Materials fundamentals of molecular beam epitaxy:
Gespeichert in:
1. Verfasser: | |
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Format: | Buch |
Sprache: | English |
Veröffentlicht: |
Boston [u.a.]
Acad. Press
1993
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Schlagworte: | |
Online-Zugang: | Inhaltsverzeichnis |
Beschreibung: | XXI, 301 S. Ill., graph. Darst. |
ISBN: | 0127016252 |
Internformat
MARC
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245 | 1 | 0 | |a Materials fundamentals of molecular beam epitaxy |c Jeffrey Y. Tsao |
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650 | 4 | |a Faisceaux moléculaires | |
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650 | 4 | |a Surfaces (Technologie) | |
650 | 4 | |a Épitaxie | |
650 | 4 | |a Molecular beam epitaxy | |
650 | 4 | |a Surfaces (Physics) | |
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Datensatz im Suchindex
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adam_text | MATERIALS FUNDAMENTALS OF MOLECULAR BEAM EPITAXY JEFFREY Y. TSAO SANDIA
NATIONAL LABORATORIES ALBUQUERQUE, NEW MEXICO ACADEMIC PRESS, INC.
HARCOURT BRACE JOVANOVICH, PUBLISHERS BOSTON SAN DIEGO NEW BRK LONDON
SYDNEY TOKYO TORONTO CONTENTS PREFACE XI LIST OF FIGURES XVII LIST OF
TABLES XXI I BULK PHASE EQUILIBRIA 1 1 FREE ENERGIES AND OPEN SYSTEMS 3
1.1 CLOSED SYSTEMS 4 1.2 OPEN SYSTEMS 6 1.3 THERMODYNAMICS OF A
CAPACITOR 8 1.4 DRIVING FORCES FOR TRANSFORMATIONS 9 2 ELEMENTAL PHASES
13 2.1 NOMENCLATURE AND PRELIMINARIES 14 2.1.1 HEAT CAPACITIES AND
THERMODYNAMICS 16 2.1.2 PARTITION FUNCTIONS AND STATISTICAL MECHANICS
... 16 2.2 CONDENSED PHASES 18 2.3 VAPOR PHASES 21 2.3.1 MONOMERIC
VAPORS 22 2.3.2 DIMERIC VAPORS 24 2.4 TWO SIMPLE ELEMENTS: SI AND GE 26
2.4.1 MOLAR HEAT CAPACITIES 27 2.4.2 MOLAR ENTROPY AND ENTHALPY OFFSETS
32 2.4.3 MOLAR GIBBS FREE ENERGIES 37 3 ALLOY PHASES 43 3.1 NOMENCLATURE
AND PRELIMINARIES 44 3.1.1 ONE PHASE, TWO COMPONENTS 44 3.1.2 TWO
PHASES, TWO COMPONENTS 45 VN VLLL 3.2 MODELS OF SOLUTIONS 49 3.2.1
PERFECT SOLUTIONS 50 3.2.2 IDEAL SOLUTIONS 52 3.2.3 REGULAER
SOLUTIONS 53 3.3 A NEARLY IDEAL SOLUTION: SIGE 56 3.3.1 FREE ENERGIES 57
3.3.2 PHASE EQUILIBRIA 58 3.3.3 CONDENSATION AND SUBLIMATION 61 3.4 A
STOICHIOMETRIC COMPOUND: GAAS 65 3.4.1 FREE ENERGIES 66 3.4.2 PHASE
EQUILIBRIA 71 3.4.3 THE MBE WINDOW 74 3.4.4 CONGRUENT AND INCONGRUENT
SUBLIMATION 78 3.4.5 VAPOR PRESSURES 83 II THIN FILM STRUCTURE AND
MICROSTRUCTURE 91 4 ORDERING AND CLUSTERING 93 4.1 MICROSCOPIC STRAIN 94
4.1.1 VIRTUAL CRYSTALS AND COVALENT RADII 94 4.1.2 MIXING ENTHALPIES 101
4.2 MACROSCOPIC STRAIN 103 4.3 THE CLUSTER VARIATION METHOD 107 4.3.1 1D
LINEAR LATTICE 108 4.3.2 2D TRIANGULAER LATTICE 115 4.3.3 3D ZINCBLENDE
LATTICE 119 4.4 A PSEUDOBINARY III-V ALLOY: INGAAS 125 4.4.1
TETRAHEDRA ENERGIES 128 4.4.2 TETRAHEDRA PROBABILITIES 135 4.4.3 FREE
ENERGIES 136 4.4.4 SHORT-RANGE ORDERING 140 4.5 SEMI-EMPIRICAL MODELS
142 4.5.1 FREE ENERGIES 143 4.5.2 PHASE DIAGRAMS 145 5 COHERENCY AND
SEMI-COHERENCY 151 5.1 ENERGETICS OF MISFIT ACCOMMODATION 154 5.1.1
COHERENCY STRAIN 154 5.1.2 MISFIT DISLOCATIONS 158 5.1.3 EQUILIBRIUM
STRAINS AND DISLOCATION DENSITIES . . . 163 5.2 FORCES ON DISLOCATIONS
169 5.2.1 STRAINED SURFACE LAYERS 169 CONTENTS IX 5.2.2 STRAINED BURIED
LAYERS 172 5.2.3 GENERALIZED EXCESS STRESS 174 5.3 RELAXATION OF STRAIN
179 5.3.1 DEFORMATION MECHANISM MAPS 180 5.3.2 A SIMPLE PHENOMENOLOGICAL
MODEL 183 5.3.3 TIME, TEMPERATURE AND EXCESS STRESS 186 5.3.4 STABILITY
DIAGRAMS 187 III SURFACE MORPHOLOGY AND COMPOSITION 199 6 SURFACE
MORPHOLOGY 201 6.1 STATISTICS OF ADATOMS, KINKS, AND STEPS 202 6.1.1
ADATOMS ON SINGULAR SURFACES 203 6.1.2 KINKS IN ISOLATED STEPS 206 6.1.3
STEPS ON VICINAL SURFACES 211 6.2 EQUILIBRIUM MORPHOLOGY 215 6.2.1
SHAPES OF CRYSTALS: WULFFS THEOREM 216 6.2.2 SHAPES OF SURFACES:
FACETTING 222 6.2.3 SHAPES OF THIN FILMS: GROWTH MODES 232 6.3
NONEQUILIBRIUM MORPHOLOGY 236 6.3.1 FAST ADATOMS AND DIFFUSIVE STEP
FLOW 239 6.3.2 SLOW ADATOMS AND CONVECTIVE STEP FLOW 242 6.3.3 2D
CLUSTER NUCLEATION, GROWTH AND COALESCENCE . . 247 6.3.4 STATISTICAL
