Photochemical vapor deposition:
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
New York [u.a.]
Wiley
1992
|
| Schriftenreihe: | Chemical analysis
122 |
| Schlagworte: | |
| Beschreibung: | XI, 193 S. Ill., graph. Darst. |
| ISBN: | 0471550833 |
Internformat
MARC
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| 100 | 1 | |a Eden, J. Gary |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Photochemical vapor deposition |c J. G. Eden |
| 264 | 1 | |a New York [u.a.] |b Wiley |c 1992 | |
| 300 | |a XI, 193 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Chemical analysis |v 122 | |
| 650 | 4 | |a Photochemistry | |
| 650 | 4 | |a Thin films | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Fotochemische Reaktion |0 (DE-588)4138378-3 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 0 | 1 | |a Fotochemische Reaktion |0 (DE-588)4138378-3 |D s |
| 689 | 0 | |5 DE-604 | |
| 830 | 0 | |a Chemical analysis |v 122 |w (DE-604)BV000008780 |9 122 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-007509081 | ||
Datensatz im Suchindex
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|---|---|
| any_adam_object | |
| author | Eden, J. Gary |
| author_facet | Eden, J. Gary |
| author_role | aut |
| author_sort | Eden, J. Gary |
| author_variant | j g e jg jge |
| building | Verbundindex |
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| callnumber-first | T - Technology |
| callnumber-label | TS695 |
| callnumber-raw | TS695 |
| callnumber-search | TS695 |
| callnumber-sort | TS 3695 |
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| dewey-raw | 671.7/35 |
| dewey-search | 671.7/35 |
| dewey-sort | 3671.7 235 |
| dewey-tens | 670 - Manufacturing |
| discipline | Chemie / Pharmazie Physik Werkstoffwissenschaften / Fertigungstechnik |
| format | Book |
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| id | DE-604.BV011195192 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:05:36Z |
| institution | BVB |
| isbn | 0471550833 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007509081 |
| oclc_num | 26258908 |
| open_access_boolean | |
| owner | DE-384 DE-83 |
| owner_facet | DE-384 DE-83 |
| physical | XI, 193 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | Wiley |
| record_format | marc |
| series | Chemical analysis |
| series2 | Chemical analysis |
| spelling | Eden, J. Gary Verfasser aut Photochemical vapor deposition J. G. Eden New York [u.a.] Wiley 1992 XI, 193 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Chemical analysis 122 Photochemistry Thin films Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Fotochemische Reaktion (DE-588)4138378-3 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 s Fotochemische Reaktion (DE-588)4138378-3 s DE-604 Chemical analysis 122 (DE-604)BV000008780 122 |
| spellingShingle | Eden, J. Gary Photochemical vapor deposition Chemical analysis Photochemistry Thin films Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd Fotochemische Reaktion (DE-588)4138378-3 gnd |
| subject_GND | (DE-588)4009846-1 (DE-588)4138378-3 |
| title | Photochemical vapor deposition |
| title_auth | Photochemical vapor deposition |
| title_exact_search | Photochemical vapor deposition |
| title_full | Photochemical vapor deposition J. G. Eden |
| title_fullStr | Photochemical vapor deposition J. G. Eden |
| title_full_unstemmed | Photochemical vapor deposition J. G. Eden |
| title_short | Photochemical vapor deposition |
| title_sort | photochemical vapor deposition |
| topic | Photochemistry Thin films Vapor-plating CVD-Verfahren (DE-588)4009846-1 gnd Fotochemische Reaktion (DE-588)4138378-3 gnd |
| topic_facet | Photochemistry Thin films Vapor-plating CVD-Verfahren Fotochemische Reaktion |
| volume_link | (DE-604)BV000008780 |
| work_keys_str_mv | AT edenjgary photochemicalvapordeposition |