Low temperature plasma physics: fundamental aspects and applications
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Berlin [u.a.]
Wiley-VCH
2001
|
| Ausgabe: | 1. ed. |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | 2. Aufl. u.d.T.: Low temperature plasmas |
| Beschreibung: | 523 S. Ill., graph. Darst. |
| ISBN: | 3527288872 |
Internformat
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| 245 | 1 | 0 | |a Low temperature plasma physics |b fundamental aspects and applications |c Rainer Hippler ... (eds.) |
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| 500 | |a 2. Aufl. u.d.T.: Low temperature plasmas | ||
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Datensatz im Suchindex
| _version_ | 1804127490689466368 |
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| adam_text | RAINER HIPPLER, SIGISMUND PFAU, MARTIN SCHMIDT, KARL H. SCHOENBACH
(EDS.) LOW TEMPERATURE PLASMA PHYSICS FUNDAMENTAL ASPECTS AND
APPLICATIONS WILEY-VCH BERLIN * WEINHEIM * NEW YORK * CHICHESTER *
BRISBANE * SINGAPORE * TORONTO CONTENTS 1 CHARACTERISTICS OF
LOW-TEMPERATURE PLASMAS UNDER NON-THERMAL CONDITIONS * A SHORT SUMMARY
(ALFRED RUTSCHER) 15 1.1 INTRODUCTION 15 1.1.1 DEFINITION 15 1.1.2 TYPES
OF PLASMAS 15 1.2 STARTING POINT FOR MODELING THE PLASMA STATE 16 1.2.1
SINGLE-PARTICLE TRAJECTORIES 16 1.2.2 KINETIC AND STATISTICAL THEORY 16
1.2.3 HYDRODYNAMIC APPROXIMATION 17 1.3 THE ROLE OF CHARGE CARRIERS 17
1.4 FACTS AND FORMULAS 17 1.4.1 ELECTRON ENERGY DISTRIBUTION FUNCTIONS
(EEDF) 17 1.4.2 KINETIC TEMPERATURE OF ELECTRONS 18 1.4.3 COEFFICIENTS
FOR PARTICLE AND ENERGY TRANSPORT 19 1.4.4 GENERALIZED *OLTZMANN
EQUILIBRIUM 20 1.4.5 AMBIPOLAR DIFFUSION 22 1.4.6 CONDITION OF
QUASI-NEUTRALITY 23 1.4.7 DEBYE SCREENING LENGTH 24 1.4.8 DEGREE OF
IONIZATION 25 1.4.9 ELECTRICAL CONDUCTIVITY 27 1.4.10 PLASMA FREQUENCY
27 2 ELECTRON KINETICS IN WEAKLY IONIZED PLASMAS (ROLF WINKLER) 2 9 2.1
INTRODUCTION 29 2.1.1 THE ACTIVE ROLE OF ELECTRONS IN THE PLASMA 29
2.1.2 ACTION OF ELECTRIC FIELDS AND COLLISION PROCESSES 30 2.2 KINETIC
TREATMENT OF THE ELECTRONS 32 2.2.1 VELOCITY DISTRIBUTION AND
MACROSCOPIC PROPERTIES 32 2.2.2 KINETIC EQUATION OF THE ELECTRONS 33
2.2.3 TREATMENT OF THE KINETIC EQUATION 33 2.2.4 MACROSCOPIC PROPERTIES
OF THE ELECTRONS 35 2.3 KINETICS IN TIME-AND SPACE-INDEPENDENT PLASMAS
37 2.3.1 BASIC EQUATIONS AND CONSISTENT MACROSCOPIC BALANCES 37 2.3.2
ILLUSTRATION OF DISTRIBUTION FUNCTIONS AND MACROSCOPIC QUANTITIES ... 39
