Functional thin films and functional materials: new concepts and technologies ; with 48 tables
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Berlin [u.a.]
Springer [u.a.]
2003
|
| Schriftenreihe: | Springer series in materials science
58 |
| Schlagworte: | |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XIII, 443 S. Ill., graph. Darst. |
| ISBN: | 3540001115 7302059039 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV017448439 | ||
| 003 | DE-604 | ||
| 005 | 20040428 | ||
| 007 | t | ||
| 008 | 030826s2003 gw ad|| |||| 00||| eng d | ||
| 016 | 7 | |a 96858425X |2 DE-101 | |
| 020 | |a 3540001115 |9 3-540-00111-5 | ||
| 020 | |a 7302059039 |9 7-302-05903-9 | ||
| 035 | |a (OCoLC)249206672 | ||
| 035 | |a (DE-599)BVBBV017448439 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 044 | |a gw |c DE | ||
| 049 | |a DE-1050 |a DE-703 |a DE-29T |a DE-83 |a DE-11 |a DE-526 | ||
| 050 | 0 | |a TK7872.T55F86 2003 | |
| 082 | 0 | |a 621.38152 | |
| 084 | |a UP 7500 |0 (DE-625)146433: |2 rvk | ||
| 084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
| 084 | |a UQ 1100 |0 (DE-625)146473: |2 rvk | ||
| 245 | 1 | 0 | |a Functional thin films and functional materials |b new concepts and technologies ; with 48 tables |c Donglu Shi (ed.) |
| 264 | 1 | |a Berlin [u.a.] |b Springer [u.a.] |c 2003 | |
| 300 | |a XIII, 443 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Springer series in materials science |v 58 | |
| 490 | 0 | |a Physics and astronomy online library | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft | |
| 650 | 4 | |a Dünne Schicht - MOCVD-Verfahren | |
| 650 | 4 | |a Dünne Schicht - Nanostrukturiertes Material - Sputtern | |
| 650 | 4 | |a Dünne Schicht - Sol-Gel-Verfahren | |
| 650 | 4 | |a Thin film devices | |
| 650 | 0 | 7 | |a Sputtern |0 (DE-588)4182614-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Hochleistungswerkstoff |0 (DE-588)4312250-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Nanostrukturiertes Material |0 (DE-588)4342626-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Sol-Gel-Verfahren |0 (DE-588)4278915-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Stoffeigenschaft |0 (DE-588)4192147-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikrostruktur |0 (DE-588)4131028-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 0 | 1 | |a Hochleistungswerkstoff |0 (DE-588)4312250-4 |D s |
| 689 | 0 | 2 | |a Mikrostruktur |0 (DE-588)4131028-7 |D s |
| 689 | 0 | 3 | |a Stoffeigenschaft |0 (DE-588)4192147-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 1 | 1 | |a Sol-Gel-Verfahren |0 (DE-588)4278915-1 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 2 | 1 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 3 | 1 | |a Nanostrukturiertes Material |0 (DE-588)4342626-8 |D s |
| 689 | 3 | 2 | |a Sputtern |0 (DE-588)4182614-0 |D s |
| 689 | 3 | |5 DE-604 | |
| 700 | 1 | |a Shi, Donglu |e Sonstige |4 oth | |
| 830 | 0 | |a Springer series in materials science |v 58 |w (DE-604)BV000683335 |9 58 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-010511024 | ||
Datensatz im Suchindex
| _version_ | 1804130254548107264 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV017448439 |
| callnumber-first | T - Technology |
| callnumber-label | TK7872 |
| callnumber-raw | TK7872.T55F86 2003 |
| callnumber-search | TK7872.T55F86 2003 |
| callnumber-sort | TK 47872 T55 F86 42003 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UP 7500 UP 7550 UQ 1100 |
| ctrlnum | (OCoLC)249206672 (DE-599)BVBBV017448439 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02871nam a2200733 cb4500</leader><controlfield tag="001">BV017448439</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20040428 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">030826s2003 gw ad|| |||| 00||| eng d</controlfield><datafield tag="016" ind1="7" ind2=" "><subfield code="a">96858425X</subfield><subfield code="2">DE-101</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">3540001115</subfield><subfield code="9">3-540-00111-5</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">7302059039</subfield><subfield code="9">7-302-05903-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)249206672</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV017448439</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">gw</subfield><subfield