Thin Films: proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994]
Gespeichert in:
| Format: | Tagungsbericht Buch |
|---|---|
| Sprache: | German |
| Veröffentlicht: |
Oberursel
DGM-Informationsges., Verl.
1994
|
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | 733, [30] S. Ill., graph. Darst. |
| ISBN: | 3883551996 |
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| 245 | 1 | 0 | |a Thin Films |b proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] |c ed. by G. Hecht ... |
| 264 | 1 | |a Oberursel |b DGM-Informationsges., Verl. |c 1994 | |
| 300 | |a 733, [30] S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
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| 689 | 0 | |5 DE-604 | |
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| 711 | 2 | |a International Symposium on Trends and New Applications in Thin Films |n 4 |d 1994 |c Dresden |j Sonstige |0 (DE-588)2140066-0 |4 oth | |
| 711 | 2 | |a Conference on High Vacuum, Interfaces and Thin Films |n 11 |d 1994 |c Dresden |j Sonstige |0 (DE-588)2140067-2 |4 oth | |
| 856 | 4 | 2 | |m Digitalisierung TU Muenchen |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006521521&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-006521521 | ||
Datensatz im Suchindex
| _version_ | 1804124206468694016 |
|---|---|
| adam_text | Contents
I. Deposition Processes
Plasma and Deposition Interactions With an Enhanced Arc
3
B. Coll, Rockaway, USA
Theoretical and Experimental Studies of Transport Phenomena
in PVD Processes
18
J.
Machet.
Limoges, France
MOCVD of Cr-Based Coatings: Suitable Organochromium
Compounds for Low Temperature Deposition Processes
24
F.
Maury,
Toulouse, France
Diamond CVD
-
a Status Report
30
C.-P. Klages, Hamburg, Germany
Tungsten and Copper for ULSI Multilevel Metallization
36
T.
Geßner,
Chemnitz, Germany
High-Current Arc
-
A New Source for High Rate Deposition
42
P. Siemroth, T. Schiilke,
В.
Schuhrich, Dresden, Germany
The Developement of Cr-Al-N Coatings by the
Multi
Source Arc Process
46
O. Knotek,
H. J.
Scholl, Aachen,
Germany
Design and Performance
of
Linear Magnetron
Sputtering
Systems 52
K.
Miernik, Radom,
Poland
Hollow-Cathode Plasma Sources and its Use in Coating Technologies
56
B.
Bücken,
W.
Grimm,
J.
Wolfframm, Dresden, Germany
САН
Multicomponent Coatings: Technology and Industrial Applitions
60
B. A. Eizner, G. V. Markov, A. A. Minevich, Minsk, Byelarus
Low Temperature Epitaxial Growth by MBE on Hydrogen Plasma
Cleaned Silicon Wafers
65
J.
Ramm,
E.
Beck, Balzers, Liechtenstein;
H. R.
Deller, Zürich,
Switzerland;
Α.
Dommann. Buchs,
Switzerland:
D.
Krüger, FrankfurtCOder),
Germany
Study and Elaboration of Boron Nitride Films by Reactive Ion
Plating
69
/.
Grenier, S.
Mülhouitre,
A. Bessaudou, J.
Machet,
Limoges, France
Multi-componem
Hard Thin Films Deposited by Hollow Cathode Arc (HCA)
Discharge Hvaporatur
D.
Schulze,
R.
Wilberi·, Dresden. Germany
Spectroscopie
Investigation of Plasma Processes in PVD and Arc
77
7 .
Witke, A.
Lenk,
Dresden, Germany
Short-Time Investigation of Laser and Arc Assisted Deposition
Processes °
P. Siemroth, Th.
Schalke,
T.
Witki ,
В.
Schultrich, Dresden,
Germany
leaser Assisted Electron Beam Evaporation
(LEBE)
for Optical Applications
85
P. Thomsen-Schmult
,
D.
Schüfer,
Berlin,
Germany;
//.
Jaharmn, T. Martini, Halle
(Saale),
Germany;
С
Pfeifer,
G.
Reiße, Mittweida,
Germany
Microstructural
Properties of Laser Deposited Oxide Films
89
G.
Reiße,
В.
Keiper,
S.
Weißmantel,
Mittweida,
Germany;
H. Johansen, T. Martini,
R.
Scholz,
HalleţSaale),
Germany
The Thickness Dependence of the Resistivity of Thin Pd Films
Deposited on Si(111)
93
H. Hh)ch, P.
Wißmann, Erlangen,
Germany
The PVD Metallization of Plastic Material: Influence of Interface
Structure on Film Properties
97
H.
Kupfer,
G.
Hecht,
Chemnitz, Germany
Preparation of Si Wafer Surface with VUV Light Assistance
102
5.
