1998 3rd International Symposium on Plasma Process Induced Damage: June 4 - 5, 1998, Honolulu, Hawaii, USA
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Sunnyvale, CA
Northern California Chapter of the American Vacuum Soc.
1998
|
| Schlagworte: | |
| Beschreibung: | 234 S. Ill., graph. Darst. |
| ISBN: | 0965157725 |
Internformat
MARC
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| 111 | 2 | |a International Symposium on Plasma Process Induced Damage |n 3 |d 1998 |c Honolulu, Hawaii |j Verfasser |0 (DE-588)5324509-X |4 aut | |
| 245 | 1 | 0 | |a 1998 3rd International Symposium on Plasma Process Induced Damage |b June 4 - 5, 1998, Honolulu, Hawaii, USA |c Moritaka Nakamura ..., ed. |
| 246 | 1 | 3 | |a Nineteen hundred and ninety-eight 3rd International Symposium on Plasma Process Induced Damage |
| 246 | 1 | 3 | |a 1998 3rd International Symposium on Plasma Process-Induced Damage |
| 264 | 1 | |a Sunnyvale, CA |b Northern California Chapter of the American Vacuum Soc. |c 1998 | |
| 300 | |a 234 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Plasma etching |v Congresses | |
| 650 | 4 | |a Semiconductor wafers |x Defects |v Congresses | |
| 650 | 4 | |a Semiconductors |x Effect of radiation on |v Congresses | |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |2 gnd-content | |
| 700 | 1 | |a Nakamura, Moritaka |e Sonstige |4 oth | |
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Datensatz im Suchindex
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| author_corporate | International Symposium on Plasma Process Induced Damage Honolulu, Hawaii |
| author_corporate_role | aut |
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| author_sort | International Symposium on Plasma Process Induced Damage Honolulu, Hawaii |
| building | Verbundindex |
| bvnumber | BV013285947 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
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| callnumber-subject | TK - Electrical and Nuclear Engineering |
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| ctrlnum | (OCoLC)40187344 (DE-599)BVBBV013285947 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
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| genre_facet | Konferenzschrift |
| id | DE-604.BV013285947 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:43:08Z |
| institution | BVB |
| institution_GND | (DE-588)5324509-X |
| isbn | 0965157725 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009057950 |
| oclc_num | 40187344 |
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| owner | DE-703 DE-83 |
| owner_facet | DE-703 DE-83 |
| physical | 234 S. Ill., graph. Darst. |
| publishDate | 1998 |
| publishDateSearch | 1998 |
| publishDateSort | 1998 |
| publisher | Northern California Chapter of the American Vacuum Soc. |
| record_format | marc |
| spelling | International Symposium on Plasma Process Induced Damage 3 1998 Honolulu, Hawaii Verfasser (DE-588)5324509-X aut 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA Moritaka Nakamura ..., ed. Nineteen hundred and ninety-eight 3rd International Symposium on Plasma Process Induced Damage 1998 3rd International Symposium on Plasma Process-Induced Damage Sunnyvale, CA Northern California Chapter of the American Vacuum Soc. 1998 234 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Plasma etching Congresses Semiconductor wafers Defects Congresses Semiconductors Effect of radiation on Congresses (DE-588)1071861417 Konferenzschrift gnd-content Nakamura, Moritaka Sonstige oth |
| spellingShingle | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA Plasma etching Congresses Semiconductor wafers Defects Congresses Semiconductors Effect of radiation on Congresses |
| subject_GND | (DE-588)1071861417 |
| title | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA |
| title_alt | Nineteen hundred and ninety-eight 3rd International Symposium on Plasma Process Induced Damage 1998 3rd International Symposium on Plasma Process-Induced Damage |
| title_auth | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA |
| title_exact_search | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA |
| title_full | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA Moritaka Nakamura ..., ed. |
| title_fullStr | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA Moritaka Nakamura ..., ed. |
| title_full_unstemmed | 1998 3rd International Symposium on Plasma Process Induced Damage June 4 - 5, 1998, Honolulu, Hawaii, USA Moritaka Nakamura ..., ed. |
| title_short | 1998 3rd International Symposium on Plasma Process Induced Damage |
| title_sort | 1998 3rd international symposium on plasma process induced damage june 4 5 1998 honolulu hawaii usa |
| title_sub | June 4 - 5, 1998, Honolulu, Hawaii, USA |
| topic | Plasma etching Congresses Semiconductor wafers Defects Congresses Semiconductors Effect of radiation on Congresses |
| topic_facet | Plasma etching Congresses Semiconductor wafers Defects Congresses Semiconductors Effect of radiation on Congresses Konferenzschrift |
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