Ultraclean surface processing of silicon wafers: secrets of VLSI manufacturing
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | German English |
| Veröffentlicht: |
Berlin [u.a.]
Springer
1998
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | Aus dem Japan. übers. |
| Beschreibung: | XXVIII, 616 S. Ill., graph. Darst. |
| ISBN: | 3540616721 |
Internformat
MARC
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Datensatz im Suchindex
| _version_ | 1804126335430295552 |
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| building | Verbundindex |
| bvnumber | BV011791214 |
| callnumber-first | T - Technology |
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| ctrlnum | (OCoLC)38494601 (DE-599)BVBBV011791214 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
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| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV011791214 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:15:49Z |
| institution | BVB |
| isbn | 3540616721 |
| language | German English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007960075 |
| oclc_num | 38494601 |
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| owner | DE-29T DE-703 DE-898 DE-BY-UBR DE-634 |
| owner_facet | DE-29T DE-703 DE-898 DE-BY-UBR DE-634 |
| physical | XXVIII, 616 S. Ill., graph. Darst. |
| publishDate | 1998 |
| publishDateSearch | 1998 |
| publishDateSort | 1998 |
| publisher | Springer |
| record_format | marc |
| spelling | Silicon wafer hyomen no clean-ka gijutsu Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing Takeshi Hattori (ed.) Berlin [u.a.] Springer 1998 XXVIII, 616 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Aus dem Japan. übers. Physique Semiconducteur Silicon Surface Surfaces (physique) ram Semiconductor wafers Cleaning Silicon Surfaces Surface preparation SOI-Technik (DE-588)4128029-5 gnd rswk-swf Oberflächenbehandlung (DE-588)4042908-8 gnd rswk-swf Oberfläche (DE-588)4042907-6 gnd rswk-swf Oberflächenreinigung (DE-588)4204243-4 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf Halbleiter (DE-588)4022993-2 gnd rswk-swf VLSI (DE-588)4117388-0 gnd rswk-swf Wafer (DE-588)4294605-0 gnd rswk-swf Silicone (DE-588)4127342-4 gnd rswk-swf Fertigung (DE-588)4016899-2 gnd rswk-swf Reinigung (DE-588)4049250-3 gnd rswk-swf Silicium (DE-588)4077445-4 s Wafer (DE-588)4294605-0 s Oberflächenbehandlung (DE-588)4042908-8 s DE-604 Reinigung (DE-588)4049250-3 s VLSI (DE-588)4117388-0 s SOI-Technik (DE-588)4128029-5 s Oberflächenreinigung (DE-588)4204243-4 s Fertigung (DE-588)4016899-2 s 1\p DE-604 Silicone (DE-588)4127342-4 s 2\p DE-604 Halbleiter (DE-588)4022993-2 s 3\p DE-604 Oberfläche (DE-588)4042907-6 s 4\p DE-604 Hattori, Takeshi Sonstige oth DNB Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007960075&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing Physique Semiconducteur Silicon Surface Surfaces (physique) ram Semiconductor wafers Cleaning Silicon Surfaces Surface preparation SOI-Technik (DE-588)4128029-5 gnd Oberflächenbehandlung (DE-588)4042908-8 gnd Oberfläche (DE-588)4042907-6 gnd Oberflächenreinigung (DE-588)4204243-4 gnd Silicium (DE-588)4077445-4 gnd Halbleiter (DE-588)4022993-2 gnd VLSI (DE-588)4117388-0 gnd Wafer (DE-588)4294605-0 gnd Silicone (DE-588)4127342-4 gnd Fertigung (DE-588)4016899-2 gnd Reinigung (DE-588)4049250-3 gnd |
| subject_GND | (DE-588)4128029-5 (DE-588)4042908-8 (DE-588)4042907-6 (DE-588)4204243-4 (DE-588)4077445-4 (DE-588)4022993-2 (DE-588)4117388-0 (DE-588)4294605-0 (DE-588)4127342-4 (DE-588)4016899-2 (DE-588)4049250-3 |
| title | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing |
| title_alt | Silicon wafer hyomen no clean-ka gijutsu |
| title_auth | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing |
| title_exact_search | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing |
| title_full | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing Takeshi Hattori (ed.) |
| title_fullStr | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing Takeshi Hattori (ed.) |
| title_full_unstemmed | Ultraclean surface processing of silicon wafers secrets of VLSI manufacturing Takeshi Hattori (ed.) |
| title_short | Ultraclean surface processing of silicon wafers |
| title_sort | ultraclean surface processing of silicon wafers secrets of vlsi manufacturing |
| title_sub | secrets of VLSI manufacturing |
| topic | Physique Semiconducteur Silicon Surface Surfaces (physique) ram Semiconductor wafers Cleaning Silicon Surfaces Surface preparation SOI-Technik (DE-588)4128029-5 gnd Oberflächenbehandlung (DE-588)4042908-8 gnd Oberfläche (DE-588)4042907-6 gnd Oberflächenreinigung (DE-588)4204243-4 gnd Silicium (DE-588)4077445-4 gnd Halbleiter (DE-588)4022993-2 gnd VLSI (DE-588)4117388-0 gnd Wafer (DE-588)4294605-0 gnd Silicone (DE-588)4127342-4 gnd Fertigung (DE-588)4016899-2 gnd Reinigung (DE-588)4049250-3 gnd |
| topic_facet | Physique Semiconducteur Silicon Surface Surfaces (physique) Semiconductor wafers Cleaning Silicon Surfaces Surface preparation SOI-Technik Oberflächenbehandlung Oberfläche Oberflächenreinigung Silicium Halbleiter VLSI Wafer Silicone Fertigung Reinigung |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007960075&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | UT siliconwaferhyomennocleankagijutsu AT hattoritakeshi ultracleansurfaceprocessingofsiliconwaferssecretsofvlsimanufacturing |