Diamond chemical vapor deposition: nucleation and early growth stages
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective of this book is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to pro...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, NJ
Noyes
1995
|
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Zusammenfassung: | This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective of this book is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists and engineers in the academic and industry communities with the latest developments in this growing field The scope of the present book encompasses the developments and applications of diamond CVD, starting with a brief description of atomic and crystal structures of diamond and a review of the various processing techniques used in diamond CVD. It is followed by an extensive discussion of fundamental phenomena, principles and processes involved in diamond CVD, with emphasis on the nucleation and early growth stages of diamond during CVD. Diamond nucleation mechanisms, epitaxy and oriented growth are discussed on the basis of experimental observations. The nucleation enhancement methods developed to date are summarized. The effects of surface conditions and deposition parameters on surface nucleation are described Finally, theoretical and modeling studies on surface nucleation are reviewed |
| Beschreibung: | XI, 195 S. Ill., graph. Darst. |
| ISBN: | 0815513801 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV011584779 | ||
| 003 | DE-604 | ||
| 005 | 20010319 | ||
| 007 | t | ||
| 008 | 971021s1995 ad|| |||| 00||| eng d | ||
| 020 | |a 0815513801 |9 0-8155-1380-1 | ||
| 035 | |a (OCoLC)32698652 | ||
| 035 | |a (DE-599)BVBBV011584779 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-384 |a DE-703 | ||
| 050 | 0 | |a TP873.5.D5 | |
| 082 | 0 | |a 666/.88 |2 20 | |
| 084 | |a UQ 8220 |0 (DE-625)146590: |2 rvk | ||
| 100 | 1 | |a Liu, Huimin |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Diamond chemical vapor deposition |b nucleation and early growth stages |c by Huimin Liu and David S. Dandy |
| 264 | 1 | |a Park Ridge, NJ |b Noyes |c 1995 | |
| 300 | |a XI, 195 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Materials science and process technology series | |
| 520 | 3 | |a This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective of this book is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists and engineers in the academic and industry communities with the latest developments in this growing field | |
| 520 | |a The scope of the present book encompasses the developments and applications of diamond CVD, starting with a brief description of atomic and crystal structures of diamond and a review of the various processing techniques used in diamond CVD. It is followed by an extensive discussion of fundamental phenomena, principles and processes involved in diamond CVD, with emphasis on the nucleation and early growth stages of diamond during CVD. Diamond nucleation mechanisms, epitaxy and oriented growth are discussed on the basis of experimental observations. The nucleation enhancement methods developed to date are summarized. The effects of surface conditions and deposition parameters on surface nucleation are described | ||
| 520 | |a Finally, theoretical and modeling studies on surface nucleation are reviewed | ||
| 650 | 4 | |a Chemical vapor deposition | |
| 650 | 4 | |a Diamonds, Artificial | |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Diamant |0 (DE-588)4012069-7 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Diamant |0 (DE-588)4012069-7 |D s |
| 689 | 0 | 1 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Dandy, David S. |e Verfasser |4 aut | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-007802242 | ||
Datensatz im Suchindex
| _version_ | 1804126112067878912 |
|---|---|
| any_adam_object | |
| author | Liu, Huimin Dandy, David S. |
| author_facet | Liu, Huimin Dandy, David S. |
| author_role | aut aut |
| author_sort | Liu, Huimin |
| author_variant | h l hl d s d ds dsd |
| building | Verbundindex |
| bvnumber | BV011584779 |
| callnumber-first | T - Technology |
| callnumber-label | TP873 |
| callnumber-raw | TP873.5.D5 |
| callnumber-search | TP873.5.D5 |
| callnumber-sort | TP 3873.5 D5 |
| callnumber-subject | TP - Chemical Technology |
| classification_rvk | UQ 8220 |
| ctrlnum | (OCoLC)32698652 (DE-599)BVBBV011584779 |
| dewey-full | 666/.88 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 666 - Ceramic & allied technologies |
| dewey-raw | 666/.88 |
| dewey-search | 666/.88 |
| dewey-sort | 3666 288 |
| dewey-tens | 660 - Chemical engineering |
| discipline | Chemie / Pharmazie Physik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02590nam a2200433 c 4500</leader><controlfield tag="001">BV011584779</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20010319 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">971021s1995 ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0815513801</subfield><subfield code="9">0-8155-1380-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)32698652</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV011584779</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-384</subfield><subfield code="a">DE-703</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TP873.5.D5</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">666/.88</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UQ 8220</subfield><subfield code="0">(DE-625)146590:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Liu, Huimin</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Diamond