CONTENTS 2.4 ELECTRON KINETICS IN TIME-DEPENDENT PLASMAS 42 2.4.1 BASIC
EQUATIONS FOR THE DISTRIBUTION COMPONENTS 42 2.4.2 BALANCE EQUATIONS AND
DISSIPATION FREQUENCIES 43 2.4.3 TEMPORAL RELAXATION OF THE ELECTRONS 45
2.5 ELECTRON KINETICS IN SPACE-DEPENDENT PLASMAS 47 2.5.1 BASIC
EQUATIONS AND CONSISTENT BALANCES 47 2.5.2 SPATIAL RELAXATION OF THE
ELECTRONS 48 2.6 CONCLUDING REMARKS 52 REFERENCES 53 ELEMENTARY
COLLISION PROCESSES IN PLASMAS {KURT H. BECKER) 55 3.1 INTRODUCTION 55
3.2 SUMMARY OF ELECTRON IMPACT-INDUCED COLLISION PROCESSES WITH ATOMS 56
3.3 ELECTRON IMPACT-INDUCED COLLISION PROCESSES WITH MOLECULES 62 3.4
CONCLUDING REMARKS 74 REFERENCES 74 FUNDAMENTAL PROCESSES IN
PLASMA-SURFACE INTERACTIONS {RAINER HIPPLER) 19 4.1 INTRODUCTION 79 4.2
THEORETICAL CONSIDERATIONS 79 4.2.1 BINARY COLLISION MODEL 79 4.2.2
MOLECULAR DYNAMICS MODEL 88 4.2.3 SCATTERING POTENTIALS 89 4.3
SCATTERING OF IONS AT SURFACES 91 4.3.1 IMPLANTATION OF IONS 91 4.3.2
BACKSCATTERING OF IONS 92 4.4 PHYSICAL SPUTTERING 94 4.4.1 PROJECTILE
ENERGY DEPENDENCE 94 4.4.2 ENERGY DISTRIBUTION OF SPUTTERED PARTICLES 95
4.4.3 SPUTTERING OF CLUSTERS 98 4.4.4 POTENTIAL SPUTTERING EMPLOYING
HIGHLY-CHARGED IONS 98 4.5 ELECTRON EMISSION 100 4.5.1 EMISSION OF
ELECTRONS BY ELECTRON IMPACT 101 4.5.2 EMISSION OF ELECTRONS BY ION
IMPACT 104 4.5.3 EMISSION OF ELECTRONS BY CLUSTER IMPACT 106 4.6
CHEMICAL EFFECTS 106 4.6.1 CHEMICAL SPUTTERING AND PLASMA ETCHING 106
REFERENCES 109 MODELING OF PLASMA-WALL INTERACTION {HOLGER KERSTEN) 113
5.1 INTRODUCTION 113 5.2 CHARACTERIZATION OF THE ELEMENTARY MECHANISMS
IN LOW-TEMPERATURE PLASMA PROCESSING 114 5.2.1 ADSORPTION, DESORPTION,
DIFFUSION 114 5.2.2 REFLECTION, ACTIVATION, MIXING 117 9 5.2.3 PHYSICAL
SPUTTERING AND IMPLANTATION 118 5.2.4 CHEMICAL REACTIONS AT THE SURFACE
119 5.3 MODELING OF ETCHING AND DEPOSITION PROCESSES 121 5.3.1 PARTICLE
BALANCE 122 5.3.2 TEMPERATURE DEPENDENCE OF THE PROCESSES 123 5.3.3
ENERGY BALANCE OF THE SUBSTRATE DURING LOW-TEMPERATURE PLASMA PRO-
CESSING 125 REFERENCES 129 6 LANGMUIR PROBE DIAGNOSTICS OF
LOW-TEMPERATURE PLASMAS (SIGISMUND PFAU AND MILAN TICHY) 131 6.1
INTRODUCTION 131 6.1.1 PROBE SHAPES AND PROBE CHARACTERISTICS 131 6.1.2
THE WORKING REGIMES OF THE LANGMUIR PROBE 134 6.1.3 ADVANTAGES AND
DISADVANTAGES OF PROBE DIAGNOSTICS 135 6.2 THE LANGMUIR SINGLE PROBE
METHOD 136 6.2.1 THEORETICAL FOUNDATIONS OF THE LANGMUIR PROBE METHOD
136 6.2.2 PROBE CHARACTERISTICS - EXAMPLE OF THE SPHERICAL PROBE 137 6.3