D. Dushenkov, K. A. Valiev, L. V. Velikov, Moscow, Russia
Resistance to Corrosion of Composite Layers Produced by Ionic Treatments
105
A, Michalskí,
T.
Wierzchoń,
D.
Krupa,
Warsaw, Poland
Growth of ZnSe on GaAs(l
10)
and
(100)
Monitored in situ by
Raman Spectroscopy
109
D. Drews,
M. Langer, W.
Richter,
Berlin, Germany;
D. R. T.
Zahn, Chemnitz,
Germany
A Mobile Transfer System for Surface Analytical Applications
113
J.-M. Abels, D.
Hecht,
H.-H. Strehblow,
Düsseldorf,
Germany;
U.
Künzelmann, Dresden,
Germany
High Resolution Transmission Electron
Microscopy of Strained
inAs
Layers Grown on
(100)
GaAs Substrate by Virtual Surfactant
Molecular Beam Epitaxy
117
A. Trampert, Stuttgart, Germany; E. Tournie. Valbonne, France;
K. H.
Ploog, Berlin, Germany
lon
Assisted
Deposition
of Low Stress Hard Coatings Using Unbalanced
Magnetron Sputtering Technique
121
S.
Münsterer,
К.
Kohlhof,
Stuttgart, Germany
Plasma Processing by Use of Electrons Generated by Vacuum Arcs
127
J.
Vetter, Bergisch Gladbach,
Germany
Reactive DC Magnetron Sputtering of Elemental Targets in Ar/Oy-Mixtures:
Relation Between the Discharge Characteristics and the Heat of Formation
of the Corresponding Oxides
131
K. Ellmer, Berlin, Germany; R. Mientus, Berlin, Germany
Behaviour of Random Cathodic Arcs on Ti-Targets in Dependence on Electrical
Power Parameters
135
H. Mecke, M. Ellrodt, Magdeburg, Germany
Preparation of Diamond-Like Films by Laser-Controlled Arc Deposition
(LASER-ARC)
139
H.-J.
Scheibe, D. Drescher,
Dresden, Germany
Elektrochemical and Mechanical Behaviour of Carbon Materials Prepared by
Ion Assisted Evaporation
143
J. Ullmann, Chemnitz, German; H.
Stopka,
G. K. Wolf,
Heidelberg, Germany
Influence of Wafer Preclean before Selective Tungsten CVD on Surface
Properties of Interconnect and Intermetal Dielectric Materials
148
S. E.
Schulz,
В.
Hintze,
W.
Grunewald,
A. Hofinann,
Chemnitz,
Germany
PACVD
of TiN in an Industrial
Plant 153
D. Heim, Wels,
Austria
Detection of Concentration Profiles During PACVD in an Industrial Reactor
157
O. Morlok,
G.
Kampschulte,
P.
Markschlager,
Stuttgart, Germany
Formation of Composite Layers on Tool Steel by PACVD Methods
162
J. Michalskí
.
Warsaw, Poland
Cold Remote Nitrogen Plasma: A New Trend for Thin Film Deposition
167
F. Callebert, C. Jama,
P.
Goudmand, O.
Dessaux,
Villeneuve
D Ascq, France
Synthesis and Characterization of Zinc Thin Films Obtained by a Cold
Remote Plasma
171
B. Mutel, A. Ben Tah b, O. Dessaux, P.
Goudmand,
L. Gengembre,
J. Grimblor.
Villeneuve d Ascq,
France
Nickel Films
Deposition by Cold
Remote
Nitrogen
Plasma
on
Acryloniťrile-Butadiene-Styrene
(ABS) 175
Α.
Brocherieia,
О.
Dessaux,
Ρ-
Goudmand,
L.
Gengembre,
J.
Grimbìot,
Villeneuve d Ascq, France
Growth of Cu Thin Films by Photo-Assisted Metal Organic Chemical
Vapor Deposition: Influence of Hydrogen
179
R. Maes, Eindhoven, The Netherlands;
M. Karsi, R.
Moroncho,
F.
Maury,
Toulouse, France
Characterization of the Plasma Enhanced CVD Process Using
Optical Emission Spectroscopy
183
R. Pintaske, S. Peter, J. Lang, G.
Hecht, F. Richter,
Chemnitz, Germany
Determination of Ion Energy Distribution in Glow Discharges
187
S. Peter, R. Pintaske, B.
Reinhold, F. Richter,
G.
Hecht, Chemnitz,
Germany
Deposition of Si-C-N Films by Metalorganic Plasma CVD
191
5.
Peter, R. Pintaske,
F. Richter,
G.
