF THERMAL
EXPANSION PROPERTIES OF LOW EXPANSION MATERIALS 500 R. SCHODEL AND A.
ABOU-ZEID 38.1 INTRODUCTION 500 38.2 EXPERIMENTAL SETUP 503 38.2.1
DESCRIPTION OF THE INTERFEROMETER 503 38.2.2 SAMPLE DESIGN 504 13.2.3
AUTOCOLLIMATION ADJUSTMENT 506 13.3 CHECK MEASUREMENTS 507 38.4
MEASUREMENT EXAMPLES 508 38.4.1 THERMAL EXPANSION AND UNCERTAINTY 509
38.4.2 CTE HOMOGENEITY 511 38.4.3 TEMPORAL LENGTH CHANGES 512 38.5
CONCLUDING REMARK 514 REFERENCES 514 INDEX 515
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NANOSCALE CALIBRATION STANDARDS AND METHODS DIMENSIONAL AND RELATED
MEASUREMENTS IN THE MICRO- AND NANOMETER RANGE EDITED BY CUNTER
WILKENING, LUDGER KOENDERS TECHNISCHE } INFORMATIONSBIBLIOTHEK
UNIVERSITATSBIBLIOTHEK HANNOVER WILEY- VCH WILEY-VCH VERLAG GMBH & CO.
KGAA CONTENTS PART I INSTRUMENTATION - OVERVIEW 1 METROLOGICAL SCANNING
PROBE MICROSCOPES - INSTRUMENTS FOR DIMENSIONAL NANOMETROLOGY 3
HANS-ULRICH DANZEBRINK, FRANK POHLENZ, GAOLIANG DAI, AND CLAUDIO DAL
SAVIO 1.1 INTRODUCTION 3 1.2 HIGH-RESOLUTION PROBING SYSTEMS 4 1.2.1
SENSOR OBJECTIVE WITH BEAM DEFLECTION DETECTION 5 1.2.2 SENSOR OBJECTIVE
WITH PIEZOLEVER MODULE 7 1.2.3 SENSOR OBJECTIVE WITH TUNING FORK MODULE
8 1.2.4 SENSOR HEAD FOR COMBINED SCANNING PROBE AND INTERFERENCE
MICROSCOPY 9 1.3 METROLOGY SYSTEMS BASED ON SCANNING PROBE MICROSCOPES
12 1.3.1 SCANNING FORCE MICROSCOPES OF TYPE VERITEKT 13 1.3.2
METROLOGICAL LARGE RANGE SCANNING FORCE MICROSCOPE 15 1.4 SUMMARY 18
ACKNOWLEDGMENTS 19 REFERENCES 19 / 2 NANOMETROLOGY AT THE IMCC 22 M.
BISI, E. MASSA, A. PASQUINI, G. B. PICOTTO, AND M. PISANI 2.1
INTRODUCTION 22 2.2 SURFACE METROLOGY 23 2.2.1 SCANNING PROBE MICROSCOPY
23 2.2.2 OPTICAL DIFFRACTOMETRY 25 2.2.3 STYLUS PROFILOMETRY 27 2.3
ATOMIC SCALE METROLOGY 28 2.3.1 LATTICE PARAMETER OF SILICON 29 2.3.2
COMBINED OPTICAL AND X-RAY INTERFEROMETRY (COXI) 30 2.4 PHASE-CONTRAST
TOPOGRAPY 31 2A.I DETECTION OF SMALL LATTICE STRAIN 31 2.4.2
PHASE-CONTRAST IMAGING 32 NANOSCALE CALIBRATION STANDARDS AND METHODS:
DIMENSIONAL AND RELATED MEASUREMENTS IN THE MICRO- AND NANOMETER RANGE.