GENERAL THEORIES OF THE CURRENT TO A LANGMUIR PROBE 140 6.3.1 STARTING
SYSTEM OF EQUATIONS 140 6.3.2 THE COLD ION MODEL BY ALLEN, BOYD AND
REYNOLDS (TI/T E = 0) . . . . 141 6.4 THE DRUYVESTEYN METHOD FOR
ESTIMATION OF THE ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF) 142 6.5
PROBE DIAGNOSTICS OF ANISOTROPIC PLASMAS 147 6.6 PROBE DIAGNOSTICS UNDER
NON-COLLISION-FREE CONDITIONS 148 6.7 LANGMUIR PROBE IN A MAGNETIZED
PLASMA 153 6.8 SPACE AND TIME RESOLVED LANGMUIR PROBE METHOD 156 6.8.1
SPACE RESOLVED LANGMUIR PROBE MEASUREMENTS 156 6.8.2 TIME RESOLVED
LANGMUIR PROBE MEASUREMENTS 157 6.9 PROBE DIAGNOSTIC OF CHEMICALLY
ACTIVE PLASMAS 161 6.10 DOUBLE PROBE TECHNIQUE 163 REFERENCES 165 7
DIAGNOSTICS OF NON-EQUILIBRIUM MOLECULAR PLASMAS USING EMISSION AND
ABSORP- TION SPECTROSCOPY (J. ROEPCKE, P.B. DAVIES, M. KAENING AND *.*.
LAVROV) 173 7.1 INTRODUCTION 173 7.2 INSTRUMENTAL TECHNIQUES 174 7.3
EMISSION SPECTROMETRY 176 7.3.1 GENERAL CONSIDERATIONS 176 7.3.2
ACTINOMETRY 177 7.4 ABSORPTION SPECTROSCOPY 178 7.4.1 BACKGROUND THEORY
178 7.4.2 INFRARED ABSORPTION SPECTROSCOPY 180 7.5 RESULTS AND
APPLICATIONS: PHYSICAL PROPERTIES OF PLASMAS 182 7.5.1 TEMPERATURES AND
DISTRIBUTION FUNCTIONS 183 10 CONTENTS 7.5.2 DEGREE OF DISSOCIATION 188
7.5.3 ELECTRIC FIELD, ELECTRON TEMPERATURE, DENSITY AND DISTRIBUTION
FUNCTION . 189 7.5.4 TIME-RESOLVED SPECTROSCOPY 191 7.6 CONCLUSIONS 192
REFERENCES 192 8 MASS SPECTROMETRIC DIAGNOSTICS {MARTIN SCHMIDT, RUEDIGER
FOEST AND RALF BASNER) 199 8.1 INTRODUCTION 199 8.2 INSTRUMENTATION 201
8.2.1 ION SOURCE 201 8.2.2 MASS ANALYZER 203 8.2.3 ION ENERGY ANALYZER
206 8.2.4 ION DETECTOR 206 8.3 COUPLING OF THE MASS SPECTROMETER WITH
THE PLASMA SYSTEM 206 8.3.1 MECHANICAL COUPLING 206 8.3.2 ELECTRICAL
COUPLING 211 8.4 NEUTRAL GAS MASS SPECTROMETRY 213 8.5 ION MASS
SPECTROMETRY 216 8.6 MASS SPECTROMETRY FOR THE DETERMINATION OF
ELEMENTARY DATA FOR PLASMA PHYSICS 222 8.7 CONCLUSIONS 223 REFERENCES
224 9 ELLIPSOMETRIC ANALYSIS OF PLASMA-TREATED SURFACES (WOLFGANG
FUKAREK) 229 9.1 INTRODUCTION 229 9.2 COMPARISON WITH OTHER TECHNIQUES
230 9.3 EXPERIMENTAL TECHNIQUE 231 9.3.1 INSTRUMENTATION 231 9.3.2 DATA
ANALYSIS 232 9.4 EXAMPLES 234 9.4.1 IN SITU SINGLE WAVELENGTH
ELLIPSOMETRY EXAMPLES 235 9.4.2 IN SITU SPECTROSCOPIC ELLIPSOMETRY
EXAMPLES 239 9.4.3 EX SITU SPECTROSCOPIC ELLIPSOMETRY EXAMPLES 246 9.5
LIMITATIONS AND REMAINING ISSUES 249 REFERENCES 250 10 CHARACTERIZATION
