Manufacturing process control for microelectronic devices and circuits: 20 - 21 October 1994, Austin, Texas
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1994
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
2336 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | IX, 250 S. Ill., graph. Darst. |
| ISBN: | 081941669X |
Internformat
MARC
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| 245 | 1 | 0 | |a Manufacturing process control for microelectronic devices and circuits |b 20 - 21 October 1994, Austin, Texas |c Anant G. Sabnis, chair/ed. |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1994 | |
| 300 | |a IX, 250 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 2336 | |
| 650 | 4 | |a Integrated circuits |x Design and construction |v Congresses | |
| 650 | 4 | |a Integrated circuits |x Very large scale integration |x Design and construction |v Congresses | |
| 650 | 4 | |a Process control |v Congresses | |
| 650 | 0 | 7 | |a Elektroniktechnologie |0 (DE-588)4402723-0 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1994 |z Austin Tex. |2 gnd-content | |
| 689 | 0 | 0 | |a Elektroniktechnologie |0 (DE-588)4402723-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Sabnis, Anant G. |e Sonstige |4 oth | |
| 830 | 0 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 2336 |w (DE-604)BV000010887 |9 2336 | |
| 856 | 4 | 2 | |m Digitalisierung TU Muenchen |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007513604&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-007513604 | ||
Datensatz im Suchindex
| _version_ | 1804125699030646784 |
|---|---|
| adam_text | Contents
vii
Conference
Committee
¡χ
introduction
SESSION
1
ADVANCED MANUFACTURING PROCESS
2
Process controls for the factories of the future (Invited Paper)
[2336-01 ]
J. Agraz-Guerena, SEMATECH
5
Radio frequency diagnostics for plasma etch systems
[2336-02]
S. Bushman, T. F. Edgar, I,
Trachtenberg, Univ.
of Texas/Austin;
N.
Williams, SEMATECH
17
Photocluster control system implementation at the IBM Advanced Semiconductor Technology
Center
[2336-03]
K.
Ausschnitt,
В.
Barker, P. Hartswick, A. Thomas, IBM Advanced Semiconductor
Technology Ctr.
25
Advanced statistical process control of a chemical vapor tungsten deposition process on an
Applied Materials Centura reactor
[2336-04]
J.
A. Stefani,
S.
Poarch,
S.
Saxena, P. K. Mozumder, Texas Instruments Inc.
3 7
Scatterometric sensor for lithography
[2336-05]
C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, J. R. McNeil, Univ. of New Mexico
50
On-line SPC-based trigger for control action
[2336-06]
R, R. Rhinehart, Texas Tech Univ.
SESSION
2
COMPUTER-CONTROLLED MANUFACTURING
60
Vigorous capital and development investments required: playing in the semiconductor
manufacturing industry endgame (Invited Paper)
[2336-07]
S. Knight, AT&T Microelectronics
63
Knowledge-based very large scale integration (VLSI) process diagnostic system
[2336-09]
M. E.
Parten,
M.
Kittappa,
F. R.
Zapata, Texas Tech Univ.
70
Comparison of
controller
tuning methods for temperature uniformity control in a rapid thermal
processor
[2336-10]
K. S. Balakrtshnan, W. Cho,
T. F.
Edgar, Univ. of Texas/Austin
81
Radio frequency tags systems to initiate system processing
[2336-11]
H. O. Madsen, Applied Magnetics Corp.; D. W. Madsen, Auto-Soft Corp.
89
Model-based equipment diagnosis
[2336-12]
D.
].
Collins, A. j. Strojwas, Carnegie Mellon Univ.; P. K. Mozumder, Texas Instruments Inc.
101
Measurement of discharge impedance for dry etch process control
[2336-13]
F.
A. Bose,
ETH-Hoenggerberg {Switzerland); R. Patrick, LSI Logic Corp.; H. Bates,
ETH-Hoenggerberg (Switzerland)
SPl£ Vol.
2336
ІТ
1
1
1
Pulse-modulated infrared-laser
interferometrie
thermometry for Si substrate temperature
measurement
[2336-14]
j. Ktkuchi, R. Kurosaki, Fujitsu Manufacturing Technology
Div.
(Japan); S.
Fujimura,
Fujitsu
Process Development
Div.
(japan); H. Yano, Fujitsu Manufacturing Technology
Div. (japan)
SESSION
3
SENSOR-BASED ADVANCED MANUFACTURING CONTROLS
122
Process control using new approaches in plasma diagnostics
[2336-15]
S. Reeves,
С
Pullwood,
Advanced Micro Devices, Inc.;
T. R.
Turner, Fourth State
Technology Inc.
133
Use of chemical sensors and process control methods to improve HF chemical etching of
dielectric films in a manufacturing environment
[2336-16]
J. L. Dolcin, AT&T Microelectronics; V. E. Anyanwu,
В. С
Chung, C. W. Draper, R. Ellis, Jr.,
A. Karp,
AT&T Engineering Research Ctr.
141
Sensor bus control networks in semiconductor processing equipment
[2336-17]
R. S. Gyurcsik, W.
С
Lamb, North Carolina State Univ.;
J. R.
Moyne, Univ. of Michigan
145
Sensor bus cost of ownership investigation
[2336-18]
R. S. Gyurcsik, North Carolina State Univ.
149
MEMaterial: a new microelectronic material deposition tool
[2336-19]
F. Maseeh, IntelliSense Corp.
155
Thin film and surface layer processes forming control using electron emission
[2336-20]
Yu. Dekhtyar, A. Kunitzin, V. Noskov, Riga Technical Univ. (Latvia)
SESSION
4
ADVANCED MANUFACTURING CONTROL ISSUES
162
169
176
190
202
208
Using cost-of-ownership (COO) modeling to optimize productivity «id wafer output
of sputtering tools
[2336-22]
S.