EDITED BY G. WILKENING AND L. KOENDERS COPYRIGHT 2005 WILEY-VCH VERLAG
GMBH & CO. KGAA, WEINHEIM ISBN 3-527-40502-X VI CONTENTS 2.5 2.6
NANOBALANCE CONCLUSIONS REFERENCES 34 35 36 3 METROLOGICAL APPLICATIONS
OF X-RAY INTERFEROMETRY 38 ANDREW YACOOT 3.1 INTRODUCTION 38 3.2
MEASUREMENT OF NON-LINEARITY IN OPTICAL INTERFEROMETERS 40 3.3 COMBINED
OPTICAL AND X-RAY INTERFEROMETRY 41 3.4 MEASUREMENT OF SMALL ANGLES 42
3.5 X-RAY INTERFEROMETRY AND SCANNING PROBE MICROSCOPY 43 3.6
CONCLUSIONS 43 REFERENCES 44 PART II INSTRUMENTATION - LONG-RANGE
SCANNING PROBE MICROSCOPE 4 ADVANCES IN TRACEABLE NANOMETROLOGY WITH THE
NANOPOSITIONING AND NANOMEASURING MACHINE 47 EBERHARD MANSKE, ROSTISLAV
MASTYLO, TINO HAUSOTTE, NORBERT HQFINANN, AND GERD JAGER 4.1
INTRODUCTION 47 4.2 DESIGN AND OPERATION 48 4.3 UNCERTAINTY BUDGET 52
4.4 FOCUS SENSOR 53 4.5 MEASURING OPPORTUNITIES AND PERFORMANCE WITH
FOCUS SENSOR 55 4.6 FOCUS PROBE WITH SFM CANTILEVER 58 4.7 CONCLUSION 58
ACKNOWLEDGEMENTS 59 REFERENCES 59 5 COORDINATE MEASUREMENTS IN
MICROSYSTEMS BY USING AFM-PROBING: PROBLEMS AND SOLUTIONS 60 DOROTHEE
HILSER, RALPH PETERSEN, AND HENDRIK ROTHE 5.1 INTRODUCTION 60 5.2
REALIZING CMMS FOR MICROSYSTEMS 61 5.3 PROBLEMS AND SOLUTIONS 64 5.3.1
DYNAMICS OF POSITIONING SYSTEM 64 5.3.2 CMM: ONE-MILLIMETER SCAN 67
5.3.3 MEASURING STRATEGIES 68 5.4 CONCLUSION AND OUTLOOK 71 REFERENCES
72 CONTENTS VII 6 METROLOGICAL LARGE RANGE SCANNING FORCE MICROSCOPE
APPLICABLE FOR TRACEABLE CALIBRATION OF SURFACE TEXTURES 73 GAOLIANG
DAI, FRANK POHLENZ, HANS-ULRICH DANZEBRINK, MIN XU, KLAUS HASCHE,
GTINTER WILKENING 6.1 INTRODUCTION 74 6.2 INSTRUMENTATION 75 6.2.1
PRINCIPLE 75 6.2.2 METROLOGICAL PROPERTIES 76 6.2.3 TRACEABILITY 78
6.2.4 SPECIALLY DESIGNED FEATURES 79 6.3 MEASUREMENT RESULT OF A
2D-GRATING STANDARD 80 6.3.1 MEASUREMENT STRATEGY 80 6.3.2 DATA
EVALUATION 82 6.3.3 MEASUREMENT RESULT OF THE MEAN PITCH VALUE 83 6.3.4
MEASUREMENT OF THE LOCAL PITCH VARIATION 83 6.4 A SELECTED MEASUREMENT
RESULT OF A MICROROUGHNESS STANDARD 85 6.4.1 MEASUREMENT RESULT OF A
GLASS FLATNESS STANDARD 86 6.4.2 MEASUREMENT OF A PTB MICROROUGHNESS
STANDARD 87 6.4.3 COMPARISON OF THE ROUGHNESS MEASUREMENT RESULTS
DERIVED FROM SFM AND STYLUS INSTRUMENTS USING GAUSSIAN FILTER 88 6.4.4
COMPARISON USING MORPHOLOGICAL FILTERS 89 6.4.5 EVALUATION RESULTS USING
PTB REFERENCE SOFTWARE 90 6.5 OUTLOOK AND CONCLUSION 91 REFERENCES 92
PART III INSTRUMENTATION - DEVELOPMENT OF SPM AND SENSORS 7 TRACEABLE
PROBING WITH AN AFM 95 K. DIRSCHERL AND K. R. KOOPS 7.1 INTRODUCTION 95
7.2 SETUP 96 7.3 CORRECTION FOR PIEZO NONLINEARITIES 10U 7.3.1
HYSTERESIS 200 7.3.2 DRIFT 102 7.4 REAL-TIME CONTROL THROUGH SSE2
ASSEMBLY 103 7.4 IMPLEMENTATION OF THE MEASUREMENT CONTROLLER 104 7.6
IMAGE ANALYSIS 105 7.7 CONCLUSIONS 207 ACKNOWLEDGMENTS 208 REFERENCES
208 8 SCANNING PROBE MICROSCOPE SETUP WITH INTERFEROMETRIC DRIFT
COMPENSATION 209 ANDRZEJ SIKORA, DMITRI V. SOKOLOV, AND HANS U.
DANZEBRINK 8.1 MOTIVATION 209 VIII CONTENTS 8.2 EXISTING SETUP - WITHOUT
DRIFT COMPENSATION 2 22 8.3 MEASUREMENT METHOD AND SETUP FOR DRIFT
COMPENSATION 212 8.4 EXPERIMENT AND RESULTS 225 8.5 SUMMARY 228
REFERENCES 228 9 DSP-BASED METROLOGICAL SCANNING FORCE MICROSCOPE WITH
DIRECT INTERFEROMETRIC POSITION MEASUREMENT AND IMPROVED MEASUREMENT
SPEED 229 GAOLIANG DAI, FRANK POHLENZ, HANS-TJLRICH DANZEBRINK, KLAUS
HASCHE, AND GIINTER WILKENING 9.1 INTRODUCTION 229 9.2 INSTRUMENT 120
9.2.1 PRINCIPLE 120 9.2.2 DSP-BASED SIGNAL PROCESSING SYSTEM 122 9.2.3
CALIBRATION OF THE TIP SIGNAL FOR TRACEABLY MEASURING THE BENDING OF THE
CANTILEVER 223 9.3 CORRECTION OF NONLINEARITY OF THE OPTICAL
INTERFEROMETERS IN THE M-SFM 124 9.3.1 REVIEW OF NONLINEARITY CORRECTION
METHODS 124 9.3.2 ADAPTED HEYDEMANN CORRECTION IN A FAST SERVO CONTROL
LOOP 225 9.3.3 PERFORMANCE OF THE INTERFEROMETERS IN THE M-SFM VERITEKT
C 226 9.4 IMPROVING THE MEASUREMENT SPEED 228 9.5 A MEASUREMENT EXAMPLE
OF STEP-HEIGHT STANDARD 129 REFERENCES 130 10 COMBINED CONFOCAL AND
SCANNING PROBE SENSOR FOR NANO-COORDINATE METROLOGY 131 DMITRI V.