OF THIN SOLID FILMS (HARM WULFF AND HARTMUT STEFFEN) 253 10.1
INTRODUCTION 253 10.2 X-RAY METHODS FOR THIN FILM ANALYSIS 254 10.2.1
GRAZING INCIDENCE X-RAY DIFFRACTOMETRY (GIXD) 254 10.2.2 GRAZING
INCIDENCE X-RAY REFLECTOMETRY (GIXR) 256 10.3 X-RAY PHOTOELECTRON
SPECTROSCOPY (XPS) 257 10.4 EXAMPLES 259 10.4.1 PHASE ANALYSIS OF
PLASMA-DEPOSITED TIN X FILMS 259 10.4.2 CHARACTERIZATION OF DEFECT
STRUCTURES BY X-RAY INVESTIGATIONS 261 11 10.4.3 CALCULATION OF DEPTH
PROFILES IN PLASMA-DEPOSITED TI/TISI FILMS .... 264 10.4.4 STRUCTURAL
STUDIES OF THIN ITO FILMS 268 10.4.5 INVESTIGATION OF PLASMA-DEPOSITED
ITO FILMS 271 10.4.6 IN SITU STUDIES OF DIFFUSION AND CRYSTAL GROWTH IN
PLASMA-DEPOSITED THIN ITO FILMS 275 10.5 CONCLUSIONS 280 REFERENCES 280
11 PLASMA SOURCES (MARTIN SCHMIDT AND HANS CONRADS) 283 11.1
INTRODUCTION 283 11.2 PROPERTIES OF NON-THERMAL PLASMAS 285 11.3 PLASMA
GENERATION BY ELECTRIC FIELDS 287 11.3.1 DIRECT CURRENT (DC) DISCHARGES
288 11.3.2 PULSED DIRECT CURRENT (DC) DISCHARGES 291 11.3.3
RADIOFREQUENCY (RF) DISCHARGES 291 11.3.4 MICROWAVE DISCHARGES 296 11.4
PLASMA GENERATION BY BEAMS 299 11.5 CONCLUSIONS 300 REFERENCES 302 12
REACTIVE NON-THERMAL PLASMAS * CHEMICAL QUASI-EQUILIBRIA, SIMILARITY
PRINCIPLES AND MACROSCOPIC KINETICS (HANS-ERICH WAGNER) 305 12.1
INTRODUCTION 305 12.2 CHEMICAL QUASI-EQUILIBRIA 306 12.2.1 THE CONCEPT
306 12.2.2 CHEMICAL QUASI-EQUILIBRIA AND THE KINETIC BACKGROUND 308
12.2.3 EXPERIMENTAL VERIFICATION 311 12.3 PLASMA CHEMICAL SIMILARITY 314
12.3.1 SIMILARITY PRINCIPLES IN THE CHEMISTRY OF NON-THERMAL PLASMAS
.... 314 12.3.2 APPLICATION TO THE FLOW REACTOR 317 12.3.3 COMPARISON
WITH EXPERIMENTAL RESULTS 319 12.4 THE METHOD OF GENERALIZED MACROSCOPIC
KINETICS 322 12.4.1 HISTORY AND CONCEPT 322 12.4.2 THE PARTICLE BALANCE
EQUATIONS 322 12.4.3 DEMONSTRATION EXAMPLES 323 12.4.4 MACROSCOPIC
MODELING OF EXPERIMENTAL RESULTS 326 12.5 SUMMARY 328 REFERENCES 329 13
HIGH-PRESSURE PLASMAS: DIELECTRIC-BARRIER AND CORONA DISCHARGES -
PROPERTIES AND TECHNICAL APPLICATIONS (ULRICH KOGELSCHATZ AND JUERGEN
SALGE) 331 13.1 INTRODUCTION 331 13.2 DIELECTRIC-BARRIER DISCHARGES 331
13.2.1 FILAMENTARY DISCHARGES 332 13.2.2 HOMOGENEOUS DISCHARGES 339 12
CONTENTS 13.2.3 APPLICATIONS 341 13.3 CORONA DISCHARGES 349 13.3.1
DIRECT CURRENT (DE) DISCHARGES 349 13.3.2 PULSED CORONA DISCHARGES 350
13.3.3 APPLICATIONS 351 REFERENCES 353 14 TRANSIENT PLASMA-ASSISTED
DIESEL EXHAUST REMEDIATION (M. GUNDERSEN, V. PUCHKAREV, A. KHARLOV, G.
