Plasma deposition of amorphous silicon based materials:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Boston [u.a.]
Acad. Press
1995
|
| Schriftenreihe: | Plasma materials interactions
|
| Schlagworte: | |
| Beschreibung: | XI, 324 S. Ill., graph. Darst. |
| ISBN: | 012137940X |
Internformat
MARC
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| 245 | 1 | 0 | |a Plasma deposition of amorphous silicon based materials |c ed. by Giovanni Bruno ... |
| 264 | 1 | |a Boston [u.a.] |b Acad. Press |c 1995 | |
| 300 | |a XI, 324 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Plasma materials interactions | |
| 650 | 4 | |a Amorphous semiconductors |x Design and construction | |
| 650 | 4 | |a Plasma-enhanced chemical vapor deposition | |
| 650 | 4 | |a Silicon alloys | |
| 650 | 0 | 7 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4143413-4 |a Aufsatzsammlung |2 gnd-content | |
| 689 | 0 | 0 | |a Amorpher Halbleiter |0 (DE-588)4001756-4 |D s |
| 689 | 0 | 1 | |a Siliciumverbindungen |0 (DE-588)4124194-0 |D s |
| 689 | 0 | 2 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Bruno, Giovanni |e Sonstige |4 oth | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-007174015 | ||
Datensatz im Suchindex
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| callnumber-subject | TK - Electrical and Nuclear Engineering |
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| dewey-full | 621.3815/2 |
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| dewey-search | 621.3815/2 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)4143413-4 Aufsatzsammlung gnd-content |
| genre_facet | Aufsatzsammlung |
| id | DE-604.BV010743157 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:58:08Z |
| institution | BVB |
| isbn | 012137940X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007174015 |
| oclc_num | 32311752 |
| open_access_boolean | |
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| owner_facet | DE-703 DE-384 DE-91 DE-BY-TUM |
| physical | XI, 324 S. Ill., graph. Darst. |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | Acad. Press |
| record_format | marc |
| series2 | Plasma materials interactions |
| spelling | Plasma deposition of amorphous silicon based materials ed. by Giovanni Bruno ... Boston [u.a.] Acad. Press 1995 XI, 324 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Plasma materials interactions Amorphous semiconductors Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Siliciumverbindungen (DE-588)4124194-0 gnd rswk-swf PECVD-Verfahren (DE-588)4267316-1 gnd rswk-swf Amorpher Halbleiter (DE-588)4001756-4 gnd rswk-swf (DE-588)4143413-4 Aufsatzsammlung gnd-content Amorpher Halbleiter (DE-588)4001756-4 s Siliciumverbindungen (DE-588)4124194-0 s PECVD-Verfahren (DE-588)4267316-1 s DE-604 Bruno, Giovanni Sonstige oth |
| spellingShingle | Plasma deposition of amorphous silicon based materials Amorphous semiconductors Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Siliciumverbindungen (DE-588)4124194-0 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Amorpher Halbleiter (DE-588)4001756-4 gnd |
| subject_GND | (DE-588)4124194-0 (DE-588)4267316-1 (DE-588)4001756-4 (DE-588)4143413-4 |
| title | Plasma deposition of amorphous silicon based materials |
| title_auth | Plasma deposition of amorphous silicon based materials |
| title_exact_search | Plasma deposition of amorphous silicon based materials |
| title_full | Plasma deposition of amorphous silicon based materials ed. by Giovanni Bruno ... |
| title_fullStr | Plasma deposition of amorphous silicon based materials ed. by Giovanni Bruno ... |
| title_full_unstemmed | Plasma deposition of amorphous silicon based materials ed. by Giovanni Bruno ... |
| title_short | Plasma deposition of amorphous silicon based materials |
| title_sort | plasma deposition of amorphous silicon based materials |
| topic | Amorphous semiconductors Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Siliciumverbindungen (DE-588)4124194-0 gnd PECVD-Verfahren (DE-588)4267316-1 gnd Amorpher Halbleiter (DE-588)4001756-4 gnd |
| topic_facet | Amorphous semiconductors Design and construction Plasma-enhanced chemical vapor deposition Silicon alloys Siliciumverbindungen PECVD-Verfahren Amorpher Halbleiter Aufsatzsammlung |
| work_keys_str_mv | AT brunogiovanni plasmadepositionofamorphoussiliconbasedmaterials |