SOKOLOV, DMITRI V. KAZANTSEV, JAMES W. G. TYRRELL, TOMASZ HASEK, AND
HANS U. DANZEBRINK 10.1 INTRODUCTION 132 10.2 INSTRUMENTATION AND
EXPERIMENTAL DETAILS 133 10.3 RESULTS AND DISCUSSION 136 10.3.1 IMAGING
IN THE CONFOCAL AND SPM MODE 136 10.3.2 ONE-DIMENSIONAL OPTICAL AND SPM
MEASUREMENTS 138 10.4 SUMMARY AND CONCLUSIONS 141 ACKNOWLEDGMENTS 142
REFERENCES 142 11 COMBINED SHEAR FORCE-TUNNELING MICROSCOPE WITH
INTERFEROMETRIC TIP OSCILLATION DETECTION FOR LOCAL SURFACE
INVESTIGATION AND OXIDATION 244 ANDRZEJ SIKORA, TEODOR GOTSZALK, AND
ROMAN SZELOCH 11.1 INTRODUCTION 144 11.2 INSTRUMENTATION 145 11.3 LOCAL
SURFACE ELECTRICAL PROPERTIES INVESTIGATION 152 CONTENTS IX 11.4 LOCAL
SURFACE OXIDATION 152 11.5 SUMMARY 154 ACKNOWLEDGEMENTS 155 REFERENCES
155 12 LOW NOISE PIEZORESISTIVE MICRO FORCE SENSOR 157 L. DOERING, E.
PEINER, V. NESTEROV, AND U. BRAND 12.1 INTRODUCTION 157 12.2
MANUFACTURING OF THE SENSOR 158 12.2.1 COMPUTER AIDED DESIGN 158 12.2.2
MANUFACTURING OF THE SENSOR 158 12.3 SENSOR PROPERTIES 160 12.3.1 DOPING
PROFILE 160 12.3.2 SPECTROSCOPIC NOISE ANALYSIS AND DETERMINATION OF THE
HOOGE CONSTANT 163 12.3.3 FORCE CALIBRATION AND ELECTRICAL CALIBRATION
165 12.4 APPLICATION: FORCE CALIBRATION OF A STYLUS INSTRUMENT 167 12.5
CONCLUSIONS 169 REFERENCES 170 PART IV CALIBRATION - OVERVIEW 13 TOWARDS
A GUIDELINE FOR SPM CALIBRATION 173 T. DZIOMBA, L. KOENDERS, AND G.
WILKENING 13.1 INTRODUCTION 173 13.2 GENERAL 176 13.2.1 SCHEMATIC
DESCRIPTION OF SPMS 176 13.2.2 METROLOGICAL CLASSIFICATION OF SPMS 177
13.2.3 CALIBRATION INTERVALS 178 13.3 VERIFICATION OF PROPERTIES OF
INSTRUMENT, TIP AND ENVIRONMENT 178 13.3.1 AMBIENT CONDITIONS 179 13.3.2
FLATNESS MEASUREMENTS AND SIGNAL NOISE 179 13.3.3 REPEATABILITY AND
NOISE 181 13.3.4 TIP SHAPE 182 13.4 CALIBRATION OF THE SCANNER AXES 183
13.4.1 LATERAL CALIBRATION 183 13.4.2 CALIBRATION OF THE VERTICAL AXIS
186 USING LASER INTERFEROMETERS 187 USING TRANSFER STANDARDS 188
EVALUATION OF STEP HEIGHT 188 13.5 UNCERTAINTY OF MEASUREMENTS 290
ACKNOWLEDGMENTS 291 REFERENCES 292 CONTENTS 14 TRUE THREE-DIMENSIONAL
CALIBRATION OF CLOSED LOOP SCANNING PROBE MICROSCOPES 193 J. GARNAES, A.