chemical vapor deposition</subfield><subfield code="b">nucleation and early growth stages</subfield><subfield code="c">by Huimin Liu and David S. Dandy</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Park Ridge, NJ</subfield><subfield code="b">Noyes</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 195 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">Materials science and process technology series</subfield></datafield><datafield tag="520" ind1="3" ind2=" "><subfield code="a">This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective of this book is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists and engineers in the academic and industry communities with the latest developments in this growing field</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">The scope of the present book encompasses the developments and applications of diamond CVD, starting with a brief description of atomic and crystal structures of diamond and a review of the various processing techniques used in diamond CVD. It is followed by an extensive discussion of fundamental phenomena, principles and processes involved in diamond CVD, with emphasis on the nucleation and early growth stages of diamond during CVD. Diamond nucleation mechanisms, epitaxy and oriented growth are discussed on the basis of experimental observations. The nucleation enhancement methods developed to date are summarized. The effects of surface conditions and deposition parameters on surface nucleation are described</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Finally, theoretical and modeling studies on surface nucleation are reviewed</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Chemical vapor deposition</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Diamonds, Artificial</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Diamant</subfield><subfield code="0">(DE-588)4012069-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Diamant</subfield><subfield code="0">(DE-588)4012069-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Dandy, David S.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-007802242</subfield></datafield></record></collection> |
| id | DE-604.BV011584779 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:12:16Z |
| institution | BVB |
| isbn | 0815513801 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007802242 |
| oclc_num | 32698652 |
| open_access_boolean | |
| owner | DE-384 DE-703 |
| owner_facet | DE-384 DE-703 |
| physical | XI, 195 S. Ill., graph. Darst. |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | Noyes |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Liu, Huimin Verfasser aut Diamond chemical vapor deposition nucleation and early growth stages by Huimin Liu and David S. Dandy Park Ridge, NJ Noyes 1995 XI, 195 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth stages of diamond CVD. The objective of this book is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experienced researchers, scientists and engineers in the academic and industry communities with the latest developments in this growing field The scope of the present book encompasses the developments and applications of diamond CVD, starting with a brief description of atomic and crystal structures of diamond and a review of the various processing techniques used in diamond CVD. It is followed by an extensive discussion of fundamental phenomena, principles and processes involved in diamond CVD, with emphasis on the nucleation and early growth stages of diamond during CVD. Diamond nucleation mechanisms, epitaxy and oriented growth are discussed on the basis of experimental observations. The nucleation enhancement methods developed to date are summarized. The effects of surface conditions and deposition parameters on surface nucleation are described Finally, theoretical and modeling studies on surface nucleation are reviewed Chemical vapor deposition Diamonds, Artificial CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Diamant (DE-588)4012069-7 gnd rswk-swf Diamant (DE-588)4012069-7 s CVD-Verfahren (DE-588)4009846-1 s DE-604 Dandy, David S. Verfasser aut |
| spellingShingle | Liu, Huimin Dandy, David S. Diamond chemical vapor deposition nucleation and early growth stages Chemical vapor deposition Diamonds, Artificial CVD-Verfahren (DE-588)4009846-1 gnd Diamant (DE-588)4012069-7 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4012069-7 |
| title | Diamond chemical vapor deposition nucleation and early growth stages |
| title_auth | Diamond chemical vapor deposition nucleation and early growth stages |
| title_exact_search | Diamond chemical vapor deposition nucleation and early growth stages |
| title_full | Diamond chemical vapor deposition nucleation and early growth stages by Huimin Liu and David S. Dandy |
| title_fullStr | Diamond chemical vapor deposition nucleation and early growth stages by Huimin Liu and David S. Dandy |
| title_full_unstemmed | Diamond chemical vapor deposition nucleation and early growth stages by Huimin Liu and David S. Dandy |
| title_short | Diamond chemical vapor deposition |
| title_sort | diamond chemical vapor deposition nucleation and early growth stages |
| title_sub | nucleation and early growth stages |
| topic | Chemical vapor deposition Diamonds, Artificial CVD-Verfahren (DE-588)4009846-1 gnd Diamant (DE-588)4012069-7 gnd |
| topic_facet | Chemical vapor deposition Diamonds, Artificial CVD-Verfahren Diamant |
| work_keys_str_mv | AT liuhuimin diamondchemicalvapordepositionnucleationandearlygrowthstages AT dandydavids diamondchemicalvapordepositionnucleationandearlygrowthstages |