Hecht,
Chemnitz, Germany
Properties of Surface Layers Produced from Organic Compounds under
Glow-Discharge Conditions
195
T. Wierzchorí, J. R. Sobiecki, K.
Kuzydhwski
,
Warsaw, Poland
Formation of Surface Layers from Gaseous Phase with Participation of
Chemical Reaction: The Role of Plasma in the Deposition Process
199
J. Michalskí,
Warsaw, Poland
Formation of Surface Layers from Gaseous Phase with Participation of
Chemical Reaction: The Role of Substrate in the Deposition Process
203
J. Michalskí,
Warsaw, Poland
Laser CVD on Carbon Fibres: Structure of Layers and Tensile
Strength of Fibres
208
V. Hopfe, R. Jacket, Dresden, Germany;
A. Tehel, S.
Böhm,
Α.
Schulze,
Chemnitz, Germany
Nucleation, Growth and Modification of Polycristalline Diamond Films
Prepared by HCAP CVD
212
S.
Laufer,
J.
Ullmann, A. Weber, J.
Stiegler,
G, Schaarschmidt,
Chemnitz, Germany
The New Technology for Fabrication of the Composition Targets,
Used for Magnetron Sputtering of Coatings, Based on the Self-Propagating
High-Temperature Syntesis (SHS). Structure and Properties of Thin Films
217
E. A. Levashov,
/.
P. Borovinskaya
,
V. I. Kosyanin, Y. V. Bogatov,
Moscow, Russia
Equipment for Ion Beam and UV-Light Assisted Deposition
220
M.
Röckelein,
В.
Rauschenbach,
Augsburg, Germany
High Energy Ion Beam Activated Deposition
224
S. Tumulevicius, A. Galdikas, L. Pranevicius, Kaunas, Lithuania
Microstructure
of Amorphous Sputtered SiNx-Coatings. Comparision
of Computer Simulation and Experiment
230
A. Zösch,
W.
Wuttke, Zwickau, Germany
Computer Simulation of Rarefied Gas Flow
234
F. Taziukov, P. Osipov, A. Burmistrov, M. Fomina, Kazan, Russia
Ion-Assisted PVD Hard and Anti-Wear Composite Films of TiN and
TiC with i-C
238
X. Yan, Chemnitz. Germany;
J.-H. Erler, Mittweida, Germany
TiN and TiC Coatings by Ion-Assisted Reactive Sputtering
242
X. Yan. Chemnitz, Germany;
J.-H. Frier. Mittweida, Germany
Effect of Evaporation on the Morphology of Beaded Thin Films
246
Y. S. Kaganovskii, S. P. Yurchenko, Kharkov, Ukraine
D. L.
Веке,
Debrecen, Hungary
Preparation, Characterisation and Wear Behaviour of PECVD-TiNx- and
(Ti.Si)Nx-Coated Cermets
250
/.
Fm/ler, E. Wolf, A. Leonhardt, Dresden, Germany;
A. Be tier, V.
Richter,
Dresden, Germany
Deposition of Aluminium or Boron Containing Films Using
Organometallic Precursor
255
Ch.
Täschner,
A. Leonhardt, Dresden, Germany;
U. Diimichen, Merseburg, Germany
Diamond Films CVD in Methane/Air Induction Plasma Jet
259
A. S. Trukhanov,
N. G. Býkova,
Yu. K. Ruliev, M. I. Yakushin
Moscow, Russia
Microwave Plasma Enhanced Low Pressure Sputtering of Copper Films
263
J.
Musil,
M.
Mišina,
Prague, Czech Republic
Effects of
Multiaxial
Substrate Rotation in Industrial PVD-Processes
267
B.
Rother,
H.
A. Jehn,
Schwäbisch Gmünd,
Germany;
G.
Ebersbach, Chemnitz,
Germany
IL Structural
and Elemental Analysis / Layer Properties
Amorphous and Nanodispersed Thin Films
-
Transport Properties and
Applications
273
A.
Heinrich,
Dresden, Germany
Giant
Magnetoresistance in
Layered and Granular Thin Films
279
J. C. S. Kools, R. Coehoorn, J. P. W. B. Duchateau, Eindhoven,
The Netherlands;
Th. G. S. M.
Rijks, Eindhoven, The Netherlands;
I. Gideonse,
Groningen,
The Netherlands
High Resolution Auger Depth Profile Analysis of Deeply Buried
Interfaces
285
A. Barna,
Aí.
Menyhard, Budapest, Hungary
Complex XRD Study of Inhomogeneous Microstructure in Hard Coatings
291
R.
Kužel,
jr.
,
Praha,
Czech Republic
Texture and Stress Analysis of Sputtered Thin Films
297
J. J. Bacmann, Grenoble, France;
P. Gergaud, Paris, France
Layer Characterisation with Linear-Optical Methods
303
T.
Zettle
r
,
Berlin, Germany
Residual Stress in
Ni
an
C Monolayers
and Multilayers Produced
by Pulsed Laser Deposition
312
N.
