Verfügbarkeit: Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V

Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V: 11 - 12 March 1986, Santa Clara, Calif.

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Bibliographische Detailangaben
Format:	Buch
Sprache:	English
Veröffentlicht:	Bellingham, Wash. SPIE, The Internat. Soc. for Opt. Engineering 1986
Schriftenreihe:	Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 632
Schlagworte:	Ion beam lithography > Congresses Lithography, Electron beam > Congresses X-ray lithography > Congresses Fotolithografie > Halbleitertechnologie Elektronenstrahl Ätzen Elektrochemie Röntgenstrahlung Lithografie > Halbleitertechnologie Konferenzschrift > 1986 > Santa Clara Calif.
Beschreibung:	VI, 272 S.: Ill., graph. Darst.
ISBN:	0892525061 089252667X

Internformat

MARC


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genre	(DE-588)1071861417 Konferenzschrift 1986 Santa Clara Calif. gnd-content
genre_facet	Konferenzschrift 1986 Santa Clara Calif.
id	DE-604.BV010738770
illustrated	Not Illustrated
indexdate	2024-07-09T17:58:03Z
institution	BVB
isbn	0892525061 089252667X
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-007170247
oclc_num	13981354
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owner	DE-91 DE-BY-TUM
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physical	VI, 272 S.: Ill., graph. Darst.
publishDate	1986
publishDateSearch	1986
publishDateSort	1986
publisher	SPIE, The Internat. Soc. for Opt. Engineering
record_format	marc
series	Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
series2	Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
spelling	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif. Phillip D. Blais chairman, ed. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies V Bellingham, Wash. SPIE, The Internat. Soc. for Opt. Engineering 1986 VI, 272 S.: Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 632 Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf Elektronenstrahl (DE-588)4151894-9 gnd rswk-swf Ätzen (DE-588)4000648-7 gnd rswk-swf Elektrochemie (DE-588)4014241-3 gnd rswk-swf Röntgenstrahlung (DE-588)4129728-3 gnd rswk-swf Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1986 Santa Clara Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Elektronenstrahl (DE-588)4151894-9 s 1\p DE-604 Elektrochemie (DE-588)4014241-3 s 2\p DE-604 Röntgenstrahlung (DE-588)4129728-3 s 3\p DE-604 Ätzen (DE-588)4000648-7 s 4\p DE-604 Lithografie Halbleitertechnologie (DE-588)4191584-7 s 5\p DE-604 Blais, Phillip D. Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 632 (DE-604)BV000010887 632 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 2\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 3\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 4\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk 5\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk
spellingShingle	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif. Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Elektronenstrahl (DE-588)4151894-9 gnd Ätzen (DE-588)4000648-7 gnd Elektrochemie (DE-588)4014241-3 gnd Röntgenstrahlung (DE-588)4129728-3 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
subject_GND	(DE-588)4174516-4 (DE-588)4151894-9 (DE-588)4000648-7 (DE-588)4014241-3 (DE-588)4129728-3 (DE-588)4191584-7 (DE-588)1071861417
title	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif.
title_alt	Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies V
title_auth	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif.
title_exact_search	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif.
title_full	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif. Phillip D. Blais chairman, ed.
title_fullStr	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif. Phillip D. Blais chairman, ed.
title_full_unstemmed	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V 11 - 12 March 1986, Santa Clara, Calif. Phillip D. Blais chairman, ed.
title_short	Electron beam, X-ray, and ion beam techniques for submicrometer lithographies V
title_sort	electron beam x ray and ion beam techniques for submicrometer lithographies v 11 12 march 1986 santa clara calif
title_sub	11 - 12 March 1986, Santa Clara, Calif.
topic	Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd Elektronenstrahl (DE-588)4151894-9 gnd Ätzen (DE-588)4000648-7 gnd Elektrochemie (DE-588)4014241-3 gnd Röntgenstrahlung (DE-588)4129728-3 gnd Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
topic_facet	Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie Elektronenstrahl Ätzen Elektrochemie Röntgenstrahlung Lithografie Halbleitertechnologie Konferenzschrift 1986 Santa Clara Calif.
volume_link	(DE-604)BV000010887
work_keys_str_mv	AT blaisphillipd electronbeamxrayandionbeamtechniquesforsubmicrometerlithographiesv1112march1986santaclaracalif AT blaisphillipd electronbeamxrayandionbeamtechniquesforsubmicrometerlithographiesv

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