Silver metal organic chemical vapor deposition for microelectronic metallization:
Gespeichert in:
1. Verfasser: | |
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Format: | Abschlussarbeit Buch |
Sprache: | English |
Veröffentlicht: |
Aachen
Shaker
2005
|
Schriftenreihe: | Selected topics of electronics and micromechatronics
15 |
Schlagworte: | |
Beschreibung: | V, 173 S. Ill., graph. Darst. 21 cm, 284 gr. |
ISBN: | 3832238956 |
Internformat
MARC
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020 | |a 3832238956 |c kart. : EUR 48.80 (DE), EUR 48.80 (AT), sfr 97.60 |9 3-8322-3895-6 | ||
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100 | 1 | |a Gao, Liming |e Verfasser |4 aut | |
245 | 1 | 0 | |a Silver metal organic chemical vapor deposition for microelectronic metallization |c Liming Gao |
264 | 1 | |a Aachen |b Shaker |c 2005 | |
300 | |a V, 173 S. |b Ill., graph. Darst. |c 21 cm, 284 gr. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Selected topics of electronics and micromechatronics |v 15 | |
502 | |a Zugl.: München, Techn. Univ., Diss., 2005 | ||
650 | 0 | 7 | |a Silber |0 (DE-588)4133759-1 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Diffusionsbarriere |0 (DE-588)4289693-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Metallisieren |0 (DE-588)4169599-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a ULSI |0 (DE-588)4226286-0 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
689 | 0 | 0 | |a ULSI |0 (DE-588)4226286-0 |D s |
689 | 0 | 1 | |a Metallisieren |0 (DE-588)4169599-9 |D s |
689 | 0 | 2 | |a Silber |0 (DE-588)4133759-1 |D s |
689 | 0 | 3 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |D s |
689 | 0 | 4 | |a Diffusionsbarriere |0 (DE-588)4289693-9 |D s |
689 | 0 | |5 DE-604 | |
830 | 0 | |a Selected topics of electronics and micromechatronics |v 15 |w (DE-604)BV014231990 |9 15 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-013171482 |
Datensatz im Suchindex
_version_ | 1804133360093626368 |
---|---|
any_adam_object | |
author | Gao, Liming |
author_facet | Gao, Liming |
author_role | aut |
author_sort | Gao, Liming |
author_variant | l g lg |
building | Verbundindex |
bvnumber | BV019846693 |
ctrlnum | (OCoLC)76741603 (DE-599)BVBBV019846693 |
discipline | Maschinenbau / Maschinenwesen |
format | Thesis Book |
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genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
genre_facet | Hochschulschrift |
id | DE-604.BV019846693 |
illustrated | Illustrated |
indexdate | 2024-07-09T20:07:28Z |
institution | BVB |
isbn | 3832238956 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-013171482 |
oclc_num | 76741603 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-12 |
owner_facet | DE-91 DE-BY-TUM DE-12 |
physical | V, 173 S. Ill., graph. Darst. 21 cm, 284 gr. |
publishDate | 2005 |
publishDateSearch | 2005 |
publishDateSort | 2005 |
publisher | Shaker |
record_format | marc |
series | Selected topics of electronics and micromechatronics |
series2 | Selected topics of electronics and micromechatronics |
spelling | Gao, Liming Verfasser aut Silver metal organic chemical vapor deposition for microelectronic metallization Liming Gao Aachen Shaker 2005 V, 173 S. Ill., graph. Darst. 21 cm, 284 gr. txt rdacontent n rdamedia nc rdacarrier Selected topics of electronics and micromechatronics 15 Zugl.: München, Techn. Univ., Diss., 2005 Silber (DE-588)4133759-1 gnd rswk-swf MOCVD-Verfahren (DE-588)4314628-4 gnd rswk-swf Diffusionsbarriere (DE-588)4289693-9 gnd rswk-swf Metallisieren (DE-588)4169599-9 gnd rswk-swf ULSI (DE-588)4226286-0 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content ULSI (DE-588)4226286-0 s Metallisieren (DE-588)4169599-9 s Silber (DE-588)4133759-1 s MOCVD-Verfahren (DE-588)4314628-4 s Diffusionsbarriere (DE-588)4289693-9 s DE-604 Selected topics of electronics and micromechatronics 15 (DE-604)BV014231990 15 |
spellingShingle | Gao, Liming Silver metal organic chemical vapor deposition for microelectronic metallization Selected topics of electronics and micromechatronics Silber (DE-588)4133759-1 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd Diffusionsbarriere (DE-588)4289693-9 gnd Metallisieren (DE-588)4169599-9 gnd ULSI (DE-588)4226286-0 gnd |
subject_GND | (DE-588)4133759-1 (DE-588)4314628-4 (DE-588)4289693-9 (DE-588)4169599-9 (DE-588)4226286-0 (DE-588)4113937-9 |
title | Silver metal organic chemical vapor deposition for microelectronic metallization |
title_auth | Silver metal organic chemical vapor deposition for microelectronic metallization |
title_exact_search | Silver metal organic chemical vapor deposition for microelectronic metallization |
title_full | Silver metal organic chemical vapor deposition for microelectronic metallization Liming Gao |
title_fullStr | Silver metal organic chemical vapor deposition for microelectronic metallization Liming Gao |
title_full_unstemmed | Silver metal organic chemical vapor deposition for microelectronic metallization Liming Gao |
title_short | Silver metal organic chemical vapor deposition for microelectronic metallization |
title_sort | silver metal organic chemical vapor deposition for microelectronic metallization |
topic | Silber (DE-588)4133759-1 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd Diffusionsbarriere (DE-588)4289693-9 gnd Metallisieren (DE-588)4169599-9 gnd ULSI (DE-588)4226286-0 gnd |
topic_facet | Silber MOCVD-Verfahren Diffusionsbarriere Metallisieren ULSI Hochschulschrift |
volume_link | (DE-604)BV014231990 |
work_keys_str_mv | AT gaoliming silvermetalorganicchemicalvapordepositionformicroelectronicmetallization |