Jiang, W. (1996). Laser induced chemical etching of silicon at wavelength of 248 nm in chlorine atmosphere.
Chicago Style (17th ed.) CitationJiang, Weidong. Laser Induced Chemical Etching of Silicon at Wavelength of 248 Nm in Chlorine Atmosphere. 1996.
MLA (9th ed.) CitationJiang, Weidong. Laser Induced Chemical Etching of Silicon at Wavelength of 248 Nm in Chlorine Atmosphere. 1996.
Warning: These citations may not always be 100% accurate.