code="c">DE</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-1050</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield><subfield code="a">DE-526</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7872.T55F86 2003</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38152</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7500</subfield><subfield code="0">(DE-625)146433:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UQ 1100</subfield><subfield code="0">(DE-625)146473:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Functional thin films and functional materials</subfield><subfield code="b">new concepts and technologies ; with 48 tables</subfield><subfield code="c">Donglu Shi (ed.)</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Berlin [u.a.]</subfield><subfield code="b">Springer [u.a.]</subfield><subfield code="c">2003</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIII, 443 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Springer series in materials science</subfield><subfield code="v">58</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Physics and astronomy online library</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Literaturangaben</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dünne Schicht - MOCVD-Verfahren</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dünne Schicht - Nanostrukturiertes Material - Sputtern</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dünne Schicht - Sol-Gel-Verfahren</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin film devices</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Hochleistungswerkstoff</subfield><subfield code="0">(DE-588)4312250-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">MOCVD-Verfahren</subfield><subfield code="0">(DE-588)4314628-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Nanostrukturiertes Material</subfield><subfield code="0">(DE-588)4342626-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Sol-Gel-Verfahren</subfield><subfield code="0">(DE-588)4278915-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Stoffeigenschaft</subfield><subfield code="0">(DE-588)4192147-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Mikrostruktur</subfield><subfield code="0">(DE-588)4131028-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Hochleistungswerkstoff</subfield><subfield code="0">(DE-588)4312250-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Mikrostruktur</subfield><subfield code="0">(DE-588)4131028-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="3"><subfield code="a">Stoffeigenschaft</subfield><subfield code="0">(DE-588)4192147-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Sol-Gel-Verfahren</subfield><subfield code="0">(DE-588)4278915-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="1"><subfield code="a">MOCVD-Verfahren</subfield><subfield code="0">(DE-588)4314628-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2="1"><subfield code="a">Nanostrukturiertes Material</subfield><subfield code="0">(DE-588)4342626-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2="2"><subfield code="a">Sputtern</subfield><subfield code="0">(DE-588)4182614-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Shi, Donglu</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Springer series in materials science</subfield><subfield code="v">58</subfield><subfield code="w">(DE-604)BV000683335</subfield><subfield code="9">58</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-010511024</subfield></datafield></record></collection> |
| id | DE-604.BV017448439 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T19:18:07Z |
| institution | BVB |
| isbn | 3540001115 7302059039 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-010511024 |
| oclc_num | 249206672 |
| open_access_boolean | |
| owner | DE-1050 DE-703 DE-29T DE-83 DE-11 DE-526 |
| owner_facet | DE-1050 DE-703 DE-29T DE-83 DE-11 DE-526 |
| physical | XIII, 443 S. Ill., graph. Darst. |
| publishDate | 2003 |
| publishDateSearch | 2003 |
| publishDateSort | 2003 |
| publisher | Springer [u.a.] |
| record_format | marc |
| series | Springer series in materials science |