KUHLE, L. NIELSEN, AND F. BORSETTO 14.1 INTRODUCTION 193 14.2 MODEL OF
THE MEASUREMENT SYSTEM 194 14.3 THE CORRECTION MATRIX 195 14.4 THEORY
FOR ESTIMATING THE VERTICAL SKEW 196 14.5 EXPERIMENTAL RESULTS AND
DISCUSSION 200 14.6 CONCLUSION 202 ACKNOWLEDGEMENTS 202 APPENDIX 203
REFERENCES 204 15 HEIGHT AND PITCH AT NANOSCALE - HOW TRACEABLE IS
NANOMETROLOGY? 205 L. KOENDERS AND F. MELI 15.1 INTRODUCTION 205 15.2
COMPARISON ON ONE-DIMENSIONAL PITCH STANDARDS (NANO 4) 206 15.2.1
STANDARDS AND MEASURAND 206 15.2.2 PARTICIPANTS AND MEASUREMENT METHODS
207 15.2.3 RESULTS 208 15.2.4 UNCERTAINTY 210 15.2.5 DISCUSSION 211 15.3
COMPARISON ON STEP HEIGHT (NANO4) 212 15.3.1 STANDARDS 212 15.3.2
MEASUREMENT METHODS 213 15.3.3 RESULTS 214 15.3.4 UNCERTAINTIES 216
15.3.5 DISCUSSION 217 15.4 CONCLUSIONS 218 ACKNOWLEDGMENT 228 REFERENCES
219 16 THE BEHAVIOR OF PIEZOELECTRIC ACTUATORS AND THE EFFECT ON
STEP-HEIGHT MEASUREMENT WITH SCANNING FORCE MICROSCOPES 220 A. GRANT, L.
MCDONNELL, AND E. M. GIL ROMERO 16.1 INTRODUCTION 220 16.2 EXPERIMENTAL
222 16.2.1 SCANNING FORCE MICROSCOPES 222 16.2.2 Z CALIBRATION WITH
STEP-HEIGHT STANDARDS 223 16.2.3 Z CALIBRATION WITH FIBER-OPTIC
DISPLACEMENT SENSOR 223 16.3 RESULTS 224 16.3.1 EFFECT OF VOLTAGE SWEEP
224 16.3.2 EFFECT OF Z ACTUATOR OFFSET 225 16.3.3 IMPLICATIONS OF
ACTUATOR OFFSET FOR SAMPLE TILT 227 16.3.4 IMPLICATIONS OF ACTUATOR
OFFSET FOR SCANNER CURVATURE 227 CONTENTS XI 16.4 CONCLUSIONS 228
ACKNOWLEDGMENTS 228 REFERENCES 228 17 AN APPROACH TO THE DEVELOPMENT OF
TOLERANCE SYSTEMS FOR MICRO- AND NANOTECHNOLOGY 230 J. SCHOBEL AND E.
WESTKAMPER 17.1 INTRODUCTION 230 17.2 TOLERANCING AND STANDARDS 231
17.2.1 MEASUREMENT SYSTEMS ANALYSIS 232 " 17.2.2 STEP-HEIGHT
MEASUREMENTS 232 17.2.3 MICROROUGHNESS 234 17.3 MACHINING EXPERIMENTS
235 17.3.1 MICROMILLING 235 17.3.2 SPUTTERING 237 17.4 CONCLUSIONS 240
REFERENCES 241 PART V CALIBRATION - STANDARDS FOR NANOMETROLOGY 18
STANDARDS FOR THE CALIBRATION OF INSTRUMENTS FOR DIMENSIONAL
NANOMETROLOGY 245 L. KOENDERS, T. DZIOMBA, P. THOMSEN-SCHMIDT, AND G.
WILKENING 18.1 INTRODUCTION 245 18.2 STANDARDS FOR SCANNING PROBE
MICROSCOPY 246 18.2.1 FLATNESS STANDARD 246 18.2.2 TIP CHARACTERIZES 248
18.2.3 LATERAL STANDARDS 250 18.2.4 STEP-HEIGHT STANDARDS 252 18.2.5
NANOROUGHNESS STANDARDS 254 18.3 FILM THICKNESS STANDARDS 254 18.4
OUTLOOK 256 ' ACKNOWLEDGMENTS 256 REFERENCES 257 19 "ATOMIC FLAT"
SILICON SURFACE FOR THE CALIBRATION OF STYLUS INSTRUMENTS 259 S. GROGER
AND M. DIETZSCH 19.1 CALIBRATION OF STYLUS INSTRUMENTS 259 19.2 "ATOMIC
FLAT" SILICON AS CALIBRATION STANDARD 263 19.3 SELECTION OF THE
MEASUREMENT INSTRUMENT FOR THE ASSESSMENT OF FLATNESS 264 19.4
CALIBRATION OF THE STYLUS INSTRUMENT ME 10 265 19.5 CHARACTERISTICS OF
THE MEASUREMENT INSTRUMENT AFTER MODIFICATION 267 19.6 CONCLUSIONS AND
OUTLOOK 268 REFERENCES 268 XII CONTENTS 20 INVESTIGATIONS OF
NANOROUGHNESS STANDARDS BY SCANNING FORCE MICROSCOPES AND INTERFERENCE
MICROSCOPE 269 R. KRIXGER-SEHM, T. DZIOMBA, AND G. DAI 20.1 INTRODUCTION
269 20.2 STANDARDIZATION ASPECTS 270 20.3 MANUFACTURING OF CALIBRATION
SPECIMENS 271 20.3.1 CONDITIONS FOR SMALLER ROUGHNESS 271 20.3.2
MANUFACTURING PROCESS 272 20.3.3 PROFILE REPETITION 273 20.4
MEASUREMENTS 274 20.4.1 IDENTIFICATION OF THE FIELDS OF INTEREST 274
20.4.2 CORRELATION OF FIELDS 274 20.4.3 MEASUREMENTS WITH INTERFERENCE
MICROSCOPE 275 20.4.4 SCANNING FORCE MICROSCOPE MEASUREMENTS 276 20.4.5
LONG RANGE SFM MEASUREMENTS 278 20.4.6 RELATION TO PROVEN ROUGHNESS
STANDARDS 279 20.5 CONCLUSIONS AND OUTLOOK 279 ACKNOWLEDGMENTS 281
REFERENCES 282 21 TESTING THE LATERAL RESOLUTION IN THE NANOMETRE RANGE
WITH A NEW TYPE OF CERTIFIED REFERENCE MATERIAL 282 M. SENONER, TH.