Kallis,
H. Mai,
Dresden, Germany
Superconductivity and Critical Fields in Amorphous Tungsten/Silicon
Multilayers
316
E. Majkova, S. Luby, M. Jergel,
Bratislava, Slovakia;
H. v. Lohneysen,
С
Strunk,
Karlsruhe, Germany;
B. George, Vandoeuvre-les-Nancy, France; P. Lobotka, Bratislava, Slovakia
Optical Properties of Laser Pulse Deposited Oxide Films
320
G.
Reiße,
S.
Weißmantel,
В.
Keiper, Mittweida,
Germany
Photosenshivíty
of
MIM
-Туре
Devices
Based on a-SiC:H
324
R.
Vincenzoni,
G.
Leo, F. Galluzzi,
Rome,
Italy
Muon
Spin
Research
of Thin Films and Surfaces
329
F. Kottmann, D.
Meiden,
M.
Meyberg,
E. Morenzoni,
Th.
Wutzke,
U.
Zimmermann, Villigen,
Suisse;
S. Matthias, Th.
Prokscha, Heidelberg,
Germany
Hydrogen Films at Low Temperatures
333
P. P. ¡Mtsishin, O. A. Panchenko, S. V. Sologub, V.
/· .
Shpugin,
Kiev, Ukraine
STM Investigations of Diamond and DLC Films
337
A. A. Gorbunov, Dresden, Germany; S. M. Pimenov,
A. A. Smolin,
Moscow, Russia;
//.
-J.
Scheibe, D. Drescher,
Dresden, Germany
An
Х
-Ray Detector Based on a-Si:H/Transition Metal Bilayer Systems
341
A.
N.
Panckow, H.
Witte,
T. Oleynik,
Magdeburg, Germany
Electrical in situ Characterisation of Cubic CdS Grown on InP(l
10) 345
С
Schultz,
Berlin, Germany; M.
von der
Emde,
D. R. T.
Zahn,
Chemnitz,
Germany
Laterally Resolved Ellipsometric Investigations of Oxide Layers
Manufactured by Laser-Assisted Electron Beam Evaporation
349
H. Schwiecker, Berlin, Germany; R. Wolf, U. Schneider, J. Zilian,
Berlin, Germany; P. Thomsen-Schmidt
,
D.
Schäfer,
Berlin, Germany
Modification of Laser-Arc DLC Layers by Ion Beams
353
A. Kolitsch. Dresden-Rossendorf, Germany;
H.-J.
Scheibe, D. Drescher,
Dresden, Germany
Correlations Between Structural and Optical Properties of
Amorphous Selenium Films
357
//.
Wine,
H.
Freistedt, J. Biasing,
H.
Giesìer,
Magdeburg,
Germany
Magneto-optic Display Material with High Faraday-Rotation and Low
Coercive Force
361
T.
Kessler,
H.
Baumann,
К.
Bethge, J. Reinmann,
K.
Friedrich, R.
Omet,
Frankfurt Main),
Germany
Optical Properties of Coated CaF2
365
S. Laiix, W.
Richter,
В.
Schröter,
T. Glaschke,
Jena, Germany
Condensation Model of Dislocations Origination in Epitaxial
Ferrospinel Surface Layers
369
L.
N.
Aleksandrov,
Novosibirsk, Russia;
L. A.
Mitlina,
E.
I. Dorodnov, V.
N.
Kostilov, T. V. Yankovskaya,
Samara, Russia
Magnetic Field Dependence of Hall Coefficient in Short-Period
PbTe/SnTe Superlattices
373
V. Litvínov,
Chernovtsy, Ukraine; M. Oszwaldmvski
,
T.
Berns, Poznan,
Poland;
O. Mironov,
Kharkov, Ukraine
Determination
of Young s Modulus of Thin Films by Ultrasonic
Surface Waves
378
D. Schneider, H.-J.
Scheibe,
В.
Schultrich, Dresden, Germany
Electrical Characteristics of HMDS-LPCVD Thin Films
382
A. Angelescu, I.
Kieps,
Bucharest, Romania
YSZ Buffer Layers for YBaCuO Deposition on Silicon
386
G. Beddies, P. Schneider,
С
Lange,
Chemnitz, Germany
The Contact Problem of Elastic Indentation of Coating/Substrate
Systems
391
N. Schwarzer, J. Schimmel, F. Richter, Chemnitz,
Germany
Photoluminescence
Studies of Porous
Silicon 395
A. A. Lebedev,
Α.
D.
Reményük, Yu.
V. Rud,
St. Petersburg, Russia
Photoluminescence of Silicon-Hydrogen Films
400
E. V. Astrová, S. V. Belov,
A.A.
Lebedev, A. D.
Reményük,
Yu. V.Rud,
St. Petersburg, Russia
The Photoluminescence of Light Emitting Films on Silicon in the
Visible Region of Spectrum
407
R. F. Vitman, I. M. Kapitamova, A. A. Lebedev,
B. S.
Razbirin,
A.
N.
