Advances in low temperature rf plasmas: basis for process design
Saved in:
| Format: | Book |
|---|---|
| Language: | English |
| Published: |
Amsterdam [u.a.]
Elsevier
2002
|
| Edition: | 1. ed. |
| Subjects: | |
| Item Description: | Aus: Applied surface science ; 192 (2002) |
| Physical Description: | XII, 341 S. zahlr. Ill. und graph. Darst. |
| ISBN: | 0444510958 |
Staff View
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Record in the Search Index
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Werkstoffwissenschaften / Fertigungstechnik |
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| id | DE-604.BV014509615 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T19:03:10Z |
| institution | BVB |
| isbn | 0444510958 |
| language | English |
| lccn | 2002070662 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009884489 |
| oclc_num | 49844130 |
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| owner | DE-703 |
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| physical | XII, 341 S. zahlr. Ill. und graph. Darst. |
| publishDate | 2002 |
| publishDateSearch | 2002 |
| publishDateSort | 2002 |
| publisher | Elsevier |
| record_format | marc |
| spelling | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe 1. ed. Amsterdam [u.a.] Elsevier 2002 XII, 341 S. zahlr. Ill. und graph. Darst. txt rdacontent n rdamedia nc rdacarrier Aus: Applied surface science ; 192 (2002) Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd rswk-swf Tieftemperatur (DE-588)4134801-1 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Hochfrequenzplasma (DE-588)4498170-3 s Tieftemperatur (DE-588)4134801-1 s DE-604 Makabe, Toshiaki Sonstige oth |
| spellingShingle | Advances in low temperature rf plasmas basis for process design Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd Tieftemperatur (DE-588)4134801-1 gnd |
| subject_GND | (DE-588)4498170-3 (DE-588)4134801-1 (DE-588)4143413-4 |
| title | Advances in low temperature rf plasmas basis for process design |
| title_auth | Advances in low temperature rf plasmas basis for process design |
| title_exact_search | Advances in low temperature rf plasmas basis for process design |
| title_full | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_fullStr | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_full_unstemmed | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_short | Advances in low temperature rf plasmas |
| title_sort | advances in low temperature rf plasmas basis for process design |
| title_sub | basis for process design |
| topic | Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd Tieftemperatur (DE-588)4134801-1 gnd |
| topic_facet | Low temperature plasmas Industrial applications Hochfrequenzplasma Tieftemperatur Aufsatzsammlung |
| work_keys_str_mv | AT makabetoshiaki advancesinlowtemperaturerfplasmasbasisforprocessdesign |