EMC 2000: lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Berlin ; Offenbach
VDE-Verl.
2000
|
| Schriftenreihe: | GMM-Fachbericht
32 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Literaturangaben |
| Beschreibung: | 201 S. Ill., graph. Darst. : 30 cm |
| ISBN: | 3800725878 |
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Datensatz im Suchindex
| _version_ | 1804128221625581568 |
|---|---|
| adam_text | GMM-FACHBERICHT 32 EMC 2000 17 TH EUROPEAN MASK CONFERENCE ON MASK
TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICRO-COMPONENTS LECTURES HELD AT
THE GMM-CONFERENCE NOVEMBER 13-14, 2000 IN MUNICH-UNTERHACHING, GERMANY
CONFERENCE CHAIRPERSON: DR. UWE BEHRINGER INSTITUTE FOR MICROSTRUCTURE
TECHNOLOGY, FORSCHUNGSZENTRUM KARLSRUHE ORGANIZER: VDE/VDI-SOCIETY
MICROELECTRONICS, MICRO- AND PRECISION ENGINEERING (GMM) IN COOPERATION
WITH SEMICONDUCTOR EQUIPMENT AND MATERIALS INTERNATIONAL, EUROPE
(SEMI-EUROPE), SPIE, BACUS AND INSTITUTE FOR MICROSTRUCTURE TECHNOLOGY,
FORSCHUNGSZENTRUM KARLSRUHE VDE VERLAG * BERLIN * OFFENBACH UB/TIB
HANNOVER 89 123 625 904 CONTENTS SESSION NGM: NEXT GENERATION MASKS
CHALLENGES AND OPPORTUNITIES FOR EPL AND EUVL MASKS 13 PAWITTER MANGAT
DIGITALDNATM LABORATORIES, MOTOROLA, TEMPE,
PAWITTER.MANGNAT@MOTOROLA.COM RESISTLESS ELECTRON BEAM LITHOGRAPHY
TECHNIQUE FOR THE FABRICATION OF X-RAY MASKS 23 ERIC LAVALLEE,
QUANTISCRIPT INC., 2500 BOUL. UNIVERSITE, SHERBROOKE, QUEBEC, CANADA,
J1K 2R1; LAVALLEE@QUANTISCRIPT.COM, JACQUES BEAUVAIS, DOMINIQUE DROUIN,
DEPARTEMENT DE GENIE ELECTRIQUE ET GENIE INFORMATIQUE, UNIVERSITE DE
SHERBROOKE, QUEBEC, CANADA, J1K 2R1 STUDY OF REMOVAL PROCESS FOR BUFFER
LAYER ON MULTILAYER OF EUVL MASK 27 EIICHI HOSHINO, TARO OGAWA, MASASHI
TAKAHASHI, HIROMASA HOKO, HIROMASA YAMANASHI, NAOYA HIRANO, AKIRA CHIBA,
BYOUNG-TAEK LEE, MASAAKI ITO AND SNINJI OKAZAKI, ASSOCIATION OF
SUPER-ADVANCED ELECTRONICS TECHNOLOGIES, ATSUGI RESEARCH CENTER; C/O NTT
TELECOMMUNICATIONS ENERGY LABORATORIES, 3-1, MORINOSATO WAKAMIYA,
ATSUGI-SHI, KANAGAWA PREF., 243-0198 JAPAN PROGRESS IN PLACEMENT CONTROL
FOR ION BEAM STENCIL MASK TECHNOLOGY 33 FRANK-MICHAEL KAMM, ALBRECHT
EHRMANN, THOMAS STRUCK, INFINEON TECHNOLOGIES AG, MUNICH JORG BUTSCHKE,
FLORIAN LETZKUS, REINHARD SPRINGER, IMS, STUTTGART ERNST HAUGENEDER,