ROTH, J. YAMPOLSKY AND D. ERWIN) 359 14.1 INTRODUCTION 359 14.2
EXPERIMENT 360 14.2.1 DIESEL EXHAUST TREATMENT 360 14.2.2 LASER-INDUCED
FLUORESCENCE (LIF) OF NO/NCV 361 14.3 EXPERIMENTAL RESULTS 361 14.3.1
PULSED POWER AND PLASMA FORMATION 361 14.3.2 TIME-AND SPACE-RESOLVED
NO/NOA; DEPLETION 363 14.3.3 PLASMA CHEMISTRY 364 14.3.4 PLASMA-ASSISTED
CATALYST 365 14.4 SUMMARY 365 REFERENCES 366 15 PLASMA DISPLAY PANEL
(J.K.LEEANDJ.P.VERBONCOEUR) 367 15.1 INTRODUCTION AND OVERVIEW 367 15.2
HISTORY AND BACKGROUND 368 15.3 ALTERNATING CURRENT PLASMA DISPLAY PANEL
(AC-PDP) 369 15.3.1 THE PLASMA DISCHARGE DRIVEN BY A HIGH VOLTAGE 369
15.3.2 ONE-DIMENSIONAL AC-PDP MODEL 372 15.3.3 TWO-DIMENSIONAL AC-PDP
MODELS 376 15.3.4 DRIVING VOLTAGE FOR THE AC-PDP 378 15.3.5 RESEARCH
STATUS AND REMAINING ISSUES 381 15.4 OTHER PDP TYPES 382 15.5
CONCLUSIONS 383 REFERENCES 384 16 LOW-PRESSURE DISCHARGE LIGHT SOURCES
(G.G. LISTER) 387 16.1 INTRODUCTION 387 16.2 THE PHYSICS OF LOW-PRESSURE
DISCHARGE LAMPS 388 16.2.1 COLLISIONAL PROCESSES 389 16.2.2 RADIATION
TRANSPORT 389 16.2.3 AMBIPOLAR DIFFUSION 390 16.2.4 ELECTRON ENERGY
BALANCE IN THE POSITIVE COLUMN 390 16.3 ELECTRODED FLUORESCENT LAMPS 390
16.4 ELECTRODELESS FLUORESCENT LAMPS 393 16.4.1 BENEFITS OF
ELECTRODELESS DISCHARGES FOR LIGHTING 393 16.4.2 ELECTROMAGNETIC
INTERFERENCE AND SAFETY 394 13 16.4.3 THE PHYSICS OF ELECTRODELESS
FLUORESCENT LAMPS 394 16.4.4 INDUCTIVE FLUORESCENT DISCHARGE LAMPS 395
16.4.5 CAPACITIVELY COUPLED FLUORESCENT LAMPS 399 16.4.6 SURFACE WAVE
FLUORESCENT DISCHARGE LAMPS 400 16.5 LOW-PRESSURE SODIUM LAMPS 400 16.6
RARE GAS DISCHARGES FOR LIGHTING 402 16.7 CONCLUSIONS 403 REFERENCES 404
17 HIGH-PRESSURE PLASMA LIGHT SOURCES (KLAUS GUENTHER) 407 17.1
INTRODUCTION AND BASIC EQUATIONS 407 17.2 APPLICATION DEMANDS 409 17.2.1
PHOTOMETRIC PROPERTIES 409 17.2.2 OPERATION REQUIREMENTS 412 17.2.3
COSTS AND ENVIRONMENTAL ASPECTS 413 17.3 HIGH INTENSITY DISCHARGE (HID)
LAMPS AND THEIR OPERATIONAL PRINCIPLE 413 17.3.1 THE PLASMA OF HID LAMPS
413 17.3.2 HIGH-PRESSURE MERCURY (HPM) LAMPS 416 17.3.3 METAL HALIDE
(MH) LAMPS 416 17.3.4 HIGH-PRESSURE SODIUM (HPS) LAMPS 418 17.3.5
TECHNICAL APPLICATIONS 420 17.3.6 NEW DEVELOPMENTS 420 17.4 LAMP
OPERATION 421 17.4.1 STARTING OF HID LAMPS 421 17.4.2 CONVENTIONAL
OPERATION 422 17.4.3 ELECTRONIC OPERATION 423 17.5 CONCLUSIONS 429
REFERENCES 429 18 PLASMA ETCHING IN MICROELECTRONICS (HARALD RICHTER AND
ANDRE WOLFF) 433 18.1 CHARACTERIZATION OF PLASMA ETCHING 433 18.2
