Proceedings of the First International Workshop on the Measurement and Characterization of Ultra-Shallow Doping Profiles in Semiconductors: 18 - 21 March 1991, MCNC, Center for Microelectronics, Research Triangle Park, North Carolina
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Bibliographic Details
Corporate Author: International Workshop on the Measurement and Characterization of Ultra Shallow Doping Profiles in Semiconductors Research Triangle Park, NC (Author)
Format: Conference Proceeding Book
Language:English
Published: New York American Institute of Physics 1992
Series:Journal of vacuum science and technology / B 10,1
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Item Description:Stücktitelaufnahme zu e. Zeitschriftenh.
Physical Description:S. 286 - 549 graph. Darst.

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