Chemical vapor deposition of tungsten and tungsten silicides: for VLSI/ULSI applications
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Buch |
| Sprache: | English |
| Veröffentlicht: |
Park Ridge, NJ
Noyes
1992
|
| Schriftenreihe: | Materials science and process technology series
|
| Schlagworte: | |
| Beschreibung: | XVI, 235 S. Ill., graph. Darst. |
| ISBN: | 0815512880 |
Internformat
MARC
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| 245 | 1 | 0 | |a Chemical vapor deposition of tungsten and tungsten silicides |b for VLSI/ULSI applications |c by John E. J. Schmitz |
| 264 | 1 | |a Park Ridge, NJ |b Noyes |c 1992 | |
| 300 | |a XVI, 235 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Materials science and process technology series | |
| 650 | 4 | |a Integrated circuits |x Ultra large scale integration |x Materials | |
| 650 | 4 | |a Integrated circuits |x Very large scale integration |x Materials | |
| 650 | 4 | |a Tungsten | |
| 650 | 4 | |a Vapor-plating | |
| 650 | 0 | 7 | |a VLSI |0 (DE-588)4117388-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
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| 999 | |a oai:aleph.bib-bvb.de:BVB01-006530855 | ||
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Datensatz im Suchindex
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|---|---|
| any_adam_object | |
| author | Schmitz, John E. |
| author_facet | Schmitz, John E. |
| author_role | aut |
| author_sort | Schmitz, John E. |
| author_variant | j e s je jes |
| building | Verbundindex |
| bvnumber | BV009863312 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.15.T85 |
| callnumber-search | TK7871.15.T85 |
| callnumber-sort | TK 47871.15 T85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UP 7550 |
| ctrlnum | (OCoLC)23732152 (DE-599)BVBBV009863312 |
| dewey-full | 621.39/5 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.39/5 |
| dewey-search | 621.39/5 |
| dewey-sort | 3621.39 15 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| id | DE-604.BV009863312 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:42:12Z |
| institution | BVB |
| isbn | 0815512880 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006530855 |
| oclc_num | 23732152 |
| open_access_boolean | |
| owner | DE-384 |
| owner_facet | DE-384 |
| physical | XVI, 235 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | Noyes |
| record_format | marc |
| series2 | Materials science and process technology series |
| spelling | Schmitz, John E. Verfasser aut Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications by John E. J. Schmitz Park Ridge, NJ Noyes 1992 XVI, 235 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Materials science and process technology series Integrated circuits Ultra large scale integration Materials Integrated circuits Very large scale integration Materials Tungsten Vapor-plating VLSI (DE-588)4117388-0 gnd rswk-swf CVD-Verfahren (DE-588)4009846-1 gnd rswk-swf Wolfram (DE-588)4066862-9 gnd rswk-swf Wolfram (DE-588)4066862-9 s CVD-Verfahren (DE-588)4009846-1 s VLSI (DE-588)4117388-0 s 1\p DE-604 1\p cgwrk 20201028 DE-101 https://d-nb.info/provenance/plan#cgwrk |
| spellingShingle | Schmitz, John E. Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications Integrated circuits Ultra large scale integration Materials Integrated circuits Very large scale integration Materials Tungsten Vapor-plating VLSI (DE-588)4117388-0 gnd CVD-Verfahren (DE-588)4009846-1 gnd Wolfram (DE-588)4066862-9 gnd |
| subject_GND | (DE-588)4117388-0 (DE-588)4009846-1 (DE-588)4066862-9 |
| title | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications |
| title_auth | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications |
| title_exact_search | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications |
| title_full | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications by John E. J. Schmitz |
| title_fullStr | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications by John E. J. Schmitz |
| title_full_unstemmed | Chemical vapor deposition of tungsten and tungsten silicides for VLSI/ULSI applications by John E. J. Schmitz |
| title_short | Chemical vapor deposition of tungsten and tungsten silicides |
| title_sort | chemical vapor deposition of tungsten and tungsten silicides for vlsi ulsi applications |
| title_sub | for VLSI/ULSI applications |
| topic | Integrated circuits Ultra large scale integration Materials Integrated circuits Very large scale integration Materials Tungsten Vapor-plating VLSI (DE-588)4117388-0 gnd CVD-Verfahren (DE-588)4009846-1 gnd Wolfram (DE-588)4066862-9 gnd |
| topic_facet | Integrated circuits Ultra large scale integration Materials Integrated circuits Very large scale integration Materials Tungsten Vapor-plating VLSI CVD-Verfahren Wolfram |
| work_keys_str_mv | AT schmitzjohne chemicalvapordepositionoftungstenandtungstensilicidesforvlsiulsiapplications |