LONENMIKROFABRIKATIONSSYSTEME GMBH, VIENNA SESSION PTT: PATTERN TRANSFER
AND TESTING INVESTIGATION OF QUARTZ ETCH RATE UNIFORMITY FOR ALTERNATING
PHASE SHIFT MASK APPLICATIONS UTILIZING A NEXT GENERATION ICP SOURCE 37
C. STRAWN, C. CONSTANTINE, J. PLUMHOFF, R. WESTERMAN, UNAXIS, INC. ST.
PETERSBURG, FL, 33716, USA, CHRIS.CONSTANTINE@UNAXIS.COM DOUBLY EXPOSED
PATTERNING CHARACTERISTICS USING TWO ALTERNATING PHASE SHIFT MASKS 47
SUNG-WOO LEE, IN-GYUN SHIN, YONG-HOON KIM, SUNG-WOON CHOI, WOO-SUNG HAN,
AND JUNG-MIN SOHN, SEMICONDUCTOR R&D CENTER, SAMSUNG ELECTRONICS, SAN
#24, NONGSEO-RI, KIHEUNG-EUP, YONGIN-CITY, KYUNGGI-DO, 499-711, KOREA,
SWLEEO@SAMSUNG.CO.KR THE CANARY RETICLE - A NEW DIAGNOSTIC FOR RETICLES
AND A WINDOW INTO THE PHYSICS OF ESD DAMAGE TO RETICLES 51 LARRY LEVIT,
- ION SYSTEMS, BERKELEY CA, USA, LLEVIT@ION.COM, ANDREAS ENGLISCH -
DUPONT PHOTOMASKS, HAMBURG, GERMANY SESSION PDP: PATTERN GENERATION AND
DATA PREPARATION, PART I RETICLE STATUS AND ISSUES RETICLE STATUS AND
ISSUES FOR APPLICATION IN ADVANCED 193 NM LITHOGRAPHY 59 KURT RONSE, RIK
JONCKHEERE, GEERT VANDENBERGHE IMEC/SPT, KAPELDREEF 75, 3001 LEUVEN,
BELGIUM, KURT.RONSE@IMEC.BE 130 NM-NODE MASK DEVELOPMENT 61 JAN M.
CHABALA, SUZANNE WEAVER, DAVID ALEXANDER, MAIYING LU, DAMON COLE ETEC
SYSTEMS, INC., AN APPLIED MATERIALS COMPANY, HAYWARD, CA 94545 USA
JAN_CHABALA@ETEC.COM CONTINUOUS IMAGE WRITER WITH IMPROVED IMAGE QUALITY
FOR HIGH-ACCURACY OPTICAL PATTERNING 71 JORG PAUFLER, STEFAN BRUNN,
JOACHIM BOLLE, TIM KORNER, SENTECH INSTRUMENTS GMBH, CARL-SCHEELE-STRABE
16, 12489 BERLIN, GERMANY, JOERG.PAUFLER@SENTECH.DE SESSION PP: POSTER
SESSION FIRST RESULTS FROM A NEW 248NM CD MEASUREMENT SYSTEM FOR FUTURE
MASK AND RETICLE GENERATION 83 GERHARD SCHLIITER, GERD SCHEURING*,
JIIRGEN HELBING*, SIGRID LEHNIGK**, HANS-JIIRGEN BRIICK* LEICA
MICROSYSTEMS, WETZLAR; GERHARD.SCHLUETER@LEICA-MICROSYSTEMS.COM * MUETEC
GMBH, MUNICH; * * SUBMICRON TECHNOLOGIES GMBH, MUNICH IMPROVEMENT OF
TEMPERATURE UNIFORMITY DURING PREBAKE PROCESS IN MASK BLANK PRODUCTION
89 BERND BEIER, FREDI SCHUBERT, UTE BUTTGEREIT, SCHOTT ML GMBH,
JERUSALEMER STRASSE 13, 98617 MEININGEN, BEI@ML.SCHOTT.DE, ANDREAS
BENSBERG, SCHOTT GLAS, HATTENBERGSTRASSE 10, 55014 MAINZ MASK DEFINITION
BY NANOIMPRINT LITHOGRAPHY (NIL) AND DRY ETCHING 93 DMITRI.
