13th Annual Symposium on Photomask Technology and Management: 22 - 23 September 1993, Santa Clara, California
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
Soc. of Photo-Opitcal Instrumentation Engineers
1994
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
2087 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | IX, 422 S. Ill., graph. Darst. |
| ISBN: | 0819413569 |
Internformat
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| 111 | 2 | |a Symposium on Photomask Technology and Management |n 13 |d 1993 |c Santa Clara, Calif. |j Verfasser |0 (DE-588)5113556-5 |4 aut | |
| 245 | 1 | 0 | |a 13th Annual Symposium on Photomask Technology and Management |b 22 - 23 September 1993, Santa Clara, California |c BACUS |
| 264 | 1 | |a Bellingham, Wash. |b Soc. of Photo-Opitcal Instrumentation Engineers |c 1994 | |
| 300 | |a IX, 422 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 2087 | |
| 650 | 4 | |a Integrated circuits |x Masks |v Congresses | |
| 650 | 4 | |a Microlithography |v Congresses | |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |2 gnd-content | |
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| 999 | |a oai:aleph.bib-bvb.de:BVB01-006771554 | ||
Datensatz im Suchindex
| _version_ | 1804124594474319872 |
|---|---|
| adam_text | Contents
vü Conference
Committee
ix
Introduction
SESSION
1
SESSION
2
ADVANCED LITHOGRAPHY
2
Masks for Markle-Dyson optics
[2087-01 ]
A. Grenville, Stanford Univ.; C. Owen, Hewlett-Packard Co.; J. A. Robinson,
IBM Microelectronics; D. A.
Borkholder,
С.
W.
Frank,
R.
F.
Pease,
Stanford Univ.;
D. A. Markle,
Ultratech
Stepper
10
Comparison of state-of-the-art lithography tools
[2087-06]
R. W.
Aprile, Photronics,
Inc.
PHOTOMASK PROCESSES AND MATERIALS
18
Flexure of photomasks in manufacturing and application
[2087-08]
M. Zander, DuPont Photomasks (FRC)
30
CORE
2564
process optimization with the APTCON
4045 [2087-09]
A. Colob, C. Mullins, C. A. Baker, E. Franks, A. Shikata,
Hoya
Micro Mask, Inc.
42
Comparison of wet and dry chrome etching with the CORE-2564
[2087-1 0]
P. D. Buck, Etec Systems, Inc.; B. J. Crenon, IBM Corp.
50
Dry etch patterning of chrome on glass optical masks using P(SI-CMS) resist
[2087-11]
A. E. Novembre,
D.
A. Mixon,
С.
Pierrat,
С.
Knurek,
AT&T Bell Labs.;
M. Stohl,
AT&T
Microelectronics
57
Results from the first fully automated PBS-mask process and pelliclization
[2087-1 2]
A. B. Oelmann,
С
Unger,
Siemens
AG (FRC)
69
CD results for 6-inch 250-mil PBS photoblanks for a O.SO-micrometer generation photomask
process
[2087-13]
С. К.
Keith, Intel Corp.
SESSION
3
METROLOGY
80
Self-calibration in one dimension
[2087-14]
M. T. Takac, IBM Corp.
87
Postioning accuracy issues for
0.35
micrometer and future microlithography
[2087-1 5]
A. Tran,
J.
DeWitt,
С.
Boettcher, Intel Corp.
99
Through-quartz metrology in an automated chemical process
[2087-16]
A. Naderi, Photronics, Inc.
SPIE
Vol.
2087
Photomask Technology
and
Management
Π
993
j /Hi
1 07
Dimensional
metrology of phase-shifting masks with scanning probe microscopes
[2087-1 7]
J. E. Griffith, H. M. Marchman, L.
С
Hopkins, C. Pierrat, S. Vaidya, AT&T Bell Labs.
119
Direct phase measurements in phase-shift masks with a differential heterodyne interferometer
[2087-18]
H. Fujita, H. Miyashita, H. Nakamura, H.
Sano,
Dai Nippon Printing Co., Ltd. (Japan); K. Kimura,
H. Nakanishi, H. Takizawa, H. Yamaguchi, T. Ode, Lasertec Corp. (Japan)
131
Application of an aerial image measurement system to mask fabrication and analysis
[2087-1 9]
R. A. Ferguson, R. M.
Martino,
IBM Microelectronics; R. A. Budd, J. L. Staples, IBM Corp.;
L. W.
Liebmann,
IBM Microelectronics; D. B. Dove, IBM Corp.; J. T. Weed,
IBM Microelectronics
145
Metrology hardware simulation of mask focus-exposure matrix
[2087-20]
M. V.
Dusa,
С.
