Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics: 3 - 4 May, San Jose, California
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | Undetermined |
| Veröffentlicht: |
New York
American Inst. of Physics
1996
|
| Schriftenreihe: | Journal of vacuum science & technology / B
14,1 |
| Schlagworte: | |
| Beschreibung: | Einzelaufnahme zu e. Zeitschr.-Bd. |
| Beschreibung: | S. 465 - 581 Ill., graph. Darst. |
Internformat
MARC
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| 111 | 2 | |a International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics |n 3 |d 1995 |c San José, Calif. |j Verfasser |0 (DE-588)5169297-1 |4 aut | |
| 245 | 1 | 0 | |a Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics |b 3 - 4 May, San Jose, California |c ed. for the workshop: Calvin Gabriel |
| 264 | 1 | |a New York |b American Inst. of Physics |c 1996 | |
| 300 | |a S. 465 - 581 |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Journal of vacuum science & technology / B |v 14,1 | |
| 500 | |a Einzelaufnahme zu e. Zeitschr.-Bd. | ||
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| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1995 |z San Jose Calif. |2 gnd-content | |
| 689 | 0 | 0 | |a Plasmastrahlbearbeitung |0 (DE-588)4136199-4 |D s |
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| 700 | 1 | |a Gabriel, Calvin |e Sonstige |4 oth | |
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Datensatz im Suchindex
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| genre_facet | Konferenzschrift 1995 San Jose Calif. |
| id | DE-604.BV010676219 |
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| indexdate | 2024-07-09T17:57:02Z |
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| physical | S. 465 - 581 Ill., graph. Darst. |
| publishDate | 1996 |
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| publisher | American Inst. of Physics |
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| series2 | Journal of vacuum science & technology / B |
| spelling | International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition: Sources, Process Control, and Diagnostics 3 1995 San José, Calif. Verfasser (DE-588)5169297-1 aut Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California ed. for the workshop: Calvin Gabriel New York American Inst. of Physics 1996 S. 465 - 581 Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Journal of vacuum science & technology / B 14,1 Einzelaufnahme zu e. Zeitschr.-Bd. Plasmastrahlbearbeitung (DE-588)4136199-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1995 San Jose Calif. gnd-content Plasmastrahlbearbeitung (DE-588)4136199-4 s DE-604 Gabriel, Calvin Sonstige oth |
| spellingShingle | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California Plasmastrahlbearbeitung (DE-588)4136199-4 gnd |
| subject_GND | (DE-588)4136199-4 (DE-588)1071861417 |
| title | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California |
| title_auth | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California |
| title_exact_search | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California |
| title_full | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California ed. for the workshop: Calvin Gabriel |
| title_fullStr | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California ed. for the workshop: Calvin Gabriel |
| title_full_unstemmed | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics 3 - 4 May, San Jose, California ed. for the workshop: Calvin Gabriel |
| title_short | Papers from the Third International Workshop on Advanced Plasma Tools for Etching, Chemical Vapor Deposition, and Plasma Vapor Deposition - Sources, Process Control, and Diagnostics |
| title_sort | papers from the third international workshop on advanced plasma tools for etching chemical vapor deposition and plasma vapor deposition sources process control and diagnostics 3 4 may san jose california |
| title_sub | 3 - 4 May, San Jose, California |
| topic | Plasmastrahlbearbeitung (DE-588)4136199-4 gnd |
| topic_facet | Plasmastrahlbearbeitung Konferenzschrift 1995 San Jose Calif. |
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