Chemical vapor deposition for microelectronics: principles, technology, and applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Westwood, NJ
Noyes Publ.
1987
|
| Ausgabe: | Reprint ed. |
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Beschreibung: | Literaturangaben |
| Beschreibung: | XI, 215 S. Ill., graph. Darst. |
| ISBN: | 0815511361 |
Internformat
MARC
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| 245 | 1 | 0 | |a Chemical vapor deposition for microelectronics |b principles, technology, and applications |c by Arthur Sherman |
| 250 | |a Reprint ed. | ||
| 264 | 1 | |a Westwood, NJ |b Noyes Publ. |c 1987 | |
| 300 | |a XI, 215 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Materials science and process technology series | |
| 500 | |a Literaturangaben | ||
| 650 | 4 | |a Integrated circuits |x Design and construction | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a Elektronische Schaltung |0 (DE-588)4113419-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Aufdampfen |0 (DE-588)4143379-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Mikroelektronik |0 (DE-588)4039207-7 |2 gnd |9 rswk-swf |
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Datensatz im Suchindex
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|---|---|
| any_adam_object | |
| author | Sherman, Arthur |
| author_facet | Sherman, Arthur |
| author_role | aut |
| author_sort | Sherman, Arthur |
| author_variant | a s as |
| building | Verbundindex |
| bvnumber | BV013636858 |
| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
| callnumber-subject | TS - Manufactures |
| classification_rvk | ZM 7680 |
| ctrlnum | (OCoLC)15657978 (DE-599)BVBBV013636858 |
| dewey-full | 621.381/7 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.381/7 |
| dewey-search | 621.381/7 |
| dewey-sort | 3621.381 17 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik Werkstoffwissenschaften / Fertigungstechnik |
| edition | Reprint ed. |
| format | Book |
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| id | DE-604.BV013636858 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:49:23Z |
| institution | BVB |
| isbn | 0815511361 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009317298 |
| oclc_num | 15657978 |
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| owner | DE-703 |
| owner_facet | DE-703 |
| physical | XI, 215 S. Ill., graph. Darst. |
| publishDate | 1987 |
| publishDateSearch | 1987 |
| publishDateSort | 1987 |
| publisher | Noyes Publ. |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Sherman, Arthur Verfasser aut Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman Reprint ed. Westwood, NJ Noyes Publ. 1987 XI, 215 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Literaturangaben Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd rswk-swf Aufdampfen (DE-588)4143379-8 gnd rswk-swf Mikroelektronik (DE-588)4039207-7 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s Elektronische Schaltung (DE-588)4113419-9 s DE-604 Aufdampfen (DE-588)4143379-8 s Mikroelektronik (DE-588)4039207-7 s 1\p DE-604 2\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Sherman, Arthur Chemical vapor deposition for microelectronics principles, technology, and applications Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Aufdampfen (DE-588)4143379-8 gnd Mikroelektronik (DE-588)4039207-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4113419-9 (DE-588)4143379-8 (DE-588)4039207-7 (DE-588)4009846-1 |
| title | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_auth | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_exact_search | Chemical vapor deposition for microelectronics principles, technology, and applications |
| title_full | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_fullStr | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_full_unstemmed | Chemical vapor deposition for microelectronics principles, technology, and applications by Arthur Sherman |
| title_short | Chemical vapor deposition for microelectronics |
| title_sort | chemical vapor deposition for microelectronics principles technology and applications |
| title_sub | principles, technology, and applications |
| topic | Integrated circuits Design and construction Vapor-plating Elektronische Schaltung (DE-588)4113419-9 gnd Aufdampfen (DE-588)4143379-8 gnd Mikroelektronik (DE-588)4039207-7 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | Integrated circuits Design and construction Vapor-plating Elektronische Schaltung Aufdampfen Mikroelektronik CVD-Verfahren |
| work_keys_str_mv | AT shermanarthur chemicalvapordepositionformicroelectronicsprinciplestechnologyandapplications |