(1984). Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III: March 15 - 16, 1984, Santa Clara, Calif. SPIE, The Internat. Soc. for Opt. Engineering.
Chicago Style (17th ed.) CitationElectron Beam, X-ray, and Ion Beam Techniques for Submicrometer Lithographies III: March 15 - 16, 1984, Santa Clara, Calif. Bellingham, Wash: SPIE, The Internat. Soc. for Opt. Engineering, 1984.
MLA (9th ed.) CitationElectron Beam, X-ray, and Ion Beam Techniques for Submicrometer Lithographies III: March 15 - 16, 1984, Santa Clara, Calif. SPIE, The Internat. Soc. for Opt. Engineering, 1984.
Warning: These citations may not always be 100% accurate.