| series2 | Springer series in materials science Physics and astronomy online library |
| spelling | Functional thin films and functional materials new concepts and technologies ; with 48 tables Donglu Shi (ed.) Berlin [u.a.] Springer [u.a.] 2003 XIII, 443 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Springer series in materials science 58 Physics and astronomy online library Literaturangaben Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft Dünne Schicht - MOCVD-Verfahren Dünne Schicht - Nanostrukturiertes Material - Sputtern Dünne Schicht - Sol-Gel-Verfahren Thin film devices Sputtern (DE-588)4182614-0 gnd rswk-swf Hochleistungswerkstoff (DE-588)4312250-4 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 gnd rswk-swf MOCVD-Verfahren (DE-588)4314628-4 gnd rswk-swf Nanostrukturiertes Material (DE-588)4342626-8 gnd rswk-swf Sol-Gel-Verfahren (DE-588)4278915-1 gnd rswk-swf Stoffeigenschaft (DE-588)4192147-1 gnd rswk-swf Mikrostruktur (DE-588)4131028-7 gnd rswk-swf Dünne Schicht (DE-588)4136925-7 s Hochleistungswerkstoff (DE-588)4312250-4 s Mikrostruktur (DE-588)4131028-7 s Stoffeigenschaft (DE-588)4192147-1 s DE-604 Sol-Gel-Verfahren (DE-588)4278915-1 s MOCVD-Verfahren (DE-588)4314628-4 s Nanostrukturiertes Material (DE-588)4342626-8 s Sputtern (DE-588)4182614-0 s Shi, Donglu Sonstige oth Springer series in materials science 58 (DE-604)BV000683335 58 |
| spellingShingle | Functional thin films and functional materials new concepts and technologies ; with 48 tables Springer series in materials science Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft Dünne Schicht - MOCVD-Verfahren Dünne Schicht - Nanostrukturiertes Material - Sputtern Dünne Schicht - Sol-Gel-Verfahren Thin film devices Sputtern (DE-588)4182614-0 gnd Hochleistungswerkstoff (DE-588)4312250-4 gnd Dünne Schicht (DE-588)4136925-7 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd Nanostrukturiertes Material (DE-588)4342626-8 gnd Sol-Gel-Verfahren (DE-588)4278915-1 gnd Stoffeigenschaft (DE-588)4192147-1 gnd Mikrostruktur (DE-588)4131028-7 gnd |
| subject_GND | (DE-588)4182614-0 (DE-588)4312250-4 (DE-588)4136925-7 (DE-588)4314628-4 (DE-588)4342626-8 (DE-588)4278915-1 (DE-588)4192147-1 (DE-588)4131028-7 |
| title | Functional thin films and functional materials new concepts and technologies ; with 48 tables |
| title_auth | Functional thin films and functional materials new concepts and technologies ; with 48 tables |
| title_exact_search | Functional thin films and functional materials new concepts and technologies ; with 48 tables |
| title_full | Functional thin films and functional materials new concepts and technologies ; with 48 tables Donglu Shi (ed.) |
| title_fullStr | Functional thin films and functional materials new concepts and technologies ; with 48 tables Donglu Shi (ed.) |
| title_full_unstemmed | Functional thin films and functional materials new concepts and technologies ; with 48 tables Donglu Shi (ed.) |
| title_short | Functional thin films and functional materials |
| title_sort | functional thin films and functional materials new concepts and technologies with 48 tables |
| title_sub | new concepts and technologies ; with 48 tables |
| topic | Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft Dünne Schicht - MOCVD-Verfahren Dünne Schicht - Nanostrukturiertes Material - Sputtern Dünne Schicht - Sol-Gel-Verfahren Thin film devices Sputtern (DE-588)4182614-0 gnd Hochleistungswerkstoff (DE-588)4312250-4 gnd Dünne Schicht (DE-588)4136925-7 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd Nanostrukturiertes Material (DE-588)4342626-8 gnd Sol-Gel-Verfahren (DE-588)4278915-1 gnd Stoffeigenschaft (DE-588)4192147-1 gnd Mikrostruktur (DE-588)4131028-7 gnd |
| topic_facet | Dünne Schicht - Hochleistungswerkstoff - Mikrostruktur - Stoffeigenschaft Dünne Schicht - MOCVD-Verfahren Dünne Schicht - Nanostrukturiertes Material - Sputtern Dünne Schicht - Sol-Gel-Verfahren Thin film devices Sputtern Hochleistungswerkstoff Dünne Schicht MOCVD-Verfahren Nanostrukturiertes Material Sol-Gel-Verfahren Stoffeigenschaft Mikrostruktur |
| volume_link | (DE-604)BV000683335 |
| work_keys_str_mv | AT shidonglu functionalthinfilmsandfunctionalmaterialsnewconceptsandtechnologieswith48tables |