LYEBYEDYEV*), H. SCHULZ, H.-C. SCHEER, MICROSTRUCTURE ENGINEERING,
UNIVERSITY WUPPERTAL, DEPARTMENT OF ELECTRICAL AND INFORMATION
ENGINEERING, FUHLROTTSTR. 10, 42119 WUPPERTAL, GERMANY,
DMITRI@UNI-WUPPERTAL.DE STRATEGIES FOR WAFER-SCALE HOT EMBOSSING
LITHOGRAPHY 97 H.-C. SCHEER, H. SCHULZ, D. LYEBYEDYEV , UNIVERSITY
WUPPERTAL, MICROSTRUCTURE ENGINEERING, DEPT. OF ELECTRICAL AND
INFORMATION ENGINEERING, FUHLROTTSTR. 10, 42097 WUPPERTAL, GERMANY
DEFECT DISPOSITIONING USING MASK PRINTABILITY ON EMBEDDED ATTENUATED
PHASE SHIFT PRODUCTION PHOTOMASKS 101 JUSTIN NOVAK, ERIC POORTINGA, BEN
EYNON (PHOTRONICS, INC., AUSTIN, TX 78728), ANJA ROSENBUSCH, YAIR ERAN
(ETEC SYSTEMS, REHOVOT, 76705, ISRAEL) 8 SESSION MT METROLOGY MASK
MANUFACTURING CONTRIBUTION ON 248NM & 193NM LITHOGRAPHY PERFORMANCES 105
A.BARBERET; G.FANGET (*); J-C RICHOILLEY; M. TISSIER; Y. QUERE (*),
DUPONT PHOTOMASKS, AVENUE VICTOIRE 13, 106 ROUSSET CEDEX- FRANCE,
ABARBERET@CEA.FR (*) CEA/LETI, 17 RUE DES MARTYRS, 38 054 GRENOBLE
CEDEX9-FRANCE, GFANGETO@CEA.FR COMPARISON OF LINEWIDTH MEASUREMENTS ON
COG MASKS ILL H. BOSSE, W. MIRANDE, C.G. FRASE, PHYSIKALISCH-TECHNISCHE
BUNDESANSTALT, BUNDESALLEE 100, 38116-BRAUNSCHWEIG, GERMANY,
HARALD.BOSSE@PTB.DE H.-J. BRIICK, MUETEC GMBH, WILDERMUTHSTR. 88, 80993
MUNICH, GERMANY S. LEHNIGK, SUBMICRON TECHNOLOGIES GMBH, WILDERMUTHSTR.
88, 80993 MUNICH, HIGH-RESOLUTION INSPECTION OF 2D-MICROSTRUCTURES USING
MULTIMODE POLARIZATION MICROSCOPY 121 M. TOTZECK, H. JACOBSEN, H. J.
TIZIANI, INSTITUT FUR TECHNISCHE OPTIK, UNIVERSITAT STUTTGART,
PFAFFENWALDRING 9, 70569 STUTTGART, TOTZECK@ITO.UNI-STUTTGART.DE QUALITY
ASSESSMENT OF ADVANCED PHOTOMASKS USING THE Q-CAP CLUSTER TOOL 129 KAI
PETER (AISS GMBH), BAYERSTR. 115/9, 80335 MUNICH, KPETER@AISS.COM THOMAS
SCHATZ (INFINEON TECHNOLOGIES AG), VOLODYMYR ORDYNSKYY (AISS GMBH),
ROMAN LIEBE (INFINEON TECHNOLOGIES AG), MARTIN VERBEEK (INFINEON
TECHNOLOGIES AG), GERALD GALAN (DUPONT PHOTOMASKS FRANCE), EMANUELE
BARACCHI (STMICROELECTRONICS), CORINNE MIRAMOND (STMICROELECTRONICS),
HANS-JIIRGEN BRIICK (MUETEC GMBH), THOMAS ENGEL (CARL ZEISS JENA GMBH),
YAIR ERAN (APPLIED MATERIALS ISRAEL LTD.), KARL SOMMER (KARL SOMMER
CONSULTING), HANS HARTMANN@(AISS GMBH) SESSION PDP PATTERN GENERATION
AND DATA PREPARATION , PART II IMPROVED THROUGHPUT IN ALTA 3000 IC MASK
WRITING SYSTEM 139 GREGORY E. VALENTIN, VISHAL GARG,* ET AL*, ETEC
SYSTEMS, INC., AN APPLIED MATERIALS COMPANY, HAYWARD, CA 94545 USA, GREG
VALENTIN@ETEC.COM, *DUPONT PHOTOMASK, INC., 2920 CORONADO DRIVE, SANTA
CLARA, CA 95054 USA AUTOMOPS: B2B AND B2C IN MASK MAKING.MASK
MANUFACTURING PERFORMANCE AND CUSTOMER SATISFACTION IMPROVEMENT THROUGH
BETTER INFORMATION FLOW MANAGEMENT (*)... 151 LUC DE RIDDER, NIMBLE
NV, FLORASTRAAT 4, B-9820 MERELBEKE, LUC.DERIDDER@NIMBLESITE.COM DR.