WIRTH, W. UNGER, W. OSTERLE, I. KAIANDER, R.I. SELLIN, AND D. BIMBERG
21.1 INTRODUCTION 282 21.2 DESCRIPTION OF THE REFERENCE MATERIAL 283
21.3 MODELING OF LATERAL RESOLUTION 284 21.3.1 ANALYSIS OF A NARROW
STRIP 288 21.3.2 ANALYSIS OF A STRAIGHT EDGE 289 21.3.3 ANALYSIS OF
GRATINGS 292 21.4 CONCLUSIONS 294 / ACKNOWLEDGMENTS 294 REFERENCES 294
PART VI CALIBRATION - TIP SHAPE 22 RECONSTRUCTION AND GEOMETRIC
ASSESSMENT OF AFM TIPS 297 TORSTEN MACHLEIDT, RALF KASTNER, AND
KARL-HEINZ FRANKE 22.1 INTRODUCTION 298 22.2 RECONSTRUCTION OF THE
TACTILE TIP 299 22.2.1 IMAGING THE TIP USING SCANNING ELECTRON
MICROSCOPY 299 22.2.2 RECONSTRUCTION BY KNOWN SAMPLE STRUCTURE 300
22.2.3 BLIND TIP ESTIMATION 302 22.2.4 MOTIVATION 302 22.2.5 TIP
ASSESSMENT 302 CONTENTS XIII 22.2.5.1 TWO-DIMENSIONAL CHARACTERIZATION
'302 22.2.5.2 GEOMETRICAL INTERPRETATION 303 22.2.5.3 TIP ANGLE 304
22.2.5.4 TIP RADIUS 305 22.2.5.5 TIP CURVATION 305 22.2.5.6 REVIEW 306
22.2.6 THREE-DIMENSIONAL CHARACTERIZATION 306 22.2.6.1 GEOMETRICAL
INTERPRETATION 306 22.2.6.2 SIMULATED ANNEALING ALGORITHM 307 22.2.6.3
CONVERGENCE 308 22.2.7 EXPERIMENTAL RESULTS 309 22.3 SUMMARY AND OUTLOOK
309 REFERENCES 320 23 COMPARISON OF DIFFERENT METHODS OF SFM TIP SHAPE
DETERMINATION FOR VARIOUS CHARACTERISATION STRUCTURES AND TYPES OF TIP
322 S. CZERKAS, T. DZIOMBA, AND H. BOSSE 23.1 INTRODUCTION 32 2 23.2
INSTRUMENTATION 322 23.3 RESULTS AND DISCUSSION 323 23.3.1 NEEDS OF CD
METROLOGY 313 23.3.2 TIP SHAPE DETERMINATION 324 23.3.3 CONCLUSIONS 328
23.4 SUMMARY 320 REFERENCES 320 PART VII CALIBRATION - OPTICAL METHODS
24 DOUBLE TILT IMAGING METHOD FOR MEASURING APERTURE CORRECTION FACTOR
323 YEN-LIANG CHEN, CHAO-JUNG CHEN, AND GWO-SHENG PENG 24.1 INTRODUCTION
323 24.2 TRACEABILITY OF STEP HEIGHT 324 ' 24.3 WORKING PRINCIPLE OF DIT
METHOD 325 24.4 EXPERIMENTAL SETUP 326 24.5 RELATIVE STANDARD
UNCERTAINTY OF NUMERICAL APERTURE CORRECTION FACTOR 328 24.6 UNCERTAINTY
ANALYSIS OF THE NUMERICAL APERTURE CORRECTION FACTOR 329 24.7 CONCLUSION
329 REFERENCES 330 25 HOW STATISTICAL NOISE LIMITS THE ACCURACY OF
OPTICAL INTERFEROMETRY FOR NANOMETROLOGY 331 VICTOR NASCOV 25.1
INTRODUCTION 331 25.2 OPTICAL INTERFEROMETRY OVERVIEW 332 XIV CONTENTS
25.2.1 TWO WAVES INTERFEROMETRY 332 25.2.2 MULTIPLE WAVES INTERFEROMETRY
337 25.3 STATISTICAL ERRORS ON PROCESSING ELEMENTARY FRINGE PATTERNS 337
25.4 WAVELENGTHS AND DISPLACEMENTS MEASUREMENT 340 25.5 ABSOLUTE
DISTANCE MEASUREMENT 341 25.6 CONCLUSIONS 343 REFERENCES 344 26
UNCERTAINTY ANALYSIS OF THE PTB MEASURING EQUIPMENT FOR THE
INVESTIGATION OF LASER INTERFEROMETERS 345 G. SPARRER AND A. ABOU-ZEID
26.1 INTRODUCTION 345 26.2 THE CALIBRATION FACILITY 346 26.3 MEASUREMENT
PROCEDURE 348 26.4 THE UNCERTAINTY OF THE COMPLETE CALIBRATION FACILITY
