Wang, C. (1993). Etching of single crystalline silicon by hydrogen plasma and silicon deposition from Si 2 H 6 and SiH 4 for low temperature silicon epitaxy.
Chicago-Zitierstil (17. Ausg.)Wang, Chunlin. Etching of Single Crystalline Silicon by Hydrogen Plasma and Silicon Deposition from Si 2 H 6 and SiH 4 for Low Temperature Silicon Epitaxy. 1993.
MLA-Zitierstil (9. Ausg.)Wang, Chunlin. Etching of Single Crystalline Silicon by Hydrogen Plasma and Silicon Deposition from Si 2 H 6 and SiH 4 for Low Temperature Silicon Epitaxy. 1993.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.