APA-Zitierstil (7. Ausg.)

(2002). Advances in low temperature rf plasmas: Basis for process design (1. ed.). Elsevier.

Chicago-Zitierstil (17. Ausg.)

Advances in Low Temperature Rf Plasmas: Basis for Process Design. 1. ed. Amsterdam [u.a.]: Elsevier, 2002.

MLA-Zitierstil (9. Ausg.)

Advances in Low Temperature Rf Plasmas: Basis for Process Design. 1. ed. Elsevier, 2002.