Principles of chemical vapor deposition: [what's going on inside the reactor]
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Dordrecht [u.a.]
Kluwer
2003
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | XI, 273 S. Ill., graph. Darst. |
| ISBN: | 1402012489 |
Internformat
MARC
| LEADER | 00000nam a2200000zc 4500 | ||
|---|---|---|---|
| 001 | BV017087638 | ||
| 003 | DE-604 | ||
| 005 | 20040304 | ||
| 007 | t | ||
| 008 | 030422s2003 na |||| 00||| eng d | ||
| 010 | |a 2003047499 | ||
| 020 | |a 1402012489 |9 1-402-01248-9 | ||
| 035 | |a (OCoLC)249275068 | ||
| 035 | |a (DE-599)BVBBV017087638 | ||
| 040 | |a DE-604 |b ger |e aacr | ||
| 041 | 0 | |a eng | |
| 044 | |a na |c AN | ||
| 049 | |a DE-91G |a DE-703 |a DE-83 | ||
| 050 | 0 | |a TS695 | |
| 082 | 0 | |a 671.735 | |
| 084 | |a ZM 7680 |0 (DE-625)160562: |2 rvk | ||
| 084 | |a FER 882f |2 stub | ||
| 084 | |a CIT 340f |2 stub | ||
| 245 | 1 | 0 | |a Principles of chemical vapor deposition |b [what's going on inside the reactor] |c [ed. by] Daniel M. Dobkin ... |
| 264 | 1 | |a Dordrecht [u.a.] |b Kluwer |c 2003 | |
| 300 | |a XI, 273 S. Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a CVD-Verfahren | |
| 650 | 4 | |a Refractory coating | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Dobkin, Daniel Mark |e Sonstige |4 oth | |
| 856 | 4 | 2 | |m HBZ Datenaustausch |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=010306385&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-010306385 | ||
Datensatz im Suchindex
| _version_ | 1804129970290688000 |
|---|---|
| adam_text | Titel: Principles of chemical vapor deposition
Autor: Dobkin, Daniel Mark
Jahr: 2003
Contents
Acknowledgements ix
Preface xi
1. Introduction 1
1. What s Behind the Facade? I
2. Generic Reactors and process Considerations 4
3. tube and showerhead reactor examples 6
2. Reactors Without Transport 9
1. what Goes In Must Go Somewhere: Measuring Gases 9
2. Review: Kinetic Theory 11
3. The Zero-dimensional Reactor 16
4. Zero-dimensional Tube and Showerhead Examples 21
3. Mass Transport 27
1. Introduction to transport 27
2. convection and diffusiom 27
3. Diffusion: Physics and Math 31
4. fluid Flow and Convective Transport 42
5. When Flows matter: the Knudsen Number 57
6. Tube and Showerhead Examples 57
7. on to phonons 66
vi Contents
4. Heat Transport 69
1. What is Heat (Energy) Transport? 69
2. Heat Conduction and Diffusion 71
3. convective heat transfer made (very) simple 73
4. Natural convection 74
5. Radiative Heat Transfer 79
6. Temperature Measurement 84
7. Tube and Showerhead Examples 86
5. Chemistry for CVD 95
1. What does the C Stand For Anyway? 95
2. Volatility: The V in CVD 106
3. Equilibrium: Where things Are Going... 112
4. Kinetics: The Slowest Step Wins 118
5. real precursors for real films 132
6. Tube Reactor Example 136
7. A Few Final remarks 146
6. Gas Discharge Plasmas For CVD 149
1. Plasma Discharges: an Instant review 149
2. The Low-pressure Cold-Plasma State 150
3. KEY Parameters for Capacitive Plasma behavior 154
4. Alternative Excitation Methods 161
5. Plasmas for Deposition 171
6. Plasma Damage 174
7. Technical Details I?8
8. ONGOING EXAMPLE: PARALLEL PLATE REACTOR 185
9. A Remark on Computational tools 193
7. CVD Films 195
1. Why CVD? 195
2. Silicon dioxide 196
3. Silicon Nitride 224
4. Tantalum PENToxiDE 229
5. Metal Deposition by CVD 233
6. Concluding Remarks 240
8. CVD Reactors 247
1. CVD Reactor configurations 247
2. TUBE REACTORS 248
3. Showerhead reactors 251
4- High Density Plasma reactors 254
5. Injector-based Atmospheric pressure Reactors 262
Contents vii
6. Reactor Conclusions 267
Index 269
|
| any_adam_object | 1 |
| building | Verbundindex |
| bvnumber | BV017087638 |
| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
| callnumber-subject | TS - Manufactures |
| classification_rvk | ZM 7680 |
| classification_tum | FER 882f CIT 340f |
| ctrlnum | (OCoLC)249275068 (DE-599)BVBBV017087638 |
| dewey-full | 671.735 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 671 - Metalworking & primary metal products |
| dewey-raw | 671.735 |
| dewey-search | 671.735 |
| dewey-sort | 3671.735 |
| dewey-tens | 670 - Manufacturing |
