Lithography process control:
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE Optical Engineering Press
1999
|
| Schriftenreihe: | Tutorial texts in optical engineering
28 |
| Schlagworte: | |
| Zusammenfassung: | This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines. |
| Beschreibung: | X, 190 S. Ill., graph. Darst. |
| ISBN: | 0819430528 |
Internformat
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| 100 | 1 | |a Levinson, Harry J. |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Lithography process control |c Harry J. Levinson |
| 264 | 1 | |a Bellingham, Wash. |b SPIE Optical Engineering Press |c 1999 | |
| 300 | |a X, 190 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Tutorial texts in optical engineering |v 28 | |
| 520 | 3 | |a This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines. | |
| 650 | 7 | |a Commande de processus |2 ram | |
| 650 | 7 | |a Microlithographie |2 ram | |
| 650 | 7 | |a Semiconducteurs - Qualité - Contrôle |2 ram | |
| 650 | 4 | |a Microlithography |x Quality control | |
| 650 | 4 | |a Semiconductors |x Etching | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Statistische Prozesslenkung |0 (DE-588)4249675-5 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | 1 | |a Statistische Prozesslenkung |0 (DE-588)4249675-5 |D s |
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| 830 | 0 | |a Tutorial texts in optical engineering |v 28 |w (DE-604)BV005345161 |9 28 | |
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Datensatz im Suchindex
| _version_ | 1804127453202874368 |
|---|---|
| any_adam_object | |
| author | Levinson, Harry J. |
| author_facet | Levinson, Harry J. |
| author_role | aut |
| author_sort | Levinson, Harry J. |
| author_variant | h j l hj hjl |
| building | Verbundindex |
| bvnumber | BV012781832 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)39875237 (DE-599)BVBBV012781832 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV012781832 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:33:35Z |
| institution | BVB |
| isbn | 0819430528 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008693242 |
| oclc_num | 39875237 |
| open_access_boolean | |
| owner | DE-703 DE-20 DE-522 |
| owner_facet | DE-703 DE-20 DE-522 |
| physical | X, 190 S. Ill., graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | SPIE Optical Engineering Press |
| record_format | marc |
| series | Tutorial texts in optical engineering |
| series2 | Tutorial texts in optical engineering |
| spelling | Levinson, Harry J. Verfasser aut Lithography process control Harry J. Levinson Bellingham, Wash. SPIE Optical Engineering Press 1999 X, 190 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Tutorial texts in optical engineering 28 This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines. Commande de processus ram Microlithographie ram Semiconducteurs - Qualité - Contrôle ram Microlithography Quality control Semiconductors Etching Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Statistische Prozesslenkung (DE-588)4249675-5 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s Statistische Prozesslenkung (DE-588)4249675-5 s DE-604 Tutorial texts in optical engineering 28 (DE-604)BV005345161 28 |
| spellingShingle | Levinson, Harry J. Lithography process control Tutorial texts in optical engineering Commande de processus ram Microlithographie ram Semiconducteurs - Qualité - Contrôle ram Microlithography Quality control Semiconductors Etching Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd |
| subject_GND | (DE-588)4191584-7 (DE-588)4249675-5 |
| title | Lithography process control |
| title_auth | Lithography process control |
| title_exact_search | Lithography process control |
| title_full | Lithography process control Harry J. Levinson |
| title_fullStr | Lithography process control Harry J. Levinson |
| title_full_unstemmed | Lithography process control Harry J. Levinson |
| title_short | Lithography process control |
| title_sort | lithography process control |
| topic | Commande de processus ram Microlithographie ram Semiconducteurs - Qualité - Contrôle ram Microlithography Quality control Semiconductors Etching Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd Statistische Prozesslenkung (DE-588)4249675-5 gnd |
| topic_facet | Commande de processus Microlithographie Semiconducteurs - Qualité - Contrôle Microlithography Quality control Semiconductors Etching Lithografie Halbleitertechnologie Statistische Prozesslenkung |
| volume_link | (DE-604)BV005345161 |
| work_keys_str_mv | AT levinsonharryj lithographyprocesscontrol |