OLAF FILIES (2) INFINEON TECHNOLOGIES AG, MH DPT, P.O. BOX 80 09 49,
D-81609 MUNICH, OLAF.FILIES@LNFINEON.COM ELECTRON-BEAM LITHOGRAPHY DATA
PREPARATION BASED ON MULTITHREADING MGS / PROXECCO 157 B. BUERGER, DR.
U. BAETZ, FRAUNHOFER IMS, GRENZSTRASSE 28, D-01109 DRESDEN / GERMANY
BUERGER@IMSDD.FHG.DE; DR. H. EICHHORN, M. LEMKE, J. GRAMSS, LEICA
MICROSYSTEMS LITHOGRAPHY GMBH, GOESCHWITZER STRASSE 25, D-07745 JENA; N.
BELIE, H. EISENMANN, AISS GMBH, BAYERSTR. 115/9, D-80335 MUNICH STUDY OF
MASK AERIAL IMAGES TO PREDICT CD PROXIMITY AND LINE END SHORTENING OF
RESIST PATTERNS 163 MIRCEA DUSA*, JUDITH VAN PRAAGH**, ANDREW RIDLEY**,
* ASML, SANTA CLARA, CA, USA; **ASML, VELDHOVEN, THE NETHERLANDS;
***METRON/ZEISS, SUNNYVALE CA, USA, MIRCEA.DUSA@ASML.COM SESSION RMB
RESIST AND MASK BLANK ISSUE APPLICATION OF E-BEAM CHEMICALLY AMPLIFIED
RESIST TO DEVICES BELOW 0.18 URN NODE .... 177 CHAN-UK JEON, CHANG-HWAN
KIM, SUNG-WOON CHOI, WOO-SUNG HAN AND JUNG-MIN SOHN, PHOTOMASK TEAM
SEMICONDUCTOR R&D CENTER, SAMSUNG ELECTRONICS, SAN #24, NONGSEO-RI,
KIHEUNG-EUP, YONGIN-CITY, KYUNGGI-DO, 499-711, KOREA J3358@SAMSUNG.CO.KR
PHOTOMASK BLANKS QUALITY AND FUNCTIONALITY IMPROVEMENT CHALLENGES FOR
THE 130 NM NODE AND BEYOND 181 HIDEO KOBAYASHI, MASAO USHIDA, KUNIHIKO
UENO, HOYA CORPORATION, ELECTRO-OPTICS COMPANY, ELECTRONIC MATERIALS
GROUP, PHOTOMASK BLANKS TECHNOLOGY DEVELOPMENT DIVISION, 3280 NAKAMARU,
NAGASAKA-CHO, KITAKOMA-GUN, YAMANASHI, JAPAN, 408-8550,
HIDEO_KOBAYASHI@SNGW.ELS. HOYA.CO.JP SESSION DIR DEFECT INSPECTION AND
REPAIR PHASE DEFECT INSPECTION OF 130 NM NODE PHASE SHIFT MASKS USING A
SIMULTANEOUS TRANSMITTED AND REFLECTED LIGHT PATTERN INSPECTION
ALGORITHM 189 LARRY ZURBRICK, DAVID EMERY, MACIEJ RUDZINSKI, MEI KUAN
PRUDHOMME, BRENT LEBACK, KLA-TENCOR CORPORATION; SAN JOSE, CA,
LARRY.ZUBRICK@KLA-TENCOR.COM CHARGED PARTICLE BEAM INDUCED PORCESSES AND
ITS APPLICABILITY TO MASK REPAIR FOR NEXT GENERATION LITHOGRAPHIES 191
HANS W.P. KOOPS, T-NOVA DEUTSCHE TELEKOM TECHNOLOGIEZENTRUM DARMSTADT,
AM KAVALLERIESAND 3, 64295 DARMSTADT, GERMANY, HANS.KOOPS@TELEKOM.DE THE
COMPACT EXCIMER LASER - LIGHT SOURCE FOR OPTICAL (MASK) INSPECTION
SYSTEMS 195 TOBIAS PFLANZ, HEINZ HUBER, TUILASER AG, LOCHHAMER SCHLAG
19, 82166 GRAEFELFING, MUNICH HH@TUILASER.COM DEFECT INSPECTION OF IPL
STENCIL MASKS WITH A KLA 351 TOOL . 201 ALBRECHT EHRMANN, ANNIKA EISNER,
INFINEON TECHNOLOGIES AG, BALANSTRASSE 73, D-81541 MUNICH,
ALBRECHT.EHRMANN@INFINEON.COM 10
|
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| author_corporate | EMC (Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik) München |
| author_corporate_role | aut |
| author_facet | EMC (Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik) München |
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| indexdate | 2024-07-09T18:45:48Z |
| institution | BVB |
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| isbn | 3800725878 |
| language | English |
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| publishDate | 2000 |