| discipline | Chemie-Ingenieurwesen Fertigungstechnik Werkstoffwissenschaften / Fertigungstechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01468nam a2200421zc 4500</leader><controlfield tag="001">BV017087638</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20040304 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">030422s2003 na |||| 00||| eng d</controlfield><datafield tag="010" ind1=" " ind2=" "><subfield code="a">2003047499</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1402012489</subfield><subfield code="9">1-402-01248-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)249275068</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV017087638</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">aacr</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">na</subfield><subfield code="c">AN</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91G</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS695</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">671.735</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZM 7680</subfield><subfield code="0">(DE-625)160562:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">FER 882f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">CIT 340f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Principles of chemical vapor deposition</subfield><subfield code="b">[what's going on inside the reactor]</subfield><subfield code="c">[ed. by] Daniel M. Dobkin ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Dordrecht [u.a.]</subfield><subfield code="b">Kluwer</subfield><subfield code="c">2003</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 273 S. Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">CVD-Verfahren</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Refractory coating</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Vapor-plating</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Dobkin, Daniel Mark</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">HBZ Datenaustausch</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=010306385&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-010306385</subfield></datafield></record></collection> |
| id | DE-604.BV017087638 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T19:13:36Z |
| institution | BVB |
| isbn | 1402012489 |
| language | English |
| lccn | 2003047499 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-010306385 |
| oclc_num | 249275068 |
| open_access_boolean | |
| owner | DE-91G DE-BY-TUM DE-703 DE-83 |
| owner_facet | DE-91G DE-BY-TUM DE-703 DE-83 |
| physical | XI, 273 S. Ill., graph. Darst. |
| publishDate | 2003 |
| publishDateSearch | 2003 |
| publishDateSort | 2003 |
| publisher | Kluwer |
| record_format | marc |
| spelling | Principles of chemical vapor deposition [what's going on inside the reactor] [ed. by] Daniel M. Dobkin ... Dordrecht [u.a.] Kluwer 2003 XI, 273 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier CVD-Verfahren Refractory coating Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s DE-604 Dobkin, Daniel Mark Sonstige oth HBZ Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=010306385&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Principles of chemical vapor deposition [what's going on inside the reactor] CVD-Verfahren Refractory coating Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4009846-1 |
| title | Principles of chemical vapor deposition [what's going on inside the reactor] |
| title_auth | Principles of chemical vapor deposition [what's going on inside the reactor] |
| title_exact_search | Principles of chemical vapor deposition [what's going on inside the reactor] |
| title_full | Principles of chemical vapor deposition [what's going on inside the reactor] [ed. by] Daniel M. Dobkin ... |
| title_fullStr | Principles of chemical vapor deposition [what's going on inside the reactor] [ed. by] Daniel M. Dobkin ... |
| title_full_unstemmed | Principles of chemical vapor deposition [what's going on inside the reactor] [ed. by] Daniel M. Dobkin ... |
| title_short | Principles of chemical vapor deposition |
| title_sort | principles of chemical vapor deposition what s going on inside the reactor |
| title_sub | [what's going on inside the reactor] |
| topic | CVD-Verfahren Refractory coating Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | CVD-Verfahren Refractory coating Vapor-plating |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=010306385&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT dobkindanielmark principlesofchemicalvapordepositionwhatsgoingoninsidethereactor |