Edelstein,
R.
Davenport, j. Nulman, Applied Materials, Inc.
Silkided versus nonsilicided gate technology for submkron CMOS ASIC applications
[2336-23]
E. Johnson, E.
Nowak,
C. Wang,
VLSI Technology Inc.
Implementation of activity-based costing
(AIO
to drive cost reduction efforts in a
semiconductor manufacturing operation
[2336-24]
H. Naguib,
I. Bol,
J.
Lora,
R. Chowdhry,
Xerox Microelectronics Ctr.
Integrated manufacturing approach to attain benchmark team performance
[2336-25]
S.-R. Chen, A. Nguyen, H. Naguib, Xerox Microelectronics Ctr.
Methods for parametric yield control
1er
future Q.I-pm deep submkron MOSFET
manufacturing
[2336-26]
R.
Sitte,
S. Dimitrijev, H.
Harrison, Griffith
Unřv.
(Australia)
CHARM-î:
a new
tooi
tor characterization of wafer charging
n
km- and plasma-based
1С
processing equipment
[2336-27]
W. Lukaszek, Wafer Charging Monitors; J.
Reedholm, Reedholm
Instrumente
Co.;
M.
I. Current,
Applied Materials, Inc.;
N.
Tripsas, Advanced Micro Devices, Inc.
iv
/SPIE Voi.
2336
217
True wafer temperature during metallization in physical vapor deposition cluster tools
[2336-31]
M. E.
Adel,
S.
Mangan,
CI Systems
Ltd. (Israel);
H.
Gruñes,
V.
Parkhe, Applied Materials, Inc.
227
Submodule
for the
laser
vacuum projection lithography
[2336-28]
E.
I.
Tochitsky,
A. V. Baranov,
V. V. Boksha, V. E. Obukhov, A. I. Sharendo,
PLASMOTEG
Engineering Ctr. (Belarus);
Y.
I. Tochitsky, State Scientific and Production Enterprise (Belarus);
V. A. Azarko, Institute of Physical-Organic Chemistry (Belarus);
V. Lopatko, Belorussian
Interbranch Enterprise (Belarus)
233
Characterization of deep-level defects and their connection with the performance of
Ir^Ga^s/InP p-t-n
photodiodes
[2336-30]
T. V. Torchinskaya,
V. I. Kooshnirenko,
L. V. Shcherbina,
Institute of Semiconductor Physics
(Ukraine);
C. J.
Miner, Bell-Northern Research Ltd. (Canada)
237
Intellectual information system of precedent search and expert diagnostics of technological
malfunctions in very large scale integration (VLSI) manufacturing
[2336-29]
P. A. Arutyunov, M. G. Kuznetsov, E. G. Yermakova, Moscow State Institute of Electronics and
Mathematics (Russia)
250
Author Index
SPIE
Vol.
2336 iv
|
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| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
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| genre | (DE-588)1071861417 Konferenzschrift 1994 Austin Tex. gnd-content |
| genre_facet | Konferenzschrift 1994 Austin Tex. |
| id | DE-604.BV011202585 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:05:42Z |
| institution | BVB |
| isbn | 081941669X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007513604 |
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| physical | IX, 250 S. Ill., graph. Darst. |
| publishDate | 1994 |
| publishDateSearch | 1994 |
| publishDateSort | 1994 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas Anant G. Sabnis, chair/ed. Bellingham, Wash. SPIE 1994 IX, 250 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 2336 Integrated circuits Design and construction Congresses Integrated circuits Very large scale integration Design and construction Congresses Process control Congresses Elektroniktechnologie (DE-588)4402723-0 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1994 Austin Tex. gnd-content Elektroniktechnologie (DE-588)4402723-0 s DE-604 Sabnis, Anant G. Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 2336 (DE-604)BV000010887 2336 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007513604&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Integrated circuits Design and construction Congresses Integrated circuits Very large scale integration Design and construction Congresses Process control Congresses Elektroniktechnologie (DE-588)4402723-0 gnd |
| subject_GND | (DE-588)4402723-0 (DE-588)1071861417 |
| title | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas |
| title_auth | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas |
| title_exact_search | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas |
| title_full | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas Anant G. Sabnis, chair/ed. |
| title_fullStr | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas Anant G. Sabnis, chair/ed. |
| title_full_unstemmed | Manufacturing process control for microelectronic devices and circuits 20 - 21 October 1994, Austin, Texas Anant G. Sabnis, chair/ed. |
| title_short | Manufacturing process control for microelectronic devices and circuits |
| title_sort | manufacturing process control for microelectronic devices and circuits 20 21 october 1994 austin texas |
| title_sub | 20 - 21 October 1994, Austin, Texas |
| topic | Integrated circuits Design and construction Congresses Integrated circuits Very large scale integration Design and construction Congresses Process control Congresses Elektroniktechnologie (DE-588)4402723-0 gnd |
| topic_facet | Integrated circuits Design and construction Congresses Integrated circuits Very large scale integration Design and construction Congresses Process control Congresses Elektroniktechnologie Konferenzschrift 1994 Austin Tex. |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007513604&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| volume_link | (DE-604)BV000010887 |
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