Voigtländer, B. (2001). Fundamental processes in Si/Si and Ge/Si epitaxy studied by scanning tunneling microscopy during growth. Elsevier.
Chicago Style (17th ed.) CitationVoigtländer, Bert. Fundamental Processes in Si/Si and Ge/Si Epitaxy Studied by Scanning Tunneling Microscopy During Growth. Amsterdam [u.a.]: Elsevier, 2001.
MLA (9th ed.) CitationVoigtländer, Bert. Fundamental Processes in Si/Si and Ge/Si Epitaxy Studied by Scanning Tunneling Microscopy During Growth. Elsevier, 2001.
Warning: These citations may not always be 100% accurate.