(1994). Electron beam, x-ray, and ion beam submicrometer lithographies for manufacturing IV: 28 February - 1 March 1994, San Jose, Calif. SPIE-The International Society for Optical Engineering.
Chicago-Zitierstil (17. Ausg.)Electron Beam, X-ray, and Ion Beam Submicrometer Lithographies for Manufacturing IV: 28 February - 1 March 1994, San Jose, Calif. Bellingham, Wash: SPIE-The International Society for Optical Engineering, 1994.
MLA-Zitierstil (9. Ausg.)Electron Beam, X-ray, and Ion Beam Submicrometer Lithographies for Manufacturing IV: 28 February - 1 March 1994, San Jose, Calif. SPIE-The International Society for Optical Engineering, 1994.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.