Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing:
Gespeichert in:
Körperschaft: | |
---|---|
Format: | Tagungsbericht Buch |
Sprache: | English |
Veröffentlicht: |
Pennington, NJ
Electrochemical Soc.
1996
|
Schriftenreihe: | Electrochemical Society: Proceedings
1995,20 |
Schlagworte: | |
Beschreibung: | XII, 626 S. Ill., graph. Darst. |
ISBN: | 1566771153 |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV012135214 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | t | ||
008 | 980902s1996 ad|| |||| 10||| eng d | ||
020 | |a 1566771153 |9 1-56677-115-3 | ||
035 | |a (OCoLC)35114783 | ||
035 | |a (DE-599)BVBBV012135214 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-703 | ||
050 | 0 | |a TK7871.85 | |
082 | 0 | |a 621.3815/2 |2 20 | |
084 | |a UP 7570 |0 (DE-625)146436: |2 rvk | ||
084 | |a ZN 4800 |0 (DE-625)157408: |2 rvk | ||
111 | 2 | |a International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |n 4 |d 1995 |c Chicago, Ill. |j Verfasser |0 (DE-588)1800601-2 |4 aut | |
245 | 1 | 0 | |a Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |c ed. Richard E. Novak ... |
246 | 1 | 3 | |a Cleaning technology in semiconductor device manufacturing |
264 | 1 | |a Pennington, NJ |b Electrochemical Soc. |c 1996 | |
300 | |a XII, 626 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Electrochemical Society: Proceedings |v 1995,20 | |
650 | 7 | |a Plaquettes à gravure en semiconducteurs - Nettoyage |2 ram | |
650 | 7 | |a Semiconducteurs - Nettoyage |2 ram | |
650 | 4 | |a Semiconductor wafers |x Cleaning |v Congresses | |
650 | 0 | 7 | |a Halbleiterbauelement |0 (DE-588)4113826-0 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Reinigung |0 (DE-588)4049250-3 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1995 |z Chicago Ill. |2 gnd-content | |
689 | 0 | 0 | |a Halbleiterbauelement |0 (DE-588)4113826-0 |D s |
689 | 0 | 1 | |a Reinigung |0 (DE-588)4049250-3 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Novak, Richard E. |e Sonstige |4 oth | |
830 | 0 | |a Electrochemical Society: Proceedings |v 1995,20 |w (DE-604)BV001900941 |9 1995,20 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-008219001 |
Datensatz im Suchindex
_version_ | 1804126744010031104 |
---|---|
any_adam_object | |
author_corporate | International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Chicago, Ill |
author_corporate_role | aut |
author_facet | International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Chicago, Ill |
author_sort | International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Chicago, Ill |
building | Verbundindex |
bvnumber | BV012135214 |
callnumber-first | T - Technology |
callnumber-label | TK7871 |
callnumber-raw | TK7871.85 |
callnumber-search | TK7871.85 |
callnumber-sort | TK 47871.85 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | UP 7570 ZN 4800 |
ctrlnum | (OCoLC)35114783 (DE-599)BVBBV012135214 |
dewey-full | 621.3815/2 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/2 |
dewey-search | 621.3815/2 |
dewey-sort | 3621.3815 12 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Conference Proceeding Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01877nam a2200457 cb4500</leader><controlfield tag="001">BV012135214</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">980902s1996 ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1566771153</subfield><subfield code="9">1-56677-115-3</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)35114783</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV012135214</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7871.85</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7570</subfield><subfield code="0">(DE-625)146436:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4800</subfield><subfield code="0">(DE-625)157408:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="111" ind1="2" ind2=" "><subfield code="a">International Symposium on Cleaning Technology in Semiconductor Device Manufacturing</subfield><subfield code="n">4</subfield><subfield code="d">1995</subfield><subfield code="c">Chicago, Ill.</subfield><subfield code="j">Verfasser</subfield><subfield code="0">(DE-588)1800601-2</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing</subfield><subfield code="c">ed. Richard E. Novak ...</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Cleaning technology in semiconductor device manufacturing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Pennington, NJ</subfield><subfield code="b">Electrochemical Soc.