Papers from the Third International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors: 20 - 22 March 1995, MCNC, Center for Microelectronics, Research Triangle Park, North Carolina
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Bibliographic Details
Corporate Author: International Workshop on the Measurement and Characterization of Ultra Shallow Doping Profiles in Semiconductors Research Triangle Park, NC (Author)
Format: Conference Proceeding Book
Language:Undetermined
Published: New York American Inst. of Physics 1996
Series:Journal of vacuum sciene & technology / B 14,1
Subjects:
Item Description:Einzelaufnahme zu e. Zeitschr.-Bd.
Physical Description:S. 191 - 462 Ill., graph. Darst.

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