Dry etch technology: 9 - 10 September 1991, San Jose, California
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Wash.
SPIE
1992
|
| Schriftenreihe: | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE
1593 |
| Schlagworte: | |
| Beschreibung: | VIII, 222 S. Ill., graph. Darst. |
| ISBN: | 0819407240 |
Internformat
MARC
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| 264 | 1 | |a Bellingham, Wash. |b SPIE |c 1992 | |
| 300 | |a VIII, 222 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
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| 490 | 1 | |a Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |v 1593 | |
| 650 | 4 | |a Microelectronics |x Materials |v Congresses | |
| 650 | 4 | |a Plasma etching |v Congresses | |
| 650 | 4 | |a Semiconductors |x Etching |v Congresses | |
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Datensatz im Suchindex
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| callnumber-search | TK7871.85 |
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| dewey-search | 621.3815/2 |
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| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
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| genre | (DE-588)1071861417 Konferenzschrift 1991 San Jose Calif. gnd-content |
| genre_facet | Konferenzschrift 1991 San Jose Calif. |
| id | DE-604.BV009532541 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T17:36:38Z |
| institution | BVB |
| isbn | 0819407240 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006294571 |
| oclc_num | 27643118 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | VIII, 222 S. Ill., graph. Darst. |
| publishDate | 1992 |
| publishDateSearch | 1992 |
| publishDateSort | 1992 |
| publisher | SPIE |
| record_format | marc |
| series | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| series2 | Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE |
| spelling | Dry etch technology 9 - 10 September 1991, San Jose, California Deepak Ranadive (chair) Bellingham, Wash. SPIE 1992 VIII, 222 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1593 Microelectronics Materials Congresses Plasma etching Congresses Semiconductors Etching Congresses Trockenätzen (DE-588)4222074-9 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1991 San Jose Calif. gnd-content Trockenätzen (DE-588)4222074-9 s DE-604 Ranadive, Deepak Sonstige oth Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE 1593 (DE-604)BV000010887 1593 |
| spellingShingle | Dry etch technology 9 - 10 September 1991, San Jose, California Society of Photo-Optical Instrumentation Engineers: Proceedings of SPIE Microelectronics Materials Congresses Plasma etching Congresses Semiconductors Etching Congresses Trockenätzen (DE-588)4222074-9 gnd |
| subject_GND | (DE-588)4222074-9 (DE-588)1071861417 |
| title | Dry etch technology 9 - 10 September 1991, San Jose, California |
| title_auth | Dry etch technology 9 - 10 September 1991, San Jose, California |
| title_exact_search | Dry etch technology 9 - 10 September 1991, San Jose, California |
| title_full | Dry etch technology 9 - 10 September 1991, San Jose, California Deepak Ranadive (chair) |
| title_fullStr | Dry etch technology 9 - 10 September 1991, San Jose, California Deepak Ranadive (chair) |
| title_full_unstemmed | Dry etch technology 9 - 10 September 1991, San Jose, California Deepak Ranadive (chair) |
| title_short | Dry etch technology |
| title_sort | dry etch technology 9 10 september 1991 san jose california |
| title_sub | 9 - 10 September 1991, San Jose, California |
| topic | Microelectronics Materials Congresses Plasma etching Congresses Semiconductors Etching Congresses Trockenätzen (DE-588)4222074-9 gnd |
| topic_facet | Microelectronics Materials Congresses Plasma etching Congresses Semiconductors Etching Congresses Trockenätzen Konferenzschrift 1991 San Jose Calif. |
| volume_link | (DE-604)BV000010887 |
| work_keys_str_mv | AT ranadivedeepak dryetchtechnology910september1991sanjosecalifornia |