Xiao,
Ε. Η.
Rauch, Technical Instrument Co.
1 55
Improvements
ir»
two-dimensional X/Y metrology on photomasks and wafers
[2087-21]
J. M. Whittey,
Leica,
Inc.
1 62
New tool for phase-shift mask evaluation: the stepper equivalent aerial image measurement
system-AIMS™
[2087-22]
R. A. Budd, J. Staples, D. B. Dove, IBM Research
Div.
SESSION
4
MICROCONTAMINATION AND PELLICLIZATION
________________________
1 74
Basic improvements in the pellicle final clean area
[2087-23]
D. M. Shernock, J.
Campi,
H. Garcia,
A. Golob,
Hoya
Micro Mask, Inc.
1 86
Development for deep-UV pellicles
[2087-24]
T. Ago, H. Nakagawa, Mitsui Petrochemical Industries, Ltd. (Japan)
SESSION
5
DEFECT INSPECTION
200
Die-to-die inspection of phase-shifting masks
[2087-25]
D. J.
Stolpe,
С.
Pierrat, AT&T Bell Labs.; S. Kirkish,
KLA
Instruments Corp.; S. Vaidya,
AT&T Bell Labs.
216
Die-to-database inspection using high accuracy database representation
[2087-26]
N.
Elmaliach,
Y. Eran,
S.
Shafrir, Orbot Instruments Ltd.; C. Thoe, P. Beard, Photronics, Inc.
225
Automatic defects classification for photolithographies reticles
[2087-27]
D. Rigaill, H. Roussel-Dupre, M. Tissier, Y. Guerin, IBM France
237
Fabrication and evaluation of a programmed transmission defect test mask
[2087-28]
L. S. Zurbrick,
KLA
Instruments Corp.; P. DePesa, R. A. Diola,
Diámon
Images, Inc.
SESSION
6
DEFECT REPAIR
248
Phase-shifting mask (PSM) defect repair using currently available tools
[2087-29]
R. Remling, Intel Corp.
iv
/SPIE
Vol.
2087
Photomask Technology and Management
(1993)
258
Laser
repair of phase-shifting masks
[2087-30]
Y.-H. Chuang, B. Yang, V. Carkavy, J. M. O Connor, K.-C. Liu, M. C. Cohen,
Excel/Quantronix Corp.; J.
Farkas,
P. B.
Comită,
IBM
Almadén
Research Ctr.
268
Recent advances in focused ion beam repair of phase-shifting masks
[2087-31 )
J. C. Morgan, Micrion Corp.
2 77
Printability of phase-shift defects using a perturbational model
[2087-32]
R. J. Socha,
A. R. Neureuther, Univ. of California/Berkeley; R. Singh, SEMATECH
288
Universal pattern data format
[2087-33]
M. R.
Rolle,
Pattern Data Systems
300
Characterization of defect sizing on an automatic inspection station (KLA238e)
[2087-34]
D.
Stocker,
B. Martin, J. O.
Browne, GEC Plessey Semiconductors Ltd. (UK)
306
Chrome-level repair of phase-shift photomasks using conventional focused ion beam repair
technology
[2087-35]
W. C. Joyce, IBM Microelectronics
SESSION
7
QUALITY AND MANUFACTURING MANAGEMENT
314
LAN integration of photomask tools at IBM Burlington using the IBM RISC/6000
[2087-36]
E. J. Wilbur, IBM Microelectronics
321
Continuous improvement journey at
Du Pont
Photomasks
[2087-37]
R. K.
Henderson, DuPont Photomasks, Inc.
331
Mask manufacturing improvement through capability definition and bottleneck line
management
[2087-38]
A. Strott, Intel Corp.
340
Cost of ownership for soft x-ray projection lithography
[2087-40]
K. Early, W. H. Arnold, Advanced Micro Devices, Inc.
350
Mask quality assessment
[2087-41]
L. Regis,
N.
Paulson, Intel Corp.;
).
A. Reynolds, Reynolds Consulting
SESSION
8
PHASE SHIFT MASK/FUTURE TECHNOLOGY
362
Phase-shifting mask fabrication
[2087-43]
С
Pierrat,
J.
DeMarco, AT&T Bell Labs.