Starukin, St. Petersburg, Russia
Surface Contamination after Lapping
411
A. Barylski, Gdansk, Poland
Investigation of Initial Oxide Growth on
NÍA1
by Scanning
Tunneling Microscopy
415
B. Wolf, M. Bobeth, W.
Pompe,
Dresden, Germany;
С
Warner, D.
Bermeli,
Philadelphia, USA; S. Baunack, Dresden, Germany
Quantitative Characterization of Thin Film Structures
419
K. J. Kurzydlowski,
T. Wierzchorí, J. J. Bucki, K.
Rożniatowski,
Warsaw, Poland
Influence of a Ti-lnterlayer on the Adhesion of TiN-Hard Coatings
423
B.
Bücken,
H.
Černohorsky,
G. Leonhardt, T.
Lunow, Dresden,
Germany
Internal Stresses and Elastic Modulus of DLC Films and their Relation to
Structure and Deposition Process
429
B. Schultrich, H.-J.
Scheibe,
G. Grandrémy, D. Schneider,
Dresden,
Germany
Deposition of Low Energy Coatings with DLC-Like Properties
433
M. Grischke. K. Trojan, II. Dimigen, Braunschweig, Germany
The Identification of Amorphous Films by the Method of
Coordination Spheres Diffractometry
473
Yu. I. Sozin, Kiev, Ukraine
SiC Interlayer Formation Studied by Infrared Spectroscopy
441
M.
Friedrich,
S.
Money,
В.
Mainz,
S.
Deutschmann,
D, R.
Г.
Zahn,
Chemnitz,
Germany
Studies of TiN Layers Using PAS and Other Methods
445
K. Uhlmann, D.
T. Britton,
M.
Härting,
Munich, Germany
Observation of Metastable Phases of Chromium Carbide Layers
by
Х
-Ray Diffraction
449
A.
Ehrlich,
W. Hoyer,
Chemnitz, Germany
Ion Beam Analysis Investigations on Multilayer Devices for Visible
Optics
453
W. Wagner, F. Ranch,
Frankfurt(Main),
Germany;
U. Jeschkowski, K.
Bange,
Mainz, Germany
Investigations in the Roughness of the Interfaces of Multilayer Films
457
T. Schuhrke, J.
Zweck,
H.
Hoffmann,
Regensburg,
Germany
Quantitative Composition Analysis of Semiconducting Suicide Films
461
G.-U. Reinsperger,
A. Schöpke,
В.
Selle,
Berlin, Germany
The Electromigration Kinetics in Precious Metal Overlayers on a Carbon Thin
Film Surface Studied by Scanning Tunneling Microscopy (STM) and Scanning
Tunneling Potentiometry (STP)
465
J. Besold,
N.
Matz, Dresden, Germany
Characterization of A1N Films
469
V. Grafe, D.
Schalch,
Α.
Scharmann,
С.
Wiese, Gießen,
Germany
Characterization of AIN/Si Interfaces
473
V. Grafe, D.
Schalch,
Α.
Scharmann,
С.
Wiese, Gießen,
Germany
Preparation of Thin Co-Doped Irondisilicid Films, Electrical and
Structural Properties
477
S.
Teichen,
С.
Lange,
R.
Kilper, T. Franke,
P. Haussier,
Chemnitz,
Germany
Nucleation and Grain
Growth of /5-FeSi, Thin Films
482
К.
Herz,
M. Powalla, Stuttgart,
Germany
The Peeling
Test with Initialized
Crack Formation
486
N. Schwarzer,
J.
Schimmel,
S. Schmidbauer, J.
Hahn. Chemnitz,
Germany
Influence
of Surface Defects on Porous Silicon Luminescence
490
Th. Dittrich, H. Flietner, Berlin, Germany;
V. Yu. Timoshenko, P. K. Kashkarov, Moscow, Russia
Absorption and Secondary Radiation in Tetrahedral Carbon Films
494
V. E. Mashchenko, Moscow, Russia;
V. M. Puzikov, A. V. Semenov, Kharkov, Ukraine
TiN/(Cr,Co)N Coatings Crystallized from Pulse Plasma
498
A. Michalskí,
Warsaw, Poland
Mechanical Properties of Amorphous Thin Films
501
P.
Nemec, V. Navrátil,
P.
Sládek, Brno,
Czech Republic
P.
Roca i
Cabarmcas, Palaiseau, France
The Influence of Interface Roughness on the Giant
Magnetoresistance
of
Со
/Cu
Multilayer Films
505
С
Dorner,
H.
Haidl,
H.
Hoffmann,
Regensburg,
Germany
Photo-Simulated Changes in Thin As-Ge-S Films Determined
by Raman Spectroscopy
509
K. Petkov, B. Dinev, Sofia, Bulgaria; V. Boychev, Sofia, Bulgaria
Optical and Photoelectrical Properties of
џс-Ѕ
Layers in Dependence
on Structural Ordering and Defect Passivation
513
R. Krankenhagen,
H.
