Electron beam, X-ray, and ion beam lithographies VI: 5 - 6 March 1987 Santa Clara, Calif.
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Bellingham, Wash.
SPIE, The Internat. Soc. for Optical Engineering
1987
|
Schriftenreihe: | International Society for Optical Engineering: Proceedings of SPIE
773 |
Schlagworte: | |
Beschreibung: | VI, 265 S.: Ill., graph. Darst. |
ISBN: | 0892528087 |
Internformat
MARC
LEADER | 00000nam a2200000 cb4500 | ||
---|---|---|---|
001 | BV010738696 | ||
003 | DE-604 | ||
005 | 19960503 | ||
007 | t | ||
008 | 960503s1987 |||| 10||| eng d | ||
020 | |a 0892528087 |9 0-89252-808-7 | ||
035 | |a (OCoLC)506773759 | ||
035 | |a (DE-599)BVBBV010738696 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-91 | ||
050 | 0 | |a TK7874 | |
084 | |a ELT 285f |2 stub | ||
245 | 1 | 0 | |a Electron beam, X-ray, and ion beam lithographies VI |b 5 - 6 March 1987 Santa Clara, Calif. |c Phillip D. Blais, chair/ed. |
246 | 1 | 3 | |a Electron-beam, X-ray, and ion-beam lithographies VI |
264 | 1 | |a Bellingham, Wash. |b SPIE, The Internat. Soc. for Optical Engineering |c 1987 | |
300 | |a VI, 265 S.: Ill., graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 1 | |a International Society for Optical Engineering: Proceedings of SPIE |v 773 | |
650 | 4 | |a Ion beam lithography |v Congresses | |
650 | 4 | |a Lithography, Electron beam |v Congresses | |
650 | 4 | |a Microlithography |v Congresses | |
650 | 4 | |a X-ray lithography |v Congresses | |
650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1987 |z Santa Clara Calif. |2 gnd-content | |
689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Blais, Phillip D. |e Sonstige |4 oth | |
830 | 0 | |a International Society for Optical Engineering: Proceedings of SPIE |v 773 |w (DE-604)BV000010887 |9 773 | |
999 | |a oai:aleph.bib-bvb.de:BVB01-007170184 |
Datensatz im Suchindex
_version_ | 1804125217129234432 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV010738696 |
callnumber-first | T - Technology |
callnumber-label | TK7874 |
callnumber-raw | TK7874 |
callnumber-search | TK7874 |
callnumber-sort | TK 47874 |
callnumber-subject | TK - Electrical and Nuclear Engineering |
classification_tum | ELT 285f |
ctrlnum | (OCoLC)506773759 (DE-599)BVBBV010738696 |
discipline | Elektrotechnik |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01623nam a2200409 cb4500</leader><controlfield tag="001">BV010738696</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19960503 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">960503s1987 |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0892528087</subfield><subfield code="9">0-89252-808-7</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)506773759</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV010738696</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Electron beam, X-ray, and ion beam lithographies VI</subfield><subfield code="b">5 - 6 March 1987 Santa Clara, Calif.</subfield><subfield code="c">Phillip D. Blais, chair/ed.</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Electron-beam, X-ray, and ion-beam lithographies VI</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Bellingham, Wash.</subfield><subfield code="b">SPIE, The Internat. Soc. for Optical Engineering</subfield><subfield code="c">1987</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VI, 265 S.: Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">International Society for Optical Engineering: Proceedings of SPIE</subfield><subfield code="v">773</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion beam lithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Lithography, Electron beam</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">X-ray lithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1987</subfield><subfield code="z">Santa Clara Calif.</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Blais, Phillip D.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">International Society for Optical Engineering: Proceedings of SPIE</subfield><subfield code="v">773</subfield><subfield code="w">(DE-604)BV000010887</subfield><subfield code="9">773</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-007170184</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift 1987 Santa Clara Calif. gnd-content |
genre_facet | Konferenzschrift 1987 Santa Clara Calif. |
id | DE-604.BV010738696 |
illustrated | Not Illustrated |
indexdate | 2024-07-09T17:58:03Z |
institution | BVB |
isbn | 0892528087 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007170184 |
oclc_num | 506773759 |
open_access_boolean | |
owner | DE-91 DE-BY-TUM |
owner_facet | DE-91 DE-BY-TUM |
physical | VI, 265 S.: Ill., graph. Darst. |
publishDate | 1987 |
publishDateSearch | 1987 |
publishDateSort | 1987 |
publisher | SPIE, The Internat. Soc. for Optical Engineering |
record_format | marc |
series | International Society for Optical Engineering: Proceedings of SPIE |
series2 | International Society for Optical Engineering: Proceedings of SPIE |
spelling | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. Phillip D. Blais, chair/ed. Electron-beam, X-ray, and ion-beam lithographies VI Bellingham, Wash. SPIE, The Internat. Soc. for Optical Engineering 1987 VI, 265 S.: Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier International Society for Optical Engineering: Proceedings of SPIE 773 Ion beam lithography Congresses Lithography, Electron beam Congresses Microlithography Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1987 Santa Clara Calif. gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Blais, Phillip D. Sonstige oth International Society for Optical Engineering: Proceedings of SPIE 773 (DE-604)BV000010887 773 |
spellingShingle | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. International Society for Optical Engineering: Proceedings of SPIE Ion beam lithography Congresses Lithography, Electron beam Congresses Microlithography Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
title | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. |
title_alt | Electron-beam, X-ray, and ion-beam lithographies VI |
title_auth | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. |
title_exact_search | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. |
title_full | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. Phillip D. Blais, chair/ed. |
title_fullStr | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. Phillip D. Blais, chair/ed. |
title_full_unstemmed | Electron beam, X-ray, and ion beam lithographies VI 5 - 6 March 1987 Santa Clara, Calif. Phillip D. Blais, chair/ed. |
title_short | Electron beam, X-ray, and ion beam lithographies VI |
title_sort | electron beam x ray and ion beam lithographies vi 5 6 march 1987 santa clara calif |
title_sub | 5 - 6 March 1987 Santa Clara, Calif. |
topic | Ion beam lithography Congresses Lithography, Electron beam Congresses Microlithography Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
topic_facet | Ion beam lithography Congresses Lithography, Electron beam Congresses Microlithography Congresses X-ray lithography Congresses Fotolithografie Halbleitertechnologie Konferenzschrift 1987 Santa Clara Calif. |
volume_link | (DE-604)BV000010887 |
work_keys_str_mv | AT blaisphillipd electronbeamxrayandionbeamlithographiesvi56march1987santaclaracalif AT blaisphillipd electronbeamxrayandionbeamlithographiesvi |