ETCHING TECHNIQUES 435 18.2.1 PHYSICAL ETCHING 436 18.2.2 CHEMICAL
ETCHING 436 18.2.3 CHEMICAL-PHYSICAL ETCHING 437 18.3 EQUIPMENT-RELATED
TOPICS 438 18.4 ETCH CHEMISTRIES 440 18.5 DRY ETCHING IN ADVANCED
TECHNOLOGIES (SELECTED EXAMPLES) 441 18.5.1 SILICON DRY ETCHING 442
18.5.2 OXIDE ETCH PROCESSES 443 18.5.3 METAL ETCH 445 18.6 PROCESS
CONTROL 446 18.7 PLASMA PROCESS-INDUCED DAMAGE 448 18.7.1 CONTAMINATION
EFFECTS 448 18.7.2 CHARGING DAMAGE 448 14 CONTENTS 18.8 FUTURE OUTLOOK
450 REFERENCES 450 19 LOW-TEMPERATURE PLASMAS FOR POLYMER SURFACE
MODIFICATION (JUERGEN MEICHSNER) 453 19.1 INTRODUCTION 453 19.2
LOW-TEMPERATURE PLASMA AND PLASMA-POLYMER INTERACTION 453 19.2.1
CHARACTERISATION OF LOW-PRESSURE ELECTRIC GAS DISCHARGES 453 19.2.2
PLASMA SPECIES AND EXPECTED EFFECTS IN POLYMER SURFACE TREATMENT . . 459
19.2.3 METHODS FOR CHARACTERISATION OF PLASMA TREATED POLYMERS 460
19.2.4 POLYMER SAMPLES AND THIN FILM PREPARATION 463 19.3 PLASMA
MODIFICATION OF POLYETHYLENE AND POLYSTYRENE 464 19.4 PLASMA
MODIFICATION OF WOOL AND CELLULOSE FABRICS 467 19.5 SUMMARY 470
REFERENCES 471 20 PLASMA-ENHANCED DEPOSITION OF SUPERHARD THIN FILMS
(ACHIM LUNK) 473 20.1 CHARACTERIZATION OF SUPERHARD MATERIALS 473 20.2
PLASMA-ENHANCED DEPOSITION OF DIAMOND AND DIAMOND-LIKE CARBON 476 20.2.1
DEPOSITION OF DIAMOND 476 20.2.2 PLASMA-ENHANCED DEPOSITION OF
DIAMOND-LIKE CARBON 481 20.3 PLASMA-ENHANCED DEPOSITION OF CUBIC BORON
NITRIDE FILMS 483 20.3.1 PHYSICAL VAPOR DEPOSITION 484 20.3.2
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION 495 REFERENCES 499 21 MARKETS
FOR PLASMA TECHNOLOGY (HANS CONRADS) 507 21.1 INTRODUCTION 507 21.2
EXISTING MARKETS 507 21.3 IMPACTS TO PUSH THE SPREAD OF PLASMA BASED
PRODUCTS AND PROCESSES 508 21.4 NEWMARKETS 510 21.5 FEATURES TO ENLARGE
THE POTENTIAL OF NEW MARKETS 512 REFERENCES 513 INDEX 515
|
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| format | Book |
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| genre | (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV012816741 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:34:11Z |
| institution | BVB |
| isbn | 3527288872 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008718124 |
| oclc_num | 45542526 |
| open_access_boolean | |
| owner | DE-20 DE-91G DE-BY-TUM DE-703 DE-526 DE-634 DE-11 |
| owner_facet | DE-20 DE-91G DE-BY-TUM DE-703 DE-526 DE-634 DE-11 |
| physical | 523 S. Ill., graph. Darst. |
| publishDate | 2001 |
| publishDateSearch | 2001 |
| publishDateSort | 2001 |
