Dielectric thin films for future ULSI devices: science and technology ; [...papers presented at the 2004 International Workshop on "Dielectric Thin Films for Future ULSI Devices: Science and Technology" (IWDTF-4), which was held in Tokyo from May 26 through 28, 2004]
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Bibliographic Details
Format: Book
Language:English
Published: Tokyo IPAP 2004
Series:Japanese journal of applied physics : 1 43,11B : special issue
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Item Description:Einzelaufnahme eines Zeitschr.-Heftes
Physical Description:S. 7807 - 7908, 27 S. Ill., graph. Darst.

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