Advances in low temperature rf plasmas: basis for process design
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Amsterdam [u.a.]
Elsevier
2002
|
| Ausgabe: | 1. ed. |
| Schlagworte: | |
| Beschreibung: | Aus: Applied surface science ; 192 (2002) |
| Beschreibung: | XII, 341 S. zahlr. Ill. und graph. Darst. |
| ISBN: | 0444510958 |
Internformat
MARC
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| 245 | 1 | 0 | |a Advances in low temperature rf plasmas |b basis for process design |c ed. by T. Makabe |
| 250 | |a 1. ed. | ||
| 264 | 1 | |a Amsterdam [u.a.] |b Elsevier |c 2002 | |
| 300 | |a XII, 341 S. |b zahlr. Ill. und graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 500 | |a Aus: Applied surface science ; 192 (2002) | ||
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| 650 | 0 | 7 | |a Hochfrequenzplasma |0 (DE-588)4498170-3 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Tieftemperatur |0 (DE-588)4134801-1 |2 gnd |9 rswk-swf |
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| 689 | 0 | 1 | |a Tieftemperatur |0 (DE-588)4134801-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Makabe, Toshiaki |e Sonstige |4 oth | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-009884489 | ||
Datensatz im Suchindex
| _version_ | 1804129313847508992 |
|---|---|
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| building | Verbundindex |
| bvnumber | BV014509615 |
| callnumber-first | T - Technology |
| callnumber-label | TA2020 |
| callnumber-raw | TA2020 |
| callnumber-search | TA2020 |
| callnumber-sort | TA 42020 |
| callnumber-subject | TA - General and Civil Engineering |
| classification_rvk | UR 8000 |
| ctrlnum | (OCoLC)49844130 (DE-599)BVBBV014509615 |
| dewey-full | 621.044 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.044 |
| dewey-search | 621.044 |
| dewey-sort | 3621.044 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Werkstoffwissenschaften / Fertigungstechnik |
| edition | 1. ed. |
| format | Book |
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| id | DE-604.BV014509615 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T19:03:10Z |
| institution | BVB |
| isbn | 0444510958 |
| language | English |
| lccn | 2002070662 |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009884489 |
| oclc_num | 49844130 |
| open_access_boolean | |
| owner | DE-703 |
| owner_facet | DE-703 |
| physical | XII, 341 S. zahlr. Ill. und graph. Darst. |
| publishDate | 2002 |
| publishDateSearch | 2002 |
| publishDateSort | 2002 |
| publisher | Elsevier |
| record_format | marc |
| spelling | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe 1. ed. Amsterdam [u.a.] Elsevier 2002 XII, 341 S. zahlr. Ill. und graph. Darst. txt rdacontent n rdamedia nc rdacarrier Aus: Applied surface science ; 192 (2002) Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd rswk-swf Tieftemperatur (DE-588)4134801-1 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Hochfrequenzplasma (DE-588)4498170-3 s Tieftemperatur (DE-588)4134801-1 s DE-604 Makabe, Toshiaki Sonstige oth |
| spellingShingle | Advances in low temperature rf plasmas basis for process design Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd Tieftemperatur (DE-588)4134801-1 gnd |
| subject_GND | (DE-588)4498170-3 (DE-588)4134801-1 (DE-588)4143413-4 |
| title | Advances in low temperature rf plasmas basis for process design |
| title_auth | Advances in low temperature rf plasmas basis for process design |
| title_exact_search | Advances in low temperature rf plasmas basis for process design |
| title_full | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_fullStr | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_full_unstemmed | Advances in low temperature rf plasmas basis for process design ed. by T. Makabe |
| title_short | Advances in low temperature rf plasmas |
| title_sort | advances in low temperature rf plasmas basis for process design |
| title_sub | basis for process design |
| topic | Low temperature plasmas Industrial applications Hochfrequenzplasma (DE-588)4498170-3 gnd Tieftemperatur (DE-588)4134801-1 gnd |
| topic_facet | Low temperature plasmas Industrial applications Hochfrequenzplasma Tieftemperatur Aufsatzsammlung |
| work_keys_str_mv | AT makabetoshiaki advancesinlowtemperaturerfplasmasbasisforprocessdesign |