</subfield><subfield code="c">1996</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XII, 626 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Electrochemical Society: Proceedings</subfield><subfield code="v">1995,20</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Plaquettes à gravure en semiconducteurs - Nettoyage</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Semiconducteurs - Nettoyage</subfield><subfield code="2">ram</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductor wafers</subfield><subfield code="x">Cleaning</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleiterbauelement</subfield><subfield code="0">(DE-588)4113826-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Reinigung</subfield><subfield code="0">(DE-588)4049250-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1995</subfield><subfield code="z">Chicago Ill.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Halbleiterbauelement</subfield><subfield code="0">(DE-588)4113826-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Reinigung</subfield><subfield code="0">(DE-588)4049250-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Novak, Richard E.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Electrochemical Society: Proceedings</subfield><subfield code="v">1995,20</subfield><subfield code="w">(DE-604)BV001900941</subfield><subfield code="9">1995,20</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008219001</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1995 Chicago Ill. gnd-content |
genre_facet | Konferenzschrift 1995 Chicago Ill. |
id | DE-604.BV012135214 |
illustrated | Illustrated |
indexdate | 2024-07-09T18:22:19Z |
institution | BVB |
institution_GND | (DE-588)1800601-2 |
isbn | 1566771153 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008219001 |
oclc_num | 35114783 |
open_access_boolean | |
owner | DE-703 |
owner_facet | DE-703 |
physical | XII, 626 S. Ill., graph. Darst. |
publishDate | 1996 |
publishDateSearch | 1996 |
publishDateSort | 1996 |
publisher | Electrochemical Soc. |
record_format | marc |
series | Electrochemical Society: Proceedings |
series2 | Electrochemical Society: Proceedings |
spelling | International Symposium on Cleaning Technology in Semiconductor Device Manufacturing 4 1995 Chicago, Ill. Verfasser (DE-588)1800601-2 aut Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. Richard E. Novak ... Cleaning technology in semiconductor device manufacturing Pennington, NJ Electrochemical Soc. 1996 XII, 626 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Electrochemical Society: Proceedings 1995,20 Plaquettes à gravure en semiconducteurs - Nettoyage ram Semiconducteurs - Nettoyage ram Semiconductor wafers Cleaning Congresses Halbleiterbauelement (DE-588)4113826-0 gnd rswk-swf Reinigung (DE-588)4049250-3 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1995 Chicago Ill. gnd-content Halbleiterbauelement (DE-588)4113826-0 s Reinigung (DE-588)4049250-3 s DE-604 Novak, Richard E. Sonstige oth Electrochemical Society: Proceedings 1995,20 (DE-604)BV001900941 1995,20 |
spellingShingle | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing Electrochemical Society: Proceedings Plaquettes à gravure en semiconducteurs - Nettoyage ram Semiconducteurs - Nettoyage ram Semiconductor wafers Cleaning Congresses Halbleiterbauelement (DE-588)4113826-0 gnd Reinigung (DE-588)4049250-3 gnd |
subject_GND | (DE-588)4113826-0 (DE-588)4049250-3 (DE-588)1071861417 |
title | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
title_alt | Cleaning technology in semiconductor device manufacturing |
title_auth | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
title_exact_search | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
title_full | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. Richard E. Novak ... |
title_fullStr | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. Richard E. Novak ... |
title_full_unstemmed | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ed. Richard E. Novak ... |
title_short | Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing |
title_sort | proceedings of the fourth international symposium on cleaning technology in semiconductor device manufacturing |
topic | Plaquettes à gravure en semiconducteurs - Nettoyage ram Semiconducteurs - Nettoyage ram Semiconductor wafers Cleaning Congresses Halbleiterbauelement (DE-588)4113826-0 gnd Reinigung (DE-588)4049250-3 gnd |
topic_facet | Plaquettes à gravure en semiconducteurs - Nettoyage Semiconducteurs - Nettoyage Semiconductor wafers Cleaning Congresses Halbleiterbauelement Reinigung Konferenzschrift 1995 Chicago Ill. |
volume_link | (DE-604)BV001900941 |
work_keys_str_mv | AT internationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturingchicagoill proceedingsofthefourthinternationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturing AT novakricharde proceedingsofthefourthinternationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturing AT internationalsymposiumoncleaningtechnologyinsemiconductordevicemanufacturingchicagoill cleaningtechnologyinsemiconductordevicemanufacturing AT novakricharde cleaningtechnologyinsemiconductordevicemanufacturing |