Proceedings: September 25 - 27, 1991 ; Sunnyvale, California
Gespeichert in:
| Körperschaft: | |
|---|---|
| Format: | Tagungsbericht Buch |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1992
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers
1604 |
| Schlagworte: | |
| Online-Zugang: | Inhaltsverzeichnis |
| Beschreibung: | VII, 348 S. Ill., graph. Darst. |
| ISBN: | 081940733X |
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| 111 | 2 | |a Symposium on Photomask Technology |n 11 |d 1991 |c Sunnyvale, Calif. |j Verfasser |0 (DE-588)5066813-4 |4 aut | |
| 245 | 1 | 0 | |a Proceedings |b September 25 - 27, 1991 ; Sunnyvale, California |c 11th Annual Symposium on Photomask Technology |
| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1992 | |
| 300 | |a VII, 348 S. |b Ill., graph. Darst. | ||
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| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers |v 1604 | |
| 650 | 4 | |a Integrated circuits |x Masks |v Congresses | |
| 650 | 4 | |a Microlithography |v Congresses | |
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Datensatz im Suchindex
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| adam_text | 1
1th ANNUAL SYMPOSIUM
ON PHOTOMASK TECHNOLOGY
SPIE
Volume
1604
CONTENTS
Conference Committee
..................................................................
v
Introduction
.........................................................................
vii
KEYNOTE ADDRESS
1604-40
Evolution of the photomask industry (Keynote Address)
A. T. White, LSI Logic Corp. of Canada, Inc. (Canada)
.......................................2
SESSION
1
DATA MANAGEMENT
1604-01
Automated critical dimension and registration communication
P. DePesa,
Diámon
Images; T. Pegelow, Transcription Enterprises Ltd
...........................26
SESSION
2
LITHOGRAPHY
1604-03
Positional errors due to substrate charging in
е
-beam lithography took
M.
A. Sturane,
J. G. Smolinski, J.
A. Robinson, IBM/General Technology
Div...................
36
1604-05
Pattern generator specification for phase-ehift 5X reticles
J.
Trotei,
European Lithography Innovation
SA
(France)
.....................................45
1604-06
Improved performance of
a CORE-ŽIOO
through a joint development program
B. Schafinan,
C. H.
Geller,
ATEQCorp.;
C. E.
Franks,
Micro
Mask, he
........................55
1604-07
Reflective masks for IX deep ultraviolet lithography
R. L. Hsieh, Y. Y. Lee,
N. L
Maluf, R. Browning, P. Jerabek,
R. F.
Pease, Stanford Univ.;
G. Owen, Hewlett-Packard Co
...........................................................67
1604-08
Advanced
е
-beam lithography system in producing high-quality reticle for 64M-DRAM
K. Kawasaki, K. Nakamura, T. Matsuzaka, H. Ohta,
N.
Saitou, T.
Копо, М.
Hoga, Hitachi,
Ltd. (Japan)
..........................................................................78
1604-09
Comparison of reflective mask technologies for soft x-ray projection lithography
D. M. Tennant, J. E. Bjorkholm, L. Eichner, R. R. Freeman, T. E. Jewell,
AT&T
Bell Labs.;
A. A. MacDowell,
Brookhaven
National
Lab.;
J. Z.
Pastalan,
L. H.
Sast»,
W.
К.
Waskiewkz,
D. L.
White,
D. L·
Windt,
O. R.
Wood II,
AT&T
Bell Labs
..................................91
SESSION
3
CLEANING AND PELLICLIZATION
1604-10
Prmtability of pellicle defect» in DUV 05-iim lithography
P. Yan, Intel Corp.; M. S. Yeung, Univ. of California/Berkeley; H. Gaw, Intel Corp
..............106
1604-11
New look at incoming pellicle inspection
R. W. Murphy, Apex Corp.; J. A. Reynolds, Reynolds Consulting
............................118
1604-33
Discriminating
submicron
lithography
proce«
variation· with a white light conf
ocal
scanning optical microscope
F. S. Menagh, G. Q. Xiao, Technical Instrument Co.; M. V.
Dusa,
Seeq Technology, btc
..........130
1604-31
lithography process improvements using bag-in-a-botde chemical packaging
and delivery system
J. Waldman, R. Wilson, Now Technologies,
Inc
............................................141
(continued)
SPIEVol.
1604 1
1
th Annual BACUS Symposium on Photomask Technology (t
991)/
iii
1
1th ANNUAL SYMPOSIUM
ON PHOTOMASK TECHNOLOGY
SPIE
Volume
1604
SESSION
4
INSPECTION AND REPAIR
1604- 13
Attenuiti ve
to die-to-database
шаяк
inspection
P. Chen, Taiwan Mask Corp. (Taiwan).
..................................................156
1604-14
Next generation laser-based mask repair tool
J. O Connor, Z. M. Droidowkx, J. K.
Tison,
Quantronix Corp..
