Ion solid interactions: fundamentals and applications
Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated...
Gespeichert in:
Hauptverfasser: | , , |
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Format: | Buch |
Sprache: | English |
Veröffentlicht: |
Cambridge
Cambridge Univ. Press
1996
|
Ausgabe: | 1. publ. |
Schlagworte: | |
Zusammenfassung: | Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering, and materials science issues associated with metastable phase synthesis |
Beschreibung: | XXVI, 540 S. graph. Darst. |
ISBN: | 052137376X |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV010701558 | ||
003 | DE-604 | ||
005 | 20140306 | ||
007 | t | ||
008 | 960409s1996 d||| |||| 00||| eng d | ||
020 | |a 052137376X |9 0-521-37376-X | ||
035 | |a (OCoLC)32274192 | ||
035 | |a (DE-599)BVBBV010701558 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-384 |a DE-703 |a DE-91 |a DE-20 |a DE-634 |a DE-83 |a DE-11 | ||
050 | 0 | |a QC176.8.R3 | |
082 | 0 | |a 530.4/16 |2 20 | |
084 | |a UP 9300 |0 (DE-625)146457: |2 rvk | ||
084 | |a UP 9350 |0 (DE-625)146462: |2 rvk | ||
084 | |a ELT 280f |2 stub | ||
084 | |a ELT 293f |2 stub | ||
084 | |a FER 786f |2 stub | ||
084 | |a PHY 622f |2 stub | ||
100 | 1 | |a Nastasi, Michael |d 1950- |e Verfasser |0 (DE-588)1059463164 |4 aut | |
245 | 1 | 0 | |a Ion solid interactions |b fundamentals and applications |c Michael Nastasi ; James W. Mayer ; James K. Hirvonen |
246 | 1 | 3 | |a Ion-solid interactions |
250 | |a 1. publ. | ||
264 | 1 | |a Cambridge |b Cambridge Univ. Press |c 1996 | |
300 | |a XXVI, 540 S. |b graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
520 | 3 | |a Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties | |
520 | |a Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering, and materials science issues associated with metastable phase synthesis | ||
650 | 7 | |a Ionen |2 gtt | |
650 | 7 | |a Vaste stoffen |2 gtt | |
650 | 4 | |a Ion bombardment | |
650 | 4 | |a Ion implantation |x Industrial applications | |
650 | 4 | |a Solids |x Effect of radiation on | |
650 | 0 | 7 | |a Festkörper |0 (DE-588)4016918-2 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Ion |0 (DE-588)4027597-8 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Ionenimplantation |0 (DE-588)4027606-5 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Ionenstrahlbearbeitung |0 (DE-588)4277034-8 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Ionenimplantation |0 (DE-588)4027606-5 |D s |
689 | 0 | |5 DE-604 | |
689 | 1 | 0 | |a Ionenstrahlbearbeitung |0 (DE-588)4277034-8 |D s |
689 | 1 | |5 DE-604 | |
689 | 2 | 0 | |a Ion |0 (DE-588)4027597-8 |D s |
689 | 2 | 1 | |a Festkörper |0 (DE-588)4016918-2 |D s |
689 | 2 | |5 DE-604 | |
700 | 1 | |a Mayer, James W. |d 1930-2013 |e Verfasser |0 (DE-588)121494349 |4 aut | |
700 | 1 | |a Hirvonen, James K. |e Verfasser |4 aut | |
999 | |a oai:aleph.bib-bvb.de:BVB01-007143099 |
Datensatz im Suchindex
_version_ | 1804125178949533696 |
---|---|
any_adam_object | |
author | Nastasi, Michael 1950- Mayer, James W. 1930-2013 Hirvonen, James K. |
author_GND | (DE-588)1059463164 (DE-588)121494349 |
author_facet | Nastasi, Michael 1950- Mayer, James W. 1930-2013 Hirvonen, James K. |
author_role | aut aut aut |
author_sort | Nastasi, Michael 1950- |
author_variant | m n mn j w m jw jwm j k h jk jkh |
building | Verbundindex |
bvnumber | BV010701558 |
callnumber-first | Q - Science |
callnumber-label | QC176 |
callnumber-raw | QC176.8.R3 |
callnumber-search | QC176.8.R3 |
callnumber-sort | QC 3176.8 R3 |
callnumber-subject | QC - Physics |
classification_rvk | UP 9300 UP 9350 |
classification_tum | ELT 280f ELT 293f FER 786f PHY 622f |
ctrlnum | (OCoLC)32274192 (DE-599)BVBBV010701558 |
dewey-full | 530.4/16 |
dewey-hundreds | 500 - Natural sciences and mathematics |
dewey-ones | 530 - Physics |
dewey-raw | 530.4/16 |
dewey-search | 530.4/16 |
dewey-sort | 3530.4 216 |
dewey-tens | 530 - Physics |
discipline | Physik Elektrotechnik Fertigungstechnik |
