Special issue on the physics of RF discharges for plasma processing:
Gespeichert in:
| Format: | Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
New York
1986
|
| Schlagworte: | |
| Beschreibung: | In: Institute of Electrical and Electronics Engineers: IEEE transactions on plasma science ; 14. 1986 2 |
| Beschreibung: | S. 77 - 196 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV009220382 | ||
| 003 | DE-604 | ||
| 005 | 00000000000000.0 | ||
| 007 | t | ||
| 008 | 940313s1986 |||| 00||| eng d | ||
| 035 | |a (OCoLC)35443197 | ||
| 035 | |a (DE-599)BVBBV009220382 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-29T | ||
| 245 | 1 | 0 | |a Special issue on the physics of RF discharges for plasma processing |
| 264 | 1 | |a New York |c 1986 | |
| 300 | |a S. 77 - 196 | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a In: Institute of Electrical and Electronics Engineers: IEEE transactions on plasma science ; 14. 1986 2 | ||
| 650 | 0 | 7 | |a Plasmatechnik |0 (DE-588)4140353-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Hochfrequenzentladung |0 (DE-588)4298594-8 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Plasmatechnik |0 (DE-588)4140353-8 |D s |
| 689 | 0 | 1 | |a Hochfrequenzentladung |0 (DE-588)4298594-8 |D s |
| 689 | 0 | |5 DE-604 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-006130112 | ||
Datensatz im Suchindex
| _version_ | 1804123663090319360 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV009220382 |
| ctrlnum | (OCoLC)35443197 (DE-599)BVBBV009220382 |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00993nam a2200301 c 4500</leader><controlfield tag="001">BV009220382</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">940313s1986 |||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)35443197</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV009220382</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-29T</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Special issue on the physics of RF discharges for plasma processing</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="c">1986</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">S. 77 - 196</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">In: Institute of Electrical and Electronics Engineers: IEEE transactions on plasma science ; 14. 1986 2</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Hochfrequenzentladung</subfield><subfield code="0">(DE-588)4298594-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Plasmatechnik</subfield><subfield code="0">(DE-588)4140353-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Hochfrequenzentladung</subfield><subfield code="0">(DE-588)4298594-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-006130112</subfield></datafield></record></collection> |
| id | DE-604.BV009220382 |
| illustrated | Not Illustrated |
| indexdate | 2024-07-09T17:33:21Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006130112 |
| oclc_num | 35443197 |
| open_access_boolean | |
| owner | DE-29T |
| owner_facet | DE-29T |
| physical | S. 77 - 196 |
| publishDate | 1986 |
| publishDateSearch | 1986 |
| publishDateSort | 1986 |
| record_format | marc |
| spelling | Special issue on the physics of RF discharges for plasma processing New York 1986 S. 77 - 196 txt rdacontent n rdamedia nc rdacarrier In: Institute of Electrical and Electronics Engineers: IEEE transactions on plasma science ; 14. 1986 2 Plasmatechnik (DE-588)4140353-8 gnd rswk-swf Hochfrequenzentladung (DE-588)4298594-8 gnd rswk-swf Plasmatechnik (DE-588)4140353-8 s Hochfrequenzentladung (DE-588)4298594-8 s DE-604 |
| spellingShingle | Special issue on the physics of RF discharges for plasma processing Plasmatechnik (DE-588)4140353-8 gnd Hochfrequenzentladung (DE-588)4298594-8 gnd |
| subject_GND | (DE-588)4140353-8 (DE-588)4298594-8 |
| title | Special issue on the physics of RF discharges for plasma processing |
| title_auth | Special issue on the physics of RF discharges for plasma processing |
| title_exact_search | Special issue on the physics of RF discharges for plasma processing |
| title_full | Special issue on the physics of RF discharges for plasma processing |
| title_fullStr | Special issue on the physics of RF discharges for plasma processing |
| title_full_unstemmed | Special issue on the physics of RF discharges for plasma processing |
| title_short | Special issue on the physics of RF discharges for plasma processing |
| title_sort | special issue on the physics of rf discharges for plasma processing |
| topic | Plasmatechnik (DE-588)4140353-8 gnd Hochfrequenzentladung (DE-588)4298594-8 gnd |
| topic_facet | Plasmatechnik Hochfrequenzentladung |