349 26.4.1 THE MEASUREMENT UNCERTAINTY OF THE COMPARATOR 349 26.4.2 THE
MEASUREMENT UNCERTAINTY OF THE STANDARD LASER INTERFEROMETER TAKING INTO
ACCOUNT THE REFRACTIVE INDEX OF AIR AND THE THERMAL EXPANSION 352 26.4.3
THE EXPANDED MEASUREMENT UNCERTAINTY OF THE ENTIRE CALIBRATION FACILITY
355 SIGNS AND SYMBOLS OF THE MODEL EQUATIONS AND THE UNCERTAINTY
BUDGETS: 356 REFERENCES 357 PART VIII APPLICATION - LATERAL STRUCTURES
27 LATERAL AND VERTICAL DIAMETER MEASUREMENTS ON POLYMER PARTICLES WITH
A METROLOGY AFM 361 F. MELI 27.1 INTRODUCTION 361 27.2 EXPERIMENTAL
SETUP 363 27.3 MEASUREMENT RESULTS AND DISCUSSION 365 27.3.1 HEIGHT
MEASUREMENTS ON GOLD COLLOIDS 365 27.3.2 POSSIBLE SYSTEMATIC DEVIATIONS
WITH HEIGHT MEASUREMENTS ON GOLD COLLOIDS 368 27.3.3 LATERAL
MEASUREMENTS ON POLYMER SPHERES 370 27 A CONCLUSION 374 REFERENCES 374
28 PITCH AND CD MEASUREMENTS AT ANISOTROPICALLY ETCHED SI STRUCTURES IN
AN SEM 375 C. G. FRASE, S. CZERKAS, H. BOSSE, YU. A. NOVIKOV, AND A. V.
RAKOV 28.1 INTRODUCTION 376 28.2 GWPS SPECIMEN 376 CONTENTS XV 28.3 SEM
INSTRUMENTATION 377 28.4 SEM IMAGE FORMATION AND MODELING 377 28.5 SEM
MEASUREMENT METHOD 381 28.6 MEASUREMENT RESULTS 382 28.7 CONCLUSION 384
REFERENCES 384 29 ANALYSIS AND COMPARISON OF CD-SEM EDGE OPERATORS: A
CONTRIBUTION TO FEATURE WIDTH METROLOGY 385 C.G. FRASE, W.
HAJLLER-GROHNE, E. BUHR, K.-HAHM, AND H. BOSSE 29.1 INTRODUCTION 385
29.2 EXPONENTIAL FIT OPERATOR 387 29.2.1 SECONDARY ELECTRON IMAGE
FORMATION AT STRUCTURAL EDGES 387 29.2.2 DEFINITION OF TOP CD OPERATOR
390 29.2.3 SEM MODEL INPUT PARAMETER VARIATIONS 390 29.2.4 EXPERIMENTAL
PARAMETER VARIATIONS 392 29.2.5 MEASUREMENT RESULTS 393 29.3 MODIFIED
EXPONENTIAL FIT OPERATOR FOR HIGH SIDEWALL ANGLES 394 29.4 GAUSS FIT
OPERATOR 396 29.5 SIGNAL DECAY OPERATOR 398 29.6 CONCLUSION 402
REFERENCES 403 30 MEASUREMENT OF HIGH-RESOLUTION INTERFERENTIAL ENCODERS
USING THE PTB NANOMETER COMPARATOR 404 J. FLTIGGE, R. KOENING, AND H.
BOSSE 30.1 PRINCIPLE 404 30.2 LASER INTERFEROMETER 405 30.3 INCREMENTAL
LINEAR ENCODERS 406 30.4 MEASUREMENT RESULTS 408 REFERENCES 409 / PART
IX APPLICATION - SURFACE 31 EXPERIMENTAL CHARACTERIZATION OF MICROMILLED
SURFACES BY LARGE-RANGE AFM 413 P. BARIANI, G. BISSACCO, H. N. HANSEN,
AND L. DE CHIFFRE 31.1 INTRODUCTION 423 31.2 MICROMILLING OF HARDENED
TOOL STEEL 424 31.3 SURFACE TOPOGRAPHY MEASUREMENT 425 31.4 LARGE-RANGE
ATOMIC FORCE MICROSCOPY 426 31.5 TECHNIQUES USED FOR COMPARISON 426 31.6
EVALUATION OF SAMPLING CONDITIONS FOR THE DIFFERENT TECHNIQUES 417 31.7
RESULTS 418 31.8 DISCUSSION AND CONCLUSIONS 422 I! XVI CONTENTS
REFERENCES 423 32 INVESTIGATION OF THE SURFACE ROUGHNESS MEASUREMENT OF
MASS STANDARDS 424 C. ZERROUKI, L.R PENDRILLJ. M. BENNETT, Y. HAIDAR, F.