edition | 1. publ. |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02992nam a2200613 c 4500</leader><controlfield tag="001">BV010701558</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20140306 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">960409s1996 d||| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">052137376X</subfield><subfield code="9">0-521-37376-X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)32274192</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV010701558</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-384</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-11</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">QC176.8.R3</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">530.4/16</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 9300</subfield><subfield code="0">(DE-625)146457:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 9350</subfield><subfield code="0">(DE-625)146462:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 280f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 293f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">FER 786f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">PHY 622f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Nastasi, Michael</subfield><subfield code="d">1950-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)1059463164</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Ion solid interactions</subfield><subfield code="b">fundamentals and applications</subfield><subfield code="c">Michael Nastasi ; James W. Mayer ; James K. Hirvonen</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Ion-solid interactions</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">1. publ.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Cambridge</subfield><subfield code="b">Cambridge Univ. Press</subfield><subfield code="c">1996</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XXVI, 540 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="520" ind1="3" ind2=" "><subfield code="a">Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering, and materials science issues associated with metastable phase synthesis</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Ionen</subfield><subfield code="2">gtt</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Vaste stoffen</subfield><subfield code="2">gtt</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion bombardment</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Ion implantation</subfield><subfield code="x">Industrial applications</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Solids</subfield><subfield code="x">Effect of radiation on</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Festkörper</subfield><subfield code="0">(DE-588)4016918-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ion</subfield><subfield code="0">(DE-588)4027597-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ionenimplantation</subfield><subfield code="0">(DE-588)4027606-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Ionenstrahlbearbeitung</subfield><subfield code="0">(DE-588)4277034-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Ionenimplantation</subfield><subfield code="0">(DE-588)4027606-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Ionenstrahlbearbeitung</subfield><subfield code="0">(DE-588)4277034-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Ion</subfield><subfield code="0">(DE-588)4027597-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2="1"><subfield code="a">Festkörper</subfield><subfield code="0">(DE-588)4016918-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Mayer, James W.</subfield><subfield code="d">1930-2013</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)121494349</subfield><subfield code="4">aut</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hirvonen, James K.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-007143099</subfield></datafield></record></collection> |
id | DE-604.BV010701558 |
illustrated | Illustrated |
indexdate | 2024-07-09T17:57:26Z |
institution | BVB |
isbn | 052137376X |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007143099 |
oclc_num | 32274192 |
open_access_boolean | |