| publisher | Wiley-VCH |
| record_format | marc |
| spelling | Low temperature plasma physics fundamental aspects and applications Rainer Hippler ... (eds.) 1. ed. Berlin [u.a.] Wiley-VCH 2001 523 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier 2. Aufl. u.d.T.: Low temperature plasmas Plasma (Gaz ionisés) Plasmas froids Low temperature plasmas Plasma (Ionized gases) Plasma (DE-588)4046249-3 gnd rswk-swf Kaltes Plasma (DE-588)4248658-0 gnd rswk-swf Niedrigtemperatur (DE-588)4417434-2 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Plasma (DE-588)4046249-3 s Niedrigtemperatur (DE-588)4417434-2 s DE-604 Kaltes Plasma (DE-588)4248658-0 s Hippler, Rainer 1948- Sonstige (DE-588)110007093 oth GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008718124&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Low temperature plasma physics fundamental aspects and applications Plasma (Gaz ionisés) Plasmas froids Low temperature plasmas Plasma (Ionized gases) Plasma (DE-588)4046249-3 gnd Kaltes Plasma (DE-588)4248658-0 gnd Niedrigtemperatur (DE-588)4417434-2 gnd |
| subject_GND | (DE-588)4046249-3 (DE-588)4248658-0 (DE-588)4417434-2 (DE-588)4143413-4 |
| title | Low temperature plasma physics fundamental aspects and applications |
| title_auth | Low temperature plasma physics fundamental aspects and applications |
| title_exact_search | Low temperature plasma physics fundamental aspects and applications |
| title_full | Low temperature plasma physics fundamental aspects and applications Rainer Hippler ... (eds.) |
| title_fullStr | Low temperature plasma physics fundamental aspects and applications Rainer Hippler ... (eds.) |
| title_full_unstemmed | Low temperature plasma physics fundamental aspects and applications Rainer Hippler ... (eds.) |
| title_short | Low temperature plasma physics |
| title_sort | low temperature plasma physics fundamental aspects and applications |
| title_sub | fundamental aspects and applications |
| topic | Plasma (Gaz ionisés) Plasmas froids Low temperature plasmas Plasma (Ionized gases) Plasma (DE-588)4046249-3 gnd Kaltes Plasma (DE-588)4248658-0 gnd Niedrigtemperatur (DE-588)4417434-2 gnd |
| topic_facet | Plasma (Gaz ionisés) Plasmas froids Low temperature plasmas Plasma (Ionized gases) Plasma Kaltes Plasma Niedrigtemperatur Aufsatzsammlung |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008718124&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT hipplerrainer lowtemperatureplasmaphysicsfundamentalaspectsandapplications |