Metal organic chemical vapor deposition of electronic ceramics II: symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A.
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Pittsburgh, Pa.
MRS
1996
|
Schriftenreihe: | Materials Research Society: Materials Research Society symposia proceedings
415 |
Schlagworte: | |
Online-Zugang: | Inhaltsverzeichnis |
Beschreibung: | XI, 264 S. Ill., graph. Darst. |
ISBN: | 1558993185 |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV011180729 | ||
003 | DE-604 | ||
005 | 19970404 | ||
007 | t | ||
008 | 970203s1996 ad|| |||| 10||| eng d | ||
020 | |a 1558993185 |9 1-55899-318-5 | ||
035 | |a (OCoLC)34190248 | ||
035 | |a (DE-599)BVBBV011180729 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-91G |a DE-703 | ||
050 | 0 | |a TK7871.15.C4 | |
082 | 0 | |a 621.3815/2 |2 20 | |
084 | |a UQ 8500 |0 (DE-625)146599: |2 rvk | ||
084 | |a ELT 075f |2 stub | ||
084 | |a ELT 280f |2 stub | ||
245 | 1 | 0 | |a Metal organic chemical vapor deposition of electronic ceramics II |b symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. |c eds.: Seshu B. Desu ... |
264 | 1 | |a Pittsburgh, Pa. |b MRS |c 1996 | |
300 | |a XI, 264 S. |b Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a Materials Research Society: Materials Research Society symposia proceedings |v 415 | |
650 | 4 | |a Electronic ceramics |v Congresses | |
650 | 4 | |a Metal organic chemical vapor deposition |v Congresses | |
650 | 4 | |a Thin films |v Congresses | |
650 | 0 | 7 | |a Elektrokeramik |0 (DE-588)4151820-2 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1995 |z Boston Mass. |2 gnd-content | |
689 | 0 | 0 | |a Elektrokeramik |0 (DE-588)4151820-2 |D s |
689 | 0 | 1 | |a MOCVD-Verfahren |0 (DE-588)4314628-4 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Desu, Seshu B. |e Sonstige |4 oth | |
830 | 0 | |a Materials Research Society: Materials Research Society symposia proceedings |v 415 |w (DE-604)BV001899105 |9 415 | |
856 | 4 | 2 | |m Digitalisierung TU Muenchen |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007497778&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
999 | |a oai:aleph.bib-bvb.de:BVB01-007497778 |
Datensatz im Suchindex
_version_ | 1804125676164349952 |
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adam_text | CONTENTS
Preface
...................................................................ix
Acknowledgmenls.........................................................xi
Materials Research
Society Symposium Proceedings
......................xii
PART I: NON-OXIDE CERAMICS
Growth via MOCVD and Characterization of GaN and
AlxGai-xWOOOl) Alloys for Optoelectric and Microelectronic
Device Applications
.......................................................3
Robert
Г.
Davis, T.W. Weeks, Jr., M.D.
Bremser,
K.S. Ailey, and
W.O.
Perry
MOCVD of SrS and SrSrCe Thin Films for Electroluminescent
Flat Panel Displays
........................................................15
John A. Samuels, David C. Smith, Kerry
N.
Siebein, Kenny Salazar,
Richard T. Tuenge, Christian F. Schaus, Christopher
П.
King,
H. Le,
J.
Hitt, R.L. Thuemler, andJ.F.
Wäger
MOCVD
of the Blue Electro-luminescent Phosphor CaGa2S4:Ce
from a Liquid Reagent Delivery System
....................................21
T.S. Moss, R.C. Dye, D.C. Smith. J.A. Samuels, M.J. DelaRosa, and
CF.
Schaus
The Properties of GalnAsSb/GaSb Heterostructure Grown by
MOCVD and p-GalnAsSb/n-GaSb
Photodiodes
...........................31
Baoiin Zhang, Yixin Jin, Tianming Zhou, Hong Jiang,
Yongqiang
Hing,
and Shuwei Li
MOCVD Growth of Gaxlni.xAsi.ySby and Gaxlni-xSb Alloys:
Effect of Parameters on their Solid Compositions
.........................37
Baoiin Zhang, Tianminng Zhou, Hong Jiang, Yongqiang
Гііпд,
Shuwei Li, and Yixin Jin
Silicon Nitride Tools Coated with TiC or TiN Composite
Diamond Structures
......................................................45
W.D. Fan, K. Jagannadham, andJ.