owner | DE-384 DE-703 DE-91 DE-BY-TUM DE-20 DE-634 DE-83 DE-11 |
owner_facet | DE-384 DE-703 DE-91 DE-BY-TUM DE-20 DE-634 DE-83 DE-11 |
physical | XXVI, 540 S. graph. Darst. |
publishDate | 1996 |
publishDateSearch | 1996 |
publishDateSort | 1996 |
publisher | Cambridge Univ. Press |
record_format | marc |
spelling | Nastasi, Michael 1950- Verfasser (DE-588)1059463164 aut Ion solid interactions fundamentals and applications Michael Nastasi ; James W. Mayer ; James K. Hirvonen Ion-solid interactions 1. publ. Cambridge Cambridge Univ. Press 1996 XXVI, 540 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier Modern technology depends on materials with precisely controlled properties. Ion beams are a favored method to achieve controlled modification of surface and near-surface regions. In every integrated circuit production line, for example, there are ion implantation systems. In addition, in integrated circuit technology, ion beams are used to modify the mechanical, tribological, and chemical properties of metal, intermetallic, and ceramic materials without altering their bulk properties Ion-solid interactions are the foundation that underlies the broad application of ion beams to the modification of materials. This text is designed to cover the fundamentals and applications of ion-solid interactions and is aimed at graduate students and researchers interested in electronic devices, surface engineering, reactor and nuclear engineering, and materials science issues associated with metastable phase synthesis Ionen gtt Vaste stoffen gtt Ion bombardment Ion implantation Industrial applications Solids Effect of radiation on Festkörper (DE-588)4016918-2 gnd rswk-swf Ion (DE-588)4027597-8 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 gnd rswk-swf Ionenstrahlbearbeitung (DE-588)4277034-8 gnd rswk-swf Ionenimplantation (DE-588)4027606-5 s DE-604 Ionenstrahlbearbeitung (DE-588)4277034-8 s Ion (DE-588)4027597-8 s Festkörper (DE-588)4016918-2 s Mayer, James W. 1930-2013 Verfasser (DE-588)121494349 aut Hirvonen, James K. Verfasser aut |
spellingShingle | Nastasi, Michael 1950- Mayer, James W. 1930-2013 Hirvonen, James K. Ion solid interactions fundamentals and applications Ionen gtt Vaste stoffen gtt Ion bombardment Ion implantation Industrial applications Solids Effect of radiation on Festkörper (DE-588)4016918-2 gnd Ion (DE-588)4027597-8 gnd Ionenimplantation (DE-588)4027606-5 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd |
subject_GND | (DE-588)4016918-2 (DE-588)4027597-8 (DE-588)4027606-5 (DE-588)4277034-8 |
title | Ion solid interactions fundamentals and applications |
title_alt | Ion-solid interactions |
title_auth | Ion solid interactions fundamentals and applications |
title_exact_search | Ion solid interactions fundamentals and applications |
title_full | Ion solid interactions fundamentals and applications Michael Nastasi ; James W. Mayer ; James K. Hirvonen |
title_fullStr | Ion solid interactions fundamentals and applications Michael Nastasi ; James W. Mayer ; James K. Hirvonen |
title_full_unstemmed | Ion solid interactions fundamentals and applications Michael Nastasi ; James W. Mayer ; James K. Hirvonen |
title_short | Ion solid interactions |
title_sort | ion solid interactions fundamentals and applications |
title_sub | fundamentals and applications |
topic | Ionen gtt Vaste stoffen gtt Ion bombardment Ion implantation Industrial applications Solids Effect of radiation on Festkörper (DE-588)4016918-2 gnd Ion (DE-588)4027597-8 gnd Ionenimplantation (DE-588)4027606-5 gnd Ionenstrahlbearbeitung (DE-588)4277034-8 gnd |
topic_facet | Ionen Vaste stoffen Ion bombardment Ion implantation Industrial applications Solids Effect of radiation on Festkörper Ion Ionenimplantation Ionenstrahlbearbeitung |
work_keys_str_mv | AT nastasimichael ionsolidinteractionsfundamentalsandapplications AT mayerjamesw ionsolidinteractionsfundamentalsandapplications AT hirvonenjamesk ionsolidinteractionsfundamentalsandapplications AT nastasimichael ionsolidinteractions AT mayerjamesw ionsolidinteractions AT hirvonenjamesk ionsolidinteractions |