Schmidt,
W.
Henrion,
I.
Sieber,
В.
Selle, H.
Flietner,
Berlin, Germany
Interface Defects at Si/SiOi-Inerfaces and Their Relation to Growth
Processes and Dynamic Effects
518
H.
Andermann,
Th.
Dittrich,
К.
Kliefoth,
H.
Flietner, Berlin, Germany
III. New Applications of Thin Films
PVD and PECVD Coatings for Packaging Applications
524
M. Benmalek, Voreppe, France
Cleaning and Interface Control in
1С
Process Technology
531
J. Mulder, Bilthoven, The Netherlands
Ultrathin SiO,- and
Al/),-
Films as Selective Component for Gas Sensors
537
J. Goschnick, P. Alihainz, A. Dahlke, M. Frietsch-Klarhof,
H. J.
Ache,
Karlsruhe, Germany
Stability of
Mo/Cu
Interfaces Under Thermal Processing
541
S. Luby,
E.
Majkova,
M.
Jergel, Bratislava, Slovakia;
M. Brunei, Grenoble, France; G. Leggieri,
A. Luches, Lecce,
Italy
Laser-Damage Resistant Multilayer Coatings on Polycarbonate Substrates
545
G. Hubrach, K.-J. Becker,
Bamberg,
Germany;
E. Hacker, H. Bemitzki, H. Lauth, Jena, Germany
Preparation and Properties of Transparent Protective Layers Produced by
Vacuum Technologies
550
G. Leonhardt, U.
Ehrlich,
M.
Falz,
В.
Bücken,
R.
Wilberg, Dresden,
Germany
Hollow Cathode Arc Plasma Pre-Treatment and Vaccum Arc Coating
-
A New Combination of Processes
556
D.
Schulze,
R.
Wilberg, Dresden, Germany
Thin Film on ASIC (TFA)-Color Sensors
-
New Applications of Optical
Thin Film Detector
560
J. Giehl, H. Stiebig, P. Rieve, M.
Böhm, Siegen,
Germany
Lift Off Patterning of Thin Film Structures
564
С
Wenzel, N.
Urbansky,
D.
Burmeister, Dresden,
Germany
Implantation
Through Metal as Suitable Technique for Formation of
Shallow p+n Junctions
568
/.
Bešše, L. Hrubčín,
Bratislava, Slovakia;
R. Senderák,
Bratislava, Slovakia; A. P.
Kobzev, Dubna,
Russia
Assessement of the Technological Capacity of High Speed Steel
(HSS)
Cutting Tools Coated with Hard Materials Using the Complex Tools Diagnosis
572
K. Kiinanz, U.
Langer,
Dresden, Germany
Material Selection for Thin Film Thermocouples Operating at Extremely
High Temperatures
576
K. Bewilogua, H.
Hübsch,
R.
Bethge, P.
Willich,
Hamburg, Germany;
M.
Dieckmann, Noordvijk,
The Netherlands;
J.-P. Bugeat, Moissy Cramayel, France
Comparison of Implantation Techniques for Formation of Shallow
p+n Junctions
580
λ
Bešše, L. Hrubčín,
Bratislava, Slovakia;
J. Hlavká, Brno,
Czech Republic;
M. Babinský, Bratislava, Slovakia
The
Influence
of Geometry on the Sensitivity of Semiconductors
584
Thermal Vacuum Sensors
V. Dubravcová, O.
Csabay, Bratislava, Slovakia
Comparative Investigation
of the Wear Behaviour of TiN Monolayer
Coatings, THCN) Multicomponent Coatings and TiC/Ti(C,N)/TiN
Multilayer Coatings Deposited by the Vacuum Arc Method
587
J. Walkowicz, J. Smolik, K.
Miernik,
J.
Bujak, Radom,
Poland
Anodic Arc Evaporation: Application to Web-Coating
591
W. Siefert, Herbolzheim, Germany
Electrophysical Properties and Device Applications of the SiC Thin Films
594
A. A. Lebedev, M. M. Anikin, M. G. Rastegaeva,
N.
S. Savkina,
A. M. Strelchuk, V.
E. Chelnokov, A. St. Petersburg, Russia
IV. Formation of Layer Structure
Modification of Growth Modes in Lattice-Mismatched Epitaxial Systems: Si/Ge
600
H.-J.
Osten,
FrankfurtíOder),
Germany
Controlling Polysilicon Sensor Characteristics by Current Trimming
606
V. A. Gridtchin, S.
Sputai,
Novosibirsk, Russia
Plasma and Surface Modeling for the Deposition of Hydrogenated
Carbon Films
611
W.