Пагауап
Characterization of Amorphous Carbon Films Based on
Carbon, Nitrogen, and Hydrogen
..........................................51
H. Efstathiadis, Z.
Akkerman,
and
F. W.
Smith
Improvement of PECVD-SiNx for TFT Gate Insulator by
Controlling Ion Bombardment Energy
......................................57
Yasuhiko
Kasama,
Tadahiro
Ohmi,
Kolch Fukuda, Hirobumi Fukui,
Chisato lwasaki, and Shoich
Ono
*lnvited Paper
PART II: PRECURSOR CHEMISTRY AND DELIVERY
MOCVD Routes to Thin Films for Superconducting Applications.
Precursor Synthesis and Film Processing Issues
.............................67
T.J. Marks, J.A. Belot. B.J. Hinds, J. Chen, D. Studebaker, J. Lei,
R.P.H. Chang, J.L.
Schindler,
and C.R.
Kannewurf
From Proposal to Product: Scaling up the Chemical Synthesis
of MOCVD Oxide Precursors
..............................................79
T.J. Leedham
Group
13-16
Precursors: What Controls their Volatility?
....................87
Edward Q. Gillan, Simon
Q. Bott,
and Andrew K. Barron
Development of novel Nickel
(ß-Diketonate)2-Ligand
Complexes
as Precursors for MOCVD of Nickel and Nickel Oxide
......................93
Caret I.M.A. Spee, Hans L. Linden,
Adri
Mackor,
¡Vaas Timmer, and
Harry
A.
Meinema
Barium bis (ß-Diketonate)*tetraglyme
Complexes as
Potential
CVD
Precursors for
Electronic Materials...................................99
Henry A. Luten
III,
David J. Otway, and William S.
Rees,
Jr.
An
Investigation into the Role of Incorporated Solvent
(ЕЮН/Н2О)
Molecules on the Structure of Group
2
Metal
bis (ß-Diketonate)
Complexes: Ramifications for CVD
Precursors of Electronic Materials
....................................... 105
David J. Otway, Henry A. Luten,
K.M.
Abdul Malik.
Michael B. Hursthouse, and William S.
Rees,
Jr.
Erbium TnsCamide) Compounds as Source Molecules for Rare
Earth Doping of Semiconducting Materials
...............................
Ill
Oliver Just. Anton
С
Qreenwald, and William S.
Rees,
Jr.
Zinc B/s(amide) Compounds Evaluated as Designed Precursors
for Site-Selective P-type Doping of ZnSe
.................................117
David A. Oaul, Oliver Just, and William S.
Rees,
Jr.
Liquid Delivery MOCVD of Ferroelectric PZT
............................. 123
J.F. Roeder,
B.A.
Vaartstra,
P.C.
Van Buskirk, and H.R. Beratan
Reproducible Growth of Highly Oriented
(001)
YSZ Films of
Amorphous S1O2 Substrates by MOCVD
................................. 129
O. Doubinina and Q.T.
Stauf
Invited Paper
vi
PART III: PROCESS ANALYSIS AND CHARACTERIZATION
Thermodynamic Analysis, A Useful Tool for MOCVD
......................137
C. Bernard, A. Pisch, F. Weiss, and H. Madar
MOCVD HTSC Precursor Delivery Monitored by
UV Spectroscopy
....................................................... 149
Brian J. Rappoli and William J.
Desisto
APCVD: In Situ Growing and Investigation of Electrochromic
WO3 Films
.............................................................. 155
K.A. Gesheva, O. Stoyanov, and D. Qogova
A Study on the Thermal Decomposition of Ba(tmhd>2
and Sr(tmhd>2
.......................................................... 161
Hyun-Kyu Ryu, Jae Hyun
tian,
and Sang
Heup
Moon
Advanced Interactive Personal Computer-Based Process
Control Systems for Oxide MOCVD Systems
..............................167
O.S.
Tompa,
D.
Shen,
С.
Zhang, I.H. Murzin, B.
Gallois, S.
Liang,
C.R. Qorla, and Y. Chen
PART IV: OXIDE CERAMICS
ВаТіОз
Thin Films for Electro-optic and Non-linear
Optical Applications
....................................................175
B.A. Block and
B.W.
