International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics San José, Calif. (1996). Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics: 3 - 4 May, San Jose, California. American Inst. of Physics.
Chicago-Zitierstil (17. Ausg.)International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics San José, Calif. Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics: 3 - 4 May, San Jose, California. New York: American Inst. of Physics, 1996.
MLA-Zitierstil (9. Ausg.)International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics San José, Calif. Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics: 3 - 4 May, San Jose, California. American Inst. of Physics, 1996.