DE FORNEL, AND P. PINOT 32.1 INTRODUCTION 424 32.2 REQUIREMENTS FOR
SURFACE ROUGHNESS OF MASS STANDARDS 425 32.3 SURFACE ROUGHNESS
MEASUREMENT METHODS APPLIED TO MASS STAN- DARDS 426 32.3.1 MECHANICAL
PROFILER (NAWC-US) 427 32.3.2 NEAR FIELD MICROSCOPE (LPUB, FR) 427
32.3.3 ANGLE-RESOLVED LIGHT SCATTERING (BNM-INM, FR) 428 32.3.4
ANGLE-RESOLVED LIGHT SCATTERING (LASERCHECK, US) 428 32.3.5 TOTAL
INTEGRATED LIGHT SCATTERING (SP, SE) 429 32.4 RESULTS AND INSTRUMENTS
COMPARISON 429 32.5 CONCLUSION 432 REFERENCES 433 33 SURFACE ANALYSIS OF
PRECISION WEIGHTS FOR THE STUDY OF COMMONLY OCCURRING CONTAMINANTS 434
ULF JACOBSSON AND PETER SJOVALL 33.1 INTRODUCTION 434 33.2 EXPERIMENTAL
435 33.3 RESULTS 438 33.4 DISCUSSION AND CONCLUSIONS 442 REFERENCES 442
34 TIP-SHAPE EFFECT ON THE ACCURACY OF CAPACITANCE DETERMINATION BY
SCANNING CAPACITANCE MICROSCOPES 443 STEFAN LDNYI 34.1 INTRODUCTION 443
34.2 PROBE GEOMETRY 445 34.3 SIMULATED TOPOGRAPHIC ARTIFACTS 446 34.4
RESULTS 447 34.5 DISCUSSION 450 REFERENCES 451 35 ATOMIC FORCE
MICROSCOPE TIP INFLUENCE ON THE FRACTAL AND MULTI-FRACTAL ANALYSES OF
THE PROPERTIES OF RANDOMLY ROUGH SURFACES 452 P. KLAPETEK, I. OHLIDAL,
AND J. BILEK 35.1 INTRODUCTION 452 35.2 DATA SIMULATION AND PROCESSING
453 35.3 FRACTAL PROPERTIES ANALYSIS 454 35.4 MULTI-FRACTAL PROPERTIES
ANALYSIS 457 35.5 RESULTS AND DISCUSSION 460 CONTENTS XVII 35.6
CONCLUSION REFERENCES 461 462 PART X APPLICATION - MATERIAL PROPERTIES
36 ATOMIC FORCE MICROSCOPE INDENTATION MEASUREMENT SOFTWARE 465 DAVID
SHUMAN 36.1 INTRODUCTION 465 36.2 EXPERIMENTAL DETAILS 468 36.2.1 SAMPLE
PREPARATION 469 36.2.2 INDENTATION PROCEDURE 469 36.2.3 AFM CALIBRATION
469 36.2.4 SURFACE HEIGHT AND ROUGHNESS 470 36.2.5 PROJECTED AREA 470
36.2.6 PROJECTED AREA 473 36.2.7 SURFACE AREA 473 36.2.8 ELASTIC
RECONSTRUCTION 474 36.2.9 BUILDING THE AREA FUNCTIONS 475 36.2.10
INDENTER ANGLE AND RADIUS 476 36.2.11 NANOMC HARDNESS 477 36.3
CONCLUSION 479 ACKNOWLEDGMENTS 479 REFERENCES 480 37 NANODEFORMATION
ANALYSIS NEAR SMALL CRACKS BY MEANS OF NANODAC TECHNIQUE 481 JURGEN
KELLER, DIETMAR VOGEL, AND BERND MICHEL 37.1 INTRODUCTION 481 37.2
DIGITAL IMAGE CORRELATION ON SPM IMAGES 482 37.2.1 PRINCIPLE OF NANODAC
482 37.2.2 STABILITY ASPECTS OF SPM MEASUREMENTS 484 37.3 CRACK
EVALUATION 488 ' 37.3.1 EXPERIMENTAL SETUP 488 37.3.2 CRACK OPENING
DISPLACEMENT ANALYSIS 489 37.4 ADAPTATION TO FINITE ELEMENT ANALYSIS 491
37'.4.1 ADAPTATION CONCEPT 492 37.4.2 MESH TRANSFER FROM FEA TO
EXPERIMENT 493 37.4.3 VERIFICATION PLATFORM 494 DEROTATION AND
DISPLACEMENT MATCHING 494 DETERMINATION OF MATERIAL PROPERTIES 495 37.5
APPLICATION OF DIC TO MICROMACHINED GAS SENSOR 496 37.6 CONCLUSIONS 498
ACKNOWLEDGMENTS 498 REFERENCES 498 ] I XVIII I CONTENTS 38 PTB'S
PRECISION INTERFEROMETERFBR HIGH ACCURACY CHARACTERIZATION OF THERMAL
EXPANSION PROPERTIES OF LOW EXPANSION MATERIALS 500 R. SCHODEL AND A.
