(1987). Electron beam, X-ray, and ion beam lithographies VI: 5 - 6 March 1987 Santa Clara, Calif. SPIE, The Internat. Soc. for Optical Engineering.
Chicago Style (17th ed.) CitationElectron Beam, X-ray, and Ion Beam Lithographies VI: 5 - 6 March 1987 Santa Clara, Calif. Bellingham, Wash: SPIE, The Internat. Soc. for Optical Engineering, 1987.
MLA (9th ed.) CitationElectron Beam, X-ray, and Ion Beam Lithographies VI: 5 - 6 March 1987 Santa Clara, Calif. SPIE, The Internat. Soc. for Optical Engineering, 1987.
Warning: These citations may not always be 100% accurate.