ROUGHENING 254 7 SURFACE COMPOSITION 259 7.1 MONOLAYER THERMODYNAMICS
260 7.1.1 SURFACE FREE ENERGIES AND CHEMICAL POTENTIALS . . . 261 7.1.2
ATOM TRANSFERS BETWEEN SURFACE AND BULK 264 7.2 ADSORPTION AND
DESORPTION 269 7.2.1 ADSORPTION ISOTHERMS AND ISOBARS 269 7.2.2 STICKING
COEFFICIENTS AND DESORPTION 272 7.3 SURFACE SEGREGATION AND TRAPPING 275
7.3.1 STEADY-STATE COMPOSITIONAL PARTITIONING 275 7.3.2 NON-STEADY-STATE
COMPOSITIONAL PARTITIONING . . . 279 INDEX 287 V
|
any_adam_object | 1 |
author | Tsao, Jeffrey Y. |
author_facet | Tsao, Jeffrey Y. |
author_role | aut |
author_sort | Tsao, Jeffrey Y. |
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building | Verbundindex |
bvnumber | BV009051888 |
callnumber-first | Q - Science |
callnumber-label | QC611 |
callnumber-raw | QC611.6.M64 |
callnumber-search | QC611.6.M64 |
callnumber-sort | QC 3611.6 M64 |
callnumber-subject | QC - Physics |
classification_rvk | UQ 2200 |
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ctrlnum | (OCoLC)26720166 (DE-599)BVBBV009051888 |
dewey-full | 620/.44 |
dewey-hundreds | 600 - Technology (Applied sciences) |
dewey-ones | 620 - Engineering and allied operations |
dewey-raw | 620/.44 |
dewey-search | 620/.44 |
dewey-sort | 3620 244 |
dewey-tens | 620 - Engineering and allied operations |
discipline | Physik Elektrotechnik |
format | Book |
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indexdate | 2024-07-09T17:29:17Z |
institution | BVB |
isbn | 0127016252 |
language | English |
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physical | XXI, 301 S. Ill., graph. Darst. |
publishDate | 1993 |
publishDateSearch | 1993 |
publishDateSort | 1993 |
publisher | Acad. Press |
record_format | marc |
spelling | Tsao, Jeffrey Y. Verfasser aut Materials fundamentals of molecular beam epitaxy Jeffrey Y. Tsao Boston [u.a.] Acad. Press 1993 XXI, 301 S. Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier Faisceaux moléculaires Moleculaire-bundelepitaxie gtt Surfaces (Physique) Surfaces (Technologie) Épitaxie Molecular beam epitaxy Surfaces (Physics) Surfaces (Technology) Molekularstrahlepitaxie (DE-588)4170399-6 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 gnd rswk-swf Festkörperoberfläche (DE-588)4127823-9 s Molekularstrahlepitaxie (DE-588)4170399-6 s DE-604 GBV Datenaustausch application/pdf http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005991502&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA Inhaltsverzeichnis |
spellingShingle | Tsao, Jeffrey Y. Materials fundamentals of molecular beam epitaxy Faisceaux moléculaires Moleculaire-bundelepitaxie gtt Surfaces (Physique) Surfaces (Technologie) Épitaxie Molecular beam epitaxy Surfaces (Physics) Surfaces (Technology) Molekularstrahlepitaxie (DE-588)4170399-6 gnd Festkörperoberfläche (DE-588)4127823-9 gnd |
subject_GND | (DE-588)4170399-6 (DE-588)4127823-9 |
title | Materials fundamentals of molecular beam epitaxy |
title_auth | Materials fundamentals of molecular beam epitaxy |
title_exact_search | Materials fundamentals of molecular beam epitaxy |
title_full | Materials fundamentals of molecular beam epitaxy Jeffrey Y. Tsao |
title_fullStr | Materials fundamentals of molecular beam epitaxy Jeffrey Y. Tsao |
title_full_unstemmed | Materials fundamentals of molecular beam epitaxy Jeffrey Y. Tsao |
title_short | Materials fundamentals of molecular beam epitaxy |
title_sort | materials fundamentals of molecular beam epitaxy |
topic | Faisceaux moléculaires Moleculaire-bundelepitaxie gtt Surfaces (Physique) Surfaces (Technologie) Épitaxie Molecular beam epitaxy Surfaces (Physics) Surfaces (Technology) Molekularstrahlepitaxie (DE-588)4170399-6 gnd Festkörperoberfläche (DE-588)4127823-9 gnd |
topic_facet | Faisceaux moléculaires Moleculaire-bundelepitaxie Surfaces (Physique) Surfaces (Technologie) Épitaxie Molecular beam epitaxy Surfaces (Physics) Surfaces (Technology) Molekularstrahlepitaxie Festkörperoberfläche |
url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=005991502&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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