Microlithography fundamentals in semiconductor devices and fabrication technology:
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Dekker
1998
|
| Schlagworte: | |
| Beschreibung: | V, 327 S. Ill., graph. Darst. |
| ISBN: | 0824799518 |
Internformat
MARC
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| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
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| 050 | 0 | |a TK7871.85 | |
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| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 100 | 1 | |a Nonogaki, Saburo |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Microlithography fundamentals in semiconductor devices and fabrication technology |c Saburo Nonogaki ; Takumi Ueno ; Toshio Ito |
| 264 | 1 | |a New York [u.a.] |b Dekker |c 1998 | |
| 300 | |a V, 327 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 650 | 4 | |a Manufacturing processes | |
| 650 | 4 | |a Microlithography |x Industrial applications | |
| 650 | 4 | |a Photoresists | |
| 650 | 4 | |a Semiconductors |x Design and construction | |
| 650 | 0 | 7 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Lithografie |g Halbleitertechnologie |0 (DE-588)4191584-7 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Ueno, Takumi |e Verfasser |4 aut | |
| 700 | 1 | |a Itō, Toshio |e Verfasser |4 aut | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-008573421 | ||
Datensatz im Suchindex
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|---|---|
| any_adam_object | |
| author | Nonogaki, Saburo Ueno, Takumi Itō, Toshio |
| author_facet | Nonogaki, Saburo Ueno, Takumi Itō, Toshio |
| author_role | aut aut aut |
| author_sort | Nonogaki, Saburo |
| author_variant | s n sn t u tu t i ti |
| building | Verbundindex |
| bvnumber | BV012621717 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)38948131 (DE-599)BVBBV012621717 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV012621717 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:30:46Z |
| institution | BVB |
| isbn | 0824799518 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008573421 |
| oclc_num | 38948131 |
| open_access_boolean | |
| owner | DE-703 DE-20 |
| owner_facet | DE-703 DE-20 |
| physical | V, 327 S. Ill., graph. Darst. |
| publishDate | 1998 |
| publishDateSearch | 1998 |
| publishDateSort | 1998 |
| publisher | Dekker |
| record_format | marc |
| spelling | Nonogaki, Saburo Verfasser aut Microlithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki ; Takumi Ueno ; Toshio Ito New York [u.a.] Dekker 1998 V, 327 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Manufacturing processes Microlithography Industrial applications Photoresists Semiconductors Design and construction Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 s DE-604 Ueno, Takumi Verfasser aut Itō, Toshio Verfasser aut |
| spellingShingle | Nonogaki, Saburo Ueno, Takumi Itō, Toshio Microlithography fundamentals in semiconductor devices and fabrication technology Manufacturing processes Microlithography Industrial applications Photoresists Semiconductors Design and construction Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| subject_GND | (DE-588)4191584-7 |
| title | Microlithography fundamentals in semiconductor devices and fabrication technology |
| title_auth | Microlithography fundamentals in semiconductor devices and fabrication technology |
| title_exact_search | Microlithography fundamentals in semiconductor devices and fabrication technology |
| title_full | Microlithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki ; Takumi Ueno ; Toshio Ito |
| title_fullStr | Microlithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki ; Takumi Ueno ; Toshio Ito |
| title_full_unstemmed | Microlithography fundamentals in semiconductor devices and fabrication technology Saburo Nonogaki ; Takumi Ueno ; Toshio Ito |
| title_short | Microlithography fundamentals in semiconductor devices and fabrication technology |
| title_sort | microlithography fundamentals in semiconductor devices and fabrication technology |
| topic | Manufacturing processes Microlithography Industrial applications Photoresists Semiconductors Design and construction Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd |
| topic_facet | Manufacturing processes Microlithography Industrial applications Photoresists Semiconductors Design and construction Lithografie Halbleitertechnologie |
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