Wessels
Preparation and Characterization of SrTiO3 Thin Films
Using ECR Plasma Assisted MOCVD
..................................... 183
Joon
Sung Lee, Han Wook Song, Dae Sung Yoon, Byung Hyuk
Jun.
Byoung Oon Yu, Zhong Tao Jiang, Won Jong Lee, and Kwangsoo Ho
The
Microstructure
and Properties of Layered Oxide Thin Films
Fabricated by MOVCVD
................................................ 189
Tingkai Li, Yongfei Zhu, Seshu B.
Desu,
and Masaya Tiagata
Preparation and Properties of Ferroelectric Bi2SrTa2O9 Thin Films
for FeRAM Using Flash-MOCVD
.......................................... 195
T. Ami, K. Hironaka, C.
¡sobe,
П.
ГіадеІ,
Λί.
Sugiyama,
Υ.
Ikeda,
К
Wałanabe,
Α.
Machida,
Κ.
Miura,
and
Λί.
Тапака
The Microstructure
of
SrBi2Ta2O9
Films
................................... 201
CD. Qutleben,
Y.
Ikeda.
С.
¡sobe,
Α.
Machida,
Τ.
Ami.
К
Hironaka, and
E. Monta
High
Temperature
X-ray Diffraction Study of PbTiO3 Thin Films
Grown on MgO(OOl) by MOCVD
..........................................207
R.S. Batzer, Biming Yen, Donhang Liu,
H. Kubo, Q.R.
Bai,
and Haydn Chen
Invited Paper
vu
The Preparation and Characterization of Lithium Cobalt Oxide
Thin Films by LPCVD
.....................................................213
L.T. Kenny. R.C.
Breitkopf, Т.Е.
Haas, and R.B. Qoldner
Dielectric Behavior of CVD (Ba, Sr)TiO3 Thin Films on Pt/Si
................219
S.K. Streiffer, C.
Baseert,
Λ.Ι.
Kingon,
S. Lipa,
S. Bilodeau,
R.
Carl, and
P.C.
Van
Bushirk
MOCVD of Very Thin Films of Lead Lanthanum Titanate
...................225
David B. Beach and Catherine
E. Vallet
MOCVD of SnO2 on Silicon Microhotplate Arrays for Use in
Gas Sensing Applications
............................................___231
F. Dimeo, Jr., S. Semancik, R.E. Cavicchi, J.S. Suehle,
P.
Chaparais,
and
П.Н.
Tea
Study of
Microstructure
and Gas Sensing Properties of Tin
Oxide Thin Films Prepared by Metal Organic Chemical
Vapor Deposition
........................................................237
Sang Woo Lee, Donhang Liu, Ping P. Tsai, and Haydn Chen
Room Temperature Deposition of High Dielectric Constant,
High Density Ceramic Thin Films
..........................................243
K. Chen. M. nielsen, S. Soss, S. Liu, E.J. Rymaszewski, and T.-M.
Lu
PART V: LATE PAPERS ACCEPTED
Chemical Vapor Deposition of Oxides from
Alkoxides ...................249
R.
Хи
Liquid Source MOCVD of High Quality YBa2Cu3O7.x Films on
Polycrystalline and Amorphous Substrates
...............................255
D.B. Studebaker, O. Doubinina, J. Zhang, Y.Y. Wang,
V.P. Dravid. and T.J. Marks
Author Index
............................................................261
Subject Index
...........................................................263
Invited Paper
viii
|
any_adam_object | 1 |
building | Verbundindex |
bvnumber | BV011180729 |
callnumber-first | T - Technology |
callnumber-label | TK7871 |
callnumber-raw | TK7871.15.C4 |
callnumber-search | TK7871.15.C4 |
callnumber-sort | TK 47871.15 C4 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_rvk | UQ 8500 |
classification_tum | ELT 075f ELT 280f |
ctrlnum | (OCoLC)34190248 (DE-599)BVBBV011180729 |
dewey-full | 621.3815/2 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/2 |
dewey-search | 621.3815/2 |
dewey-sort | 3621.3815 12 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01967nam a2200457 cb4500</leader><controlfield tag="001">BV011180729</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19970404 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">970203s1996 ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">1558993185</subfield><subfield code="9">1-55899-318-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)34190248</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV011180729</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91G</subfield><subfield code="a">DE-703</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7871.15.C4</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UQ 8500</subfield><subfield code="0">(DE-625)146599:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 075f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 280f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Metal organic chemical vapor deposition of electronic ceramics II</subfield><subfield code="b">symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A.</subfield><subfield code="c">eds.: Seshu B. Desu ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Pittsburgh, Pa.