Introduction to microlithography:
Gespeichert in:
Format: | Buch |
---|---|
Sprache: | English |
Veröffentlicht: |
Washington, DC
American Chemical Society
1994
|
Ausgabe: | 2. ed. |
Schriftenreihe: | ACS professional reference book
|
Schlagworte: | |
Beschreibung: | XIV, 527 S. graph. Darst. |
ISBN: | 0841228485 |
Internformat
MARC
LEADER | 00000nam a2200000 c 4500 | ||
---|---|---|---|
001 | BV009799172 | ||
003 | DE-604 | ||
005 | 00000000000000.0 | ||
007 | t | ||
008 | 940909s1994 d||| |||| 00||| eng d | ||
020 | |a 0841228485 |9 0-8412-2848-5 | ||
035 | |a (OCoLC)29359317 | ||
035 | |a (DE-599)BVBBV009799172 | ||
040 | |a DE-604 |b ger |e rakddb | ||
041 | 0 | |a eng | |
049 | |a DE-29T |a DE-703 |a DE-188 | ||
050 | 0 | |a TR940 | |
082 | 0 | |a 621.3815/31 |2 20 | |
084 | |a ZN 4170 |0 (DE-625)157366: |2 rvk | ||
245 | 1 | 0 | |a Introduction to microlithography |c ed. by Larry F. Thompson ... |
250 | |a 2. ed. | ||
264 | 1 | |a Washington, DC |b American Chemical Society |c 1994 | |
300 | |a XIV, 527 S. |b graph. Darst. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
490 | 0 | |a ACS professional reference book | |
650 | 7 | |a Materiais e dispositivos semicondutores |2 larpcal | |
650 | 4 | |a Microlithography |v Congresses | |
650 | 4 | |a Photoresists |v Congresses | |
650 | 4 | |a Plasma etching |v Congresses | |
650 | 4 | |a Semiconductors |x Etching |v Congresses | |
650 | 0 | 7 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |2 gnd |9 rswk-swf |
655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |2 gnd-content | |
689 | 0 | 0 | |a Fotolithografie |g Halbleitertechnologie |0 (DE-588)4174516-4 |D s |
689 | 0 | |5 DE-604 | |
700 | 1 | |a Thompson, Larry F. |e Sonstige |4 oth | |
999 | |a oai:aleph.bib-bvb.de:BVB01-006483421 |
Datensatz im Suchindex
_version_ | 1804124148298940416 |
---|---|
any_adam_object | |
building | Verbundindex |
bvnumber | BV009799172 |
callnumber-first | T - Technology |
callnumber-label | TR940 |
callnumber-raw | TR940 |
callnumber-search | TR940 |
callnumber-sort | TR 3940 |
callnumber-subject | TR - Photography |
classification_rvk | ZN 4170 |
ctrlnum | (OCoLC)29359317 (DE-599)BVBBV009799172 |
dewey-full | 621.3815/31 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 621 - Applied physics |
dewey-raw | 621.3815/31 |
dewey-search | 621.3815/31 |
dewey-sort | 3621.3815 231 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
edition | 2. ed. |
format | Book |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01425nam a2200421 c 4500</leader><controlfield tag="001">BV009799172</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">940909s1994 d||| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0841228485</subfield><subfield code="9">0-8412-2848-5</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)29359317</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV009799172</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-188</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TR940</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/31</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ZN 4170</subfield><subfield code="0">(DE-625)157366:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Introduction to microlithography</subfield><subfield code="c">ed. by Larry F. Thompson ...</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">2. ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, DC</subfield><subfield code="b">American Chemical Society</subfield><subfield code="c">1994</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XIV, 527 S.</subfield><subfield code="b">graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="0" ind2=" "><subfield code="a">ACS professional reference book</subfield></datafield><datafield tag="650" ind1=" " ind2="7"><subfield code="a">Materiais e dispositivos semicondutores</subfield><subfield code="2">larpcal</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Microlithography</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photoresists</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Fotolithografie</subfield><subfield code="g">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4174516-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Thompson, Larry F.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-006483421</subfield></datafield></record></collection> |
genre | (DE-588)1071861417 Konferenzschrift gnd-content |
genre_facet | Konferenzschrift |
id | DE-604.BV009799172 |
illustrated | Illustrated |
indexdate | 2024-07-09T17:41:03Z |
institution | BVB |
isbn | 0841228485 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006483421 |
oclc_num | 29359317 |
open_access_boolean | |
owner | DE-29T DE-703 DE-188 |
owner_facet | DE-29T DE-703 DE-188 |
physical | XIV, 527 S. graph. Darst. |
publishDate | 1994 |
publishDateSearch | 1994 |
publishDateSort | 1994 |
publisher | American Chemical Society |
record_format | marc |
series2 | ACS professional reference book |
spelling | Introduction to microlithography ed. by Larry F. Thompson ... 2. ed. Washington, DC American Chemical Society 1994 XIV, 527 S. graph. Darst. txt rdacontent n rdamedia nc rdacarrier ACS professional reference book Materiais e dispositivos semicondutores larpcal Microlithography Congresses Photoresists Congresses Plasma etching Congresses Semiconductors Etching Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift gnd-content Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s DE-604 Thompson, Larry F. Sonstige oth |
spellingShingle | Introduction to microlithography Materiais e dispositivos semicondutores larpcal Microlithography Congresses Photoresists Congresses Plasma etching Congresses Semiconductors Etching Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
subject_GND | (DE-588)4174516-4 (DE-588)1071861417 |
title | Introduction to microlithography |
title_auth | Introduction to microlithography |
title_exact_search | Introduction to microlithography |
title_full | Introduction to microlithography ed. by Larry F. Thompson ... |
title_fullStr | Introduction to microlithography ed. by Larry F. Thompson ... |
title_full_unstemmed | Introduction to microlithography ed. by Larry F. Thompson ... |
title_short | Introduction to microlithography |
title_sort | introduction to microlithography |
topic | Materiais e dispositivos semicondutores larpcal Microlithography Congresses Photoresists Congresses Plasma etching Congresses Semiconductors Etching Congresses Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd |
topic_facet | Materiais e dispositivos semicondutores Microlithography Congresses Photoresists Congresses Plasma etching Congresses Semiconductors Etching Congresses Fotolithografie Halbleitertechnologie Konferenzschrift |
work_keys_str_mv | AT thompsonlarryf introductiontomicrolithography |