Extreme ultraviolet lithography: from the topical meeting May 1 - 3, 1996 Boston, Mass.
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Washington, DC
1996
|
| Schriftenreihe: | Optical Society of America: OSA trends in optics and photonics
4 |
| Schlagworte: | |
| Beschreibung: | IX, 235 S. graph. Darst. |
| ISBN: | 1557524351 |
Internformat
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV012168502 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 980924s1996 d||| |||| 10||| eng d | ||
| 020 | |a 1557524351 |9 1-55752-435-1 | ||
| 035 | |a (OCoLC)36176256 | ||
| 035 | |a (DE-599)BVBBV012168502 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-29T |a DE-703 |a DE-83 | ||
| 050 | 0 | |a TS517.2 | |
| 082 | 0 | |a 621.3815/31 |2 21 | |
| 084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
| 245 | 1 | 0 | |a Extreme ultraviolet lithography |b from the topical meeting May 1 - 3, 1996 Boston, Mass. |c ed. by Glenn D. Kubiak ... |
| 264 | 1 | |a Washington, DC |c 1996 | |
| 300 | |a IX, 235 S. |b graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Optical Society of America: OSA trends in optics and photonics |v 4 | |
| 650 | 4 | |a Interferometry |v Congresses | |
| 650 | 4 | |a Lasers |x Industrial applications |v Congresses | |
| 650 | 4 | |a Optical coatings |v Congresses | |
| 650 | 4 | |a Photolithography |v Congresses | |
| 650 | 4 | |a Ultraviolet radiation |x Industrial applications |v Congresses | |
| 650 | 0 | 7 | |a Extremes Ultraviolett |0 (DE-588)4264163-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotolithografie |0 (DE-588)4274823-9 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1996 |z Boston Mass. |2 gnd-content | |
| 689 | 0 | 0 | |a Fotolithografie |0 (DE-588)4274823-9 |D s |
| 689 | 0 | 1 | |a Extremes Ultraviolett |0 (DE-588)4264163-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Kubiak, Glenn D. |e Sonstige |4 oth | |
| 830 | 0 | |a Optical Society of America: OSA trends in optics and photonics |v 4 |w (DE-604)BV012166388 |9 4 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-008243615 | ||
Datensatz im Suchindex
| _version_ | 1804126780991209472 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV012168502 |
| callnumber-first | T - Technology |
| callnumber-label | TS517 |
| callnumber-raw | TS517.2 |
| callnumber-search | TS517.2 |
| callnumber-sort | TS 3517.2 |
| callnumber-subject | TS - Manufactures |
| classification_rvk | ZN 4170 |
| ctrlnum | (OCoLC)36176256 (DE-599)BVBBV012168502 |
| dewey-full | 621.3815/31 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/31 |
| dewey-search | 621.3815/31 |
| dewey-sort | 3621.3815 231 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01694nam a2200445 cb4500</leader><controlfield tag="001">BV012168502</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">980924s1996 d||| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1557524351</subfield><subfield code="9">1-55752-435-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)36176256</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV012168502</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-83</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TS517.2</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield><subfield code="2">21</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Extreme ultraviolet lithography</subfield><subfield code="b">from the topical meeting May 1 - 3, 1996 Boston, Mass.</subfield><subfield code="c">ed. by Glenn D. Kubiak ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, DC</subfield><subfield code="c">1996</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IX, 235 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Optical Society of America: OSA trends in optics and photonics</subfield><subfield code="v">4</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Interferometry</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lasers</subfield><subfield code="x">Industrial applications</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Optical coatings</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photolithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ultraviolet radiation</subfield><subfield code="x">Industrial applications</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Extremes Ultraviolett</subfield><subfield code="0">(DE-588)4264163-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1996</subfield><subfield code="z">Boston Mass.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="0">(DE-588)4274823-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Extremes Ultraviolett</subfield><subfield code="0">(DE-588)4264163-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Kubiak, Glenn D.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Optical Society of America: OSA trends in optics and photonics</subfield><subfield code="v">4</subfield><subfield code="w">(DE-604)BV012166388</subfield><subfield code="9">4</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008243615</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1996 Boston Mass. gnd-content |
| genre_facet | Konferenzschrift 1996 Boston Mass. |
| id | DE-604.BV012168502 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:22:54Z |
| institution | BVB |
| isbn | 1557524351 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008243615 |
| oclc_num | 36176256 |
| open_access_boolean | |
| owner | DE-29T DE-703 DE-83 |
| owner_facet | DE-29T DE-703 DE-83 |
| physical | IX, 235 S. graph. Darst. |
| publishDate | 1996 |
| publishDateSearch | 1996 |
| publishDateSort | 1996 |
| record_format | marc |
| series | Optical Society of America: OSA trends in optics and photonics |
| series2 | Optical Society of America: OSA trends in optics and photonics |
| spelling | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. ed. by Glenn D. Kubiak ... Washington, DC 1996 IX, 235 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Optical Society of America: OSA trends in optics and photonics 4 Interferometry Congresses Lasers Industrial applications Congresses Optical coatings Congresses Photolithography Congresses Ultraviolet radiation Industrial applications Congresses Extremes Ultraviolett (DE-588)4264163-9 gnd rswk-swf Fotolithografie (DE-588)4274823-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1996 Boston Mass. gnd-content Fotolithografie (DE-588)4274823-9 s Extremes Ultraviolett (DE-588)4264163-9 s DE-604 Kubiak, Glenn D. Sonstige oth Optical Society of America: OSA trends in optics and photonics 4 (DE-604)BV012166388 4 |
| spellingShingle | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. Optical Society of America: OSA trends in optics and photonics Interferometry Congresses Lasers Industrial applications Congresses Optical coatings Congresses Photolithography Congresses Ultraviolet radiation Industrial applications Congresses Extremes Ultraviolett (DE-588)4264163-9 gnd Fotolithografie (DE-588)4274823-9 gnd |
| subject_GND | (DE-588)4264163-9 (DE-588)4274823-9 (DE-588)1071861417 |
| title | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. |
| title_auth | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. |
| title_exact_search | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. |
| title_full | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. ed. by Glenn D. Kubiak ... |
| title_fullStr | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. ed. by Glenn D. Kubiak ... |
| title_full_unstemmed | Extreme ultraviolet lithography from the topical meeting May 1 - 3, 1996 Boston, Mass. ed. by Glenn D. Kubiak ... |
| title_short | Extreme ultraviolet lithography |
| title_sort | extreme ultraviolet lithography from the topical meeting may 1 3 1996 boston mass |
| title_sub | from the topical meeting May 1 - 3, 1996 Boston, Mass. |
| topic | Interferometry Congresses Lasers Industrial applications Congresses Optical coatings Congresses Photolithography Congresses Ultraviolet radiation Industrial applications Congresses Extremes Ultraviolett (DE-588)4264163-9 gnd Fotolithografie (DE-588)4274823-9 gnd |
| topic_facet | Interferometry Congresses Lasers Industrial applications Congresses Optical coatings Congresses Photolithography Congresses Ultraviolet radiation Industrial applications Congresses Extremes Ultraviolett Fotolithografie Konferenzschrift 1996 Boston Mass. |
| volume_link | (DE-604)BV012166388 |
| work_keys_str_mv | AT kubiakglennd extremeultravioletlithographyfromthetopicalmeetingmay131996bostonmass |