Möller, Dresden-Rossendorf,
Germany
Diffusion of Nitrogen in the Ti-N System
-
Formation of Intermediate Phases
614
W. Lengauer, Vienna, Austria
Thermal Ageing of Ni/C Multilayers Produced by Pulsed Laser Deposition
620
R. Krawietz, B. Wehner, Dresden, Germany;
N.
Kallis,
R.
Dietsch,
H. Mai,
Dresden, Germany
Interface Stability and Silizide Formation in High Temperature Stable
MOxSiy/Si Multilayer Soft
Х
-Ray Mirrors Studied by Means of X-Ray
Diffraction and
ТЕМ
624
U.
Kleineberg,
H. J.
Stock,
A.
Kloidt,
В.
Schmiedeskamp,
U.
Heinzmann,
Bielefeld,
Germany;
5. Hopfe,
R.
Scholz,
Halle(Saale),
Germany
Physical and Electronic Properties of Thin Siliconoxynitride Layers
Prepared by Rapid Thermal Processing
628
R. Beyer, H. Burghardt, G.
Prösch,
E.
Thomas,
R.
Reich,
Chemnitz, Germany; D. Grambole, F. Herrmann, Dresden-Rossendorf, Germany;
G. Weidner, FrankfurKQder); H. Syhre, K. Dittmar, Dresden, Germany
Ion Kinetics in RF-Plasmas for Surface Modification of Polymers
632
M. Zeuner, J. Meichsner, Chemnitz, Germany
Interdiffusion
in r-Component (r>2) Alloys; the Mathematical Model
for Thin Films
636
M. Danielewski, R. Filipek, Cracow, Poland;
K. Holly,
W. Krzyżański,
Cracow, Poland
Deposition of Glass-Ceramic Layers from a Beam of Particles Accelerated
by a High-Voltage Electric Field
640
A. Olszyna,
I. Zacharenko, Warsaw, Poland
Effect of Rapid Cooling and Heating on the Plasma-Enhanced Crystallization
of Layers of High-Melting Materials from Gaseous Phase
645
A. Olszyna,
A. Michalskí, K.
Zdunek, A. Sokołowska,
Warsaw, Poland
Characterization and Radiation Grafted PVDF and PCVDF/TrFE) Films
650
E. Petersohn,
N.
Betz, A. Le Moël, Gif-sur-Yvette,
France
Thin Film Nanoprocessing by Laser/STM Combination
654
A. A. Gorbunov, W.
Pompe,
Dresden, Germany
Formation and Properties of Borided Layers on Steel Under Glow
Discharge Condititons
658
T.
Wierzchoń,
P.
Bieliňski, D.
Krupa,
Warsaw, Poland
A12O3 Films Formed by Anodic Oxidation of Al-lwt%Si-0.5wt%Cu Films
662
S.
Chiu,
P.-H. Chang, C.-H. Tung, Hsinchu, Taiwan
Х
-Ray Diffraction Analysis of RTP-Annealed Thin ZnO Films
666
O.
Nennewitz,
J.
Schawohl,
L.
Spieß, Ilmenau,
Germany;
H.
Schmidt,
J. Pezoldt, T.
Stauden, Ilmenau,
Germany
Corrosion Resistance of Chromized Layers Produced by the Vacuum
Technique on Low-Carbon Steel
670
E. Kasprzycka, K. Pietrzak, J. Tacikowski, Warsaw, Poland
Infrared Spectroscopy of Plasma Modification Effects in Thin Polymer Films
674
M. Nitschke, J. Meichsner, Chemnitz, Germany
Structure and Morphology of Chromium Diffusion Layers Made on
Low-Carbon Steel in the Process of Vacuum Chromizing
678
E. Kasprzycka, J. Tacikowski, Warsaw, Poland
Ellipsometric Study of Thin Polymer Films Modified in Low Pressure Plasma
682
R. Rochotzki, M.
Arzt,
Chemnitz, Germany
Laser Induced Structural Modification of Excimer Laser Ablated
Carbon Films
686
B. Keiper, S.
Weißmantel,
G.
Reiße, Mittweida,
Germany;
5. Schulze,
Chemnitz, Germany
Graphitisation of Amorphous Carbon C:H Films under Irradiation and
Thermal Treatment
690
A. P. Rubshtein, I. S. Trakhtenberg, Ekaterinburg, Russia
Single MeC or Composite MeC/Me(C,N)/MeN Coatings on High Speed
Steels by Means of an Indirect Method
694
ß. Wendler, Lodz,
Poland
Buffer Layer for Growing 0-SiC on Si
698
J. Stoemenos,
Thessaloniki,
Greece;
fi. Pécz,
P.
В. Вата,
Budapest, Hungary
The Conversation of Momentum and Energy in Open Systems, Diffusional
Approach to the Mass Transport in Solids
702
M. Danielewski, Cracow, Poland
The
ΑΙ
-Fe
and Al-N Phase Formation on the
α
-Fe
Surface by the
Ion-Beam Mixing and Subsequent N+ Ion Implantation
706
1.