</subfield><subfield code="b">MRS</subfield><subfield code="c">1996</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 264 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Materials Research Society: Materials Research Society symposia proceedings</subfield><subfield code="v">415</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Electronic ceramics</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Metal organic chemical vapor deposition</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Thin films</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektrokeramik</subfield><subfield code="0">(DE-588)4151820-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">MOCVD-Verfahren</subfield><subfield code="0">(DE-588)4314628-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1995</subfield><subfield code="z">Boston Mass.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Elektrokeramik</subfield><subfield code="0">(DE-588)4151820-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">MOCVD-Verfahren</subfield><subfield code="0">(DE-588)4314628-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Desu, Seshu B.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Materials Research Society: Materials Research Society symposia proceedings</subfield><subfield code="v">415</subfield><subfield code="w">(DE-604)BV001899105</subfield><subfield code="9">415</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">Digitalisierung TU Muenchen</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007497778&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-007497778</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1995 Boston Mass. gnd-content |
genre_facet | Konferenzschrift 1995 Boston Mass. |
id | DE-604.BV011180729 |
illustrated | Illustrated |
indexdate | 2024-07-09T18:05:20Z |
institution | BVB |
isbn | 1558993185 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007497778 |
oclc_num | 34190248 |
open_access_boolean | |
owner | DE-91G DE-BY-TUM DE-703 |
owner_facet | DE-91G DE-BY-TUM DE-703 |
physical | XI, 264 S. Ill., graph. Darst. |
publishDate | 1996 |
publishDateSearch | 1996 |
publishDateSort | 1996 |
publisher | MRS |
record_format | marc |
series | Materials Research Society: Materials Research Society symposia proceedings |
series2 | Materials Research Society: Materials Research Society symposia proceedings |
spelling | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. eds.: Seshu B. Desu ... Pittsburgh, Pa. MRS 1996 XI, 264 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials Research Society: Materials Research Society symposia proceedings 415 Electronic ceramics Congresses Metal organic chemical vapor deposition Congresses Thin films Congresses Elektrokeramik (DE-588)4151820-2 gnd rswk-swf MOCVD-Verfahren (DE-588)4314628-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1995 Boston Mass. gnd-content Elektrokeramik (DE-588)4151820-2 s MOCVD-Verfahren (DE-588)4314628-4 s DE-604 Desu, Seshu B. Sonstige oth Materials Research Society: Materials Research Society symposia proceedings 415 (DE-604)BV001899105 415 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007497778&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
spellingShingle | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. Materials Research Society: Materials Research Society symposia proceedings Electronic ceramics Congresses Metal organic chemical vapor deposition Congresses Thin films Congresses Elektrokeramik (DE-588)4151820-2 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd |
subject_GND | (DE-588)4151820-2 (DE-588)4314628-4 (DE-588)1071861417 |
title | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. |
title_auth | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. |
title_exact_search | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. |
title_full | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. eds.: Seshu B. Desu ... |
title_fullStr | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. eds.: Seshu B. Desu ... |
title_full_unstemmed | Metal organic chemical vapor deposition of electronic ceramics II symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. eds.: Seshu B. Desu ... |
title_short | Metal organic chemical vapor deposition of electronic ceramics II |
title_sort | metal organic chemical vapor deposition of electronic ceramics ii symposium held november 27 29 1995 boston massachusetts u s a |
title_sub | symposium held November 27 - 29, 1995, Boston, Massachusetts, U.S.A. |
topic | Electronic ceramics Congresses Metal organic chemical vapor deposition Congresses Thin films Congresses Elektrokeramik (DE-588)4151820-2 gnd MOCVD-Verfahren (DE-588)4314628-4 gnd |
topic_facet | Electronic ceramics Congresses Metal organic chemical vapor deposition Congresses Thin films Congresses Elektrokeramik MOCVD-Verfahren Konferenzschrift 1995 Boston Mass. |
url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=007497778&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
volume_link | (DE-604)BV001899105 |
work_keys_str_mv | AT desuseshub metalorganicchemicalvapordepositionofelectronicceramicsiisymposiumheldnovember27291995bostonmassachusettsusa |