ABOU-ZEID 38.1 INTRODUCTION 500 38.2 EXPERIMENTAL SETUP 503 38.2.1
DESCRIPTION OF THE INTERFEROMETER 503 38.2.2 SAMPLE DESIGN 504 13.2.3
AUTOCOLLIMATION ADJUSTMENT 506 13.3 CHECK MEASUREMENTS 507 38.4
MEASUREMENT EXAMPLES 508" 38.4.1 THERMAL EXPANSION AND UNCERTAINTY 509
38.4.2 CTE HOMOGENEITY 511 38.4.3 TEMPORAL LENGTH CHANGES 512 38.5
CONCLUDING REMARK 514 REFERENCES 514 INDEX 515 |
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| author_GND | (DE-588)128827459 |
| building | Verbundindex |
| bvnumber | BV021234510 |
| callnumber-first | Q - Science |
| callnumber-label | QC176 |
| callnumber-raw | QC176.8.N35 |
| callnumber-search | QC176.8.N35 |
| callnumber-sort | QC 3176.8 N35 |
| callnumber-subject | QC - Physics |
| classification_rvk | UH 6310 ZN 3700 ZQ 3100 ZQ 3700 ZQ 3900 |
| ctrlnum | (OCoLC)60667236 (DE-599)BVBBV021234510 |
| dewey-full | 681.20287 620.50287 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 681 - Precision instruments and other devices 620 - Engineering and allied operations |
| dewey-raw | 681.20287 620.50287 |
| dewey-search | 681.20287 620.50287 |
| dewey-sort | 3681.20287 |
| dewey-tens | 680 - Manufacture of products for specific uses 620 - Engineering and allied operations |
| discipline | Maschinenbau / Maschinenwesen Physik Handwerk und Gewerbe / Verschiedene Technologien Elektrotechnik / Elektronik / Nachrichtentechnik Mess-/Steuerungs-/Regelungs-/Automatisierungstechnik / Mechatronik |
| discipline_str_mv | Maschinenbau / Maschinenwesen Physik Handwerk und Gewerbe / Verschiedene Technologien Elektrotechnik / Elektronik / Nachrichtentechnik Mess-/Steuerungs-/Regelungs-/Automatisierungstechnik / Mechatronik |
| edition | 1. ed., 1. reprint |
| format | Book |
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| id | DE-604.BV021234510 |
| illustrated | Illustrated |
| index_date | 2024-07-02T13:29:21Z |
| indexdate | 2024-07-09T20:28:26Z |
| institution | BVB |
| isbn | 352740502X 9783527405022 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-014277296 |
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| physical | XXII, 519 S. Ill., graph. Darst. |
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| spelling | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range ed. by Günter Wilkening ... 1. ed., 1. reprint Weinheim Wiley-VCH 2005 XXII, 519 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Microstructure Measurement Congresses Nanostructured materials Measurement Congresses Scientific apparatus and instruments Calibration Congresses Stereology Congresses Messtechnik (DE-588)4114575-6 gnd rswk-swf Nanometerbereich (DE-588)4327473-0 gnd rswk-swf Mikrometerbereich (DE-588)4774350-5 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content (DE-588)1071861417 Konferenzschrift gnd-content Messtechnik (DE-588)4114575-6 s Mikrometerbereich (DE-588)4774350-5 s DE-604 Nanometerbereich (DE-588)4327473-0 s Wilkening, Günter Sonstige (DE-588)128827459 oth GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=014277296&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range Microstructure Measurement Congresses Nanostructured materials Measurement Congresses Scientific apparatus and instruments Calibration Congresses Stereology Congresses Messtechnik (DE-588)4114575-6 gnd Nanometerbereich (DE-588)4327473-0 gnd Mikrometerbereich (DE-588)4774350-5 gnd |
| subject_GND | (DE-588)4114575-6 (DE-588)4327473-0 (DE-588)4774350-5 (DE-588)4143413-4 (DE-588)1071861417 |
| title | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range |
| title_auth | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range |
| title_exact_search | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range |
| title_exact_search_txtP | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range |
| title_full | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range ed. by Günter Wilkening ... |
| title_fullStr | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range ed. by Günter Wilkening ... |
| title_full_unstemmed | Nanoscale calibration standards and methods dimensional and related measurements in the micro- and nanometer range ed. by Günter Wilkening ... |
| title_short | Nanoscale calibration standards and methods |
| title_sort | nanoscale calibration standards and methods dimensional and related measurements in the micro and nanometer range |
| title_sub | dimensional and related measurements in the micro- and nanometer range |
| topic | Microstructure Measurement Congresses Nanostructured materials Measurement Congresses Scientific apparatus and instruments Calibration Congresses Stereology Congresses Messtechnik (DE-588)4114575-6 gnd Nanometerbereich (DE-588)4327473-0 gnd Mikrometerbereich (DE-588)4774350-5 gnd |
| topic_facet | Microstructure Measurement Congresses Nanostructured materials Measurement Congresses Scientific apparatus and instruments Calibration Congresses Stereology Congresses Messtechnik Nanometerbereich Mikrometerbereich Aufsatzsammlung Konferenzschrift |
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