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| series | GMM-Fachbericht |
| series2 | GMM-Fachbericht |
| spelling | EMC (Gesellschaft Mikroelektronik, Mikro- und Feinwerktechnik) 17 2000 München Verfasser (DE-588)10010651-1 aut EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany 17th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components. Conference chairperson: Uwe Behringer. Organizer: VDE/VDI Society Microelectronics, Micro- and Precision Engineering (GMM). In cooperation with Semiconductor Equipment and Materials International, Europe (SEMI-Europe) ... Berlin ; Offenbach VDE-Verl. 2000 201 S. Ill., graph. Darst. : 30 cm txt rdacontent n rdamedia nc rdacarrier GMM-Fachbericht 32 Literaturangaben Maskentechnik (DE-588)4125845-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 2000 Unterhaching gnd-content Maskentechnik (DE-588)4125845-9 s DE-604 Behringer, Uwe Sonstige oth GMM-Fachbericht 32 (DE-604)BV011091581 32 GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=009166948&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany GMM-Fachbericht Maskentechnik (DE-588)4125845-9 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)1071861417 |
| title | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany |
| title_auth | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany |
| title_exact_search | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany |
| title_full | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany 17th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components. Conference chairperson: Uwe Behringer. Organizer: VDE/VDI Society Microelectronics, Micro- and Precision Engineering (GMM). In cooperation with Semiconductor Equipment and Materials International, Europe (SEMI-Europe) ... |
| title_fullStr | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany 17th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components. Conference chairperson: Uwe Behringer. Organizer: VDE/VDI Society Microelectronics, Micro- and Precision Engineering (GMM). In cooperation with Semiconductor Equipment and Materials International, Europe (SEMI-Europe) ... |
| title_full_unstemmed | EMC 2000 lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany 17th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components. Conference chairperson: Uwe Behringer. Organizer: VDE/VDI Society Microelectronics, Micro- and Precision Engineering (GMM). In cooperation with Semiconductor Equipment and Materials International, Europe (SEMI-Europe) ... |
| title_short | EMC 2000 |
| title_sort | emc 2000 lectures held at the gmm conference november 13 14 2000 in munich unterhaching germany |
| title_sub | lectures held at the GMM conference, November 13 - 14, 2000 in Munich-Unterhaching, Germany |
| topic | Maskentechnik (DE-588)4125845-9 gnd |
| topic_facet | Maskentechnik Konferenzschrift 2000 Unterhaching |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=009166948&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV011091581 |
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