Photomask and x-ray mask technology VI: 13 - 14 April 1999, Yokohama, Japan
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1999
|
| Schriftenreihe: | Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers
3748 |
| Schlagworte: | |
| Beschreibung: | XIII, 628 S. Ill., graph. Darst. |
| ISBN: | 081943230X |
Internformat
MARC
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| 245 | 1 | 0 | |a Photomask and x-ray mask technology VI |b 13 - 14 April 1999, Yokohama, Japan |c Hiraoki Morimoto ed. |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1999 | |
| 300 | |a XIII, 628 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers |v 3748 | |
| 650 | 4 | |a Integrated circuits |x Masks |v Congresses | |
| 650 | 4 | |a Masks (Electronics) |v Congresses | |
| 650 | 4 | |a Microlithography |v Congresses | |
| 650 | 4 | |a Optoelectronic devices |x Design and construction |v Congresses | |
| 650 | 4 | |a X-ray lithography |v Congresses | |
| 650 | 0 | 7 | |a Maskentechnik |0 (DE-588)4125845-9 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1999 |z Yokohama |2 gnd-content | |
| 689 | 0 | 0 | |a Maskentechnik |0 (DE-588)4125845-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Morimoto, Hiraoki |e Sonstige |4 oth | |
| 810 | 2 | |a Society of Photo-Optical Instrumentation Engineers |t Proceedings of SPIE |v 3748 |w (DE-604)BV000010887 |9 3748 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-009497633 | ||
Datensatz im Suchindex
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| bvnumber | BV013882642 |
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| callnumber-raw | TK7872.M3 TS510 |
| callnumber-search | TK7872.M3 TS510 |
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| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1999 Yokohama gnd-content |
| genre_facet | Konferenzschrift 1999 Yokohama |
| id | DE-604.BV013882642 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:53:44Z |
| institution | BVB |
| isbn | 081943230X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009497633 |
| oclc_num | 42467808 |
| open_access_boolean | |
| owner | DE-703 |
| owner_facet | DE-703 |
| physical | XIII, 628 S. Ill., graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | SPIE |
| record_format | marc |
| series2 | Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers |
| spelling | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan Hiraoki Morimoto ed. Bellingham, Wash. SPIE 1999 XIII, 628 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Proceedings of SPIE / Society of Photo-Optical Instrumentation Engineers 3748 Integrated circuits Masks Congresses Masks (Electronics) Congresses Microlithography Congresses Optoelectronic devices Design and construction Congresses X-ray lithography Congresses Maskentechnik (DE-588)4125845-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1999 Yokohama gnd-content Maskentechnik (DE-588)4125845-9 s DE-604 Morimoto, Hiraoki Sonstige oth Society of Photo-Optical Instrumentation Engineers Proceedings of SPIE 3748 (DE-604)BV000010887 3748 |
| spellingShingle | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan Integrated circuits Masks Congresses Masks (Electronics) Congresses Microlithography Congresses Optoelectronic devices Design and construction Congresses X-ray lithography Congresses Maskentechnik (DE-588)4125845-9 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)1071861417 |
| title | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan |
| title_auth | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan |
| title_exact_search | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan |
| title_full | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan Hiraoki Morimoto ed. |
| title_fullStr | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan Hiraoki Morimoto ed. |
| title_full_unstemmed | Photomask and x-ray mask technology VI 13 - 14 April 1999, Yokohama, Japan Hiraoki Morimoto ed. |
| title_short | Photomask and x-ray mask technology VI |
| title_sort | photomask and x ray mask technology vi 13 14 april 1999 yokohama japan |
| title_sub | 13 - 14 April 1999, Yokohama, Japan |
| topic | Integrated circuits Masks Congresses Masks (Electronics) Congresses Microlithography Congresses Optoelectronic devices Design and construction Congresses X-ray lithography Congresses Maskentechnik (DE-588)4125845-9 gnd |
| topic_facet | Integrated circuits Masks Congresses Masks (Electronics) Congresses Microlithography Congresses Optoelectronic devices Design and construction Congresses X-ray lithography Congresses Maskentechnik Konferenzschrift 1999 Yokohama |
| volume_link | (DE-604)BV000010887 |
| work_keys_str_mv | AT morimotohiraoki photomaskandxraymasktechnologyvi1314april1999yokohamajapan |