Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III: March 15 - 16, 1984, Santa Clara, Calif.
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE, The Internat. Soc. for Opt. Engineering
1984
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
471 |
| Schlagworte: | |
| Beschreibung: | VI, 136 S.: Ill., graph. Darst. |
| ISBN: | 0892525061 089252667X |
Internformat
MARC
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| 245 | 1 | 0 | |a Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III |b March 15 - 16, 1984, Santa Clara, Calif. |c Alfred Wagner, ed. |
| 246 | 1 | 3 | |a Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III |
| 264 | 1 | |a Bellingham, Wash. |b SPIE, The Internat. Soc. for Opt. Engineering |c 1984 | |
| 300 | |a VI, 136 S.: Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 471 | |
| 650 | 4 | |a Ion beam lithography |v Congresses | |
| 650 | 4 | |a Lithography, Electron beam |v Congresses | |
| 650 | 4 | |a X-ray lithography |v Congresses | |
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| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1986 |z Santa Clara Calif. |2 gnd-content | |
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Datensatz im Suchindex
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| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1986 Santa Clara Calif. gnd-content |
| genre_facet | Konferenzschrift 1986 Santa Clara Calif. |
| id | DE-604.BV010738737 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T17:58:03Z |
| institution | BVB |
| isbn | 0892525061 089252667X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007170219 |
| oclc_num | 10939699 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | VI, 136 S.: Ill., graph. Darst. |
| publishDate | 1984 |
| publishDateSearch | 1984 |
| publishDateSort | 1984 |
| publisher | SPIE, The Internat. Soc. for Opt. Engineering |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. Alfred Wagner, ed. Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III Bellingham, Wash. SPIE, The Internat. Soc. for Opt. Engineering 1984 VI, 136 S.: Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 471 Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1986 Santa Clara Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Wagner, Alfred Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 471 (DE-604)BV000010887 471 |
| spellingShingle | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
| title | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. |
| title_alt | Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III |
| title_auth | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. |
| title_exact_search | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. |
| title_full | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. Alfred Wagner, ed. |
| title_fullStr | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. Alfred Wagner, ed. |
| title_full_unstemmed | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III March 15 - 16, 1984, Santa Clara, Calif. Alfred Wagner, ed. |
| title_short | Electron beam, X-ray, and ion beam techniques for submicrometer lithographies III |
| title_sort | electron beam x ray and ion beam techniques for submicrometer lithographies iii march 15 16 1984 santa clara calif |
| title_sub | March 15 - 16, 1984, Santa Clara, Calif. |
| topic | Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
| topic_facet | Ion beam lithography Congresses Lithography, Electron beam Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie Konferenzschrift 1986 Santa Clara Calif. |
| volume_link | (DE-604)BV000010887 |
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