Verfügbarkeit: In-situ patterning

In-situ patterning: selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.]

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Bibliographische Detailangaben
Format:	Buch
Sprache:	English
Veröffentlicht:	Pittsburgh Materials Research Soc. 1990
Schriftenreihe:	Materials Research Society: Materials Research Society symposia proceedings 158
Schlagworte:	Dotierung Halbleitertechnologie Laserstrahlätzen Plasmaätzen Ätzen Lasers > Industrial applications > Congresses Plasma etching > Congresses Semiconductor doping > Congresses Semiconductors > Etching > Congresses Konferenzschrift Kongress
Beschreibung:	XI, 496 S. zahlr. Ill. und graph. Darst.
ISBN:	1558990461

Internformat

MARC


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Datensatz im Suchindex

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discipline	Elektrotechnik / Elektronik / Nachrichtentechnik
format	Book
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id	DE-604.BV011341175
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indexdate	2024-07-09T18:08:06Z
institution	BVB
isbn	1558990461
language	English
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physical	XI, 496 S. zahlr. Ill. und graph. Darst.
publishDate	1990
publishDateSearch	1990
publishDateSort	1990
publisher	Materials Research Soc.
record_format	marc
series	Materials Research Society: Materials Research Society symposia proceedings
series2	Materials Research Society: Materials Research Society symposia proceedings
spelling	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.] eds.: Anthony F. Bernhardt ... Pittsburgh Materials Research Soc. 1990 XI, 496 S. zahlr. Ill. und graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials Research Society: Materials Research Society symposia proceedings 158 Dotierung swd Halbleitertechnologie swd Laserstrahlätzen swd Plasmaätzen swd Ätzen swd Lasers Industrial applications Congresses Plasma etching Congresses Semiconductor doping Congresses Semiconductors Etching Congresses Laserstrahlätzen (DE-588)4568583-6 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Ätzen (DE-588)4000648-7 gnd rswk-swf Plasmaätzen (DE-588)4174821-9 gnd rswk-swf Dotierung (DE-588)4130672-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift gnd-content Kongress swd Halbleitertechnologie (DE-588)4158814-9 s 1\p DE-604 Laserstrahlätzen (DE-588)4568583-6 s 2\p DE-604 Plasmaätzen (DE-588)4174821-9 s 3\p DE-604 Dotierung (DE-588)4130672-7 s 4\p DE-604 Ätzen (DE-588)4000648-7 s 5\p DE-604 Bernhardt, Anthony Sonstige oth Materials Research Society: Materials Research Society symposia proceedings 158 (DE-604)BV001899105 158 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 5\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.] Materials Research Society: Materials Research Society symposia proceedings Dotierung swd Halbleitertechnologie swd Laserstrahlätzen swd Plasmaätzen swd Ätzen swd Lasers Industrial applications Congresses Plasma etching Congresses Semiconductor doping Congresses Semiconductors Etching Congresses Laserstrahlätzen (DE-588)4568583-6 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Ätzen (DE-588)4000648-7 gnd Plasmaätzen (DE-588)4174821-9 gnd Dotierung (DE-588)4130672-7 gnd
subject_GND	(DE-588)4568583-6 (DE-588)4158814-9 (DE-588)4000648-7 (DE-588)4174821-9 (DE-588)4130672-7 (DE-588)1071861417
title	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.]
title_auth	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.]
title_exact_search	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.]
title_full	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.] eds.: Anthony F. Bernhardt ...
title_fullStr	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.] eds.: Anthony F. Bernhardt ...
title_full_unstemmed	In-situ patterning selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.] eds.: Anthony F. Bernhardt ...
title_short	In-situ patterning
title_sort	in situ patterning selective area deposition and etching symposium held november 29 december 1 1989 boston massachusetts u s a
title_sub	selective area deposition and etching ; [symposium held November 29 - December 1, 1989, Boston, Massachusetts, U.S.A.]
topic	Dotierung swd Halbleitertechnologie swd Laserstrahlätzen swd Plasmaätzen swd Ätzen swd Lasers Industrial applications Congresses Plasma etching Congresses Semiconductor doping Congresses Semiconductors Etching Congresses Laserstrahlätzen (DE-588)4568583-6 gnd Halbleitertechnologie (DE-588)4158814-9 gnd Ätzen (DE-588)4000648-7 gnd Plasmaätzen (DE-588)4174821-9 gnd Dotierung (DE-588)4130672-7 gnd
topic_facet	Dotierung Halbleitertechnologie Laserstrahlätzen Plasmaätzen Ätzen Lasers Industrial applications Congresses Plasma etching Congresses Semiconductor doping Congresses Semiconductors Etching Congresses Konferenzschrift Kongress
volume_link	(DE-604)BV001899105
work_keys_str_mv	AT bernhardtanthony insitupatterningselectiveareadepositionandetchingsymposiumheldnovember29december11989bostonmassachusettsusa

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