..............................167
1604-15
Reticle defert sizing and printability
B. J. Grenon, K. D. Badger, M. J. Trybendis, IBM/General Technology
Div
.....................179
1604-16
Zero-bias PBS process for 5X reticles
R. G. Tarascon, C. Pierrat, M. Stohl, C.
Braun,
J. Burdorf, S. Vaidya, AT&T Bell Labs
...........196
SESSION
5
METROLOGY
1604-17
Two-dimensional photomask
standarde
calibration
W. Haessler-Grohne, Physikalisch-Technische
Bundesanstalt
(FRG); H. Paul,
Leica GmbH
(FRG)
..................................................................212
SESSION
6
PHASE-SHIFT MASKS
1604-20
Phase-shifting mask design tool
D. M. Newmark, A. R. Neureuther, Univ. of California/Berkeley
.............................226
1604-21
Issues associated with die commercialization of phase-shift masks
J. L. Nistler, Advanced Micro Devices, Inc.; G. P. Hughes, DuPont Photomasks; A. Muray, ETEC
Systems, Inc.; J.
N.
Wiley,
KLA
Instruments Corp
.......................................... 236
1604-30
Specifying phase-shift mask image quality parameters
P. D. Buck, M. L. Rieger, ATEQCorp
...................................................265
1604-22
Optimization of real phase-mask performance
F. M. Schellenberg,
M. D.
Levenson, P. J. Brock, IBM/
Almadén
Research Ctr
...................274
1604-23
Evaluation of practical properties of a spin-on-glass for a shifter of phase-shift masks
H. Miyashita, K.
Mikami,
H.
Sano,
Dai
Nippon
Printing Co., Ltd. (Japan)
......................297
1604-28
Continuous-slope phase-shift transition
A. K.
Pfau,
E.
W.
Scheckler,
D. M. Newmark, A. R.
Neureuther, Univ. of California/Berkeley.
... 308
SESSION
7
QUALITY
MANAGEMENT
1604-24
Focusing on continuous improvement
О.
Elliott,
Ord
Elliot
Enterprises
........................................................318
1604-25
Organizational dynamics and the pursuit of total quality
D. M. Bradley, Silicon Valley Group,
Inc
..................................................325
1604-27
Economic survival in the
COs
J. W. Giffin, GTech Enterprises
.........................................................336
Addendum
..........................................................................347
Author Index
........................................................................348
iv
/SPKVol
1604
11th AnnualBACUS Symposium on Photomask Technology
(1991)
|
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| genre_facet | Konferenzschrift 1991 Sunnyvale Calif. |
| id | DE-604.BV009533751 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:36:39Z |
| institution | BVB |
| institution_GND | (DE-588)5066813-4 |
| isbn | 081940733X |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006295581 |
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| physical | VII, 348 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | SPIE |
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| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers |
| spelling | Symposium on Photomask Technology 11 1991 Sunnyvale, Calif. Verfasser (DE-588)5066813-4 aut Proceedings September 25 - 27, 1991 ; Sunnyvale, California 11th Annual Symposium on Photomask Technology Bellingham, Wash. SPIE 1992 VII, 348 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers 1604 Integrated circuits Masks Congresses Microlithography Congresses Maskentechnik (DE-588)4125845-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 Sunnyvale Calif. gnd-content Maskentechnik (DE-588)4125845-9 s DE-604 Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers 1604 (DE-604)BV000010887 1604 Digitalisierung TU Muenchen application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006295581&sequence=000002&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
| spellingShingle | Proceedings September 25 - 27, 1991 ; Sunnyvale, California Society of Photo-Optical Instrumentation Engineers: Proceedings of the Society of Photo-optical Instrumentation Engineers Integrated circuits Masks Congresses Microlithography Congresses Maskentechnik (DE-588)4125845-9 gnd |
| subject_GND | (DE-588)4125845-9 (DE-588)1071861417 |
| title | Proceedings September 25 - 27, 1991 ; Sunnyvale, California |
| title_auth | Proceedings September 25 - 27, 1991 ; Sunnyvale, California |
| title_exact_search | Proceedings September 25 - 27, 1991 ; Sunnyvale, California |
| title_full | Proceedings September 25 - 27, 1991 ; Sunnyvale, California 11th Annual Symposium on Photomask Technology |
| title_fullStr | Proceedings September 25 - 27, 1991 ; Sunnyvale, California 11th Annual Symposium on Photomask Technology |
| title_full_unstemmed | Proceedings September 25 - 27, 1991 ; Sunnyvale, California 11th Annual Symposium on Photomask Technology |
| title_short | Proceedings |
| title_sort | proceedings september 25 27 1991 sunnyvale california |
| title_sub | September 25 - 27, 1991 ; Sunnyvale, California |
| topic | Integrated circuits Masks Congresses Microlithography Congresses Maskentechnik (DE-588)4125845-9 gnd |
| topic_facet | Integrated circuits Masks Congresses Microlithography Congresses Maskentechnik Konferenzschrift 1991 Sunnyvale Calif. |
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