372 New simple
method of extending the limit of rim phase-shift mask
[2087-44]
S.-W. Choi, S. G. Woo, j. M. Kim, J. M. Son,
J. G.
Lee, Samsung
Electronics Co., Ltd. (Korea)
380
Simulation and fabrication of a new phase-shifting mask for
0.35-μνη
contact hole pattern
transfer: half-tone rim
[2087-45]
W.-A. Loong, National Chiao Tung Univ. (Taiwan); S.-L. Shy, National
Nano
Device Lab. (Taiwan); G.-C. Guo, Y.-L.
Chou,
National Chiao Tung Univ. (Taiwan)
SPIE
Vol.
2087
Photomask Technology and Management
(1 993}
390
Continous
phase transitions fabricated by subtractive process
[2087-46]
T.
Saito,
H.
Jinbo,
К.
Takushima, I. Ashida, Y. Tanaka,
Oki
Electric Industry Co., Ltd. (Japan)
399
Electron-beam lithography optimization for
0.25-μνη
x-ray mask making
[2087-47]
D. Puisto, IBM Corp.
408
Practical approach to
0.35-μνη
i-line
lithography
[2087-48]
E.
Morita, Etec Systems, Inc.
420
Addendum
421
Author Index
í
¡SPIE
Vol.
2087
Photomask Technology and Management
(1993/
Conference
Committee
Conference Chairs
Edward
С
Grady,
Hoya
Micro Mask, Inc.
Jack P.
Moneta, Photronics,
Inc.
Cochairs
David
E. Kettering,
Nikon Precision Inc.
Nancy Stojowski, Nikon Precision Inc.
Barry M. Harris,
Diámon
Images, Inc.
Stewart E. Lyle,
KLA
Instruments Corporation
Gregory K. Hearn, SCIOPT Enterprises
Robert J.
Naber, Etec
Systems, Inc.
Program Committee
James A. Reynolds, Reynolds Consulting
James
N.
Wiley,
KLA
Instruments Corporation
Kevin C. McGinnis, DuPont Photomask, Inc.
Scott
Landstrom, SiScan
Systems, Inc.
Session Chairs
7
Advanced Lithography
Barry Rockwell, Photronics, Inc.
2
Photomask Processes and Materials
Hans-Karl Mueller, DuPont Electronics
3
Metrology
William L.
Brodsky,
AT&T Bell Laboratories
4
Microcontamination and Pell
¡cl ization
Asao Shikata,
Hoya
Micro Mask, Inc.
5
Defect Inspection
James
N.
Wiley,
KLA
Instruments Corporation
6
Defect Repair
James
N.
Wiley,
KLA
Instruments Corporation
7
Quality and Manufacturing Management
Larry Regis, Intel Corporation
8
Phase Shift Mask/Future Technology
Gilbert V. Shelden, SEMATECH/IBM Corporation
SPÌE
Vol.
2087
Photomask Technology and Management
(1993/
vìi
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| indexdate | 2024-07-09T17:48:09Z |
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| isbn | 0819413569 |
| language | English |
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| physical | IX, 422 S. Ill., graph. Darst. |
| publishDate | 1994 |
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| spelling | Symposium on Photomask Technology and Management 13 1993 Santa Clara, Calif. Verfasser (DE-588)5113556-5 aut 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California BACUS Bellingham, Wash. Soc. of Photo-Opitcal Instrumentation Engineers 1994 IX, 422 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 2087 Integrated circuits Masks Congresses Microlithography Congresses (DE-588)1071861417 Konferenzschrift gnd-content Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 2087 (DE-604)BV000010887 2087 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006771554&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Integrated circuits Masks Congresses Microlithography Congresses |
| subject_GND | (DE-588)1071861417 |
| title | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California |
| title_auth | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California |
| title_exact_search | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California |
| title_full | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California BACUS |
| title_fullStr | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California BACUS |
| title_full_unstemmed | 13th Annual Symposium on Photomask Technology and Management 22 - 23 September 1993, Santa Clara, California BACUS |
| title_short | 13th Annual Symposium on Photomask Technology and Management |
| title_sort | 13th annual symposium on photomask technology and management 22 23 september 1993 santa clara california |
| title_sub | 22 - 23 September 1993, Santa Clara, California |
| topic | Integrated circuits Masks Congresses Microlithography Congresses |
| topic_facet | Integrated circuits Masks Congresses Microlithography Congresses Konferenzschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006771554&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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