Gateisolatoren für MOS-Feldeffekttransistoren:
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Buch |
Sprache: | German |
Veröffentlicht: |
2000
|
Schlagworte: | |
Beschreibung: | München, Univ. der Bundeswehr, Diss., 2000 |
Beschreibung: | VIII, 162 S. Ill., graph. Darst. |
Internformat
MARC
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035 | |a (DE-599)BVBBV013552650 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | 0 | |a ger | |
049 | |a DE-91 |a DE-12 |a DE-29T |a DE-706 | ||
084 | |a ELT 321d |2 stub | ||
100 | 1 | |a Pompl, Thomas |e Verfasser |4 aut | |
245 | 1 | 0 | |a Gateisolatoren für MOS-Feldeffekttransistoren |c Thomas Pompl |
264 | 1 | |c 2000 | |
300 | |a VIII, 162 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
500 | |a München, Univ. der Bundeswehr, Diss., 2000 | ||
650 | 0 | 7 | |a Siliciumdioxid |0 (DE-588)4077447-8 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Gate-Oxid |0 (DE-588)4269383-4 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a MOS-FET |0 (DE-588)4207266-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Titandioxid |0 (DE-588)4185549-8 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
689 | 0 | 0 | |a Gate-Oxid |0 (DE-588)4269383-4 |D s |
689 | 0 | 1 | |a Siliciumdioxid |0 (DE-588)4077447-8 |D s |
689 | 0 | 2 | |a MOS-FET |0 (DE-588)4207266-9 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a Gate-Oxid |0 (DE-588)4269383-4 |D s |
689 | 1 | 1 | |a Titandioxid |0 (DE-588)4185549-8 |D s |
689 | 1 | 2 | |a MOS-FET |0 (DE-588)4207266-9 |D s |
689 | 1 | |5 DE-604 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-009254658 |
Datensatz im Suchindex
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any_adam_object | |
author | Pompl, Thomas |
author_facet | Pompl, Thomas |
author_role | aut |
author_sort | Pompl, Thomas |
author_variant | t p tp |
building | Verbundindex |
bvnumber | BV013552650 |
classification_tum | ELT 321d |
ctrlnum | (OCoLC)76254534 (DE-599)BVBBV013552650 |
discipline | Elektrotechnik |
format | Book |
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genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
genre_facet | Hochschulschrift |
id | DE-604.BV013552650 |
illustrated | Illustrated |
indexdate | 2024-07-09T18:47:51Z |
institution | BVB |
language | German |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009254658 |
oclc_num | 76254534 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM DE-12 DE-29T DE-706 |
owner_facet | DE-91 DE-BY-TUM DE-12 DE-29T DE-706 |
physical | VIII, 162 S. Ill., graph. Darst. |
publishDate | 2000 |
publishDateSearch | 2000 |
publishDateSort | 2000 |
record_format | marc |
spelling | Pompl, Thomas Verfasser aut Gateisolatoren für MOS-Feldeffekttransistoren Thomas Pompl 2000 VIII, 162 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier München, Univ. der Bundeswehr, Diss., 2000 Siliciumdioxid (DE-588)4077447-8 gnd rswk-swf Gate-Oxid (DE-588)4269383-4 gnd rswk-swf MOS-FET (DE-588)4207266-9 gnd rswk-swf Titandioxid (DE-588)4185549-8 gnd rswk-swf (DE-588)4113937-9 Hochschulschrift gnd-content Gate-Oxid (DE-588)4269383-4 s Siliciumdioxid (DE-588)4077447-8 s MOS-FET (DE-588)4207266-9 s DE-604 Titandioxid (DE-588)4185549-8 s |
spellingShingle | Pompl, Thomas Gateisolatoren für MOS-Feldeffekttransistoren Siliciumdioxid (DE-588)4077447-8 gnd Gate-Oxid (DE-588)4269383-4 gnd MOS-FET (DE-588)4207266-9 gnd Titandioxid (DE-588)4185549-8 gnd |
subject_GND | (DE-588)4077447-8 (DE-588)4269383-4 (DE-588)4207266-9 (DE-588)4185549-8 (DE-588)4113937-9 |
title | Gateisolatoren für MOS-Feldeffekttransistoren |
title_auth | Gateisolatoren für MOS-Feldeffekttransistoren |
title_exact_search | Gateisolatoren für MOS-Feldeffekttransistoren |
title_full | Gateisolatoren für MOS-Feldeffekttransistoren Thomas Pompl |
title_fullStr | Gateisolatoren für MOS-Feldeffekttransistoren Thomas Pompl |
title_full_unstemmed | Gateisolatoren für MOS-Feldeffekttransistoren Thomas Pompl |
title_short | Gateisolatoren für MOS-Feldeffekttransistoren |
title_sort | gateisolatoren fur mos feldeffekttransistoren |
topic | Siliciumdioxid (DE-588)4077447-8 gnd Gate-Oxid (DE-588)4269383-4 gnd MOS-FET (DE-588)4207266-9 gnd Titandioxid (DE-588)4185549-8 gnd |
topic_facet | Siliciumdioxid Gate-Oxid MOS-FET Titandioxid Hochschulschrift |
work_keys_str_mv | AT pomplthomas gateisolatorenfurmosfeldeffekttransistoren |