G. Munin,
L.
P. Choupiatova, I. A. Komarovsky, E. I. Kolosova,
A. P. Kuprin, Moscow, Russia
Polycrystalline
Iridium
Suicide Film-Structure, Electrical and
Optical Properties
710
J. Schumann, D.
Elefant,
С.
Gladun,
A. Heinrich,
Dresden, Germany;
H.
Lange,
W.
Henrion, Berlin, Germany
High Temperature
Х
-Ray Diffraction Studies of the Phase Formation
Process in Thin
1гхЅ1,.х
films
714
W. Pitschke, A.
Heinrich,
J. Schumann, Dresden, Germany
The Formation of
Agi
in
(100), (110)
and (111) Ag Films
G. Safran,
О.
Geszti,
G.
Radnóczi,
P.
В.
Barna, Budapest, Hungary;
K. Tóth, Budapest, Hungary
Analysis of Diffusion-Limited Growth Al-Mn Quasicrystal Layers by High
Temperature Sequential Deposition
722
G.
Zsigmond,
P. B.
Barna,
Budapest, Hungary;
F. Raschewski, K. Urban,
Julien,
Germany;
A. Csanády,
Budapest, Hungary
Correlation between Texture and Morphology of Polycrystalline Films
726
M. Adamik, P. B.
Barna,
Budapest, Hungary;
/.
Tomov, Sofia, Bulgaria
Mechanisms of Low Temperature Silicid Creation
730
A. E. Kiv, V. V. Kovalchuk, E. P. Britavskaya, Odessa, Ukraine
|
| any_adam_object | 1 |
| building | Verbundindex |
| bvnumber | BV009851554 |
| classification_rvk | UP 7500 |
| classification_tum | PHY 803f ELT 279f PHY 658f |
| ctrlnum | (OCoLC)311918402 (DE-599)BVBBV009851554 |
| dewey-full | 530.4/275 |
| dewey-hundreds | 500 - Natural sciences and mathematics |
| dewey-ones | 530 - Physics |
| dewey-raw | 530.4/275 |
| dewey-search | 530.4/275 |
| dewey-sort | 3530.4 3275 |
| dewey-tens | 530 - Physics |
| discipline | Physik Elektrotechnik |
| format | Conference Proceeding Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1994 Dresden gnd-content |
| genre_facet | Konferenzschrift 1994 Dresden |
| id | DE-604.BV009851554 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:41:59Z |
| institution | BVB |
| institution_GND | (DE-588)2140066-0 (DE-588)2140067-2 |
| isbn | 3883551996 |
| language | German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006521521 |
| oclc_num | 311918402 |
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| owner | DE-703 DE-29T DE-384 DE-91 DE-BY-TUM DE-83 DE-634 |
| owner_facet | DE-703 DE-29T DE-384 DE-91 DE-BY-TUM DE-83 DE-634 |
| physical | 733, [30] S. Ill., graph. Darst. |
| publishDate | 1994 |
| publishDateSearch | 1994 |
| publishDateSort | 1994 |
| publisher | DGM-Informationsges., Verl. |
| record_format | marc |
| spelling | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] ed. by G. Hecht ... Oberursel DGM-Informationsges., Verl. 1994 733, [30] S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Dünne Schicht (DE-588)4136925-7 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1994 Dresden gnd-content Dünne Schicht (DE-588)4136925-7 s DE-604 Hecht, Günther Sonstige oth International Symposium on Trends and New Applications in Thin Films 4 1994 Dresden Sonstige (DE-588)2140066-0 oth Conference on High Vacuum, Interfaces and Thin Films 11 1994 Dresden Sonstige (DE-588)2140067-2 oth Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006521521&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] Dünne Schicht (DE-588)4136925-7 gnd |
| subject_GND | (DE-588)4136925-7 (DE-588)1071861417 |
| title | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] |
| title_auth | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] |
| title_exact_search | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] |
| title_full | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] ed. by G. Hecht ... |
| title_fullStr | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] ed. by G. Hecht ... |
| title_full_unstemmed | Thin Films proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] ed. by G. Hecht ... |
| title_short | Thin Films |
| title_sort | thin films proceedings of the joint 4th international symposium on trends and new applications in thin films tatf 94 and the 11th conference on high vacuum interfaces and thin films hvitf 94 dresden march 7 11 1994 |
| title_sub | proceedings of the joint 4th International Symposium on Trends and New Applications in Thin Films - TATF '94 and the 11th Conference on High Vacuum, Interfaces and Thin Films - HVITF '94 ; [Dresden, March 7 - 11, 1994] |
| topic | Dünne Schicht (DE-588)4136925-7 gnd |
| topic_facet | Dünne Schicht Konferenzschrift 1994 Dresden |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006521521&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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