Verfügbarkeit: Handbook of plasma processing technology

Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions

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Bibliographische Detailangaben
Format:	Buch
Sprache:	English
Veröffentlicht:	Westwood, NJ Noyes 1990
Ausgabe:	Reprint ed.
Schriftenreihe:	Materials science and process technology series
Schlagworte:	Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors > Etching Ätzen Halbleiter Plasmaätzen Plasma Plasmatechnik Plasmastrahlbearbeitung Sputtern Dünnschichttechnik
Beschreibung:	XXIII, 523 S. Ill., graph. Darst.
ISBN:	0815512201

Internformat

MARC


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Datensatz im Suchindex

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ctrlnum	(OCoLC)53783848 (DE-599)BVBBV012985174
discipline	Werkstoffwissenschaften / Fertigungstechnik
edition	Reprint ed.
format	Book
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id	DE-604.BV012985174
illustrated	Illustrated
indexdate	2024-07-09T18:37:13Z
institution	BVB
isbn	0815512201
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-008846405
oclc_num	53783848
open_access_boolean
owner	DE-1050 DE-703
owner_facet	DE-1050 DE-703
physical	XXIII, 523 S. Ill., graph. Darst.
publishDate	1990
publishDateSearch	1990
publishDateSort	1990
publisher	Noyes
record_format	marc
series2	Materials science and process technology series
spelling	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions ed. by Stephen M. Rossnagel ... Reprint ed. Westwood, NJ Noyes 1990 XXIII, 523 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Ätzen (DE-588)4000648-7 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Plasma (DE-588)4046249-3 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf Sputtern (DE-588)4182614-0 gnd rswk-swf Dünnschichttechnik (DE-588)4136339-5 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 s DE-604 Halbleiter (DE-588)4022993-2 s Plasmastrahlbearbeitung (DE-588)4136199-4 s Sputtern (DE-588)4182614-0 s 1\p DE-604 Plasmaätzen (DE-588)4174821-9 s 2\p DE-604 Dünnschichttechnik (DE-588)4136339-5 s 3\p DE-604 Plasma (DE-588)4046249-3 s 4\p DE-604 Ätzen (DE-588)4000648-7 s 5\p DE-604 Rossnagel, Stephen M. Sonstige oth 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 5\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Ätzen (DE-588)4000648-7 gnd Halbleiter (DE-588)4022993-2 gnd Plasmaätzen (DE-588)4174821-9 gnd Plasma (DE-588)4046249-3 gnd Plasmatechnik (DE-588)4140353-8 gnd Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd
subject_GND	(DE-588)4000648-7 (DE-588)4022993-2 (DE-588)4174821-9 (DE-588)4046249-3 (DE-588)4140353-8 (DE-588)4136199-4 (DE-588)4182614-0 (DE-588)4136339-5
title	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
title_auth	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
title_exact_search	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
title_full	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions ed. by Stephen M. Rossnagel ...
title_fullStr	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions ed. by Stephen M. Rossnagel ...
title_full_unstemmed	Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions ed. by Stephen M. Rossnagel ...
title_short	Handbook of plasma processing technology
title_sort	handbook of plasma processing technology fundamentals etching deposition and surface interactions
title_sub	fundamentals, etching, deposition, and surface interactions
topic	Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Ätzen (DE-588)4000648-7 gnd Halbleiter (DE-588)4022993-2 gnd Plasmaätzen (DE-588)4174821-9 gnd Plasma (DE-588)4046249-3 gnd Plasmatechnik (DE-588)4140353-8 gnd Plasmastrahlbearbeitung (DE-588)4136199-4 gnd Sputtern (DE-588)4182614-0 gnd Dünnschichttechnik (DE-588)4136339-5 gnd
topic_facet	Ingeniería del plasma Plasma - Erosión selectiva Semiconductores - Ataque químico Plasma engineering Plasma etching Semiconductors Etching Ätzen Halbleiter Plasmaätzen Plasma Plasmatechnik Plasmastrahlbearbeitung Sputtern Dünnschichttechnik
work_keys_str_mv	AT rossnagelstephenm handbookofplasmaprocessingtechnologyfundamentalsetchingdepositionandsurfaceinteractions

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